Number | Name | Date | Kind |
---|---|---|---|
4568189 | Bass et al. | Feb 1986 | A |
4848911 | Uchida et al. | Jul 1989 | A |
5343292 | Brueck et al. | Aug 1994 | A |
5545593 | Watkins et al. | Aug 1996 | A |
5629772 | Ausschnitt | May 1997 | A |
5712707 | Ausschnitt et al. | Jan 1998 | A |
5731877 | Ausschnitt | Mar 1998 | A |
5756242 | Koizumi et al. | May 1998 | A |
5757507 | Ausschnitt et al. | May 1998 | A |
5776645 | Barr et al. | Jul 1998 | A |
5790254 | Ausschnitt | Aug 1998 | A |
5805290 | Ausschnitt et al. | Sep 1998 | A |
5877861 | Ausschnitt et al. | Mar 1999 | A |
5914784 | Ausschnitt et al. | Jun 1999 | A |
5928822 | Rhyu | Jul 1999 | A |
5949547 | Tseng et al. | Sep 1999 | A |
5952134 | Hwang | Sep 1999 | A |
5953128 | Ausschnitt et al. | Sep 1999 | A |
5965309 | Ausschnitt et al. | Oct 1999 | A |
5968693 | Adams | Oct 1999 | A |
5976740 | Ausschnitt et al. | Nov 1999 | A |
5981119 | Adams | Nov 1999 | A |
5985495 | Okumura et al. | Nov 1999 | A |
6003223 | Hagen et al. | Dec 1999 | A |
6004706 | Ausschnitt et al. | Dec 1999 | A |
6020966 | Ausschnitt et al. | Feb 2000 | A |
6027842 | Ausschnitt et al. | Feb 2000 | A |
6042976 | Chiang et al. | Mar 2000 | A |
6128089 | Ausschnitt et al. | Oct 2000 | A |
6130750 | Ausschnitt et al. | Oct 2000 | A |
6137578 | Ausschnitt | Oct 2000 | A |
6183919 | Ausschnitt et al. | Feb 2001 | B1 |
6317211 | Ausschnitt et al. | Nov 2001 | B1 |
6346979 | Ausschnitt et al. | Feb 2002 | B1 |
Number | Date | Country |
---|---|---|
61-168227 | Jul 1986 | JP |
61-170032 | Jul 1986 | JP |
2-260441 | Oct 1990 | JP |
10-213895 | Aug 1998 | JP |
Entry |
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Starikov, Alexander; “Exposure Monitor Structure”, SPIE vol. 1261, Integrated Circuit Metrology, Inspection and Process Control IV, 1990, pp. 315-324. |
“Method for Measuring Semiconductor Lithographic Tool Focus and Exposure”, IBM Technical Disclosure Bulletin, Jul. 1987, pp. 516-518. |