3795554

Information

• Patent Grant
• 3795554

• References
• Source

• Patent Number

  3,795,554

• Date Filed

  Not available

• Date Issued

  Tuesday, March 5, 1974
  50 years ago

• CPC

  • H01L21/00 - Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • C30B29/06 - Silicon
  • C30B31/06 - by contacting with diffusion material in the gaseous state
  • C30B31/185 - Pattern diffusion
  • H01L29/00 - Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier
  • Y10S252/951 - for vapor transport
  • Y10S438/923 - Diffusion through a layer

• US Classifications

  • 438 - Semiconductor device manufacturing: process
  • 252 - Compositions