3649388

Information

• Patent Grant
• 3649388

• References
• Source

• Patent Number

  3,649,388

• Date Filed

  Not available

• Date Issued

  Tuesday, March 14, 1972
  53 years ago

• CPC

  • H01L21/223 - using diffusion into or out of a solid from or into a gaseous phase
  • E04F17/02 - for carrying away waste gases
  • H01L21/00 - Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • H01L21/306 - Chemical or electrical treatment
  • Y10S148/003 - Anneal
  • Y10S148/04 - Dopants, special
  • Y10S148/041 - Doping control in crystal growth
  • Y10S148/079 - Inert carrier gas

• US Classifications

  • 438 - Semiconductor device manufacturing: process
  • 148 - Metal treatment