Number | Date | Country | Kind |
---|---|---|---|
5-074076 | Mar 1993 | JPX | |
5-152381 | Jun 1993 | JPX |
This application is a continuation of application number 08/560,509, filed Nov. 17, 1995, now abandoned, which is a continuation of application number 08/186,633, filed Jan. 26, 1994, now abandoned.
Number | Name | Date | Kind |
---|---|---|---|
4462863 | Nishimatsu | Jul 1984 | |
4615756 | Tsujii et al. | Oct 1986 | |
4664747 | Sekiguchi et al. | May 1987 | |
4863561 | Freeman et al. | Sep 1989 | |
4983254 | Fujimura et al. | Jan 1991 | |
4992134 | Gupta et al. | Feb 1991 | |
5002632 | Loewenstein et al. | Mar 1991 | |
5007983 | Lerner et al. | Apr 1991 | |
5030319 | Nishino et al. | Jul 1991 | |
5089441 | Moslehi | Feb 1992 | |
5092937 | Ogura et al. | Mar 1992 | |
5223085 | Kawai et al. | Jun 1993 | |
5225036 | Watanabe et al. | Jul 1993 | |
5298112 | Hayasaka et al. | Mar 1994 | |
5308791 | Horiike et al. | May 1994 | |
5326406 | Kaneko et al. | Jul 1994 | |
5328558 | Kawamura | Jul 1994 |
Number | Date | Country |
---|---|---|
0 246 802 | Nov 1987 | EPX |
0 376 252 | Jul 1990 | EPX |
0 406 434 | Jan 1991 | EPX |
0517165 | Dec 1992 | EPX |
64-14218 | Jan 1964 | JPX |
64-41218 | Feb 1989 | JPX |
64-59819 | Mar 1989 | JPX |
1-219184 | Sep 1989 | JPX |
1-259184 | Oct 1989 | JPX |
2-77124 | Mar 1990 | JPX |
Entry |
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B. Anthony, et al., "In situ Cleaning of Silicon Substrate . . . ", 8257b Journal of Vacuum Science & Technology B 7(1989), No. 4, pp. 621-626. |
T. Aoyama, et al., "Removing Native Oxide . . . ", 320 Applied Physics Letters, 59 (1991), pp. 2576-2578. |
"Ideal Hydrogen Termination of the Si (111) Surface," G.S. Higashi et al., J. Appl. Phys. Lett., vol. 56, No. 7, Feb. 1990, pp. 656-658. |
"In-Situ RHEED Monitoring of Hydrogen Plasma Cleaning on Semiconductor Surfaces," A. Kishimoto et al., J. Appl. Phys. Lett., vol. 29, No. 10, Oct. 1990, pp. 2273-2276. |
"Control of the Chemical Reactivity of a Silicon Single-Crystal Surface Using the Chemical Modification Technique," T. Takahagi et al., J. Appl. Phys. Lett., vol. 68, No. 5, Sep. 1, 1990, pp. 2187-2191. |
Number | Date | Country | |
---|---|---|---|
Parent | 560509 | Nov 1995 | |
Parent | 186633 | Jan 1994 |