3755015

Information

• Patent Grant
• 3755015

• References
• Source

• Patent Number

  3,755,015

• Date Filed

  Not available

• Date Issued

  Tuesday, August 28, 1973
  51 years ago

• CPC

  • H01L21/31625 - Deposition of boron or phosphorus doped silicon oxide
  • H01J9/233 - Manufacture of photo-electric screens or charge-storage screens
  • H01J29/455 - formed on a silicon substrate
  • H01L21/02129 - the material being boron or phosphorus doped silicon oxides
  • H01L21/02271 - deposition by decomposition or reaction of gaseous or vapour phase compounds
  • H01L21/02282 - liquid deposition
  • H01L27/00 - Devices consisting of a plurality of semiconductor or other solid state components formed in or on a common substrate
  • Y10S148/026 - Deposition thru hole in mask
  • Y10S148/039 - Displace P-N junction
  • Y10S148/043 - Dual dielectric
  • Y10S148/115 - Orientation
  • Y10S148/118 - Oxide films

• US Classifications

  • 438 - Semiconductor device manufacturing: process
  • 136 - Batteries: thermoelectric and photoelectric
  • 148 - Metal treatment
  • 257 - Active solid-state devices
  • 313 - Electric lamp and discharge devices