Claims
- 1. An apparatus for a plasma CVD process which comprises:
- (a) a vacuum chamber;
- (b) a central electrode for use as a gas collection port in said vacuum chamber;
- (c) means for holding a plurality of substrates in said vacuum chamber circumferentially surrounding said central electrode with gaps between adjacent substrates; and
- (d) means for passing a starting gas through said gaps in a direction radially along a path from the periphery of said vacuum chamber to a central point at said central electrode, said vacuum chamber being capable of generating a plasma atmosphere within the space circumscribed by said substrates.
- 2. An apparatus according to claim 1, wherein each substrate is placed on a rotating means.
- 3. An apparatus according to claim 1, wherein the substrate is in a cylinder type.
- 4. An apparatus according to claim 1, wherein a heating means is provided for heating the substrate.
- 5. An apparatus according to claim 1, wherein the substrates are used as electrodes.
- 6. The apparatus according to claim 1 wherein the electrode which generates the plasma atmosphere is hollow and foraminous and constitutes the means for passing a starting gas through gaps between the adjacent substrates.
Priority Claims (1)
Number |
Date |
Country |
Kind |
58-116842 |
Jun 1983 |
JPX |
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Parent Case Info
This application is a continuation of application Ser. No. 204,919, filed June 9, 1988 now abandoned, which, in turn, is a continuation of application Ser. No. 915,925, filed Oct. 6, 1986, now abandoned, which is a continuation of application Ser. No. 623,935, filed June 25, 1984, now abandoned.
US Referenced Citations (9)
Continuations (3)
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Number |
Date |
Country |
Parent |
204919 |
Jun 1988 |
|
Parent |
915925 |
Oct 1986 |
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Parent |
623935 |
Jun 1984 |
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