3607468

Information

• Patent Grant
• 3607468

• References
• Source

• Patent Number

  3,607,468

• Date Filed

  Not available

• Date Issued

  Tuesday, September 21, 1971
  53 years ago

• CPC

  • H01L29/36 - characterised by the concentration or distribution of impurities in the bulk material
  • A47L15/42 - Details
  • G01D5/244 - influencing characteristics of pulses or pulse trains generating pulses or pulse trains
  • H01L21/00 - Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • H01L21/22 - Diffusion of impurity materials
  • H01L21/265 - producing ion implantation
  • H01L27/00 - Devices consisting of a plurality of semiconductor or other solid state components formed in or on a common substrate
  • H01L29/73 - Bipolar junction transistors
  • Y10S148/037 - Diffusion-deposition
  • Y10S148/04 - Dopants, special
  • Y10S148/085 - Isolated-integrated
  • Y10S148/151 - Simultaneous diffusion
  • Y10S148/157 - Special diffusion and profiles

• US Classifications

  • 438 - Semiconductor device manufacturing: process
  • 148 - Metal treatment
  • 257 - Active solid-state devices