Claims
- 1. A method of developing a positive photo-resist layer, which is formed in a predetermined thickness on a disc substrate and which is exposed by a light beam modulated in accordance with record information to produce an optical record medium comprising the photo-resist layer and the disc substrate, said method comprising the successive steps of:
- (1) developing the exposed photo-resist layer with an alkaline developing solution which, has a normality of 0.17 to 0.19N, for 10 seconds to 60 seconds such that the photo-resist layer is incompletely developed to a predetermined depth from a surface of the exposed photo-resist layer;
- (2) washing the partially developed photo-resist layer of step (1) to stop the development, and drying the washed photo-resist layer;
- (3) further developing the dried photo-resist layer of step (2) with said alkaline developing solution for 100 seconds to 300 seconds such that the photo-resist layer is completely developed to a pit depth; and
- (4) washing the developed photo-resist layer of step (3) to stop the development, and drying the washed photo-resist layer to produce the optical record medium recorded with the record information as developed pit pattern.
- 2. The method according to claim 1, comprising the additional step of pre-washing the exposed photo-resist layer before developing step (1) to improve a wettability of the exposed photo-resist layer with respect to the alkaline developing solution.
- 3. The method according to claim 1, wherein said optical record medium comprises a master disc for an optical disc.
- 4. The method according to claim 1, wherein in developing steps (1) and (3) the alkaline developing solution is applied to a surface of the photo-resist layer while rotating the disc substrate.
- 5. The method according to claim 1, wherein in washing steps (2) and (4) pure water is supplied to a surface of the photo-resist layer while rotating the disc substrate.
Priority Claims (1)
Number |
Date |
Country |
Kind |
7-40369 |
Feb 1995 |
JPX |
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Parent Case Info
This is a Rule 62 File Wrapper Continuation of application Ser. No. 08/606,401, filed 23 Feb. 1996, now abandoned.
US Referenced Citations (4)
Foreign Referenced Citations (1)
Number |
Date |
Country |
1-214863 |
Aug 1989 |
JPX |
Non-Patent Literature Citations (4)
Entry |
Elliot, David J., Integrated Cicuit Fabrication Technology McGraw-Hill pp. 214-229 1982. |
Chiong et al., "Contrast and sensitivity. . . ", J. Vac. Sci. Technol., B vol. 6(6) Nov./Dec. 1988. |
Abstract of JP 01-214863. |
Elliott "Integrated Circuit Fabrication Technology"(.COPYRGT.1982) pp. 214-229. |
Continuations (1)
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Number |
Date |
Country |
Parent |
606401 |
Feb 1996 |
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