Number | Name | Date | Kind |
---|---|---|---|
3892973 | Coquin et al. | Jul 1975 | |
4037111 | Coquin et al. | Jul 1977 | |
4171489 | Adams et al. | Oct 1979 | |
4253029 | Lepselter et al. | Feb 1981 |
Entry |
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A. C. Adams et al., "The Chemical Deposition of Boron-Nitrogen Films," J. Electrochemical Society, vol. 127, No. 2, Feb. 1980, pp. 399-405. |
Shand, Glass Engineering Handbook, 2nd Ed., McGraw-Hill Book Co., New York, 1958, pp. 106-109. |
R. J. Jaccodine et al., "Measurement of Strains at Si-SiO.sub.2 Interface," Journal of Applied Physics, vol. 37, No. 6, May 1966, pp. 2429-2434. |