3711073

Information

• Patent Grant
• 3711073

• References
• Source

• Patent Number

  3,711,073

• Date Filed

  Not available

• Date Issued

  Tuesday, January 16, 1973
  52 years ago

• CPC

  • H01L21/00 - Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • C23C16/545 - for coating elongated substrates
  • C30B31/106 - Continuous processes
  • C30B31/12 - Heating of the reaction chamber
  • C30B31/16 - Feed and outlet means for the gases Modifying the flow of the gases
  • C30B33/005 - Oxydation
  • H01L21/223 - using diffusion into or out of a solid from or into a gaseous phase
  • H01L21/3065 - Plasma etching Reactive-ion etching
  • H01L23/29 - characterised by the material
  • H01L2924/0002 - Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

• US Classifications

  • 219 - Electric heating
  • 257 - Active solid-state devices
  • 266 - Metallurgical apparatus
  • 422 - Chemical apparatus and process disinfecting, deodorizing, preserving, or sterilizing
  • 432 - Heating