Controlling out-of-plane anisotropy in an MR sensor with free layer dusting

Information

  • Patent Grant
  • 12320870
  • Patent Number
    12,320,870
  • Date Filed
    Tuesday, July 19, 2022
    3 years ago
  • Date Issued
    Tuesday, June 3, 2025
    a month ago
Abstract
Methods and apparatus for a magnetoresistive (MR) sensor a free layer with a thickness of the CoFeB material to produce out-of-plane sensing for the sensor and a reference layer magnetically coupled to the free layer. A dusting layer of an oxide material is disposed on the free layer to achieve perpendicular magnetic anisotropy for an interface of the oxide layer and the free layer for a desired sensitivity for the sensor.
Description
BACKGROUND

Magnetic field sensors are used in a variety of applications, including, but not limited to, angle sensing to senses an angle of a direction of a magnetic field, current sensing to sense a magnetic field generated by a current carried by a current-carrying conductor, magnetic switching to sense the proximity of a ferromagnetic object, a detecting rotation to sense passing ferromagnetic articles, for example, magnetic domains of a ring magnet or a ferromagnetic target (e.g., gear teeth) where the magnetic field sensor is used in combination with a back-biased or other magnet, and magnetic field sensing to sense a magnetic field density of a magnetic field.


In certain applications, magnetic field sensors include magnetoresistance elements which have an electrical resistance that changes in the presence of an external magnetic field. Tunnel magnetoresistance (TMR) is a magnetoresistive effect that occurs in a magnetic tunnel junction (MIT) that includes two ferromagnetic layers separated by an insulator. Electrons tunnel from one ferromagnetic layer into the other due to a quantum mechanical effects. Spin valves are a type of magnetoresistance element formed from two or more magnetic materials or layers. The simplest form of a spin valve has a reference (or magnetically fixed) layer and a free layer between which an insulative barrier is located. The resistance of the spin valve changes as a function of the magnetic alignment of the reference and free layers. Typically, the magnetic alignment of the reference layer does not change, while the magnetic alignment of the free layer moves in response to external magnetic fields.


SUMMARY

Example embodiments of the disclosure provide methods and apparatus for a magnetic field sensor including a stackup for a magnetoresistive element with a selected magnetic orientation having a defined anisotropy of the magnetic free layer for out-of-plane sensing. In embodiments, the stackup is manipulated to obtain a preferred magnetic orientation with a defined anisotropy of the magnetic free layer.


In some embodiments, the magnetic anisotropy in the free layer is tuned by changing the thickness of the active free layer component, e.g., CoFeB. By tuning the thickness of the CoFeB layer, the orientation of the free layer magnetization changes. For example, hard axis loops shift to easy axis upon increasing the CoFeB thickness. This thickness manipulation exploits the interfacial nature of perpendicular anisotropy.


In embodiments, an oxide, e.g., MgO, Al2O3 or another textured metallic oxide, dusting layer on the free layer allows for gradual control of the magnetic anisotropy of the stack. By adjusting the amount of MgO, the anisotropy can be manipulated to control the out-of-plane sensitivity of the magnetic sensor. The benefits of controlling the magnetic orientation and sensitivity in the free layer will be readily understood by one of ordinary skill in the art.


In one aspect, a method comprises: forming, as part of a magnetic sensor, a free layer, wherein the free layer comprises CoFeB material; selecting a thickness of the CoFeB material to produce out-of-plane sensing for the sensor; and controlling a thickness of a dusting layer of an oxide material on the free layer to achieve perpendicular magnetic anisotropy for an interface of the oxide material and the CoFeB for providing a desired sensitivity for the sensor.


A method can further include one or more of following features: the oxide layer comprises MgO, the thickness of the CoFeB material determines an orientation of a magnetic field of the free layer, the perpendicular magnetic anisotropy occurs as a result of hybridization between 2p and 3d orbitals of Oxygen in the oxide layer and Fe in the CoFeB, a magnetic field orientation of the free layer is orthogonal to magnetic field orientations of a reference layer, the CoFeB material has a thickness of less than 1.4 nm, the CoFeB material has a thickness of about 1.0 nm, a response of the magnetic sensor is linear, and/or the magnetic sensor comprises an angle sensor.


In another aspect, a magnetic field sensor comprises: a free layer comprising CoFeB material having a thickness to produce out-of-plane sensing for the sensor; and a dusting layer comprising an oxide material on the free layer to achieve perpendicular magnetic anisotropy for an interface of the oxide material and the CoFeB of the free layer for providing a desired sensitivity for the sensor.


A sensor can further include one or more of following features: the oxide layer comprises MgO, the thickness of the CoFeB material determines an orientation of a magnetic field of the free layer, the perpendicular magnetic anisotropy occurs as a result of hybridization between 2p and 3d orbitals of Oxygen in the oxide layer and Fe in the CoFeB, a magnetic field orientation of the free layer is orthogonal to magnetic field orientations of a reference layer, the CoFeB material has a thickness of less than 1.4 nm, the CoFeB material has a thickness of about 1.0 nm, a response of the magnetic sensor is linear, and/or the magnetic sensor comprises an angle sensor.





BRIEF DESCRIPTION OF THE DRAWINGS

The foregoing features of this invention, as well as the invention itself, may be more fully understood from the following description of the drawings in which:



FIG. 1A is a graphical representation of resistance versus in-plane magnetic field strength for various free layer, e.g., CoFeB, thicknesses;



FIG. 1B is a graphical representation of resistance versus in-plane magnetic field strength for various dusting layer, e.g., MgO, thicknesses;



FIG. 2 shows an example layer stackup for a magnetoresistive element of a MR sensor in accordance with example embodiments of the disclosure; and



FIG. 3 shows an example MR magnetic field sensor including a magnetoresistive element having a selected magnetic orientation with a defined anisotropy of the magnetic free layer for out-of-plane sensing in accordance with example embodiments of the disclosure.





DETAILED DESCRIPTION

Embodiments of the disclosure provide methods and apparatus for a magnetic sensor, such as a three-dimensional sensor, having a dusting layer on the free layer for influencing the interfacial magnetic anisotropy. Perpendicular Magnetic Anisotropy (PMA) at the interface occurs as a result of the hybridization between the 2p and 3d atomic orbitals of Oxygen in MgO, for example, and Fe in CoFeB, for example, respectively. This orbital overlap is used to finely tune the anisotropy of the free layer for enhanced sensitivity characteristics.



FIG. 1A shows example wafer-level current-in-plane (CIPT) transport curves providing a swift transition from out-of-plane 100 free layer orientation to in plane 102 with increasing CoFeB thickness t, where curves are shown for about t=1.0 nm and t>1.4 nm. While CoFeB layers vary in the illustrated embodiment, a first MgO layer is constant at 2 nm and a second MgO layer is constant at 0.5 nm, where the CoFeB layer is between the first and second MgO layers, as shown in FIG. 2. As can be seen, for free layer CoFeB thickness of about 1.0 nm, the change in resistance for the MR element is generally linear in response to a changing external in-plane magnetic field while a free layer CoFeB thickness of more than about 1.4 nm results in a steep transition in resistance based on the in-plane field.



FIG. 1B shows example wafer level CIPT transport curves showing gradual changes in sensitivity due to modulation of anisotropy by addition of MgO dusting layer(s)s. As can be seen, utilizing an MgO dusting layer allows for gradual control of the magnetic anisotropy of the stack. By adjusting the amount of MgO, the anisotropy can be manipulated to control the out-of-plane sensitivity of the magnetic sensor. The benefits of controlling the magnetic orientation and sensitivity in the free layer will be readily understood by one of ordinary skill in the art.


In example embodiments, the dusting layer thickness of MgO can range from about 0.2 nm 150 to about 0.5 nm 152. A plot 154 is also shown for 0 nm of MgO (no MgO dusting layer) so that MgO thickness is shown for samples of 0 nm, 0.2 nm, and 0.5 nm. Out of plane anisotropy is an interfacial effect and hence even small changes to the MgO dusting layer can induce a change in the transfer curve and sensitivity of the magnetic sensor. Depending on the choice of sensitivity and linearity desired, the amount of dusting layer can be adjusted accordingly. Similar modification can be obtained by changing the CoFeB thickness, but controlling the top interface provides a more reliable way to fine tune the response.


In general, any suitable crystalline or textured oxide material can be used for a dusting layer. Naturally occurring oxide is not suitable as it is usually amorphous in nature. At the atomic level one needs to ensure a sufficient orbital overlap between oxygen and iron 2p and 3d atomic orbitals respectively.



FIG. 2 shows an example stackup for a magnetoresistive (MR) element 200 having controlled anisotropy in accordance with example embodiments of the disclosure. It is understood that out of plane and inplane orientations of the free layer are in reference to the plane of the substrate.


In the illustrative embodiment, a seed layer 210 may be provided on a substrate 215. In embodiments, the seed layer 210 does not interact with the stack magnetically, but rather, provides an electrical contact to the MR elements.


In the illustrated embodiment, a reference layer 220 is disposed on the seed layer 210. A dielectric or spacer layer 230, such as an oxide layer, e.g., MgO, is located between the reference layer 220 and a free layer 240.


In example embodiments, a dusting layer 250 is disposed on the free layer 240. A cap 260, which may comprise Ta and Ru, for example, can be disposed on the dusting layer 250 to facilitate electrical connection to the MR stackup and protect the multilayer from environmental atmosphere.


In example embodiments, the free layer 240 comprises CoFeB disposed between the dielectric layer 230 and the dusting layer 250. It is understood that the illustrated MR element 200 in FIG. 2 corresponds to certain curves in FIGS. 1A and 1B. For example, out-of-plane curves 100 in FIGS. 1A and 1B for a configuration of 2 nm MgO/1 nm CoFeB/0.5 MgO corresponds to dielectric layer 230 (MgO 2 nm), free layer 240 (CoFeB t nm), and dusting layer 250 (x nm) in FIG. 2, where t refers to a thickness of CoFeB and x refers to a thickness of MgO.


The magnetic alignment of the reference layer 220 is fixed and the magnetic alignment of the free layer 240 moves in response to an external magnetic field. Movement can be referenced to parallel and anti-parallel positions. The resistance of the TMR spin valve changes as a function of the magnetic alignment of the reference and free layers.


The illustrative stackup indicates the orientation of magnetic fields in the various layers. An X indicates a field pointing into the page and a circle with a dot indicates a field coming out of the page. Arrows up, down, left and right indicate fields pointing in the respective directions.


Each of the material layers in the stack has electrical and magnetic properties which, when placed together, cause magnetoresistance element 200 to react to external magnetic fields. Magnetoresistance element 200 is supported by a substrate 215 that supports integrated circuits.


In embodiments, the magnetoresistance element 200 is a spin valve device so that the electrical resistance of magnetoresistance element changes as the magnetic alignment between different material layers changes. Spin valves have at least the reference layer 220, which has a fixed magnetic alignment, and the free layer 240, which has a magnetic alignment that changes in response to an external magnetic field. When the magnetic alignment of the free layer 240 is aligned with the magnetic alignment of the reference layer 220, the electrical resistance of the spin valve has a minimal value. Conversely, when the magnetic alignment of the free layer 240 is aligned in an opposite direction to the reference layer, the electrical resistance of the spin valve is at a maximum value. At points in between, the resistance of the magnetoresistance element 200 is at an intermediate value. Generally, as the magnetic alignment of the free layer 240 changes from one extreme (e.g., oppositely aligned with the reference layer) to the other extreme (e.g., aligned with the reference layer), with selected layer configurations and thicknesses the electrical resistance of the spin valve changes linearly from its maximum value to its small value.


In the illustrated embodiment, the magnetoresistance element 200 is a perpendicular tunneling magnetoresistance (TMR) element where the magnetic alignment of free layer 240 is generally perpendicular to the substrate 215 and can spin from a direction opposite to the substrate to a direction toward the substrate. The reference layer 220 has a magnetic alignment parallel to the substrate. The free layer 240 can spins so its magnetic alignment changes in relation to the substrate which changes the resistance of the magnetoresistance element 200.


In embodiments, the dielectric or spacer layer 230 comprises an insulative material through which electrical current tunnels through the layer 230. When the magnetic directions of the free layer 240 and the reference layer 220 are aligned, more electrons can tunnel through the dielectric layer 230, which lowers the resistance of the element 200. Conversely, when the magnetic directions of free layer 240 and reference layer 220 are in opposite directions, electrons face a greater resistance to tunneling through the dielectric layer 230, and thus the electrical resistance of magnetoresistance element 200 increases.


In the illustrated embodiment, the reference layer 220 includes a CoFeB layer 221 about 1.5 nm thick and a Ta layer 222 about 0.1 nm thick. The reference layer 220 can further include an Ru layer 223 about 0.83 nm thick between a first layer 224 of CoFe about 1.0 nm thick and a second layer 225 of CoFe about 2.3 nm thick. As can be seen, the first and second CoFe layers 224, 225 have magnetic fields pointing in opposite directions as indicated by the arrows pointing to the left and right sides of the page respectively. The reference layer 220 also includes a PtMn layer 227 about 25 nm thick with a series of fields pointing in alternating directions to the left and right sides of the page. As can be seen, the reference layer 220 and the free layer 240 fields point in orthogonal directions.


In example embodiments, the seed layer 210 comprises alternating layers of CuN 212 and Ta 214, which may provide electrical contacts to a substrate. It is understood that any practical number of alternating layers of CuN 202 and Ta 204 can be used including a single Cu layer in the seed layer.


As described above, the dusting layer 250 thickness on the free layer 240 modulates the interfacial anisotropy for controlling the out-of-plane sensitivity of the magnetic sensor. For example, the slope of the response of the magnetoresistance element 200 and/or the linearity of the response can correspond to the thickness of the dusting layer. With this arrangement, out-of-plane sensing characteristics of an MR sensor can be enhanced as compared to sensors not having an oxide dusting layer on the free layer.


In other embodiments, an optional bias layer may be provided that is magnetically coupled to the free layer 240 to provide a double pinned configuration. The optional bias layer can be added above the free layer with a biasing direction in the out of plane orientation to provide an out of plane orientation of the free layer.


If no external magnetic field is present, the bias layer may cause the magnetic alignment of the free layer 240 to default to a predetermined alignment. The magnetic coupling between the bias layer and the free layer 240 is relatively weak so that an external field can override the bias and realign the magnetic alignment of the free layer. The bias layer can provide a so-called double pinned configuration since the bias layer and the reference layer 220 pin the free layer. The bias layer can help to linearize the response of the free layer 240, and therefore the resistance, to an external field.


It is understood that example dimensions are provided for the various layers in the stackup to facilitate an understanding of the disclosure and are not intended to limit the scope of the claimed invention in any way. It is understood that dimensions of the layers can be modified to meet the needs of a particular application. In addition, it is further understood that example materials are provided for which substitutions may be made to meet the needs of a particular application.


It is understood that TMR sensors can be used in a wide range of applications in which it is desirable to sense a magnetic field.


Examples of MR sensors having double pinned arrangements can be found, for example, in U.S. Pat. Nos. 9,529,060, and 9,922,673, and 9,804,234, all of which are incorporated by reference herein in their entirety.



FIG. 3 shows one type of magnetic field sensor 300 that include one or more magnetoresistance elements MR having a dusting layer on a free layer. Here, four magnetoresistance elements are shown which can be of a type described above arranged over a common substrate. The four magnetoresistance elements can be arranged in a bridge. Other electronic components (not shown), for example, amplifiers and processors, can also be integrated upon the common substrate.


The magnetic field sensor 300 can be disposed proximate a moving magnetic object, for example, a ring magnet 302 having alternating north and south magnetic poles. The ring magnet 302 is subject to rotation. The magnetic field sensor 300 can be configured to generate an output signal indicative of at least a speed of rotation of the ring magnet. In some arrangements, the ring magnet 302 is coupled to a target object, for example, a cam shaft in an engine, and the sensed speed of rotation of the ring magnet 302 is indicative of a speed of rotation of the target object.


While the magnetic field sensor 300 is used as a rotation detector, it should be understood that other similar magnetic field sensors, for example, current sensors, can have one or more of the magnetoresistance elements.


As used herein, the term “anisotropy” or “anisotropic” refer to a particular axis or direction to which the magnetization of a ferromagnetic or ferrimagnetic layer tends to orientate when it does not experience an additional external field. An axial anisotropy can be created by a crystalline effect or by a shape anisotropy, both of which allow two equivalent directions of magnetic fields. A directional anisotropy can also be created in an adjacent layer, for example, by an antiferromagnetic layer, which allows only a single magnetic field direction along a specific axis in the adjacent layer.


In view of the above, it will be understood that introduction of an anisotropy in a magnetic layer results in forcing the magnetization of the magnetic layer to be aligned along that anisotropy in the absence of an external field. In the case of a GMR or TMR element, a directional anisotropy provides an ability to obtain a coherent rotation of the magnetic field in a magnetic layer in response, for example, to an external magnetic field.


In general, magnetic materials can have a variety of magnetic characteristics and can be classified by a variety of terms, including, but not limited to, ferromagnetic, antiferromagnetic, and nonmagnetic. Description of the variety of types of magnetic materials is not made herein in detail. However, let it suffice here to say, that a ferromagnetic material is one in which magnetic moments of atoms within the ferromagnetic material tend to, on average, align to be both parallel and in the same direction, resulting in a nonzero net magnetic magnetization of the ferromagnetic material.


An antiferromagnetic material is one in which magnetic moments within the antiferromagnetic material tend to, on average, align to be parallel, but in opposite directions in sub-layers within the antiferromagnetic material, resulting in a zero net magnetization.


As used herein, the term “magnetic field sensing element” is used to describe a variety of electronic elements that can sense a magnetic field. The magnetic field sensing element can be, but is not limited to, a Hall effect element, a magnetoresistance element, or a magnetotransistor. As is known, there are different types of Hall effect elements, for example, a planar Hall element, a vertical Hall element, and a Circular Vertical Hall (CVH) element. As is also known, there are different types of magnetoresistance elements, for example, a semiconductor magnetoresistance element such as Indium Antimonide (InSb), a giant magnetoresistance (GMR) element, for example, a spin valve, an anisotropic magnetoresistance element (AMR), a tunneling magnetoresistance (TMR) element, and a magnetic tunnel junction (MTJ). The magnetic field sensing element may be a single element or, alternatively, may include two or more magnetic field sensing elements arranged in various configurations, e.g., a half bridge or full (Wheatstone) bridge. Depending on the device type and other application requirements, the magnetic field sensing element may be a device made of a type IV semiconductor material such as Silicon (Si) or Germanium (Ge), or a type III-V semiconductor material like Gallium-Arsenide (GaAs) or an Indium compound, e.g., Indium-Antimonide (InSb).


As is known, some of the above-described magnetic field sensing elements tend to have an axis of maximum sensitivity parallel to a substrate that supports the magnetic field sensing element, and others of the above-described magnetic field sensing elements tend to have an axis of maximum sensitivity perpendicular to a substrate that supports the magnetic field sensing element. In particular, planar Hall elements tend to have axes of sensitivity perpendicular to a substrate, while metal based or metallic magnetoresistance elements (e.g., GMR, TMR, AMR) and vertical Hall elements tend to have axes of sensitivity parallel to a substrate.


As used herein, the term “magnetic field sensor” is used to describe a circuit that uses a magnetic field sensing element, generally in combination with other circuits. Magnetic field sensors are used in a variety of applications, including, but not limited to, an angle sensor that senses an angle of a direction of a magnetic field, a current sensor that senses a magnetic field generated by a current carried by a current-carrying conductor, a magnetic switch that senses the proximity of a ferromagnetic object, a rotation detector that senses passing ferromagnetic articles, for example, magnetic domains of a ring magnet or a ferromagnetic target (e.g., gear teeth) where the magnetic field sensor is used in combination with a back-biased or other magnet, and a magnetic field sensor that senses a magnetic field density of a magnetic field.


Having described exemplary embodiments of the disclosure, it will now become apparent to one of ordinary skill in the art that other embodiments incorporating their concepts may also be used. The embodiments contained herein should not be limited to disclosed embodiments but rather should be limited only by the spirit and scope of the appended claims. All publications and references cited herein are expressly incorporated herein by reference in their entirety.


Elements of different embodiments described herein may be combined to form other embodiments not specifically set forth above. Various elements, which are described in the context of a single embodiment, may also be provided separately or in any suitable subcombination. Other embodiments not specifically described herein are also within the scope of the following claims.

Claims
  • 1. A method, comprising: forming, as part of a magnetic sensor, a free layer, wherein the free layer comprises CoFeB material;selecting a thickness of the CoFeB material to produce out-of-plane sensing for the sensor; andcontrolling a thickness of a dusting layer of an oxide material on the free layer to achieve perpendicular magnetic anisotropy for an interface of the oxide material and the CoFeB for providing a desired sensitivity for the sensor,wherein the magnetic sensor comprises an angle sensor.
  • 2. The method according to claim 1, wherein the oxide material comprises MgO.
  • 3. The method according to claim 1, wherein the thickness of the CoFeB material determines an orientation of a magnetic field of the free layer.
  • 4. The method according to claim 1, wherein the perpendicular magnetic anisotropy occurs as a result of hybridization between 2p and 3d orbitals of Oxygen in the oxide material and Fe in the CoFeB.
  • 5. The method according to claim 1, wherein a magnetic field orientation of the free layer is orthogonal to magnetic field orientations of a reference layer.
  • 6. The method according to claim 1, wherein the CoFeB material has a thickness of less than 1.4 nm.
  • 7. The method according to claim 1, wherein the CoFeB material has a thickness of about 1.0 nm.
  • 8. The method according to claim 1, wherein a response of the magnetic sensor is linear.
  • 9. A magnetic field sensor, comprising: a free layer comprising CoFeB material having a thickness to produce out-of-plane sensing for the sensor; anda dusting layer comprising an oxide material on the free layer to achieve perpendicular magnetic anisotropy for an interface of the oxide material and the CoFeB of the free layer for providing a desired sensitivity for the sensor,wherein the magnetic sensor comprises an angle sensor.
  • 10. The sensor according to claim 9, wherein the oxide material comprises MgO.
  • 11. The sensor according to claim 9, wherein the thickness of the CoFeB material determines an orientation of a magnetic field of the free layer.
  • 12. The sensor according to claim 9, wherein the perpendicular magnetic anisotropy occurs as a result of hybridization between 2p and 3d orbitals of Oxygen in the oxide material and Fe in the CoFeB.
  • 13. The sensor according to claim 9, wherein a magnetic field orientation of the free layer is orthogonal to magnetic field orientations of a reference layer.
  • 14. The sensor according to claim 9, wherein the CoFeB material has a thickness of less than 1.4 nm.
  • 15. The sensor according to claim 9, wherein the CoFeB material has a thickness of about 1.0 nm.
  • 16. The sensor according to claim 9, wherein a response of the magnetic sensor is linear.
US Referenced Citations (194)
Number Name Date Kind
5216560 Brug et al. Jun 1993 A
5282104 Coutellier et al. Jan 1994 A
5561368 Dovek et al. Oct 1996 A
5677625 Dieny Oct 1997 A
5821517 Fedeli et al. Oct 1998 A
5858125 Hasegawa Jan 1999 A
5895727 Hasegawa Apr 1999 A
5923514 Scott et al. Jul 1999 A
5933306 Santos et al. Aug 1999 A
6013365 Dieny et al. Jan 2000 A
6026355 Rahman et al. Feb 2000 A
6055136 Gill et al. Apr 2000 A
6069476 Vieux-Rochaz et al. May 2000 A
6094330 Criniti et al. Jul 2000 A
6141197 Kim et al. Oct 2000 A
6166539 Dahlberg et al. Dec 2000 A
6278592 Xue et al. Aug 2001 B1
6373247 Marx et al. Apr 2002 B1
6411476 Lin et al. Jun 2002 B1
6429640 Daughton et al. Aug 2002 B1
6462641 Dieny et al. Oct 2002 B1
6490140 Mao et al. Dec 2002 B1
6501678 Lenssen et al. Dec 2002 B1
6522132 Vieus-Rochaz et al. Feb 2003 B1
6532164 Redon et al. Mar 2003 B2
6603677 Redon et al. Aug 2003 B2
6770382 Chang et al. Aug 2004 B1
7064937 Wan et al. Jun 2006 B2
7095596 Schmollngruber et al. Aug 2006 B2
7106046 Nagano et al. Sep 2006 B2
7176679 Baragatti et al. Feb 2007 B2
7259545 Stauth et al. Aug 2007 B2
7288931 Granig et al. Oct 2007 B2
7394247 Guo et al. Jul 2008 B1
7453672 Dieny et al. Nov 2008 B2
7463016 Shoji Dec 2008 B2
7472004 Hara et al. Dec 2008 B2
7713755 Xiao May 2010 B1
7759933 Coillot et al. Jul 2010 B2
7799179 Maass et al. Aug 2010 B2
7813202 Rodmacq et al. Oct 2010 B2
7838133 Zhang et al. Nov 2010 B2
7855555 Biziere et al. Dec 2010 B2
7902811 Shoji Mar 2011 B2
7944205 Fermon et al. May 2011 B2
7944736 Dieny et al. May 2011 B2
8093886 Okada et al. Jan 2012 B2
8129988 Fermon et al. Mar 2012 B2
8269491 Cummings et al. Sep 2012 B2
8279666 Dieny et al. Oct 2012 B2
8422176 Leng et al. Apr 2013 B1
8487701 Boujamaa et al. Jul 2013 B2
8513944 Rodmacq et al. Aug 2013 B2
8542072 Dieny et al. Sep 2013 B2
8624590 Dieny Jan 2014 B2
8638529 Leng et al. Jan 2014 B1
8669122 Viala et al. Mar 2014 B2
8743507 Hassan et al. Jun 2014 B1
8779764 Meguro et al. Jul 2014 B2
8836317 Kasajima Sep 2014 B2
8847589 Walther et al. Sep 2014 B2
9046562 Cummings et al. Jun 2015 B2
9093102 Gong et al. Jul 2015 B1
9378761 Seagle Jun 2016 B1
9465056 Han et al. Oct 2016 B2
9529060 Fermon et al. Dec 2016 B2
9741372 Campiglio Aug 2017 B1
9804234 Dressler et al. Oct 2017 B2
9812637 Fermon et al. Nov 2017 B2
9922673 Campiglio et al. Mar 2018 B2
10026425 Campiglio Jul 2018 B2
10060880 Chen et al. Aug 2018 B2
10347277 Campiglio et al. Jul 2019 B2
10620279 Campiglio et al. Apr 2020 B2
10727402 Ando Jul 2020 B2
10734443 Lassalle-Balier et al. Aug 2020 B2
10753989 Campiglio et al. Aug 2020 B2
10840001 Lassalle-Balier et al. Nov 2020 B2
11002807 Campiglio et al. May 2021 B2
11022661 Lassalle-Balier et al. Jun 2021 B2
11127518 Campiglio et al. Sep 2021 B2
11193989 Campiglio et al. Dec 2021 B2
11217626 Campiglio et al. Jan 2022 B2
11467232 Muehlenhoff Oct 2022 B2
20020061421 Dieny May 2002 A1
20020158626 Shay et al. Oct 2002 A1
20020171417 Schoedlbauer Nov 2002 A1
20020191356 Hasegawa et al. Dec 2002 A1
20030002226 Lin et al. Jan 2003 A1
20030053266 Dieny et al. Mar 2003 A1
20030070497 Kikuchi et al. Apr 2003 A1
20030218840 Apel et al. Nov 2003 A1
20030226409 Steele et al. Dec 2003 A1
20040056647 Stauth et al. Mar 2004 A1
20040056654 Goldfine et al. Mar 2004 A1
20040086751 Hasegawa et al. May 2004 A1
20040207035 Witcraft et al. Oct 2004 A1
20040263157 Sudo et al. Dec 2004 A1
20050068683 Gill Mar 2005 A1
20050115822 Maass et al. Jun 2005 A1
20050180059 Gill Aug 2005 A1
20060002184 Hong et al. Jan 2006 A1
20060038407 Shelley et al. Feb 2006 A1
20060077598 Taylor et al. Apr 2006 A1
20060091993 Shoji May 2006 A1
20060114098 Shoji Jun 2006 A1
20060193089 Li et al. Aug 2006 A1
20060214656 Sudo et al. Sep 2006 A1
20060218775 Carey et al. Oct 2006 A1
20070019341 Mizuno et al. Jan 2007 A1
20070044370 Shoji Mar 2007 A1
20070076332 Shoji et al. Apr 2007 A1
20070121249 Parker May 2007 A1
20070164734 Shimizu et al. Jul 2007 A1
20080031035 Rodmacq et al. Feb 2008 A1
20080098167 Rodmacq et al. Apr 2008 A1
20080151615 Rodmacq et al. Jun 2008 A1
20080171223 Wang et al. Jul 2008 A1
20080258721 Guo et al. Oct 2008 A1
20080316655 Shoji Dec 2008 A1
20090015252 Raberg et al. Jan 2009 A1
20090015972 Dieny et al. Jan 2009 A1
20090021249 Kumar et al. Jan 2009 A1
20090027048 Sato et al. Jan 2009 A1
20090087589 Guo et al. Apr 2009 A1
20090115405 Guo May 2009 A1
20090161268 Lin Jun 2009 A1
20090189601 Okada et al. Jul 2009 A1
20090192755 Sheiretov et al. Jul 2009 A1
20090237075 Koss Sep 2009 A1
20090251829 Zhang et al. Oct 2009 A1
20090289694 Rieger et al. Nov 2009 A1
20090290053 Hammerschmidt Nov 2009 A1
20100007344 Guo et al. Jan 2010 A1
20100045277 Goldfine et al. Feb 2010 A1
20100060263 Granig et al. Mar 2010 A1
20100142101 Sato et al. Jun 2010 A1
20100277971 Slaughter et al. Nov 2010 A1
20110025320 Ohta et al. Feb 2011 A1
20110062537 Oh et al. Mar 2011 A1
20110068786 Miura et al. Mar 2011 A1
20110069413 Maat et al. Mar 2011 A1
20110133728 Tokunaga Jun 2011 A1
20110260270 Zhang et al. Oct 2011 A1
20120049843 Sun Mar 2012 A1
20120119735 Zimmer et al. May 2012 A1
20120156522 Maat et al. Jun 2012 A1
20120241878 Hu Sep 2012 A1
20120257298 Sato et al. Oct 2012 A1
20120286382 Jan et al. Nov 2012 A1
20130094108 Gao Apr 2013 A1
20130140658 Yamane et al. Jun 2013 A1
20130141964 Yamane Jun 2013 A1
20130270523 Wang Oct 2013 A1
20130299345 Abarra et al. Nov 2013 A1
20140175574 Watts et al. Jun 2014 A1
20140197504 Moriyama et al. Jul 2014 A1
20140250244 Song et al. Sep 2014 A1
20140252518 Zhang et al. Sep 2014 A1
20140334032 Nishioka et al. Nov 2014 A1
20140340791 Braganca et al. Nov 2014 A1
20150022196 Hebiguchi et al. Jan 2015 A1
20150177286 Fuji et al. Jun 2015 A1
20150192648 Campiglio et al. Jul 2015 A1
20150221326 Jung et al. Aug 2015 A1
20150333254 Liu et al. Nov 2015 A1
20150340601 Huai et al. Nov 2015 A1
20160005954 Erickson et al. Jan 2016 A1
20160218277 Yano et al. Jul 2016 A1
20160282101 Kaji et al. Sep 2016 A1
20160359103 Fermon et al. Dec 2016 A1
20170148977 Zhu et al. May 2017 A1
20170154643 Nishioka et al. Jun 2017 A1
20170256703 Zhu Sep 2017 A1
20170314969 Ausserlechner et al. Nov 2017 A1
20170373246 Wang Dec 2017 A1
20190043547 DeBrosse Feb 2019 A1
20190067561 Avci et al. Feb 2019 A1
20190173003 Beach Jun 2019 A1
20190178954 Lassalle-Balier et al. Jun 2019 A1
20190219616 Cadugan et al. Jul 2019 A1
20190219643 Cadugan et al. Jul 2019 A1
20190295615 Fukuzawa Sep 2019 A1
20200033424 Campiglio et al. Jan 2020 A1
20200064413 Campiglio et al. Feb 2020 A1
20200106003 Gottwald Apr 2020 A1
20210035633 Chiang et al. Feb 2021 A1
20210293911 Lassalle-Balier et al. Sep 2021 A1
20210383953 Campiglio et al. Dec 2021 A1
20210389393 Lassalle-Balier et al. Dec 2021 A1
20230178131 Carpenter Jun 2023 A1
20230240150 Chen Jul 2023 A1
20230263074 Song Aug 2023 A1
20240027547 Jaiswal Jan 2024 A1
Foreign Referenced Citations (80)
Number Date Country
201622299 Nov 2010 CN
101900754 Dec 2010 CN
198 10 838 Sep 1999 DE
198 43 348 Mar 2000 DE
102 22 467 Dec 2003 DE
102 57 253 Feb 2004 DE
10 2005 024 879 Dec 2006 DE
10 2005 042 307 Mar 2007 DE
10 2006 019 483 Oct 2007 DE
10 2008 030 334 Jan 2010 DE
0 779 632 Jun 1997 EP
0 863 406 Sep 1998 EP
1 323 856 Jul 2003 EP
1 336 985 Aug 2003 EP
1 510 787 Mar 2005 EP
1 617 472 Jan 2006 EP
1 666 894 Jun 2006 EP
1 672 321 Jun 2006 EP
1 777 440 Apr 2007 EP
1 918 678 May 2008 EP
1 947 469 Jul 2008 EP
2 727 778 Jun 1996 FR
2 729 790 Jul 1996 FR
2 752 302 Feb 1998 FR
2 773 395 Jul 1999 FR
2 774 774 Aug 1999 FR
2 814 592 Mar 2002 FR
2 817 998 Jun 2002 FR
2 817 999 Jun 2002 FR
2 830 621 Apr 2003 FR
2 876 800 Apr 2006 FR
2 889 348 Feb 2007 FR
2 932 315 Dec 2009 FR
2000-055997 Feb 2000 JP
2000-055999 Feb 2000 JP
2000-056000 Feb 2000 JP
2001-230471 Aug 2001 JP
2002-082136 Mar 2002 JP
2002-267692 Sep 2002 JP
2002-328140 Nov 2002 JP
2002-542617 Dec 2002 JP
2003-315091 Nov 2003 JP
2005-018908 Jan 2005 JP
2006-179566 Jul 2006 JP
2006-214910 Aug 2006 JP
2007-101253 Apr 2007 JP
2007-108069 Apr 2007 JP
2009-014544 Jan 2009 JP
2009-252342 Oct 2009 JP
2018-037613 Mar 2018 JP
I 513993 Dec 2015 TW
I 6333321 Aug 2018 TW
WO 2001067085 Sep 2001 WO
WO 2002084680 Oct 2002 WO
WO 2003032338 Apr 2003 WO
WO 2003104829 Dec 2003 WO
WO 2003107018 Dec 2003 WO
WO 2004048986 Jun 2004 WO
WO 2004068152 Aug 2004 WO
WO 2004068158 Aug 2004 WO
WO 2005028993 Mar 2005 WO
WO 2006136577 Dec 2006 WO
WO 2007095971 Aug 2007 WO
WO 2007148028 Dec 2007 WO
WO 2007148029 Dec 2007 WO
WO 2008012309 Jan 2008 WO
WO 2008015354 Feb 2008 WO
WO 2009001160 Dec 2008 WO
WO 2009001162 Dec 2008 WO
WO 2009007324 Jan 2009 WO
WO 2009110892 Sep 2009 WO
WO 2010001077 Jan 2010 WO
WO 2010026948 Mar 2010 WO
WO 2010066976 Jun 2010 WO
WO 2010084165 Jul 2010 WO
WO 2010113820 Oct 2010 WO
WO 2010116102 Oct 2010 WO
WO 2011007767 Jan 2011 WO
WO 2010136527 Dec 2012 WO
WO 2018012953 Jan 2018 WO
Non-Patent Literature Citations (43)
Entry
U.S. Appl. No. 16/157,313, filed Oct. 11, 2018, Lassalle-Balier et al.
U.S. Appl. No. 16/157,317, filed Oct. 11, 208, Lassalle-Balier et al.
Allegro MicroSystems, LLC, “High Sensitivity, 1 MHz GMR-Based Current Sensor IC in Space-Saving Low Resistance QFN Package;” ACS70331; Dec. 1, 2017; 22 Pages.
Lee et al.; “Critical Thickness Effects of NiFeCr—CoFe Seed Layers for Spin Valve Multilayers;” IEEE Transactions on Magnetics, vol. 40, No. 4; Jul. 20024; pp. 2209-2211; 3 Pages.
Repetski et al.; “Improved Interfaces and Magnetic Properties in Spin Valves Using Ni80Fe20 Seed Layer;” Journal of Applied Physics, vol. 91, No. 6; Mar. 15, 2002; pp. 3891-3895; 5 Pages.
Sankaranarayanan et al.; “Exchange Bias Variations of the Seed and Top NiFe Layers in NiFe/FeMn/NiFe Trilayer as a Function of Seed Layer Thickness;” Journal of Magnetism and Magnetic Material 286; Feb. 2005; pp. 196-199; 4 Pages.
Notice of Allowance dated Aug. 22, 2019 for U.S. Appl. No. 15/869,620; 11 Pages.
Taiwan 1st Office Action (with English Translation) dated May 28, 2020 for Taiwan Application No. 108127885; 20 Pages.
PCT International Search Report and Written Opinion of the ISA dated Jun. 3, 2015; for PCT Pat. App. No. PCT/US2015/010424; 17 Pages.
Response to PCT Written Opinion dated Feb. 27, 2017 for EP Pat. Appl. No. 15700938.2; 4 Pages.
Amended Claims included with A.A. Thornton response dated Feb. 27, 2017 for EP Pat. Appl. No. 15700938.2; 6 Pages.
U.S. Preliminary Amendment filed on Oct. 19, 2018 for U.S. Appl. No. 16/113,321; 7 Pages.
U.S. Non-Final Office Action dated Feb. 7, 2020 for U.S. Appl. No. 16/113,321; 16 Pages.
Response to U.S. Non-Final Office Action dated Feb. 7, 2020 for U.S. Appl. No. 16/113,321; Response filed Apr. 10, 2020; 12 Pages.
U.S. Notice of Allowance dated May 14, 2020 for U.S. Appl. No. 16/113,321; 15 Pages.
U.S. Preliminary Amendment filed on Nov. 1, 2019 for U.S. Appl. No. 16/507,538; 12 Pages.
U.S. Second Preliminary Amendment filed on Nov. 4, 2019 for U.S. Appl. No. 16/507,538; 12 Pages.
U.S. Notice of Allowance dated May 4, 2020 for U.S. Appl. No. 16/507,538; 10 Pages.
Response (with Machine English Translation) to Taiwan Office Action dated May 28, 2020 for Taiwan Application No. 108127885; Response filed Aug. 18, 2020; 19 Pages.
Taiwan Allowance Decision (with English Translation) dated Oct. 29, 2020 for Taiwan Application No. 108127885; 3 Pages.
Extended European Search Report (EESR) dated Feb. 23, 2021 for European Application No. 20184390.1; 9 Pages.
Taiwan Office Action (with English Translation) dated Dec. 1, 2021 for Taiwan Application No. 110101393; 9 Pages.
Response (with Machine English Translation) to Taiwan Office Action dated Dec. 1, 2021 for Taiwan Application No. 110101393; Response filed Feb. 9, 2022; 38 Pages.
Taiwan Allowance Decision (with English Translation) dated May 2, 2022 for Taiwan Application No. 110101393; 3 Pages.
U.S. Non-Final Office Action dated Jan. 12, 2017 for U.S. Appl. No. 14/591,213; 7 Pages.
Response to U.S. Non-Final Office Action dated Jan. 12, 2017 for U.S. Appl. No. 14/591,213; Response filed Apr. 4, 2017; 16 Pages.
U.S. Notice of Allowance dated Jul. 19, 2017 for U.S. Appl. No. 14/591,213; 6 Pages.
PCT International Preliminary Report dated Jul. 21, 2016 for International Application No. PCT/US2015/010424; 11 Pages.
European Decision to Grant dated Sep. 17, 2020 for European Application No. 15700938.2; 2 Pages.
Japanese Notice of Reasons for Rejection (with English Translation) dated Nov. 13, 2018 for Japanese Application No. 2016-545864; 13 Pages.
Response (with Machine English Translation) to Japanese Notice of Reasons for Rejection dated Nov. 13, 2018 for Japanese Application No. 2016-545864; Response filed Jan. 28, 2019; 20 Pages.
Japanese Allowance Report (with Claims and English Translation) dated Mar. 26, 2019 for Japanese Application No. 2016-545864; 10 Pages.
Korean 1st Office Action (with English Translation) dated Nov. 23, 2020 for Korean Application No. 10-2016-7021480; 25 Pages.
Response (with English Translation) to Korean 1st Office Action dated Nov. 23, 2020 for Korean Application No. 10-2016-7021480; Response filed Jan. 21, 2021; 137 Pages.
Korean 2nd Office Action (with English Translation) dated May 28, 2021 for Korean Application No. 10-2016-7021480; 34 Pages.
Response (with English Translation) to Korean 2nd Office Action dated May 28, 2021 for Korean Application No. 10-2016-7021480; Response filed Jul. 27, 2021; 77 Pages.
Korean Notice of Allowance (with English Translation) dated Nov. 26, 2021 for Korean Application No. 10-2016-7021480; 10 Pages.
Response to European Examination Report Mar. 13, 2024, filed on May 22, 2024 for European Application No. 20184390.1, 20 pages.
U.S. Appl. No. 17/805,054, filed Jun. 2, 2022, Campiglio et al.
European Examination Report Mar. 13, 2024 for European Application No. 20184390.1, 7 pages.
U.S. Non-Final Office Action dated Mar. 30, 2023 for U.S. Appl. No. 17/805,054; 25 Pages.
Response to U.S. Non-Final Office Action dated Mar. 30, 2023 for U.S. Appl. No. 17/805,054; Response filed Apr. 5, 2023; 8 Pages.
U.S. Notice of Allowance dated May 10, 2023 for U.S. Appl. No. 17/805,054; 8 Pages.
Related Publications (1)
Number Date Country
20240027547 A1 Jan 2024 US