Claims
- 1. An inline electron holograph method for observing a specimen with a transmission electron microscope having an electron gun, a collimating lens system, two spaced objective lenses, a biprism, and an imaging means comprising the steps of:
with the first objective lens forming a virtual image of a portion of the specimen; with the second objective lens focussing the virtual image at an intermediate image plane to form an intermediate image; and projecting the intermediate image onto the imaging means.
- 2. An inline electron holograph method for observing semiconductor devices with a transmission electron microscope having a field emission electron gun, a collimating lens system, two spaced objective lenses, a biprism, and an imaging means located at an image plane comprising the steps of:
with the first objective lens forming a virtual image of a portion of the semiconductor device; with the second objective lens focussing the virtual image at an intermediate image plane beyond the biprism to form an intermediate image; adjusting the magnification of both of the objective and the voltage applied to the biprism to provide a continuously variable field of view between 5 and 2000 nanometers and a continuously variable fringe spacing of between 0.1 and 30 nanometers; and projecting the intermediate image onto the imaging means.
- 3. An inline electron holograph method according to claim 2 wherein the intermediate image plane is fixed.
- 4. An inline electron holograph method according to claim 2 wherein the intermediate image plane is variable.
- 5. An inline intermediate image method according to claim 2 wherein the variable fringe spacing is between 0.1 and 30 nanometers.
RELATED APPLICATION
[0001] This application claims priority to provisional patent Application No. 60/438,968, filed Jan. 9, 2003 and incorporates that application by reference.
Provisional Applications (1)
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Number |
Date |
Country |
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60438968 |
Jan 2003 |
US |