Claims
- 1. An apparatus for conditioning a polishing surface comprising:a polishing media; a carrier; a polishing head coupled to the carrier, the polishing head disposed proximate the polishing media; a conditioning device coupled to the carrier; the conditioning device comprising a rod disposed adjacent to the polishing head; the rod having a conditioning surface that selectively contacts the polishing media.
- 2. The apparatus of claim 1 further comprising:an actuator coupled to the rod.
- 3. The apparatus of claim 1 further comprising:a driver supporting the carrier.
- 4. The apparatus of claim 1 wherein the rod is in contact with the polishing media as the driver moves the polishing head.
- 5. The apparatus of claim 1, wherein the conditioning surface is selected from one or more materials consisting of diamond coating, quartz, aluminum oxide, oxides, silicon carbide, cubic boron nitride, ceramic, copper, silicon carbide, resist or plastic.
- 6. An apparatus for conditioning a polishing surface comprising:a polishing media; and a first conditioning device having a first rotational axis oriented parallel to the polishing media and a second conditioning device having a second rotational axis oriented parallel to the polishing media, the first and the second conditioning devices disposed proximate the polishing media, wherein the first conditioning device is selectively actuated to contact the polishing media with a first rotational velocity and the second conditioning device is selectively actuated to contact the polishing media with a second rotational velocity in a direction opposing the first rotational velocity.
- 7. The apparatus of claim 6, wherein the first conditioning device and the second conditioning device each further comprise a textured surface.
- 8. The apparatus of claim 7, wherein the conditioning surface is selected from one or more materials consisting of diamond coating, quartz, aluminum oxide, oxides, silicon carbide, cubic boron nitride, ceramic, copper, silicon carbide, resist or plastic.
- 9. The apparatus of claim 7, wherein the first conditioning device further comprises:a plurality of plates.
- 10. The apparatus of claim 9, wherein each of the plates further comprise:a textured surface.
- 11. The apparatus of claim 9, wherein the plates are releasably attached to the retaining ring.
- 12. The apparatus of claim 7 further comprising:a waste collection system.
- 13. The apparatus of claim 7 further comprising:one or more additional conditioning devices selectively disposed against the polishing media selected from the group consisting of a brush, a fluid jet and a megasonic wave generator.
- 14. The apparatus of claim 6 further comprising:a winder; and an unwind, the polishing media advanced between the winder and the unwind during conditioning.
- 15. An apparatus for conditioning a polishing surface comprising:a web of polishing media; a polishing head disposed proximate the web; a first drive system supporting the polishing head; a second drive system disposed proximate the first drive system; and a first conditioning device coupled to the second drive system, wherein the first conditioning device is a disk or rod having textured surface that selectively contacts the polishing media.
- 16. The apparatus of claim 15, wherein the first conditioning device is selectively actuated to contact the polishing media.
- 17. The apparatus of claim 15, wherein the first conditioning device is rotated on an axis perpendicular to the polishing media.
- 18. The apparatus of claim 15, wherein the first conditioning device further comprises:a cylinder that is selectively disposed against the polishing media.
- 19. The apparatus of claim 15, wherein the polishing media is advanced when in contact with the first conditioning device.
- 20. The apparatus of claim 15, wherein the first conditioning device moves relative to the width of the polishing media.
- 21. The apparatus of claim 15, wherein the first condition device further comprises:a roller having an centerline disposed parallel to the plane of the polishing media.
- 22. The apparatus of claim 21, wherein the roller is rotated on its centerline.
- 23. The apparatus of claim 21, wherein the roller further comprises:a length at least equal to a width of a working surface the polishing media.
- 24. The apparatus of claim 21, wherein the web is advanced when in contact with the polishing media.
- 25. The apparatus of claim 21, wherein the roller further comprises:a plurality of plates.
- 26. The apparatus of claim 25, wherein each of the plates further comprise:a textured surface.
- 27. The apparatus of claim 25, wherein the plates are releasably attached to the roller.
- 28. A method for conditioning a web of polishing material comprising the steps of:advancing a web of polishing material; moving a conditioner at an angle to the direction of web advancement; and conditioning the polishing material by bringing a first rotating member in contact with the polishing material and bringing a second rotating member having a rotation opposite said first rotating member in contact with the polishing material.
- 29. The method of claim 28, wherein the advancing step further comprises the step of transferring the web between an unwind and a winder.
- 30. The method of claim 28, wherein the rotating member rotates on an axis parallel to the polishing material.
- 31. The method of claim 28, wherein the rotating member rotates on an axis perpendicular to the polishing material.
- 32. The method of claim 28 further comprising the steps of:transferring the conditioned web to a processing system; polishing a substrate on the web; and reconditioning the web on the processing system.
- 33. A method for conditioning a web of polishing material comprising the steps of:advancing a web of polishing material; moving a conditioner at an angle to the direction of web advancement; and conditioning the polishing material by bringing a first rotating member in contact with the polishing material wherein the rotating member rotates on an axis perpendicular to the polishing material.
- 34. A method for conditioning a web of polishing material comprising the steps of:advancing a web of polishing material; moving a conditioner at an angle to the direction of web advancement; and conditioning the polishing material by bringing a first rotating member in contact with the polishing material wherein the rotating member rotates on an axis parallel to the polishing material.
Parent Case Info
This application claims benefit of U.S. Provisional Application No. 60/172,416, filed Dec. 17, 1999, which is hereby incorporated by reference in its entirety.
US Referenced Citations (10)
Foreign Referenced Citations (1)
Number |
Date |
Country |
WO 9845090 |
Oct 1998 |
WO |
Provisional Applications (1)
|
Number |
Date |
Country |
|
60/172416 |
Dec 1999 |
US |