by plasma EUV sources

Industry

CPC
G03F7/70033

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70033by plasma EUV sources

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 12,265,336
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kai-Chieh Chang
- G02 - OPTICS
Information Patent Grant
Solution, solution storage body, actinic ray-sensitive or radiation...
- Patent number 12,253,801
- Issue date Mar 18, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV photolithography system fuel source and methods of operating th...
- Patent number 12,235,586
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Cheng-Hao Lai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for performing lithography process, light source, and EUV li...
- Patent number 12,235,594
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chi Yang
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Radiation conduit
- Patent number 12,235,585
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- Remco Johannes Elisa Heijmans
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of forming an enhanced unexposed photoresist layer
- Patent number 12,222,644
- Issue date Feb 11, 2025
- ASM IP Holding B.V.
- Jan Willem Maes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device and method to remove debris from an extreme ultraviolet (EUV...
- Patent number 12,216,413
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Han Lin
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Reticle cleaning device and method of use
- Patent number 12,210,295
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Che-Chang Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet lithography system with heated tin vane bucket...
- Patent number 12,207,381
- Issue date Jan 21, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ssu-Yu Chen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Target supply system, extreme ultraviolet light generation apparatu...
- Patent number 12,207,382
- Issue date Jan 21, 2025
- Gigaphoton Inc.
- Nozomu Oue
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method for reducing line-end space in integrated circuit patterning
- Patent number 12,197,131
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jing-Huei Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for efficient high harmonic generation
- Patent number 12,196,688
- Issue date Jan 14, 2025
- ASML Netherlands B.V.
- Petrus Wilhelmus Smorenburg
- G01 - MEASURING TESTING
Information Patent Grant
Methods for extreme ultraviolet (EUV) resist patterning development
- Patent number 12,189,297
- Issue date Jan 7, 2025
- Tokyo Electron Limited
- Yun Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning a structure surface in an EUV chamber
- Patent number 12,189,313
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Chunguang Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV vessel perimeter flow auto adjustment
- Patent number 12,189,298
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Che-Chang Hsu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
EUV light generation apparatus, electronic device manufacturing met...
- Patent number 12,185,449
- Issue date Dec 31, 2024
- Gigaphoton Inc.
- Fumio Iwamoto
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Semiconductor manufacturing apparatus and operating method thereof
- Patent number 12,185,450
- Issue date Dec 31, 2024
- Samsung Electronics Co., Ltd.
- Dohyung Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Calibration system for an extreme ultraviolet light source
- Patent number 12,174,550
- Issue date Dec 24, 2024
- ASML Netherlands B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System and method for performing extreme ultraviolet photolithograp...
- Patent number 12,174,545
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tai-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System for monitoring a plasma
- Patent number 12,171,053
- Issue date Dec 17, 2024
- ASML Netherlands B.V.
- Michael Anthony Purvis
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
EUV light source with a beam positioning device
- Patent number 12,171,054
- Issue date Dec 17, 2024
- TRUMPF Lasersystems for Semiconductor Manufacturing SE
- Martin Lambert
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
EUV light source and apparatus for lithography
- Patent number 12,167,525
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shang-Chieh Chien
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 12,164,235
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shao-Hua Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for generating droplets for EUV photolithography...
- Patent number 12,167,526
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Kuang Sun
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Particle removal device and method
- Patent number 12,158,701
- Issue date Dec 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng-Hsuan Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Counterflow gas nozzle for contamination mitigation in extreme ultr...
- Patent number 12,158,576
- Issue date Dec 3, 2024
- KLA Corporation
- Rudy F. Garcia
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and systems for reducing particulate deposition on photomask
- Patent number 12,158,707
- Issue date Dec 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jui-Chieh Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning method, method for forming semiconductor structure and sys...
- Patent number 12,153,341
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Wu-Hung Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhancing lithography operation for manufacturing semiconductor dev...
- Patent number 12,153,351
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yi-Chen Su
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing semiconductor devices
- Patent number 12,153,350
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ru-Gun Liu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVIN...
- Publication number 20250110402
- Publication date Apr 3, 2025
- NISSAN CHEMICAL CORPORATION
- Kodai KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATT...
- Publication number 20250110405
- Publication date Apr 3, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING A PATTERN ON A SUBSTRATE
- Publication number 20250110411
- Publication date Apr 3, 2025
- ASM IP HOLDING B.V.
- Kishan Ashokbhai Patel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RETICLE CLEANING DEVICE AND METHOD OF USE
- Publication number 20250110414
- Publication date Apr 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Che-Chang HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD, AND RESIST BASE FILM...
- Publication number 20250110407
- Publication date Apr 3, 2025
- JSR Corporation
- Hiroyuki KOMATSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250102911
- Publication date Mar 27, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RETICLE MASKING DEVICE, SUBSTRATE PROCESSING APPARATUS INCLUDING TH...
- Publication number 20250102926
- Publication date Mar 27, 2025
- Samsung Electronics Co., Ltd.
- Sanghwan LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM WITH FUEL CELL AND METHODS
- Publication number 20250102927
- Publication date Mar 27, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien-Hua FU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIN COMPOUNDS CONTAINING A TIN-OXYGEN DOUBLE BOND, A PHOTORESIST CO...
- Publication number 20250102909
- Publication date Mar 27, 2025
- INDUSTRY FOUNDATION OF CHONNAM NATIONAL UNIVERSITY
- Hyun-Dam JEONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIFFERENTIAL EVACUATION DEVICE AND ELECTRONIC DEVICE MANUFACTURING...
- Publication number 20250102919
- Publication date Mar 27, 2025
- Gigaphoton Inc.
- Atsushi UEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR AREA SELECTIVE DEPOSITION ON EXTREME ULTRA-VIOLET (EUV)...
- Publication number 20250093778
- Publication date Mar 20, 2025
- TOKYO ELECTRON LIMITED
- Lior Huli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY...
- Publication number 20250093763
- Publication date Mar 20, 2025
- Samsung Electronics Co., Ltd.
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Compound For Forming Metal-Containing Film, Composition For Forming...
- Publication number 20250087495
- Publication date Mar 13, 2025
- Shin-Etsu Chemical Co., Ltd.
- Shohei Iwamori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR ELECTRIC FIELD-ASSISTED LITHOGRAPHY
- Publication number 20250085639
- Publication date Mar 13, 2025
- ASM IP HOLDING B.V.
- Fatemeh Davodi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CALIBRATION SYSTEM FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20250085641
- Publication date Mar 13, 2025
- ASML NETHERLANDS B.V.
- Daniel Jason Riggs
- G01 - MEASURING TESTING
Information Patent Application
CLEANING A STRUCTURE SURFACE IN AN EUV CHAMBER
- Publication number 20250085643
- Publication date Mar 13, 2025
- ASML NETHERLANDS B.V.
- Chunguang Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET (EUV) SOURCE AND A SUBSTRATE PROCESSING APPARAT...
- Publication number 20250076776
- Publication date Mar 6, 2025
- Samsung Electronics Co., Ltd.
- SEUNGPYO HONG
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Methods for Extreme Ultraviolet (EUV) Resist Patterning Development
- Publication number 20250076771
- Publication date Mar 6, 2025
- TOKYO ELECTRON LIMITED
- Yun Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET SOURCE CLEANING APPARATUS, EUV SOURCE CLEANING...
- Publication number 20250076775
- Publication date Mar 6, 2025
- SAMSUNG ELECTRONICS CO,. LTD.
- CHULMIN CHO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Light Source Using Pre-Ionization
- Publication number 20250081319
- Publication date Mar 6, 2025
- Hamamatsu Photonics K. K.
- Frederick Marvin Niell
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EXTREME ULTRAVIOLET LIGHT GENERATING DEVICE
- Publication number 20250081320
- Publication date Mar 6, 2025
- Samsung Electronics Co., Ltd.
- Injae LEE
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
NEW DESIGN OF EUV VESSEL PERIMETER FLOW AUTO ADJUSTMENT
- Publication number 20250076770
- Publication date Mar 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Che-Chang HSU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LITHOGRAPHIC APPARATUS, ILLUMINATION SYSTEM, AND CONNECTION SEALING...
- Publication number 20250060682
- Publication date Feb 20, 2025
- ASML NETHERLANDS B.V.
- Armin Bernhard RIDINGER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS
- Publication number 20250060673
- Publication date Feb 20, 2025
- LAM RESEARCH CORPORATION
- Chenghao Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
- Publication number 20250053103
- Publication date Feb 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shao-Hua WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND SYSTEMS FOR REDUCING PARTICULATE DEPOSITION ON PHOTOMASK
- Publication number 20250053104
- Publication date Feb 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jui-Chieh Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLE POD PROVIDED WITH RETICLE SUPPORT FOR ABSORBING DOWNWARD PR...
- Publication number 20250053100
- Publication date Feb 13, 2025
- GUDENG PRECISION INDUSTRIAL CO,. LTD.
- Ming-Chien Chiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PUPIL FILTER WITH SPATIALLY-VARYING TRANSMISSION
- Publication number 20250044679
- Publication date Feb 6, 2025
- KLA Corporation
- Alexander Pokrovskiy
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES
- Publication number 20250044708
- Publication date Feb 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ru-Gun LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE AND SILICON-CONTAINING...
- Publication number 20250044701
- Publication date Feb 6, 2025
- JSR Corporation
- Kazunori SAKAI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

by plasma EUV sources

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor processing tool and methods of operation

Solution, solution storage body, actinic ray-sensitive or radiation...

EUV photolithography system fuel source and methods of operating th...

Method for performing lithography process, light source, and EUV li...

Radiation conduit

Method of forming an enhanced unexposed photoresist layer

Device and method to remove debris from an extreme ultraviolet (EUV...

Reticle cleaning device and method of use

Extreme ultraviolet lithography system with heated tin vane bucket...

Target supply system, extreme ultraviolet light generation apparatu...

Method for reducing line-end space in integrated circuit patterning

Method and apparatus for efficient high harmonic generation

Methods for extreme ultraviolet (EUV) resist patterning development

Cleaning a structure surface in an EUV chamber

EUV vessel perimeter flow auto adjustment

EUV light generation apparatus, electronic device manufacturing met...

Semiconductor manufacturing apparatus and operating method thereof

Calibration system for an extreme ultraviolet light source

System and method for performing extreme ultraviolet photolithograp...

System for monitoring a plasma

EUV light source with a beam positioning device

EUV light source and apparatus for lithography

Semiconductor processing tool and methods of operation

Method and system for generating droplets for EUV photolithography...

Particle removal device and method

Counterflow gas nozzle for contamination mitigation in extreme ultr...

Methods and systems for reducing particulate deposition on photomask

Cleaning method, method for forming semiconductor structure and sys...

Enhancing lithography operation for manufacturing semiconductor dev...

Method of manufacturing semiconductor devices

Patents Applicationslast 30 patents

SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVIN...

MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATT...

METHOD FOR FORMING A PATTERN ON A SUBSTRATE

RETICLE CLEANING DEVICE AND METHOD OF USE

SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD, AND RESIST BASE FILM...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RETICLE MASKING DEVICE, SUBSTRATE PROCESSING APPARATUS INCLUDING TH...

LITHOGRAPHY SYSTEM WITH FUEL CELL AND METHODS

TIN COMPOUNDS CONTAINING A TIN-OXYGEN DOUBLE BOND, A PHOTORESIST CO...

DIFFERENTIAL EVACUATION DEVICE AND ELECTRONIC DEVICE MANUFACTURING...

METHOD FOR AREA SELECTIVE DEPOSITION ON EXTREME ULTRA-VIOLET (EUV)...

PHOTOMASK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY...

Compound For Forming Metal-Containing Film, Composition For Forming...

METHODS AND SYSTEMS FOR ELECTRIC FIELD-ASSISTED LITHOGRAPHY

CALIBRATION SYSTEM FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE

CLEANING A STRUCTURE SURFACE IN AN EUV CHAMBER

EXTREME ULTRAVIOLET (EUV) SOURCE AND A SUBSTRATE PROCESSING APPARAT...

Methods for Extreme Ultraviolet (EUV) Resist Patterning Development

EXTREME ULTRAVIOLET SOURCE CLEANING APPARATUS, EUV SOURCE CLEANING...

Light Source Using Pre-Ionization

EXTREME ULTRAVIOLET LIGHT GENERATING DEVICE

NEW DESIGN OF EUV VESSEL PERIMETER FLOW AUTO ADJUSTMENT

LITHOGRAPHIC APPARATUS, ILLUMINATION SYSTEM, AND CONNECTION SEALING...

DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

METHODS AND SYSTEMS FOR REDUCING PARTICULATE DEPOSITION ON PHOTOMASK

RETICLE POD PROVIDED WITH RETICLE SUPPORT FOR ABSORBING DOWNWARD PR...

PUPIL FILTER WITH SPATIALLY-VARYING TRANSMISSION

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES

METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE AND SILICON-CONTAINING...