BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a diagram schematically showing a structure of an example of an electron beam apparatus with aberration corrector to which the present invention is applied;
FIG. 2 shows an example of structure of an electromagnetic multipole lens of the aberration corrector;
FIG. 3 shows an example of structure of pole of the electromagnetic multipole lens;
FIG. 4 shows an example of structure of an electrostatic and electromagnetic complex type multipole lens of the aberration corrector;
FIG. 5 shows an example of structure of the electromagnetic and electrostatic complex type multipole lens.
FIG. 6 shows an example of structure of a scanning charged particle optical apparatus of a second embodiment;
FIG. 7 shows an example of structure of an electromagnetic multipole lens of the second embodiment;
FIG. 8 shows an example of structure of the electromagnetic and electrostatic complex type multipole lens of the second embodiment;
FIG. 9 shows an example of the other structure of the pole of the electromagnetic multipole lens;
FIG. 10 shows an example of structure of the pole of the electromagnetic and electrostatic complex type multipole lens; and
FIG. 11 shows an example of structure of a scanning charged particle optical apparatus of a third embodiment.