by plasma EUV sources

Industry

CPC
G03F7/70033

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70033by plasma EUV sources

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
EUV light generation apparatus, electronic device manufacturing met...
- Patent number 12,185,449
- Issue date Dec 31, 2024
- Gigaphoton Inc.
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Semiconductor manufacturing apparatus and operating method thereof
- Patent number 12,185,450
- Issue date Dec 31, 2024
- Samsung Electronics Co., Ltd.
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Calibration system for an extreme ultraviolet light source
- Patent number 12,174,550
- Issue date Dec 24, 2024
- ASML Netherlands B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System and method for performing extreme ultraviolet photolithograp...
- Patent number 12,174,545
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tai-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System for monitoring a plasma
- Patent number 12,171,053
- Issue date Dec 17, 2024
- ASML Netherlands B.V.
- Michael Anthony Purvis
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
EUV light source with a beam positioning device
- Patent number 12,171,054
- Issue date Dec 17, 2024
- TRUMPF Lasersystems for Semiconductor Manufacturing SE
- Martin Lambert
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
EUV light source and apparatus for lithography
- Patent number 12,167,525
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shang-Chieh Chien
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 12,164,235
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shao-Hua Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for generating droplets for EUV photolithography...
- Patent number 12,167,526
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Kuang Sun
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Particle removal device and method
- Patent number 12,158,701
- Issue date Dec 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng-Hsuan Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Counterflow gas nozzle for contamination mitigation in extreme ultr...
- Patent number 12,158,576
- Issue date Dec 3, 2024
- KLA Corporation
- Rudy F. Garcia
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and systems for reducing particulate deposition on photomask
- Patent number 12,158,707
- Issue date Dec 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jui-Chieh Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning method, method for forming semiconductor structure and sys...
- Patent number 12,153,341
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Wu-Hung Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhancing lithography operation for manufacturing semiconductor dev...
- Patent number 12,153,351
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yi-Chen Su
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing semiconductor devices
- Patent number 12,153,350
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ru-Gun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mitigating long-term energy decay of laser devices
- Patent number 12,147,166
- Issue date Nov 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Ping Yen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Target substance replenishment device, extreme ultraviolet light ge...
- Patent number 12,150,233
- Issue date Nov 19, 2024
- Gigaphoton Inc.
- Yutaka Shiraishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Droplet generator nozzle
- Patent number 12,139,436
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Dietmar Uwe Herbert Trees
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Reticle enclosure for lithography systems
- Patent number 12,135,499
- Issue date Nov 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Pei-Cheng Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for mitigating contamination
- Patent number 12,130,555
- Issue date Oct 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Ping Yen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma position control for extreme ultraviolet lithography light s...
- Patent number 12,130,556
- Issue date Oct 29, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ssu-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for generating extreme ultraviolet radiation
- Patent number 12,133,319
- Issue date Oct 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ting-Ya Cheng
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Pellicle for an EUV lithography mask and a method of manufacturing...
- Patent number 12,117,725
- Issue date Oct 15, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV lithography apparatus
- Patent number 12,119,129
- Issue date Oct 15, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng Hung Tsai
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 12,111,583
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kai-Chieh Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image-forming optical system, exposure apparatus, and device produc...
- Patent number 12,105,428
- Issue date Oct 1, 2024
- Nikon Corporation
- Hideki Komatsuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for cleaning an EUV mask
- Patent number 12,099,310
- Issue date Sep 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yen-Hui Li
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method for controlling a lithographic system
- Patent number 12,099,306
- Issue date Sep 24, 2024
- ASML Netherlands B.V.
- Oscar Franciscus Jozephus Noordman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for using radiation source apparatus
- Patent number 12,096,543
- Issue date Sep 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chiao-Hua Cheng
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Semiconductor device manufacturing method and extreme ultraviolet m...
- Patent number 12,092,961
- Issue date Sep 17, 2024
- Samsung Electronics Co., Ltd.
- Sang Chul Yeo
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING TERMINATED PO...
- Publication number 20240427246
- Publication date Dec 26, 2024
- NISSAN CHEMICAL CORPORATION
- Tomotada HIROHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Acoustic Xenon Droplet Generator
- Publication number 20240431012
- Publication date Dec 26, 2024
- KLA Corporation
- Sherman Seelinger
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD AND APPARATUS FOR MASK REPAIR
- Publication number 20240419065
- Publication date Dec 19, 2024
- Carl Zeisss SMT GmbH
- Christian Felix Hermanns
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET LIGHT SOURCE WITH THERMAL STABILIZATION
- Publication number 20240422888
- Publication date Dec 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Hsing Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STRUCTURES FOR PATTERNING AND RELATED METHODS AND SYSTEMS
- Publication number 20240419068
- Publication date Dec 19, 2024
- ASM IP HOLDING B.V.
- Daniele Piumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY SELECTIVE ADHESION AND STRENGTH PROMOTERS IN SEMICONDUCT...
- Publication number 20240419079
- Publication date Dec 19, 2024
- Geminatio, Inc.
- Brennan Peterson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM AND METHODS
- Publication number 20240419082
- Publication date Dec 19, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ming-Hsin CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET LIGHT GENERATION CHAMBER DEVICE AND ELECTRONIC...
- Publication number 20240422889
- Publication date Dec 19, 2024
- Gigaphoton Inc.
- Takayuki SUZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SO...
- Publication number 20240419083
- Publication date Dec 19, 2024
- ASML NETHERLANDS B.V.
- Robert Jay Rafac
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR CALCULATING REPARATION DOSE FOR A DIE OF A...
- Publication number 20240411232
- Publication date Dec 12, 2024
- ASML NETHERLANDS B.V.
- Jingshi LI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND ASSOCIATED METHODS
- Publication number 20240411233
- Publication date Dec 12, 2024
- ASML NETHERLANDS B.V.
- Gosse Charles DE VRIES
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTEGRATED CIRCUIT WITH PATTERN OVERLAY FOR ASSISTING OVERLAY SIGNA...
- Publication number 20240405100
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Pei-Sheng TANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY SYSTEM AND METHODS
- Publication number 20240402623
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chen-Pin CHENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK SUBSTRATE AND MANUFACTURING METHOD THEREOF
- Publication number 20240393699
- Publication date Nov 28, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tomoaki SUGIYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ENHANCING LITHOGRAPHY OPERATION FOR MANUFACTURING SEMICONDUCTOR DEV...
- Publication number 20240393701
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi-Chen SU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLE ENCLOSURE FOR LITHOGRAPHY SYSTEMS
- Publication number 20240385511
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Hung LIAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD, METHOD FOR FORMING SEMICONDUCTOR STRUCTURE AND SYS...
- Publication number 20240385512
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- WU-HUNG KO
- B08 - CLEANING
Information Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
- Publication number 20240385537
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kai-Chieh CHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
- Publication number 20240385540
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kai-Chieh CHANG
- G02 - OPTICS
Information Patent Application
MASK CHARACTERIZATION METHODS AND APPARATUSES
- Publication number 20240385111
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Cheng Chen
- G01 - MEASURING TESTING
Information Patent Application
DRY PHOTORESIST OR HARDMASK FOR EUV LITHOGRAPHY
- Publication number 20240385505
- Publication date Nov 21, 2024
- International Business Machines Corporation
- Gerhard Ingmar Meijer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Reducing Line-End Space in Integrated Circuit Patterning
- Publication number 20240385526
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- Jing-Huei Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EUV LITHOGRAPHY SYSTEM HAVING A GAS-BINDING COMPONENT
- Publication number 20240385541
- Publication date Nov 21, 2024
- Carl Zeiss SMT GMBH
- Wilbert KRUITHOF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONTROL OF DYNAMIC GAS LOCK FLOW INLETS OF AN INTERMEDIATE FOCUS CAP
- Publication number 20240385527
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Kai CHANG
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
MITIGATING LONG-TERM ENERGY DECAY OF LASER DEVICES
- Publication number 20240385542
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Ping YEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY THERMAL CONTROL
- Publication number 20240389215
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tai-Yu CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE, EXPOSURE ORIGINAL PLATE, EXPOSURE APPARATUS, METHOD OF MA...
- Publication number 20240385510
- Publication date Nov 21, 2024
- Mitsui Chemicals, Inc.
- Yousuke ONO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTEGRATED COUPON DESIGN FOR SURFACE COATING QUALITY
- Publication number 20240377759
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Wei HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR MONITORING AND CONTROLLING EXTREME ULTRAVIOLE...
- Publication number 20240377752
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tai-Yu CHEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
SYSTEM AND METHOD FOR CLEANING AN EUV MASK
- Publication number 20240377766
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Hui LI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

by plasma EUV sources

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

EUV light generation apparatus, electronic device manufacturing met...

Semiconductor manufacturing apparatus and operating method thereof

Calibration system for an extreme ultraviolet light source

System and method for performing extreme ultraviolet photolithograp...

System for monitoring a plasma

EUV light source with a beam positioning device

EUV light source and apparatus for lithography

Semiconductor processing tool and methods of operation

Method and system for generating droplets for EUV photolithography...

Particle removal device and method

Counterflow gas nozzle for contamination mitigation in extreme ultr...

Methods and systems for reducing particulate deposition on photomask

Cleaning method, method for forming semiconductor structure and sys...

Enhancing lithography operation for manufacturing semiconductor dev...

Method of manufacturing semiconductor devices

Mitigating long-term energy decay of laser devices

Target substance replenishment device, extreme ultraviolet light ge...

Droplet generator nozzle

Reticle enclosure for lithography systems

Method and apparatus for mitigating contamination

Plasma position control for extreme ultraviolet lithography light s...

Apparatus and method for generating extreme ultraviolet radiation

Pellicle for an EUV lithography mask and a method of manufacturing...

EUV lithography apparatus

Semiconductor processing tool and methods of operation

Image-forming optical system, exposure apparatus, and device produc...

System and method for cleaning an EUV mask

Method for controlling a lithographic system

Method for using radiation source apparatus

Semiconductor device manufacturing method and extreme ultraviolet m...

Patents Applicationslast 30 patents

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING TERMINATED PO...

Acoustic Xenon Droplet Generator

METHOD AND APPARATUS FOR MASK REPAIR

EXTREME ULTRAVIOLET LIGHT SOURCE WITH THERMAL STABILIZATION

STRUCTURES FOR PATTERNING AND RELATED METHODS AND SYSTEMS

CHEMICALLY SELECTIVE ADHESION AND STRENGTH PROMOTERS IN SEMICONDUCT...

LITHOGRAPHY SYSTEM AND METHODS

EXTREME ULTRAVIOLET LIGHT GENERATION CHAMBER DEVICE AND ELECTRONIC...

LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SO...

METHOD AND APPARATUS FOR CALCULATING REPARATION DOSE FOR A DIE OF A...

LITHOGRAPHIC APPARATUS AND ASSOCIATED METHODS

INTEGRATED CIRCUIT WITH PATTERN OVERLAY FOR ASSISTING OVERLAY SIGNA...

LITHOGRAPHY SYSTEM AND METHODS

MASK BLANK SUBSTRATE AND MANUFACTURING METHOD THEREOF

ENHANCING LITHOGRAPHY OPERATION FOR MANUFACTURING SEMICONDUCTOR DEV...

RETICLE ENCLOSURE FOR LITHOGRAPHY SYSTEMS

CLEANING METHOD, METHOD FOR FORMING SEMICONDUCTOR STRUCTURE AND SYS...

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

MASK CHARACTERIZATION METHODS AND APPARATUSES

DRY PHOTORESIST OR HARDMASK FOR EUV LITHOGRAPHY

Method for Reducing Line-End Space in Integrated Circuit Patterning

EUV LITHOGRAPHY SYSTEM HAVING A GAS-BINDING COMPONENT

CONTROL OF DYNAMIC GAS LOCK FLOW INLETS OF AN INTERMEDIATE FOCUS CAP

MITIGATING LONG-TERM ENERGY DECAY OF LASER DEVICES

LITHOGRAPHY THERMAL CONTROL

PELLICLE, EXPOSURE ORIGINAL PLATE, EXPOSURE APPARATUS, METHOD OF MA...

INTEGRATED COUPON DESIGN FOR SURFACE COATING QUALITY

SYSTEM AND METHOD FOR MONITORING AND CONTROLLING EXTREME ULTRAVIOLE...

SYSTEM AND METHOD FOR CLEANING AN EUV MASK