Claims
- 1. A method of polishing a material comprising:exposing said material to a slurry which contains an abrasive and an organic oxidant being hydroxylamine.
- 2. The method of claim 1 wherein said abrasive is alumina.
- 3. The method of claim 1 wherein the pH of said slurry is acidic.
- 4. The method of claim 3 wherein the pH of said slurry is between 0 and 1.
- 5. The method of claim 1 in which said slurry containsalumina, oxidant, complexing agent, and surfactant.
- 6. A method of polishing a material comprising:exposing said material to a slurry which contains an abrasive and an organic oxidant, said organic oxidant being chosen from the group consisting of hydroxylamine or hydroxylamine sulfate.
CROSS REFERENCE TO RELATED APPLICATIONS
This application is a continuation of our commonly assigned, copending U.S. application Ser. No. 09/043,505, filed Mar. 23, 1998, now U.S. Pat. No. 6,117,783 which claims the priority of Patent Co-Operation Treaty Application PCT US97-12220 filed Jul. 21, 1997, which in turn claims the priority of U.S. Provisional Application Serial No. 60/023,299, filed Jul. 26, 1996.
US Referenced Citations (23)
Foreign Referenced Citations (2)
Number |
Date |
Country |
52081692 |
Jul 1977 |
JP |
03-256665 |
Nov 1991 |
JP |
Non-Patent Literature Citations (3)
Entry |
Van der Puy, M. and Dimmit, J.H., Redox Properties of Hydroxylamines Part 1 Inorganic Reactions, Buffalo Research Laboratory, pp. 1-10 No Date Available. |
Van der Puy, M., Redox Properties of Hydroxylamines Part 2 Organic Reactions, Buffalo Research Laboratory, pp. 1-13 No Date Available. |
Follow the Oximes Road to Success, Allied Signal No Date Available. |
Provisional Applications (1)
|
Number |
Date |
Country |
|
60/023299 |
Jul 1996 |
US |
Continuations (1)
|
Number |
Date |
Country |
Parent |
09/043505 |
|
US |
Child |
09/226996 |
|
US |