3425878

Information

• Patent Grant
• 3425878

• References
• Source

• Patent Number

  3,425,878

• Date Filed

  Not available

• Date Issued

  Tuesday, February 4, 1969
  56 years ago

• CPC

  • H01L21/00 - Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • C01B33/12 - Silica Hydrates thereof
  • H01L21/02381 - Silicon, silicon germanium, germanium
  • H01L21/02529 - Silicon carbide
  • H01L21/0262 - Reduction or decomposition of gaseous compounds
  • Y10S118/90 - Semiconductor vapor doping
  • Y10S148/006 - Apparatus
  • Y10S148/051 - Etching
  • Y10S148/052 - Face to face deposition
  • Y10S438/913 - Diverse treatments performed in unitary chamber

• US Classifications

  • 117 - Single-crystal, oriented-crystal, and epitaxy growth processes
  • 118 - Coating apparatus
  • 148 - Metal treatment
  • 264 - Plastic and nonmetallic article shaping or treating: processes
  • 438 - Semiconductor device manufacturing: process