3364087

Information

• Patent Grant
• 3364087

• References
• Source

• Patent Number

  3,364,087

• Date Filed

  Not available

• Date Issued

  Tuesday, January 16, 1968
  57 years ago

• CPC

  • B23K26/123 - in an atmosphere of particular gases
  • B23K26/12 - in a special atmosphere
  • B23K26/127 - in an enclosure
  • C23C8/06 - using gases
  • C23C14/28 - by wave energy or particle radiation
  • C23C16/481 - by radiant heating of the substrate
  • C23F4/02 - by evaporation
  • C30B31/185 - Pattern diffusion
  • H01L21/00 - Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • Y10S148/071 - Heating, selective
  • Y10S148/093 - Laser beam treatment in general
  • Y10S430/165 - Thermal imaging composition

• US Classifications

  • 216 - Etching a substrate: processes
  • 118 - Coating apparatus
  • 148 - Metal treatment
  • 219 - Electric heating
  • 427 - Coating processes
  • 430 - Radiation imagery chemistry: process, composition, or product thereof
  • 438 - Semiconductor device manufacturing: process