by plasma EUV sources

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CPC
G03F7/70033

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70033by plasma EUV sources

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Apparatus for and method of controlling droplet generator performance
- Patent number 12,324,084
- Issue date Jun 3, 2025
- ASML Netherlands B.V.
- Pooriya Beyhaghi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Extreme ultraviolet light source device and protection method for r...
- Patent number 12,321,107
- Issue date Jun 3, 2025
- USHIO DENKI KABUSHIKI KAISHA
- Hironobu Yabuta
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method for generating EUV radiation
- Patent number 12,321,099
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Sheng-Min Wang
- G02 - OPTICS
Information Patent Grant
Correcting apparatus of extreme ultraviolet (EUV) photomask and cor...
- Patent number 12,313,979
- Issue date May 27, 2025
- Samsung Electronics Co., Ltd.
- Sanguk Park
- G02 - OPTICS
Information Patent Grant
Extreme ultraviolet light generation apparatus and electronic devic...
- Patent number 12,309,908
- Issue date May 20, 2025
- Gigaphoton Inc.
- Atsushi Ueda
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method of manufacturing integrated circuit device
- Patent number 12,300,490
- Issue date May 13, 2025
- Samsung Electronics Co., Ltd.
- Sookyung Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Droplet generator and method of servicing extreme ultraviolet imagi...
- Patent number 12,302,484
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wei-Chih Lai
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Width adjustment of EUV radiation beam
- Patent number 12,292,687
- Issue date May 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chi Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insert for a source chamber of an EUV radiation source
- Patent number 12,292,690
- Issue date May 6, 2025
- Carl Zeiss SMT GmbH
- Michael Hagg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Hybrid droplet generator for extreme ultraviolet light sources in l...
- Patent number 12,295,088
- Issue date May 6, 2025
- ASML Netherlands B.V.
- Benjamin Andrew Sams
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Low-temperature direct growth method of multilayer graphene, pellic...
- Patent number 12,287,568
- Issue date Apr 29, 2025
- Korea Electronics Technology Institute
- Hyeong Keun Kim
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Method for operating an EUV lithography apparatus, and EUV lithogra...
- Patent number 12,287,588
- Issue date Apr 29, 2025
- Carl Zeiss SMT GmbH
- Moritz Becker
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method for controlling extreme ultraviolet light
- Patent number 12,282,262
- Issue date Apr 22, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ssu-Yu Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,272,554
- Issue date Apr 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jia-Lin Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Target delivery system
- Patent number 12,273,986
- Issue date Apr 8, 2025
- ASML Netherlands B.V.
- Georgiy Olegovich Vaschenko
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 12,265,336
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kai-Chieh Chang
- G02 - OPTICS
Information Patent Grant
Solution, solution storage body, actinic ray-sensitive or radiation...
- Patent number 12,253,801
- Issue date Mar 18, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV photolithography system fuel source and methods of operating th...
- Patent number 12,235,586
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Cheng-Hao Lai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for performing lithography process, light source, and EUV li...
- Patent number 12,235,594
- Issue date Feb 25, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chi Yang
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Radiation conduit
- Patent number 12,235,585
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- Remco Johannes Elisa Heijmans
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of forming an enhanced unexposed photoresist layer
- Patent number 12,222,644
- Issue date Feb 11, 2025
- ASM IP Holding B.V.
- Jan Willem Maes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device and method to remove debris from an extreme ultraviolet (EUV...
- Patent number 12,216,413
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Han Lin
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Reticle cleaning device and method of use
- Patent number 12,210,295
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Che-Chang Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet lithography system with heated tin vane bucket...
- Patent number 12,207,381
- Issue date Jan 21, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ssu-Yu Chen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Target supply system, extreme ultraviolet light generation apparatu...
- Patent number 12,207,382
- Issue date Jan 21, 2025
- Gigaphoton Inc.
- Nozomu Oue
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method for reducing line-end space in integrated circuit patterning
- Patent number 12,197,131
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jing-Huei Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for efficient high harmonic generation
- Patent number 12,196,688
- Issue date Jan 14, 2025
- ASML Netherlands B.V.
- Petrus Wilhelmus Smorenburg
- G01 - MEASURING TESTING
Information Patent Grant
Methods for extreme ultraviolet (EUV) resist patterning development
- Patent number 12,189,297
- Issue date Jan 7, 2025
- Tokyo Electron Limited
- Yun Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning a structure surface in an EUV chamber
- Patent number 12,189,313
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Chunguang Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV vessel perimeter flow auto adjustment
- Patent number 12,189,298
- Issue date Jan 7, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Che-Chang Hsu
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMI...
- Publication number 20250172875
- Publication date May 29, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND AC...
- Publication number 20250164875
- Publication date May 22, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- KhanhTin NGUYEN
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250164878
- Publication date May 22, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250164882
- Publication date May 22, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250164886
- Publication date May 22, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION PROCESS FOR PATTERNING EDGE PLACEMENT ERROR IMPROVEMENT
- Publication number 20250166994
- Publication date May 22, 2025
- Applied Materials, Inc.
- Zhiyu HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMING METHOD
- Publication number 20250164883
- Publication date May 22, 2025
- JSR Corporation
- Motohiro SHIRATANI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
EUV LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING...
- Publication number 20250164889
- Publication date May 22, 2025
- Gigaphoton Inc.
- Kotaro MIYASHITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION CONDUIT
- Publication number 20250155820
- Publication date May 15, 2025
- ASML NETHERLANDS B.V.
- Remco Johannes Elisa HEIJMANS
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
TIN COMPOUND, TIN COMPOSITION, PRODUCING METHODS THEREOF, RESIST SO...
- Publication number 20250155798
- Publication date May 15, 2025
- MITSUBISHI CHEMICAL CORPORATION
- Yuta Hioki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250155800
- Publication date May 15, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FILM FORMING METHOD, ARTICLE MANUFACTURING METHOD AND FILM FORMING...
- Publication number 20250157817
- Publication date May 15, 2025
- Canon Kabushiki Kaisha
- MASAHIRO TAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL INSPECTION DEVICE
- Publication number 20250155380
- Publication date May 15, 2025
- Carl Zeiss SMT GMBH
- Maximilian Henning
- G01 - MEASURING TESTING
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250155801
- Publication date May 15, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTE...
- Publication number 20250155799
- Publication date May 15, 2025
- Samsung SDI Co., Ltd.
- Soobin LIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Radiation-Sensitive Composition and Method for Forming Resist Pattern
- Publication number 20250155802
- Publication date May 15, 2025
- JSR Corporation
- Ken MARUYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE POLYMER, PHOTORESIST COMPOSITION INCLUDING THE SAME,...
- Publication number 20250155810
- Publication date May 15, 2025
- Samsung Electronics Co., Ltd.
- Jiyup KIM
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
OPTICAL APPARATUS AND CONTROL METHOD OF OPTICAL APPARATUS
- Publication number 20250155823
- Publication date May 15, 2025
- Lasertec Corporation
- Ko GONDAIRA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRC...
- Publication number 20250149336
- Publication date May 8, 2025
- Samsung Electronics Co., Ltd.
- Yonghoon MOON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING APPARATUS, EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM, AND MET...
- Publication number 20250147439
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Han LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20250147421
- Publication date May 8, 2025
- JSR Corporation
- Ken MARUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CONFIGURING EXTREME ULTRA-VIOLET (EUV) ILLUMINATION SYSTE...
- Publication number 20250138434
- Publication date May 1, 2025
- Samsung Electronics Co., Ltd.
- Yeongchan CHO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELECTRIC COMPONENT BOX AND EXTREME ULTRAVIOLET LIGHT GENERATION APP...
- Publication number 20250138438
- Publication date May 1, 2025
- Gigaphoton Inc.
- Ken YAMADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PATTERNS, SEMICONDUCTOR MEMORY DEVICE, AND METHOD...
- Publication number 20250140558
- Publication date May 1, 2025
- Samsung Electronics Co., Ltd.
- Yeongsup SOHN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MIRROR FOR A PROJECTION EXPOSURE APPARATUS
- Publication number 20250138228
- Publication date May 1, 2025
- Carl Zeiss SMT GMBH
- Valentin Jonatan Bolsinger
- G02 - OPTICS
Information Patent Application
METROLOGY METHOD OF CALIBRATING AND MONITORING RADIATION IN EUV LIT...
- Publication number 20250137844
- Publication date May 1, 2025
- KLA Corporation
- Earl Jensen
- G01 - MEASURING TESTING
Information Patent Application
IMAGING EUV OPTICAL UNIT FOR IMAGING AN OBJECT FIELD INTO AN IMAGE...
- Publication number 20250130503
- Publication date Apr 24, 2025
- Carl Zeiss SMT GMBH
- Michael BREHM
- G02 - OPTICS
Information Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND COMPOUND
- Publication number 20250130492
- Publication date Apr 24, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Tetsuya Matsushita
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CHAMBER, EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM, AND ELECTRONI...
- Publication number 20250126699
- Publication date Apr 17, 2025
- Gigaphoton Inc.
- Atsushi UEDA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
LITHOGRAPHY MASK HAVING HIGH EXTINCTION COEFFICIENT ABSORBER AND RE...
- Publication number 20250123552
- Publication date Apr 17, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Pei-Cheng HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

by plasma EUV sources

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Apparatus for and method of controlling droplet generator performance

Extreme ultraviolet light source device and protection method for r...

Method for generating EUV radiation

Correcting apparatus of extreme ultraviolet (EUV) photomask and cor...

Extreme ultraviolet light generation apparatus and electronic devic...

Method of manufacturing integrated circuit device

Droplet generator and method of servicing extreme ultraviolet imagi...

Width adjustment of EUV radiation beam

Insert for a source chamber of an EUV radiation source

Hybrid droplet generator for extreme ultraviolet light sources in l...

Low-temperature direct growth method of multilayer graphene, pellic...

Method for operating an EUV lithography apparatus, and EUV lithogra...

Method for controlling extreme ultraviolet light

Method of manufacturing a semiconductor device

Target delivery system

Semiconductor processing tool and methods of operation

Solution, solution storage body, actinic ray-sensitive or radiation...

EUV photolithography system fuel source and methods of operating th...

Method for performing lithography process, light source, and EUV li...

Radiation conduit

Method of forming an enhanced unexposed photoresist layer

Device and method to remove debris from an extreme ultraviolet (EUV...

Reticle cleaning device and method of use

Extreme ultraviolet lithography system with heated tin vane bucket...

Target supply system, extreme ultraviolet light generation apparatu...

Method for reducing line-end space in integrated circuit patterning

Method and apparatus for efficient high harmonic generation

Methods for extreme ultraviolet (EUV) resist patterning development

Cleaning a structure surface in an EUV chamber

EUV vessel perimeter flow auto adjustment

Patents Applicationslast 30 patents

POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMI...

RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND AC...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

DEPOSITION PROCESS FOR PATTERNING EDGE PLACEMENT ERROR IMPROVEMENT

RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMING METHOD

EUV LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING...

RADIATION CONDUIT

TIN COMPOUND, TIN COMPOSITION, PRODUCING METHODS THEREOF, RESIST SO...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

FILM FORMING METHOD, ARTICLE MANUFACTURING METHOD AND FILM FORMING...

OPTICAL INSPECTION DEVICE

RESIST COMPOSITION AND PATTERN FORMING PROCESS

SEMICONDUCTOR PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTE...

Radiation-Sensitive Composition and Method for Forming Resist Pattern

PHOTOSENSITIVE POLYMER, PHOTORESIST COMPOSITION INCLUDING THE SAME,...

OPTICAL APPARATUS AND CONTROL METHOD OF OPTICAL APPARATUS

PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRC...

CLEANING APPARATUS, EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM, AND MET...

RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

METHOD OF CONFIGURING EXTREME ULTRA-VIOLET (EUV) ILLUMINATION SYSTE...

ELECTRIC COMPONENT BOX AND EXTREME ULTRAVIOLET LIGHT GENERATION APP...

METHOD OF FORMING PATTERNS, SEMICONDUCTOR MEMORY DEVICE, AND METHOD...

MIRROR FOR A PROJECTION EXPOSURE APPARATUS

METROLOGY METHOD OF CALIBRATING AND MONITORING RADIATION IN EUV LIT...

IMAGING EUV OPTICAL UNIT FOR IMAGING AN OBJECT FIELD INTO AN IMAGE...

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND COMPOUND

CHAMBER, EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM, AND ELECTRONI...

LITHOGRAPHY MASK HAVING HIGH EXTINCTION COEFFICIENT ABSORBER AND RE...