Coating compositions for use with an overcoated photoresist

Abstract

Underlying coating compositions are provided for use with an overcoated photoresist composition. In one aspect, the coating composition can be crosslinked and comprise one or more components that contain one or more acid-labile groups and/or one or more base-reactive groups that are reactive following crosslinking. In another aspect, underlying coating composition are provided that can be treated to provide a modulated water contact angle. Preferred underlying coating compositions can exhibit enhanced etch rates in plasma etchants. Additional preferred coating compositions can enhance lithographic performance of an associated photoresist composition.

Description

Claims

1. A coated substrate comprising: a coating composition layer that can be treated to provide a different water contact angle; anda photoresist layer over the coating composition layer.

2. The coated substrate of claim 1 wherein the coating composition layer comprises one or more oxygen-containing components.

3. The substrate of claim 1 wherein the water contact angle is changed by treatment with acid or base.

4. The substrate of claim 1 wherein the coating composition comprises one or more components that comprise acid-labile groups and/or base reactive groups.

5. A coated substrate comprising: a crosslinkable coating composition layer comprising one or more components that comprise one or more acid-labile groups and/or one or more base-reactive groups; anda photoresist layer over the coating composition layer.

6. A method of forming a photoresist relief image, comprising: applying a coating composition on a substrate, the applied composition can be treated to provide a different water contact angle;applying a photoresist composition above the coating composition layer; andexposing and developing the photoresist layer to provide a resist relief image.

7. The method of claim 6 wherein the applied coating composition is treated with photoacid from the photoresist layer to provide a decreased water contact angle of the coating composition areas that contact the photoacid.

8. The method of claim 6 wherein the coating composition layer comprises one or more oxygen-containing components.

9. The method of claim 6 wherein the coating composition comprises a component that comprises acid-labile groups or anhydride groups.

10. A crosslinkable antireflective composition for use with an overcoated photoresist composition, the antireflective composition comprising one or more components that comprise one or more acid-labile groups and/or one or more base-reactive groups.