This disclosure relates to extreme ultraviolet (EUV) light sources, and more specifically to creating Xenon (Xe) droplets in a vacuum.
EUV light sources, which typically produce light with a wavelength of 13.5 nm, are used in semiconductor manufacturing equipment. EUV light sources may operate by spraying Xenon (Xe) gas onto the outside surface of a spinning drum that is cooled with liquid nitrogen. Nitrogen gas produced by cooling the drum is exhausted from the drum while the drum spins. The Xe freezes on the outside surface of the drum, resulting in the formation of Xe ice on the outside surface of the drum. A diamond cutter blade shaves down the Xe ice to level it out. An infrared laser beam is focused on the Xe ice surface, sparking a plasma that emits EUV light, including 13.5 nm light. Such light sources, while effective, are complex, heavy, and expensive.
Accordingly, there is a need for simpler EUV light sources.
In some embodiments, an apparatus includes a vacuum chamber and a cup, disposed in the vacuum chamber, to hold liquid Xe. The cup has an open top. The apparatus also includes a piezoelectric transducer, disposed in the cup, to generate acoustic waves through the liquid Xe in the cup. The acoustic waves are to create liquid Xe droplets that fly out of the cup. The apparatus may further include a laser to generate laser-beam pulses and optics to focus the laser-beam pulses onto respective liquid Xe droplets that have flown out of the cup, to generate EUV light.
In some embodiments, a method includes producing a vacuum in a vacuum chamber. With the vacuum in the vacuum chamber, liquid Xe is held in a cup with an open top. The cup is disposed in the vacuum chamber. Also with the vacuum in the vacuum chamber, acoustic waves are generated through the liquid Xe in the cup, using a piezoelectric transducer disposed in the cup. The acoustic waves create liquid Xe droplets that fly out of the cup. The method may further include generating laser-beam pulses and focusing the laser-beam pulses onto respective liquid Xe droplets that have flown out of the cup, to generate EUV light.
For a better understanding of the various described implementations, reference should be made to the Detailed Description below, in conjunction with the following drawings.
Like reference numerals refer to corresponding parts throughout the drawings and specification.
Reference will now be made in detail to various embodiments, examples of which are illustrated in the accompanying drawings. In the following detailed description, numerous specific details are set forth in order to provide a thorough understanding of the various described embodiments. However, it will be apparent to one of ordinary skill in the art that the various described embodiments may be practiced without these specific details. In other instances, well-known methods, procedures, components, circuits, and networks have not been described in detail so as not to unnecessarily obscure aspects of the embodiments.
A piezoelectric transducer 112 is disposed in the cup 104. For example, the piezoelectric transducer 112 is disposed at the bottom of the cup 104. The piezoelectric transducer 112 generates acoustic waves 114 that travel through the liquid Xe 110 in the cup 104. The acoustic waves 114 are focused on a point at the surface of the liquid Xe 110. This point is the focal point of the piezoelectric transducer 112. The acoustic waves 114 create droplets 116 of liquid Xe, which fly out of the cup 104 (i.e., out of the open top 106 of the cup 104). In some embodiments, the liquid Xe droplets 116 have a diameter of approximately 100 um (e.g., to within 5% or 10%). By having the liquid Xe droplets 116 fly out of the open top 106 of the cup 104, the EUV light source 100 avoids the use of a nozzle to dispense the liquid Xe droplets 116.
The piezoelectric transducer 112 is driven by a piezo driver 126, to which the piezoelectric transducer 112 is electrically connected. The piezo driver 126 repeatedly provides a voltage to the piezoelectric transducer 112, causing the piezoelectric transducer 112 to expand and thus to generate an acoustic wave 114. The piezo driver 126 may provide the voltage to the piezoelectric transducer 112 at a regular frequency (i.e., periodically), such that the acoustic waves 114 are generated at this frequency and the liquid Xe droplets 116 are created at this frequency. In some embodiments, the frequency is on the scale of kilohertz or tens of kilohertz. For example, the frequency is in the range of 5-15 kHz.
The EUV light source 100 further includes a laser 118 (e.g., an infrared laser) that generates laser-beam pulses 124 (e.g., infrared laser-beam pulses). Optics, including for example an objective 120 (i.e., an objective lens), focus the laser-beam pulses 124 onto respective liquid Xe droplets 116. In some embodiments, the objective 120 is disposed in a port 122 in a wall of the vacuum chamber 102, with the laser-beam pulses 124 being introduced into the vacuum chamber 102 through the objective 120. When a laser-beam pulse 124 hits a respective liquid Xe droplet 116, it causes the liquid Xe droplet 116 to explode, sparking a plasma. The plasma emits EUV light, including 13.5 nm light. The vacuum chamber 102 may further include collection mirrors (not shown) that collect the EUV light and ports through which the collected EUV light exits the vacuum chamber 102. EUV optics outside of the vacuum chamber 102 (not shown) direct the collected EUV light to a target. In some embodiments, the distance from the open top 106 of the cup 104 and the point at which laser-beam pulses hit respective liquid Xe droplets 116 is in the range of 5-6 inches.
The explosion caused by a laser-beam pulse 124 hitting a respective liquid Xe droplet 116 generates a shockwave that may disturb the trajectory of subsequent liquid Xe droplets 116 (i.e., droplets 116 below the exploding droplet 116) and roil the surface of the liquid Xe 110 in the cup 104. These effects may prevent subsequent liquid Xe droplets 116 from passing through the point of focus of the laser-beam pulses 124. The effects of the shockwave may be allowed to die out before hitting another liquid Xe droplet 116 with a respective laser-beam pulse 124. To allow the effects of the shockwave to die out, one or more liquid Xe droplets 116 may be allowed to pass without being hit by corresponding laser-beam pulses 124 (i.e., without corresponding laser-beam pulses 124 being generated and focused on them). Only every nth liquid Xe droplet 116 thus may have a respective laser-beam pulse 124 focused on it, where n is an integer greater than one, in accordance with some embodiments. Accordingly, the laser 118 may generate the laser-beam pulses 124 with a timing that causes successive respective liquid Xe droplets 116 onto which the laser-beam pulses 124 are focused to be separated by a specified number of liquid Xe droplets 116 from the cup 104 that are not illuminated by (i.e., hit by) the laser-beam pulses 124. The frequency with which the laser-beam pulses 124 are generated and focused onto respective liquid Xe droplets 116 therefore may be 1/n times the frequency at which liquid Xe droplets 116 are created. This approach helps to ensure that liquid Xe droplets 116 are hit by the laser-beam pulses 124 in a reliable, repeatable manner.
In some embodiments, the open top 106 of the cup 104 has sharp edges 108. (The plural term edges as used herein may refer to a single edge, if, for example, the cup 104 is round or has another shape without corners such that there is only one edge 108.) The pump 204 may be configured to provide the liquid Xe 110 to the cup 104 at a rate (e.g., a constant rate) sufficient to cause the liquid Xe 110 to continuously overflow the top of the cup 204, over the sharp edges 108. By having the liquid Xe 110 continuously overflow the top of the cup 104, the liquid Xe 110 is held at a constant height in the cup 104. Holding the liquid Xe 110 at a constant height helps to ensure that the liquid Xe droplets 116 are created in a repeatable manner.
In the examples of
Creation of a liquid Xe droplet 116 (i.e., emission of a liquid Xe droplet 116 from the cup 104) creates waves on the surface of the liquid Xe 110, such as a wave 402. If the wave 402 is situated at or near the focal point of the piezoelectric transducer 112 when an acoustic wave 114 reaches the focal point, the wave 402 will cause the liquid Xe droplet 116 to fly out of the cup 104 in a non-vertical direction. This non-vertical direction is at an acute angle to the open top 106 of the cup 104 (with the open top 106 being horizontal in
In some embodiments, the direction and/or shape of the waves, including the wave 402, are controlled at least in part through the design of the cup.
The second wall (or second wall portion) 504 may have a sharp edge 108. The liquid Xe 110 in the cup 502 may continuously overflow the sharp edge 108. The first wall (or first wall portion) 506 may or may not have a sharp edge. The liquid Xe 110 in the cup 502 does not overflow the top of the first wall (or first wall portion) 506.
The light source 500 is an alternative to the light source 400 (
The vacuum chamber 602 includes one or more baffles 604 that separate a first vacuum zone 608 of the vacuum chamber 602 from a second vacuum zone 610 of the vacuum chamber 602. The first and second vacuum zones 608 and 610 may be separately pumped using respective vacuum pumps. The cup 104 is disposed in the second vacuum zone 610. Liquid Xe droplets 116 from the cup 104 pass through an aperture 606 in the one or more baffles 604 into the first vacuum zone 608, where at least some of the liquid Xe droplets 116 (e.g., every nth liquid Xe droplet 116) are hit by respective laser-beam pulses 124. The one or more baffles 604 protect the surface of the liquid Xe 110 in the cup 104 from the resulting shockwaves.
In the method 700, a vacuum is provided (702) in a vacuum chamber (e.g., vacuum chamber 102,
Liquid Xe (e.g., liquid Xe 110,
Acoustic waves (e.g., acoustic waves 114,
In some embodiments, the liquid Xe that overflows the first cup in step 708 is collected (718) in a second cup (e.g., second cup 302,
Laser-beam pulses (e.g., laser-beam pulses 124,
The steps of the method 700 are shown as being performed in a particular order. In practice, however, steps 704-722 are performed in an overlapping, ongoing manner.
The foregoing description, for purpose of explanation, has been described with reference to specific embodiments. However, the illustrative discussions above are not intended to be exhaustive or to limit the scope of the claims to the precise forms disclosed. Many modifications and variations are possible in view of the above teachings. The embodiments were chosen in order to best explain the principles underlying the claims and their practical applications, to thereby enable others skilled in the art to best use the embodiments with various modifications as are suited to the particular uses contemplated.
This application claims the benefit of U.S. Provisional Patent Application No. 63/522,416, filed on Jun. 22, 2023, which is incorporated by reference in its entirety for all purposes.
| Number | Date | Country | |
|---|---|---|---|
| 63522416 | Jun 2023 | US |