involving a beam of energy

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H05G2/008

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Parent Industries

HELECTRICITY H05Electric techniques H05GX-RAY TECHNIQUE H05G2/00Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes

Current Industry

H05G2/008involving a beam of energy

Industries

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Patents Grantslast 30 patents

Information Patent Grant
EUV light source device and plasma gas recycling system for high-de...
- Patent number 12,250,763
- Issue date Mar 11, 2025
- ESOL Inc.
- Dong Gun Lee
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Light source apparatus
- Patent number 12,250,762
- Issue date Mar 11, 2025
- Ushio Denki Kabushiki Kaisha
- Yusuke Teramoto
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Optical isolation module
- Patent number 12,245,350
- Issue date Mar 4, 2025
- ASML Netherlands B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method for performing lithography process, light source, and EUV li...
- Patent number 12,235,594
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chi Yang
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
EUV light source target metrology
- Patent number 12,238,848
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- Robert Jay Rafac
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Laser amplification device and extreme ultraviolet light generation...
- Patent number 12,230,936
- Issue date Feb 18, 2025
- Mitsubishi Electric Corporation
- Yuzuru Tadokoro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Robust fluid coupling apparatus
- Patent number 12,222,050
- Issue date Feb 11, 2025
- ASML Netherlands B.V.
- Benjamin Andrew Sams
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Device and method to remove debris from an extreme ultraviolet (EUV...
- Patent number 12,216,413
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Han Lin
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Extreme ultraviolet lithography system with heated tin vane bucket...
- Patent number 12,207,381
- Issue date Jan 21, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ssu-Yu Chen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Target supply system, extreme ultraviolet light generation apparatu...
- Patent number 12,207,382
- Issue date Jan 21, 2025
- Gigaphoton Inc.
- Nozomu Oue
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method and apparatus for efficient high harmonic generation
- Patent number 12,196,688
- Issue date Jan 14, 2025
- ASML Netherlands B.V.
- Petrus Wilhelmus Smorenburg
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for generating extreme ultraviolet radiation
- Patent number 12,193,136
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wei-Chih Lai
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
EUV vessel perimeter flow auto adjustment
- Patent number 12,189,298
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Che-Chang Hsu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
EUV light generation apparatus, electronic device manufacturing met...
- Patent number 12,185,449
- Issue date Dec 31, 2024
- Gigaphoton Inc.
- Fumio Iwamoto
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Semiconductor manufacturing apparatus and operating method thereof
- Patent number 12,185,450
- Issue date Dec 31, 2024
- Samsung Electronics Co., Ltd.
- Dohyung Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Calibration system for an extreme ultraviolet light source
- Patent number 12,174,550
- Issue date Dec 24, 2024
- ASML Netherlands B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System for monitoring a plasma
- Patent number 12,171,053
- Issue date Dec 17, 2024
- ASML Netherlands B.V.
- Michael Anthony Purvis
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
EUV light source with a beam positioning device
- Patent number 12,171,054
- Issue date Dec 17, 2024
- TRUMPF Lasersystems for Semiconductor Manufacturing SE
- Martin Lambert
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
EUV light source and apparatus for lithography
- Patent number 12,167,525
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shang-Chieh Chien
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method and system for generating droplets for EUV photolithography...
- Patent number 12,167,526
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Kuang Sun
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Target substance replenishment device, extreme ultraviolet light ge...
- Patent number 12,150,233
- Issue date Nov 19, 2024
- Gigaphoton Inc.
- Yutaka Shiraishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Droplet generator nozzle
- Patent number 12,139,436
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Dietmar Uwe Herbert Trees
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method and apparatus for mitigating contamination
- Patent number 12,130,555
- Issue date Oct 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Ping Yen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Rotating target for extreme ultraviolet source with liquid metal
- Patent number 12,133,318
- Issue date Oct 29, 2024
- KLA Corporation
- Alexander Bykanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus and method for generating extreme ultraviolet radiation
- Patent number 12,133,319
- Issue date Oct 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ting-Ya Cheng
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
EUV lithography apparatus
- Patent number 12,119,129
- Issue date Oct 15, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng Hung Tsai
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Shock wave visualization for extreme ultraviolet plasma optimization
- Patent number 12,114,412
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yen-Shuo Su
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for generating extreme ultraviolet radiation
- Patent number 12,114,411
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Huan Chen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Laser sustained plasma and endoscopy light source
- Patent number 12,108,515
- Issue date Oct 1, 2024
- Excelitas Technologies Singapore Pte. Ltd.
- Rudi Blondia
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method for using radiation source apparatus
- Patent number 12,096,543
- Issue date Sep 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chiao-Hua Cheng
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
EUV RADIATION GENERATION FOLLOWING LASER BEAM ROTATION
- Publication number 20250113427
- Publication date Apr 3, 2025
- TRUMPF Lasersystems for Semiconductor Manufacturing GmbH
- Stefan Piehler
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SAPPHIRE LAMP FOR LASER SUSTAINED PLASMA BROADBAND LIGHT SOURCE
- Publication number 20250106973
- Publication date Mar 27, 2025
- KLA Corporation
- Sergei Gluchko
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION
- Publication number 20250106974
- Publication date Mar 27, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wei-Chih LAI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
LIGHT SOURCE SYSTEM AND METHOD OF OPERATION
- Publication number 20250098056
- Publication date Mar 20, 2025
- xLight Inc.
- David Douglas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VIBRATION-MONITORED LASER OPTICAL UNIT
- Publication number 20250093197
- Publication date Mar 20, 2025
- TRUMPF Lasersystems for Semiconductor Manufacturing GmbH
- Stefan Piehler
- G01 - MEASURING TESTING
Information Patent Application
EUV LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD
- Publication number 20250089150
- Publication date Mar 13, 2025
- Gigaphoton Inc.
- Yuichi NISHIMURA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
CALIBRATION SYSTEM FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20250085641
- Publication date Mar 13, 2025
- ASML NETHERLANDS B.V.
- Daniel Jason Riggs
- G01 - MEASURING TESTING
Information Patent Application
EXTREME ULTRAVIOLET (EUV) SOURCE AND A SUBSTRATE PROCESSING APPARAT...
- Publication number 20250076776
- Publication date Mar 6, 2025
- Samsung Electronics Co., Ltd.
- SEUNGPYO HONG
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Light Source Using Pre-Ionization
- Publication number 20250081319
- Publication date Mar 6, 2025
- Hamamatsu Photonics K. K.
- Frederick Marvin Niell
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EXTREME ULTRAVIOLET LIGHT GENERATING DEVICE
- Publication number 20250081320
- Publication date Mar 6, 2025
- Samsung Electronics Co., Ltd.
- Injae LEE
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
NEW DESIGN OF EUV VESSEL PERIMETER FLOW AUTO ADJUSTMENT
- Publication number 20250076770
- Publication date Mar 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Che-Chang HSU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EXTREME ULTRAVIOLET LIGHT GENERATION CHAMBER DEVICE AND ELECTRONIC...
- Publication number 20250071880
- Publication date Feb 27, 2025
- Gigaphoton Inc.
- Masaki NAKANO
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
LIGHT SOURCE SYSTEM AND METHOD OF OPERATION
- Publication number 20250056704
- Publication date Feb 13, 2025
- xLight Inc.
- David Douglas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APERTURE AND METHOD
- Publication number 20250031294
- Publication date Jan 23, 2025
- ASML NETHERLANDS B.V.
- Roger Anton Marie TIMMERMANS
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS FOR SUPPLYING LIQUID TARGET MATERIAL TO A RADIATION SOURCE
- Publication number 20250021026
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- William Peter VAN DRENT
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
AN ASSEMBLY FOR A LASER-OPERATED LIGHT SOURCE AND METHOD OF USE
- Publication number 20250021009
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Ferry ZIJP
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND DEVICE FOR GENERATING ISOLATED ULTRASHORT ELECTROMAGNETI...
- Publication number 20250024579
- Publication date Jan 16, 2025
- Commissariat A L'Energie Atomique et Aux Energies Alternatives
- Henri VINCENTI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
OPTICAL SYSTEM AND METHOD FOR A RADIATION SOURCE
- Publication number 20250008634
- Publication date Jan 2, 2025
- ASML NETHERLANDS B.V.
- Andrey Sergeevich TYCHKOV
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Acoustic Xenon Droplet Generator
- Publication number 20240431012
- Publication date Dec 26, 2024
- KLA Corporation
- Sherman Seelinger
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EXTREME ULTRAVIOLET LIGHT SOURCE WITH THERMAL STABILIZATION
- Publication number 20240422888
- Publication date Dec 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Hsing Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET LIGHT GENERATION CHAMBER DEVICE AND ELECTRONIC...
- Publication number 20240422889
- Publication date Dec 19, 2024
- Gigaphoton Inc.
- Takayuki SUZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SO...
- Publication number 20240419083
- Publication date Dec 19, 2024
- ASML NETHERLANDS B.V.
- Robert Jay Rafac
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL MODULE FOR EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20240397603
- Publication date Nov 28, 2024
- ASML NETHERLANDS B.V.
- Erik Fernando Huerta
- G02 - OPTICS
Information Patent Application
CONTROL OF DYNAMIC GAS LOCK FLOW INLETS OF AN INTERMEDIATE FOCUS CAP
- Publication number 20240385527
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Kai CHANG
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
ENTANGLED PHOTON LIGHT SOURCE SYSTEMS AND METHODS
- Publication number 20240389214
- Publication date Nov 21, 2024
- Purdue Research Foundation
- Niranjan H. Shivaram
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
LITHOGRAPHY THERMAL CONTROL
- Publication number 20240389215
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tai-Yu CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR MONITORING AND CONTROLLING EXTREME ULTRAVIOLE...
- Publication number 20240377752
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tai-Yu CHEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION
- Publication number 20240381515
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ting-Ya CHENG
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SYSTEM AND METHOD FOR DETECTING DEBRIS IN A PHOTOLITHOGRAPHY SYSTEM
- Publication number 20240377764
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Yu TU
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EUV LITHOGRAPHY APPARATUS
- Publication number 20240379259
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng Hung TSAI
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING

involving a beam of energy

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

EUV light source device and plasma gas recycling system for high-de...

Light source apparatus

Optical isolation module

Method for performing lithography process, light source, and EUV li...

EUV light source target metrology

Laser amplification device and extreme ultraviolet light generation...

Robust fluid coupling apparatus

Device and method to remove debris from an extreme ultraviolet (EUV...

Extreme ultraviolet lithography system with heated tin vane bucket...

Target supply system, extreme ultraviolet light generation apparatu...

Method and apparatus for efficient high harmonic generation

Apparatus and method for generating extreme ultraviolet radiation

EUV vessel perimeter flow auto adjustment

EUV light generation apparatus, electronic device manufacturing met...

Semiconductor manufacturing apparatus and operating method thereof

Calibration system for an extreme ultraviolet light source

System for monitoring a plasma

EUV light source with a beam positioning device

EUV light source and apparatus for lithography

Method and system for generating droplets for EUV photolithography...

Target substance replenishment device, extreme ultraviolet light ge...

Droplet generator nozzle

Method and apparatus for mitigating contamination

Rotating target for extreme ultraviolet source with liquid metal

Apparatus and method for generating extreme ultraviolet radiation

EUV lithography apparatus

Shock wave visualization for extreme ultraviolet plasma optimization

Apparatus and method for generating extreme ultraviolet radiation

Laser sustained plasma and endoscopy light source

Method for using radiation source apparatus

Patents Applicationslast 30 patents

EUV RADIATION GENERATION FOLLOWING LASER BEAM ROTATION

SAPPHIRE LAMP FOR LASER SUSTAINED PLASMA BROADBAND LIGHT SOURCE

APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION

LIGHT SOURCE SYSTEM AND METHOD OF OPERATION

VIBRATION-MONITORED LASER OPTICAL UNIT

EUV LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD

CALIBRATION SYSTEM FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE

EXTREME ULTRAVIOLET (EUV) SOURCE AND A SUBSTRATE PROCESSING APPARAT...

Light Source Using Pre-Ionization

EXTREME ULTRAVIOLET LIGHT GENERATING DEVICE

NEW DESIGN OF EUV VESSEL PERIMETER FLOW AUTO ADJUSTMENT

EXTREME ULTRAVIOLET LIGHT GENERATION CHAMBER DEVICE AND ELECTRONIC...

LIGHT SOURCE SYSTEM AND METHOD OF OPERATION

APERTURE AND METHOD

APPARATUS FOR SUPPLYING LIQUID TARGET MATERIAL TO A RADIATION SOURCE

AN ASSEMBLY FOR A LASER-OPERATED LIGHT SOURCE AND METHOD OF USE

METHOD AND DEVICE FOR GENERATING ISOLATED ULTRASHORT ELECTROMAGNETI...

OPTICAL SYSTEM AND METHOD FOR A RADIATION SOURCE

Acoustic Xenon Droplet Generator

EXTREME ULTRAVIOLET LIGHT SOURCE WITH THERMAL STABILIZATION

EXTREME ULTRAVIOLET LIGHT GENERATION CHAMBER DEVICE AND ELECTRONIC...

LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SO...

OPTICAL MODULE FOR EXTREME ULTRAVIOLET LIGHT SOURCE

CONTROL OF DYNAMIC GAS LOCK FLOW INLETS OF AN INTERMEDIATE FOCUS CAP

ENTANGLED PHOTON LIGHT SOURCE SYSTEMS AND METHODS

LITHOGRAPHY THERMAL CONTROL

SYSTEM AND METHOD FOR MONITORING AND CONTROLLING EXTREME ULTRAVIOLE...

APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION

SYSTEM AND METHOD FOR DETECTING DEBRIS IN A PHOTOLITHOGRAPHY SYSTEM

EUV LITHOGRAPHY APPARATUS