C. Elsmore et al., “Comparision of HCI Gas-Phase Cleaning with Conventional and Dilute Wet Chemistries”, Electrochem. Soc. Proc. (1995) 142-149. |
P.J. Holmes et al., “A Vapor Etching Technique for the Photolithography of Silicon Dioxide,” Microelectronics and Reliability, (1966) 337-341. |
K. D. Beyer et al., “Etching of SiO2 in Gaseous HF/H2O,” IBM Technical Bulletin, 19(7), (Dec. 1976), 2513. |
A. Izumi et al., “A New Cleaning Method by Using Anhydrous HF/CH3OH Vapor System,” J. Ruzyllo et al., ed. Symposium on Cleaning Technology in Semiconductor Device Manufacturing, ECS Proceedings, 92(12), 260-266 (1992). |
Robert D. Donovan et al., “Semiconductor Wafer Cleaning Technology”, Austin, TX, Feb. 23-24, 1993. |
J. Butterbaugh et al., “Gas Phase Etching of Silicon Oxide with Anhydrous HF and Isopropanol”, Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, ECS Proceedings, 94(7), 374-383 (1994). |
M. Jun-Ru, “A New Conformal Dry-etch Technique for Submicron Structures,” j. Vac. Sci. Technol., Nov./Dec. 1981, 1385-1389. |
K.D. Beyer et al., “Silicon Surface Cleaning Process,” IBM Technical Disclosure Bulletin, 20(5) (Oct. 1977), 1746-7. |