Number | Name | Date | Kind |
---|---|---|---|
4233091 | Kawabe | Nov 1980 | A |
4309813 | Hull | Jan 1982 | A |
4338620 | Kawabe | Jul 1982 | A |
5498501 | Shimoda et al. | Mar 1996 | A |
5532520 | Haraguchi et al. | Jul 1996 | A |
5695897 | Mitome et al. | Dec 1997 | A |
5982044 | Lin et al. | Nov 1999 | A |
6037671 | Keplet et al. | Mar 2000 | A |
6043134 | Bishop | Mar 2000 | A |
6049137 | Jang et al. | Apr 2000 | A |
6077756 | Lin et al. | Jun 2000 | A |
6081040 | Okuda et al. | Jun 2000 | A |
6083807 | Hsu | Jul 2000 | A |
6097102 | Takizawa | Aug 2000 | A |
Number | Date | Country |
---|---|---|
1560778 | Feb 1980 | GB |
54-072684 | Jun 1979 | JP |
Entry |
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Electron Beam/Optical Mixed Lithography at Half-Micron Ground Rules, P. Coane, P. Rudeck, L. K. Wang, F. Hohn, Microelectronic Engineering 5 (1986) 133-140, Elsevier Science Publishers B.V. (North-Holland). |