Treatment after imagewise removal

Industry

CPC
G03F7/40

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/40Treatment after imagewise removal

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Chemical liquid, rinsing solution, and resist pattern forming method
- Patent number 12,366,805
- Issue date Jul 22, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for preparing pixel define layer
- Patent number 12,366,802
- Issue date Jul 22, 2025
- DUK SAN NEOLUX CO., LTD.
- Jun Bae
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 12,360,451
- Issue date Jul 15, 2025
- Samsung Electronics Co., Ltd.
- Chawon Koh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film-forming composition
- Patent number 12,360,452
- Issue date Jul 15, 2025
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of producing touch sensor and touch sensor
- Patent number 12,360,629
- Issue date Jul 15, 2025
- FUJIFILM Corporation
- Kazuhiro Hasegawa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
EUV photo masks and manufacturing method thereof
- Patent number 12,353,120
- Issue date Jul 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wei-Che Hsieh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developing method and substrate treatment system
- Patent number 12,339,593
- Issue date Jun 24, 2025
- Tokyo Electron Limited
- Yuya Kamei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal oxide resists for EUV patterning and methods for developing t...
- Patent number 12,332,568
- Issue date Jun 17, 2025
- Tokyo Electron Limited
- Hamed Hajibabaeinajafabadi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Storage container storing treatment liquid for manufacturing semico...
- Patent number 12,313,976
- Issue date May 27, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insulating layer for multilayer printed circuit board, multilayer p...
- Patent number 12,313,973
- Issue date May 27, 2025
- LG Chem, Ltd.
- Jeong Wook Mun
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Micro- and nano-fluidic chip, method of fabricating the same, and a...
- Patent number 12,303,897
- Issue date May 20, 2025
- SHENZHEN INSTITUTES OF ADVANCED TECHNOLOGY
- Hui Yang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Treatment liquid and pattern forming method
- Patent number 12,306,538
- Issue date May 20, 2025
- FUJIFILM Corporation
- Hideaki Tsubaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer processing equipment and method of manufacturing semiconducto...
- Patent number 12,287,147
- Issue date Apr 29, 2025
- Samsung Electronics Co., Ltd.
- Sangjine Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for fabrication of large area 3D photonic crys...
- Patent number 12,287,571
- Issue date Apr 29, 2025
- Steven R.J. Brueck
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Fabrication of blazed diffractive optics by through-mask oxidation
- Patent number 12,287,498
- Issue date Apr 29, 2025
- Paul Scherrer Institut
- Christian David
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Film deposition apparatus for fine pattern forming
- Patent number 12,288,671
- Issue date Apr 29, 2025
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for cleaning substrate, method for manufacturing photomask a...
- Patent number 12,282,260
- Issue date Apr 22, 2025
- Taiwan Semiconductor Manufacturing Company Ltd.
- Yu-Hsin Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern decomposition lithography techniques
- Patent number 12,278,204
- Issue date Apr 15, 2025
- Intel Corporation
- Charles H. Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organotin oxide hydroxide patterning compositions, precursors, and...
- Patent number 12,276,913
- Issue date Apr 15, 2025
- Inpria Corporation
- Stephen T. Meyers
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate transferring unit, substrate processing apparatus, and su...
- Patent number 12,278,133
- Issue date Apr 15, 2025
- Samsung Electronics Co., Ltd.
- Sangjine Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation-sensitive resin composition, method of forming resist pat...
- Patent number 12,259,653
- Issue date Mar 25, 2025
- JSR Corporation
- Katsuaki Nishikori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 12,253,802
- Issue date Mar 18, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film-forming composition containing indolocarbazo...
- Patent number 12,242,196
- Issue date Mar 4, 2025
- Nissan Chemical Industries, Ltd.
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor photoresist composition, method for preparing thereof...
- Patent number 12,242,189
- Issue date Mar 4, 2025
- Samsung SDI Co., Ltd.
- Kyungsoo Moon
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Onium salt, chemically amplified resist composition and patterning...
- Patent number 12,240,804
- Issue date Mar 4, 2025
- Shin-Etsu Chemical Co., Ltd.
- Takayuki Fujiwara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Curable composition, kit, interlayer, laminate, imprint pattern pro...
- Patent number 12,242,185
- Issue date Mar 4, 2025
- FUJIFILM Corporation
- Naoya Shimoju
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography method for positive tone development
- Patent number 12,222,654
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ming-Hui Weng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming semiconductor structure
- Patent number 12,222,653
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ming-Hui Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 12,222,649
- Issue date Feb 11, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, photosensitive resin film, photos...
- Patent number 12,216,405
- Issue date Feb 4, 2025
- Shin-Etsu Chemical Co., Ltd.
- Hitoshi Maruyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY...
- Publication number 20250236813
- Publication date Jul 24, 2025
- YCCHEM CO., LTD.
- Su Jin LEE
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
CLEANING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN USIN...
- Publication number 20250236822
- Publication date Jul 24, 2025
- DONGWOO FINE-CHEM CO., LTD.
- GI JIN KWUN
- B08 - CLEANING
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOS...
- Publication number 20250237952
- Publication date Jul 24, 2025
- Shin-Etsu Chemical Co., Ltd.
- Hitoshi Maruyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNAB...
- Publication number 20250231492
- Publication date Jul 17, 2025
- SUNTIFIC MATERIALS (WEIFANG), LTD.
- Sam SUN
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ORGANOTIN OXIDE HYDROXIDE PATTERNING COMPOSITIONS, PRECURSORS, AND...
- Publication number 20250224680
- Publication date Jul 10, 2025
- INPRIA CORPORATION
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WAFER PROCESSING EQUIPMENT AND METHOD OF MANUFACTURING SEMICONDUCTO...
- Publication number 20250224177
- Publication date Jul 10, 2025
- Samsung Electronics Co., Ltd.
- Sangjine PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250224683
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING
- Publication number 20250226177
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Kazuhide HASEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CLEANING SUBSTRATE, METHOD FOR MANUFACTURING PHOTOMASK A...
- Publication number 20250216791
- Publication date Jul 3, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- YU-HSIN HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE TRANSFERRING UNIT, SUBSTRATE PROCESSING APPARATUS, AND SU...
- Publication number 20250210405
- Publication date Jun 26, 2025
- Samsung Electronics Co., Ltd.
- Sangjine Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICRO- AND NANO-FLUIDIC CHIP, METHOD OF FABRICATING THE SAME, AND A...
- Publication number 20250196140
- Publication date Jun 19, 2025
- SHENZHEN INSTITUTES OF ADVANCED TECHNOLOGY
- Hui Yang
- B82 - NANO-TECHNOLOGY
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION, METHOD FOR PREPARING THEREOF...
- Publication number 20250199400
- Publication date Jun 19, 2025
- Samsung SDI Co., Ltd.
- Kyungsoo MOON
- C07 - ORGANIC CHEMISTRY
Information Patent Application
MICRO- AND NANO-FLUIDIC CHIP, METHOD OF FABRICATING THE SAME, AND A...
- Publication number 20250196139
- Publication date Jun 19, 2025
- SHENZHEN INSTITUTES OF ADVANCED TECHNOLOGY
- Hui Yang
- B82 - NANO-TECHNOLOGY
Information Patent Application
RINSE MATERIAL COMPOSITION FOR PATTERNING PROCESS USING LITHOGRAPHY...
- Publication number 20250197782
- Publication date Jun 19, 2025
- Samsung Electronics Co., Ltd.
- Chawon Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF INCREASING CROSSLINKING DENSITY OF PHOTORESIST
- Publication number 20250199412
- Publication date Jun 19, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yuan Chih LO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING PLATED ARTICLE
- Publication number 20250189895
- Publication date Jun 12, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Daisuke Ojima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYIMIDE RESIN PRECURSOR
- Publication number 20250189891
- Publication date Jun 12, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Kazuaki EBISAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ANISOTROPIC CONDUCTIVE ELASTIC MATERIAL, METHOD FOR PREPARING THE S...
- Publication number 20250194005
- Publication date Jun 12, 2025
- MIDAS H&T INC.
- Un Yong JEONG
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
COMPOSITION FOR PRETREATMENT
- Publication number 20250180989
- Publication date Jun 5, 2025
- NISSAN CHEMICAL CORPORATION
- Satoshi KAMIBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL-COMPOUND-REMOVING SOLVENT AND METHOD IN LITHOGRAPHY
- Publication number 20250172879
- Publication date May 29, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST MATERIAL AND METHOD FOR LITHOGRAPHY
- Publication number 20250155809
- Publication date May 15, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Chih Ho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO PATTERN A SEMICONDUCTOR SUBSTRATE USING A MULTILAYER PHOT...
- Publication number 20250149335
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Kandabara Tapily
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY METHOD FOR POSITIVE TONE DEVELOPMENT
- Publication number 20250147424
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ming-Hui WENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROTECTIVE-FILM FORMING COMPOSITION
- Publication number 20250136734
- Publication date May 1, 2025
- NISSAN CHEMICAL CORPORATION
- Tokio NISHITA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION FOR PHOTOLITHOGRAPHY AND METHOD FOR MANUFACTURIN...
- Publication number 20250130491
- Publication date Apr 24, 2025
- Inha University Research and Business Foundation
- Jinkyun LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY PROCESS
- Publication number 20250116937
- Publication date Apr 10, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming-Hui WENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVIN...
- Publication number 20250110402
- Publication date Apr 3, 2025
- NISSAN CHEMICAL CORPORATION
- Kodai KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20250102918
- Publication date Mar 27, 2025
- TOKYO ELECTRON LIMITED
- Koji Ushimaru
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK AND METHOD OF MANUFACTURING THE SAME
- Publication number 20250102904
- Publication date Mar 27, 2025
- SAMSUNG DISPLAY CO., LTD.
- JINWOO LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250092514
- Publication date Mar 20, 2025
- TOKYO ELECTRON LIMITED
- Masanobu IGETA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Treatment after imagewise removal

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Chemical liquid, rinsing solution, and resist pattern forming method

Method for preparing pixel define layer

Method of manufacturing semiconductor device

Resist underlayer film-forming composition

Method of producing touch sensor and touch sensor

EUV photo masks and manufacturing method thereof

Developing method and substrate treatment system

Metal oxide resists for EUV patterning and methods for developing t...

Storage container storing treatment liquid for manufacturing semico...

Insulating layer for multilayer printed circuit board, multilayer p...

Micro- and nano-fluidic chip, method of fabricating the same, and a...

Treatment liquid and pattern forming method

Wafer processing equipment and method of manufacturing semiconducto...

Method and apparatus for fabrication of large area 3D photonic crys...

Fabrication of blazed diffractive optics by through-mask oxidation

Film deposition apparatus for fine pattern forming

Method for cleaning substrate, method for manufacturing photomask a...

Pattern decomposition lithography techniques

Organotin oxide hydroxide patterning compositions, precursors, and...

Substrate transferring unit, substrate processing apparatus, and su...

Radiation-sensitive resin composition, method of forming resist pat...

Positive resist composition and pattern forming process

Resist underlayer film-forming composition containing indolocarbazo...

Semiconductor photoresist composition, method for preparing thereof...

Onium salt, chemically amplified resist composition and patterning...

Curable composition, kit, interlayer, laminate, imprint pattern pro...

Lithography method for positive tone development

Method for forming semiconductor structure

Positive resist composition and pattern forming process

Photosensitive resin composition, photosensitive resin film, photos...

Patents Applicationslast 30 patents

RINSE SOLUTION COMPOSITION FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY...

CLEANING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN USIN...

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOS...

MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNAB...

ORGANOTIN OXIDE HYDROXIDE PATTERNING COMPOSITIONS, PRECURSORS, AND...

WAFER PROCESSING EQUIPMENT AND METHOD OF MANUFACTURING SEMICONDUCTO...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING

METHOD FOR CLEANING SUBSTRATE, METHOD FOR MANUFACTURING PHOTOMASK A...

SUBSTRATE TRANSFERRING UNIT, SUBSTRATE PROCESSING APPARATUS, AND SU...

MICRO- AND NANO-FLUIDIC CHIP, METHOD OF FABRICATING THE SAME, AND A...

SEMICONDUCTOR PHOTORESIST COMPOSITION, METHOD FOR PREPARING THEREOF...

MICRO- AND NANO-FLUIDIC CHIP, METHOD OF FABRICATING THE SAME, AND A...

RINSE MATERIAL COMPOSITION FOR PATTERNING PROCESS USING LITHOGRAPHY...

METHOD OF INCREASING CROSSLINKING DENSITY OF PHOTORESIST

METHOD OF MANUFACTURING PLATED ARTICLE

POLYIMIDE RESIN PRECURSOR

ANISOTROPIC CONDUCTIVE ELASTIC MATERIAL, METHOD FOR PREPARING THE S...

COMPOSITION FOR PRETREATMENT

METAL-COMPOUND-REMOVING SOLVENT AND METHOD IN LITHOGRAPHY

PHOTORESIST MATERIAL AND METHOD FOR LITHOGRAPHY

METHOD TO PATTERN A SEMICONDUCTOR SUBSTRATE USING A MULTILAYER PHOT...

LITHOGRAPHY METHOD FOR POSITIVE TONE DEVELOPMENT

PROTECTIVE-FILM FORMING COMPOSITION

RESIST COMPOSITION FOR PHOTOLITHOGRAPHY AND METHOD FOR MANUFACTURIN...

LITHOGRAPHY PROCESS

SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVIN...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

MASK AND METHOD OF MANUFACTURING THE SAME

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM