3475661

Information

• Patent Grant
• 3475661

• References
• Source

• Patent Number

  3,475,661

• Date Filed

  Not available

• Date Issued

  Tuesday, October 28, 1969
  55 years ago

• CPC

  • H01L21/00 - Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • C23C8/00 - Solid state diffusion of only non-metal elements into metallic material surfaces Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating
  • H01L21/02381 - Silicon, silicon germanium, germanium
  • H01L21/02532 - Silicon, silicon germanium, germanium
  • H01L21/0262 - Reduction or decomposition of gaseous compounds
  • H01L21/02639 - Preparation of substrate for selective deposition
  • H01L21/761 - PN junctions
  • H01L29/00 - Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier
  • Y10S148/037 - Diffusion-deposition
  • Y10S148/122 - Polycrystalline
  • Y10S438/922 - Diffusion along grain boundaries

• US Classifications

  • 257 - Active solid-state devices
  • 148 - Metal treatment
  • 438 - Semiconductor device manufacturing: process