The present invention relates to a conveyance device.
Conventionally, devices that convey objects in a non-contact manner have been used to convey semiconductor wafers. For example, Patent Document 1 discloses a device that conveys semiconductor wafers in a non-contact manner by utilizing Bernoulli's principle. The device disclosed in Patent Document 1 has a cylindrical chamber that opens at an underside, generates a swirling flow in the cylindrical chamber, and applies suction to semiconductor wafers under a negative pressure generated at the center of the swirling flow. The device enables non-contact transfer of semiconductor wafers by maintaining a consistent distance between the device and the semiconductor wafers by fluid flowing out of the cylindrical chamber.
Patent Document 1: Japanese Unexamined Patent Application No. 2005-51260
The present invention has been made in view of the above technology, and the purpose of the present invention is to substantially reduce damage to a surface of plate-shaped objects to be conveyed.
To solve the problem described above, the present invention provides a conveyance device that applies suction to and conveys a plate-shaped object to be conveyed, the device comprising: a plate-shaped main body that faces the plate-shaped object to be conveyed; a plurality of recesses formed in the plate-shaped main body to face an outer circumferential portion of the plate-shaped object to be conveyed; a plurality of discharge channels formed inside the plate-shaped main body; and, a plurality of movement restriction members formed on the main body to contact with and restrict lateral movement of the plate-shaped object to be conveyed; wherein, one each of the plurality of discharge channels is connected to one each of the plurality of recesses, and a swirling flow is formed in the plurality of recesses with fluid supplied from the plurality of connected discharge channels; and, in each of the plurality of recesses, a portion of an opening not covered by the plate-shaped object to be conveyed is covered by one of the plurality of movement restriction members.
In a preferred embodiment of the above-described conveyance device, the plurality of recesses are formed at each of one end and another end of the main body in opposing relation to each other; and, the plurality of discharge channels are formed so that fluid flowing out of the plurality of recesses connected to the plurality of discharge channels flows in a direction from outside to inside of the plate-shaped object to be conveyed.
In a further preferred embodiment of the above-described conveyance device, the plurality of movement restriction members each forms an outlet path between the plate-shaped main body such that fluid flowing out of any one of the plurality of recesses whose opening is partially covered by any one of the plurality of movement restriction members flows in the direction from the inside to the outside of the plate-shaped object to be conveyed.
According to the present invention, damage to a surface of a plate-shaped object to be conveyed can be substantially reduced.
Wafer conveyance hand 1 of the first embodiment of the present invention is described below with reference to the drawings.
Wafer conveyance hand 1 comprises paddle 11, sealing member 12, sensor 13, and four guide members 14, which are described below.
Arms 111A and 111B are substantially rectangular in shape, and have leading and trailing edges that are arc-shaped. Arms 111A and 111B have through holes113 at their leading and trailing edges. Through hole 113 is circular in shape. At the leading edges of arms 111A and 111B, through holes 113 are positioned in opposing relation to face each other in the left and right directions as shown in the figure. Similarly, at the trailing edges of arms 111A and 111B through holes 113 are positioned in opposing relation to each other in the left and right directions as shown in the figure. Arms 111A and 111B have a total of four through holes 113 arranged circumferentially to face the outer edge of wafer W to be conveyed. Each of through holes 113 forms concave part 15, described below, when a portion thereof is covered by sealing member 12.
Discharge grooves 114 are formed on the top surface of arms 111A and 111B, and each are connected to one of through holes 113.
As shown in
As shown in
The foregoing is a description of paddle 11.
Sealing member 12 will now be described. As shown in
Air discharged into concave part 15 through discharge channels 16 is guided by the inner wall of concave part 15 to form a swirling flow, and flows out of concave part 15. When air is discharged into concave part 15, if wafer W faces the opening of concave part 15, wafer W restricts a flow of external air into concave part 15. Under such a condition, centrifugal forces and entrainment of the swirling flow result in a smaller density of fluid molecules per unit volume in the center of the swirling flow. Consequently, a negative pressure is generated within the center of the swirling flow. As a result, wafer W is subject to a pressure of surrounding air and is suctioned toward concave part 15. As wafer W approaches concave part 15, an amount of air flowing out of concave part 15 is reduced. As a result, the negative pressure generated within the center of the swirling flow decreases, and wafer W is supported by the surrounding air to maintain a distance from concave part 15.
The pair of discharge channels 16 are positioned so that air flowing out of concave part 15 flows in the longitudinal direction of arms 111, as indicated by arrows A1 in
The direction of air flowing out of concave part 15 varies dependent on a flow rate of air discharged into concave part 15. Consequently, a direction in which each of discharge channels 16 extends can be adjusted so that outflow air flows toward the leading edge or trailing edge of arm 111A based on an optimal air flow rate discharged into concave part 15.
Sealing member 12 will now be further described. As shown in
The foregoing is a description of sealing member 12.
Sensor 13 will now be described. As shown in
Guide members 14 will now be described. As shown in
Main Portion 141 is an arc-shaped plate.
Inclined Portion 142 is continuous with the inner edge of main portion 141. Inclined Portion 142 forms a slope between main portion 141 and protruding parts 143, which have sloped bottom sides. Namely, a two-step slope is formed by inclined portion 142 and protruding parts 143.
Protruding parts 143 are each a substantially rectangular-shaped plate, and extend laterally from an inner side of main portion 141, such that the further away from main portion 141 that the protruding parts 143 extend the thinner they are to maintain therebetween a predetermined distance.
Viewed in cross section exhaust groove 144 is a U-shaped groove, and is formed on the top surface of main portion 141 to extend in the lateral direction of main portion 141.
As shown in
As shown in these figures, main portion 141 of guide member 14 mounted to arm 111A or 111B partially covers the opening of concave part 15. Specifically, guide member 14 covers a portion of the opening of concave part 15 that is not covered by wafer W to be conveyed. The slope formed by inclined portion 142 and protruding parts 143 of guide member 14 linearly contacts the outer edge of wafer W to be conveyed, and restricts horizontal movement of wafer W. The protruding parts 143 are configured to have concave part 15 between them, and guide a part of air flowing out of concave part 15 toward the center of arms 111. Exhaust groove 144 of guide member 14 forms exhaust channel 18 with the bottom surface of arms 111. Viewed in cross section, exhaust channel 18 is substantially rectangular, and extends in the longitudinal direction of arms 111. Exhaust channel 18 is a passageway used to exhaust outside of the device a part of air flowing out of concave part 15. Namely, exhaust channel 18 allows a part of air flowing out of concave part 15 to be exhausted in a direction from the inside of wafer W toward the outside of wafer W.
The foregoing is a description of guide members 14.
As shown in
As shown in
As shown in
A part of air flowing out of concave part 15 flows in the longitudinal direction of arms 111. In other words, a part of air flowing out of concave part 15 flows from the outside to the inside of wafer W.
Wafer conveyance hand 2 of the second embodiment of the present invention is described below with reference to the drawings.
Wafer conveyance hand 2 comprises paddle 21, sealing member 22, guide members 23, cushioning members 24, and grip 25, which are described below.
Four pairs of discharge grooves 212 are formed on the top surface of paddle 21, and each are connected to one of through holes 211.
As shown in
The foregoing is a description of paddle 21.
Sealing member 22 will now be described. As shown in
Air discharged into concave part 26 through discharge channels 27 is guided by the inner wall of concave part 26 to form a swirling flow, and flows out of concave part 26. When air is discharged into concave part 26, if wafer W faces the opening of concave part 26, wafer W restricts a flow of external air into concave part 26. Under such a condition, centrifugal forces and entrainment of the swirling flow result in a smaller density of fluid molecules per unit volume in the center of the swirling flow. Consequently, a negative pressure is generated within the center of the swirling flow. As a result, wafer W is subject to a pressure of surrounding air and is suctioned toward concave part 26. As wafer W approaches concave part 26, an amount of air flowing out of concave part 26 is reduced. As a result, the negative pressure generated within the center of the swirling flow decreases, and wafer W is supported by the surrounding air to maintain a distance from concave part 26.
The pair of discharge channels 27 are positioned so that air flowing out of concave part 26 flows in the longitudinal direction of paddle 21, as indicated by arrows A4 in
Each of arrows A4 in
The direction of air flowing out of concave part 26 varies dependent on a flow rate of air discharged into concave part 26. Consequently, a direction in which each of discharge channels 27 extends can be adjusted so that outflow air flows toward the leading edge or trailing edge of paddle 21 based on an optimal air flow rate discharged into concave part 26.
Sealing member 22 will now be further described. Sealing member 22 has circular shaped supply port 221 (not shown in
The foregoing is a description of sealing member 22.
Guide members 23 will now be described. As shown in
Main portion 231 is an arc-shaped plate.
Inclined portion 232 is continuous with the inner edge of main portion 231.
As viewed in cross section, each of exhaust grooves 233 is U-shaped, and is formed on the top surface of main portion 231 to extend laterally from main portion 23.
As shown in
As shown in these figures, main portion 231 of guide member 23 mounted to paddle 21 partially covers the opening of concave part 26. Specifically, guide member 23 covers a portion of the opening of concave part 26 that is not covered by wafer W to be conveyed. The inner circumferential side of main portion 231 contacts the outer edge of wafer W to be conveyed and restricts horizontal movement of wafer W. Two exhaust grooves 233 of guide member 23 form two exhaust channels 29 with the bottom surface of paddle 21. Viewed in cross section, each of exhaust channels 29 is substantially rectangular. Each of exhaust channels 29 extends in the longitudinal direction of paddle 21. Exhaust channels 29 are passageways used to exhaust outside of the device a part of air flowing out of concave part 26. Namely, exhaust channels 29 allow a part of air flowing out of concave part 26 to be exhausted in a direction from the inside of wafer W toward the outside of wafer W.
The foregoing is a description of guide members 23.
Cushioning member 24 will now be described. Wafer conveyance hand 2 has eight cushioning members 24. Each of cushioning members 24 is a resin plate of substantially rectangular shape. As shown in
Grip 25 will now be described. Grip 25 is a hollow rod-shaped member. One end of grip 25 is connected to the top of the trailing end of paddle 21, and the other end of grip 25 is connected to a tube extending from an air pump (not shown in
As shown in
As shown in
As shown in
A part of air flowing out of concave parts 26 flows toward the center in the longitudinal direction of paddle 21. In other words, a part of air flowing out of each of concave parts 26 flows from the outside to the inside of wafer W.
The embodiments described above may be modified as described below. It is of note that two or more of the modifications described below may be combined.
Wafer conveyance hand 2 of the second embodiment has paddle 21 and sealing member 22, each of which are I-shaped. The shapes of paddle 21 and sealing member 22 may be changed.
The shape of through holes 113 and 211 is not limited to circular. For example, the shape of through hole 113 or 211 may be elliptical shape as shown in
The numbers of guide members 14, concave parts 15, discharge channels 16 and exhaust channels 18 of wafer conveyance hand 1 may be changed according to the size of wafer W to be conveyed. Similarly, the numbers of guide members 23, concave parts 26, discharge channels 27 and exhausting channels 29 of wafer conveyance hand 2 may be changed according to the size of wafer W to be conveyed.
Paddle 11, sealing member 12 and four guide members 14 of wafer conveyance hand 1 may be molded as one piece. Similarly, paddle 21, sealing member 22, two guide members 23 and eight cushioning members 24 of wafer conveyance hand 2 may be molded as one piece.
The object conveyed by wafer conveyance hand 1 or 2 is not limited to a TAIKO wafer W. Wafer conveyance hand 1 or 2 may convey a plate-shaped object other than a TAIKO wafer W.
The fluid used to convey wafer W is not limited to a gas such as air, and liquid may be used to convey wafer W.
Wafer conveyance hand 2 need not comprise cushioning member 24, and only guide members 23 may be used to restrict horizontal movement of wafer W.
In the second embodiment described above, a part of the opening of concave part 26 of wafer conveyance hand 2 is covered by guide member 23. Instead of guide member 23, a part of the opening of concave part 26 may be covered by cushioning member 41 that restricts horizontal movement of wafer W.
Main portion 411 is an arc-shaped plate.
Each of protruding portions 412 is a substantially rectangular-shaped plate. Protruding portions 412 are formed from the inside surface of main portion 411 and extends laterally in the direction of main portion 411.
Exhaust groove 413 has a U-shaped cross-section. Exhaust groove 413 is formed on the top surface of main portion 411, and extends laterally in the direction of main portion 411.
Main portion 411 of cushioning member 41 mounted to paddle 21 partially covers the opening of concave part 26. Specifically, cushioning member 41 covers a portion of the opening of concave part 26 that is not covered by wafer W to be conveyed. Two protruding portions 412 of cushioning member 41 come into contact with the outer edge of wafer W to be conveyed and restrict horizontal movement of wafer W. Protruding portions 412 are positioned across concave part 26, and guide a part of air flowing out of concave part 26 toward the center in the longitudinal direction of paddle 21. Exhaust grooves 413 of guide member 41 form exhaust channel 42 with the bottom surface of paddle 21. As viewed in cross section, exhaust channel 42 is rectangular-shaped. Exhaust channel 42 extends in the longitudinal direction of paddle 21, and is a passageway for exhausting to outside of the device a part of air flowing out of concave part 26.
The shape of main portion 141 or 231 is not limited to an arc-shape, and it may be configured as appropriate depending on a shape of the plate-shaped object to be conveyed.
One or more grooves may be formed on the bottom of arms 111 of wafer conveyance hand 1 to guide a part of air flowing out of concave part 15 to the center in the longitudinal direction of arms 111. Air guided by the one or more grooves flows between arms 111 and wafer W, thereby separating wafer W from arms 111.
Similarly, one or more grooves may be formed on the bottom of paddle 21 of wafer conveyance hand 2 to guide a part of air flowing out of concave part 26 to the center in the longitudinal direction of paddle 21. Air guided by the one or more grooves flows between paddle 21 and wafer W, thereby separating wafer W from paddle 21.
1, 2, 3: wafer conveyance hand
11, 21 ,31: paddle
12, 22, 32: sealing member
13: sensor
14, 23: guide member
15, 26: concave part
16, 27: discharge channel
17, 28: supply channel
18, 29, 42: exhaust channel
24, 41: cushioning member
25: grip
111A, 111B: arm
112: connecting part
113, 211: through hole
114, 212: discharge groove
115, 213: supply groove
121, 221: supply port
141, 231: main portion
142, 232: inclined portion
143, 412: protruding portion
144, 233, 413: exhaust groove
411: main portion
W: wafer
Number | Date | Country | Kind |
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2020-089035 | May 2020 | JP | national |
Filing Document | Filing Date | Country | Kind |
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PCT/JP2021/018765 | 5/18/2021 | WO |