3418181

Information

• Patent Grant
• 3418181

• References
• Source

• Patent Number

  3,418,181

• Date Filed

  Not available

• Date Issued

  Tuesday, December 24, 1968
  56 years ago

• CPC

  • H01L23/291 - Oxides or nitrides or carbides
  • H01L21/00 - Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • H01L29/00 - Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier
  • H01L2924/0002 - Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
  • Y10S148/036 - Diffusion, nonselective
  • Y10S148/043 - Dual dielectric
  • Y10S148/06 - Gettering
  • Y10S148/106 - Masks, special

• US Classifications

  • 438 - Semiconductor device manufacturing: process
  • 148 - Metal treatment