3524114

Information

• Patent Grant
• 3524114

• References
• Source

• Patent Number

  3,524,114

• Date Filed

  Not available

• Date Issued

  Tuesday, August 11, 1970
  54 years ago

• CPC

  • H01L29/747 - Bidirectional devices
  • H01L21/00 - Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • H01L23/291 - Oxides or nitrides or carbides
  • H01L27/00 - Devices consisting of a plurality of semiconductor or other solid state components formed in or on a common substrate
  • H01L29/74 - Thyristor-type devices
  • H01L2924/0002 - Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
  • Y10S148/031 - Diffusion at an edge
  • Y10S148/043 - Dual dielectric
  • Y10S148/049 - Equivalence and options
  • Y10S148/051 - Etching
  • Y10S148/085 - Isolated-integrated
  • Y10S148/117 - Oxidation, selective

• US Classifications

  • 257 - Active solid-state devices
  • 148 - Metal treatment