Number | Date | Country | Kind |
---|---|---|---|
63-48765 | Mar 1988 | JPX | |
63-76202 | Mar 1988 | JPX | |
63-144827 | Jun 1988 | JPX | |
63-264163 | Oct 1988 | JPX | |
1-197993 | Aug 1989 | JPX | |
1-224484 | Sep 1989 | JPX | |
2-161413 | Jun 1990 | JPX | |
3-242557 | Aug 1991 | JPX | |
3-242558 | Aug 1991 | JPX |
This application is a continuation-in-part application of the application Ser. No. 07/671,801 having a filing date of Apr. 22, 1991 abandoned, which is a continuation-in-part application of the application Ser. No. 07/318,330 having a filing date of Mar. 3, 1989, now U.S. Pat. No. 5,110.637.
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3634286 | Yates | Jan 1972 | |
3763026 | Cordes | Oct 1973 | |
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4290876 | Nishiyama et al. | Sep 1981 | |
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4964969 | Kusakabe et al. | Oct 1990 | |
4966676 | Fukasawa et al. | Oct 1990 | |
4978437 | Wicz | Dec 1990 | |
4990234 | Szczyrbowski et al. | Feb 1991 |
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---|---|---|
0374931 | Jun 1990 | EPX |
1493822 | Jul 1967 | FRX |
55-110127 | Aug 1980 | JPX |
58-500174 | Feb 1983 | JPX |
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61-144029 | Jul 1986 | JPX |
61-145823 | Jul 1986 | JPX |
62-73202 | Apr 1987 | JPX |
0767044 | Sep 1980 | SUX |
Entry |
---|
Hoffmann et al., "DC Reactive Sputtering Using A Rotating Cylindrical Magnetron", Air Co Coating Technology, dated unknown. |
Patent Abstracts of Japan, JP-61-145823, Jul. 3, 1986, Masao Mashita, et al., "Molecular Beam Epitaxial Growth Method". |
Patent Abstracts of Japan, JP-61-144029, Jul. 1, 1986, Tadashi Serikawa, "Method And Apparatus For Manufacturing Silicon Oxide Film Containing Phosphorus". |
Patent Abstracts of Japan, JP-67-73202, Apr. 3, 1987, Yoshiharu Oi, "Production Of Thin Optical Film". |
Patent Abstracts of Japan, JP-55-110127, Aug. 25, 1980, Makoto Azuma, et al., "Preparation Of Plastic Antireflection Film". |
Chemical Abstracts, vol. 97, No. 22, Feb. 1982, p. 300, abstract No. 187013z, Columbus, Ohio, US; & JP-A-82 100 943 (Asahi Glass Co., Ltd. Murakami Kaimeido K.K.) Jun. 23, 1982 *whole abstract*. |
Chemical Abstracts, vol. 97, No. 22, Feb. 1982, p. 300, abstract No. 187014a, Columbus, Ohio, US; & JP-A-82 100 912 (Asahi Glass Co., Ltd. Murakami Kaimeido K.K.) Jun. 23, 1982 *whole abstract*. |
Chemical Abstracts, vol. 97, No. 22, Feb. 1982, p. 300, abstract No. 187015b, Columbus, Ohio, US; & JP-A-82 100 940 (Asahi Glass Co., Ltd. Murakami Kaimeido K.K.) Jun. 23, 1982 *whole abstract*. |
Chemical Abstracts, vol. 92, p. 264, abstract No. 219710q, Columbus, Ohio, US; T. Stefaniak: "Protecting Properties and behavior of antireflection coatings", & Opt. Appl. 1979, 9(4), 277-9 *whole abstract*. |
Number | Date | Country | |
---|---|---|---|
Parent | 671801 | Apr 1991 | |
Parent | 318330 | Mar 1989 |