Electroplating apparatus with improved throughput

Abstract

One embodiment provides an electroplating apparatus, which includes a tank filled with an electrolyte solution, a number of anodes situated around edges of the tank, a cathode situated above the tank, and a plurality of wafer-holding jigs attached to the cathode. A respective wafer-holding jig includes a common connector electrically coupled to the cathode and a pair of wafer-mounting frames electrically coupled to the common connector. Each wafer-mounting frame includes a plurality of openings, and a respective opening provides a mounting space for a to-be-plated solar cell, thereby facilitating simultaneous plating of front and back surfaces of the plurality of the solar cells.

Description

BACKGROUND

Field

This disclosure is generally related to an electroplating apparatus used for fabrication of solar modules. More specifically, this disclosure is related to an electroplating apparatus that has an improved throughput.

Related Art

Conventional solar cells often rely on Ag grid on the light-facing side to collect light generated current. To form the Ag grid, conventional methods involve printing Ag paste (which often includes Ag particle, organic binder, and glass frit) onto the wafers and then firing the Ag paste at a temperature between 700° C. and 800° C. The high-temperature firing of the Ag paste ensures good contact between Ag and Si, and lowers the resistivity of the Ag lines. The resistivity of the fired Ag paste is typically between 5×10⁻⁶ and 8×10⁻⁶ ohm-cm, which is much higher than the resistivity of bulk silver.

In addition to the high series resistance, the electrode grid obtained by screen-printing Ag paste also has other disadvantages, including higher material cost, wider line width, and limited line height. As the price of silver rises, the material cost of the silver electrode has exceeded half of the processing cost for manufacturing solar cells. With the state-of-the-art printing technology, the Ag lines typically have a line width between 100 and 120 microns, and it is difficult to reduce the line width further. Although inkjet printing can result in narrower lines, inkjet printing suffers other problems, such as low productivity. The height of the Ag lines is also limited by the printing method. One print can produce Ag lines with a height that is less than 25 microns. Although multiple printing can produce lines with increased height, it also increases line width, which is undesirable for high-efficiency solar cells. Similarly, electroplating of Ag or Cu onto the printed Ag lines can increase line height at the expense of increased line width. In addition, the resistance of such Ag lines is still too high to meet the requirement of high-efficiency solar cells.

Another solution is to electroplate a metal grid, which can include one or more metal layers, directly on the Si emitter or on a TCO layer above the emitter. The electroplated metal grid tend to have lower resistance (the resistivity of plated Cu is typically between 2×10⁻⁶ and 3×10⁻⁶ ohm-cm) than the printed metal grid. In large-scale solar cell fabrications, throughput can be a key to reduce to the overall fabrication cost.

SUMMARY

One embodiment provides an electroplating apparatus, which includes a tank filled with an electrolyte solution, a number of anodes situated around edges of the tank, a cathode situated above the tank, and a plurality of wafer-holding jigs attached to the cathode. A respective wafer-holding jig includes a common connector electrically coupled to the cathode and a pair of wafer-mounting frames electrically coupled to the common connector. Each wafer-mounting frame includes a plurality of openings, and a respective opening provides a mounting space for a to-be-plated solar cell, thereby facilitating simultaneous plating of front and back surfaces of the plurality of the solar cells.

In a variation on the embodiment, the cathode is configured to move from one end of the tank to the other end of the tank, thereby facilitating continuous operation of the electroplating apparatus.

In a variation on the embodiment, the wafer-mounting frame is made of one or more materials selected from the following group: stainless steel, Ti, and Cu.

In a variation on the embodiment, the opening is slightly larger than the to-be-plated solar cell.

In a variation on the embodiment, the wafer-mounting frame further comprises a plurality of spring-loaded pins that hold the to-be-plated solar cell inside the opening in a way such that a surface of the to-be-plated solar cell is substantially parallel to a surface of the wafer-mounting frame.

In a further variation, the spring-loaded pins act as electrodes to electrically couple front and back surfaces of the to-be-plated solar cell to the cathode.

In a variation on the embodiment, the wafer-mounting frames are parallel to each other, and a distance between the wafer-mounting frames is between 2 and 20 cm.

In a variation on the embodiment, the wafer-mounting frame further includes a plurality of through holes, thereby facilitating uniform metal deposition of both the front and back surfaces of the solar cell.

In a variation on the embodiment, a gap between two adjacent wafer-holding jigs is between 1 and 10 cm wide.

In a variation on the embodiment, the electroplating apparatus further includes an auxiliary anode situated between the pair of wafer-mounting frames.

In a further variation, the auxiliary anode is made of one or more materials selected from the following group: stainless steel, Ti, and Pt.

In a further variation, the auxiliary anode is made of similar metals that form the anodes situated around edges of the tank.

BRIEF DESCRIPTION OF THE FIGURES

FIG. 1 presents a diagram illustrating an exemplary solar cell with electroplated metal grids, in accordance with an embodiment of the present invention.

FIG. 2A presents a diagram illustrating a schematic top view of a conventional electroplating system (prior art).

FIG. 2B presents a diagram illustrating a schematic cross-sectional view of a conventional electroplating system (prior art).

FIG. 3A presents a diagram illustrating a partial front view of one arm of the wafer-holding jig, in accordance with an embodiment of the present invention.

FIG. 3B presents a diagram illustrating a cross-sectional view of one arm of the wafer-holding jig, in accordance with an embodiment of the present invention.

FIG. 4A presents a diagram illustrating a front view of a double-arm wafer-holding jig, in accordance with an embodiment of the present invention.

FIG. 4B presents a diagram illustrating a cross-sectional view of the double-arm wafer-holding jig, in accordance with an embodiment of the present invention.

FIG. 5 presents a diagram illustrating a schematic top view of an electroplating system, in accordance with an embodiment of the present invention.

FIG. 6 presents a diagram illustrating a front view of a double-arm wafer-holding jig, in accordance with an embodiment of the present invention.

FIG. 7 presents a diagram illustrating a cross-sectional view of an electroplating system, in accordance with an embodiment of the present invention.

In the figures, like reference numerals refer to the same figure elements.

DETAILED DESCRIPTION

The following description is presented to enable any person skilled in the art to make and use the embodiments, and is provided in the context of a particular application and its requirements. Various modifications to the disclosed embodiments will be readily apparent to those skilled in the art, and the general principles defined herein may be applied to other embodiments and applications without departing from the spirit and scope of the present disclosure. Thus, the present invention is not limited to the embodiments shown, but is to be accorded the widest scope consistent with the principles and features disclosed herein.

Overview

Embodiments of the present invention provide a high-throughput electroplating apparatus. More specifically, the electroplating apparatus includes novel wafer-holding jigs each having two arms. Each arm of the jig holds a plurality of solar cells submerged in a plating bath, allowing the solar cells to be plated on both sides simultaneously. Compared with conventional electroplating systems that use single-arm wafer-holding jigs, the system that uses the double-arm jigs can double its throughput.

Electroplating System for Solar Cell Fabrication

It has been shown that, for solar cell applications, electroplated metal grids have lower resistivity compared with printed Ag grids, which include low-temperature-cured silver paste layers. For example, a metal grid that includes one or more electroplated Cu layers may have a resistivity equal to or less than 5×10⁻⁶ Ω·cm, which is significantly lower than the resistivity of a metal grid that is composed of printed Ag. FIG. 1 presents a diagram illustrating an exemplary solar cell with electroplated metal grids, in accordance with an embodiment of the present invention. In the example shown in FIG. 1, solar cell 100 is a double-sided tunneling junction solar cell. More specifically, solar cell 100 includes a base layer 102, quantum tunneling barrier (QTB) layers 104 and 106 that cover both surfaces of base layer 102 and passivate the surface-defect states, a front-side doped a-Si layer forming a front emitter 108, a back-side doped a-Si layer forming a BSF layer 110, a front transparent conducting oxide (TCO) layer 112, a back TCO layer 114, a front-side electroplated metal grid 116, and a back-side electroplated metal grid 118. Note that a similar solar cell can have an emitter layer situated at the backside and a front surface field (FSF) layer situated at the front side. In addition to the tunneling junction solar cells, the electroplated metal grids can also be incorporated with other types of solar cell structure, such as diffusion based solar cells. Detailed descriptions of fabricating solar cells with electroplated metal grids can be found in U.S. patent application Ser. No. 12/835,670, entitled “SOLAR CELL WITH METAL GRID FABRICATED BY ELECTROPLATING,” by inventors Jianming Fu, Zheng Xu, Chentao Yu, and Jiunn Benjamin Heng, filed 13 Jul. 2010, and U.S. patent application Ser. No. 13/220,532, entitled “SOLAR CELL WITH ELECTROPLATED METAL GRID,” by inventors Jianming Fu, Zheng Xu, Chentao Yu, and Jiunn Benjamin Heng, filed 29 Aug. 2011, the disclosures of which are herein incorporated by reference in their entirety.

In common electroplating settings, work pieces (the parts to be plated) are electrically coupled to a cathode, and the metal to be plated (such as Cu and Ni) forms the anode. To facilitate the flow of current, all components, including the anode and the work pieces) are submerged in a suitable electrolyte solution, and a voltage is applied between the anode and the cathode. For a large-scale fabrication of the solar cells, the electrolyte solution along with the anode are usually placed in a large tank, forming an electrolyte bath, and work pieces (in this case solar cells) connecting to a moving cathode sequentially enter the bath from one end and get plated while they move from one end of the tank to the other. The moving speed is controlled based on the desired plating thickness. The plated solar cells are taken out of the bath once they reach the other end while new solar cells continuously enter the bath. To ensure plating uniformity, the electrolyte solution is circulated and filtered.

FIG. 2A presents a diagram illustrating a schematic top view of a conventional electroplating system (prior art). In FIG. 2, an electroplating system 200 includes a rectangular tank 202 filled with electrolyte solution, a number of anodes (such as anodes 204 and 206) situated on both sides of tank 202, and a number of wafer-holding jigs, such as jigs 208 and 210, submerged in the electrolyte solution. Each jig can hold multiple wafers. Note that the wafer-holding jigs not only provide mounting places for the to-be-plated solar cells but also provide electrical connections between the plating surfaces (in this case, both side of the solar cells) and the cathode (not shown in FIG. 2B), thus enabling metal ions to be deposited onto the plating surfaces. In the system shown in FIGS. 2A and 2B, the jigs placed in the bath form a single line, with each jig providing two plating surfaces (the front surface and the back surface). With a careful design, both sides of the solar cells mounted on a jig can be electroplated simultaneously. For example, both the front and back surfaces of a solar cell can include conducting portions that are electrically connected to the cathode and are exposed to the electrolyte solution. Hence, these conducting portions of both surfaces will be plated simultaneously.

FIG. 2B presents a diagram illustrating a schematic cross-sectional view of a conventional electroplating system (prior art). More specifically, FIG. 2B shows that the wafer-holding jigs, such as jigs 208 and 210, are attached to a cathode 212 and are submerged in the electrolyte solution inside tank 202. During plating, cathode 212, and hence the jigs and solar cells mounted on the jigs, can move along the longer edger of tank 202, as indicated by arrow 214, and the both sides of the solar cells are plated during the process. Depending on the desired plating thickness, various parameters, such as the moving speed of the jigs and the voltage applied between the cathode and the anodes, can be adjusted.

Electroplating system 200 shown in FIGS. 2A and 2B allows continuous, simultaneous plating of a plurality of solar cells, and hence it is favored for high-throughput fabrication of solar cells. However, such a system often occupies a large space (due to the size of the tank, which can be up to 50 m long), and a large-scale solar cell manufacturing facility may need to accommodate many such systems. In addition, building and maintaining such systems can also be costly. Therefore, it is desirable to improve the throughput of each electroplating system in order to reduce the number of needed equipments and to save space and cost.

In some embodiments of the present invention, in order to improve the plating throughput each wafer-holding jig provides four, instead of two, plating surfaces, thus allowing simultaneous plating of twice as many solar cells. More specifically, each jig now has two arms, with each arm holding multiple solar cells.

FIG. 3A presents a diagram illustrating a partial front view of one arm of the wafer-holding jig, in accordance with an embodiment of the present invention. In FIG. 3A, a wafer-holding jig 300 includes a frame 302, which include a number of pre-cut openings, such as openings 304 and 306. A to-be-plated solar cell can be placed inside an opening and mounted on frame 302 by multiple spring-loaded pins. For example, a solar cell 308 is placed inside opening 304 with its edges pined in position by spring-loaded pins 310, 312, 314, and 316. Note that, because the solar cells are mounted on frame 302 via the pre-cutting openings, both sides of the solar cells are exposed to the electrolyte solution and can be plated simultaneously.

Frame 302 is typically made of chemical-resistant metals, such as stainless steel, Cu, Ti, etc. In some embodiments, frame 302 is made of stainless steel. To prevent unintentional plating, most areas of frame 302 are covered with chemical-resistant paint and are electrically insulated, except at locations where electrical connections are needed. For example, at the location where frame 302 is in contact with a movable cathode (not shown in FIG. 3A), frame 302 may remain bare to enable direct electrical connection. In some embodiments, the cathode includes a metal rode that has a number of frame-hanging studs, and frame 302 can hang on one or more of the studs. Electrical connections between the frame and the cathode may be established via the direct metal-to-metal contact. The pre-cut openings may have difference sizes in order to fit solar cells of different sizes. In some embodiments, the solar cells have a dimension of 125×125 mm² (or 5×5 inch²), and the openings can then have a dimension of 130×130 mm² or a slightly larger dimension. In addition, depending on the design and the size of the plating tank, frame 302 may accommodate different number of solar cells. In the example shown in FIG. 3A, frame 302 includes 9 (3 rows and 3 columns) pre-cut openings, capable of holding 9 solar cells. In some embodiments, a frame may include 15 (5 rows and 3 columns) or more pre-cut openings. In such a case, frame 302 may be as large as 450×800 mm².

FIG. 3B presents a diagram illustrating a cross-sectional view of one arm of the wafer-holding jig, in accordance with an embodiment of the present invention. From FIG. 3B, one can see that the solar cells, such as a solar cell 318, are held in place within the openings by the multiple spring-loaded pins. For example, FIG. 3B shows that solar cell 318 is held in place by at least spring-loaded pins 320 and 324. More specifically, the spring-loaded pins hold the solar cells in a way that surfaces of solar cells are substantially parallel to the surface of the frame, as shown in FIGS. 3A and 3B.

The spring-loaded pins situated around each opening not only provide support to the solar cells but also act as electrodes that enable electrical connections between the solar cells and the metal frame. In the amplified view of spring-loaded pin 320 shown in FIG. 3B, one can see that a spring-loaded pin includes a front part 332 and a back part 334, with front part 332 being rotatable (in and out of the paper) by loading and unloading spring 336 and back part 334 being fixed in position. Note that both front part 332 and back part 334 have an extruded point that together can apply pressure to solar cell 318, which is situated between them. Note that the amount of pressure being applied to solar cell 318 can be carefully adjusted to make sure that such pressure can hold solar cell 318 in position without damaging it. Moreover, in some embodiments, the extruded portions of front part 332 and back part 334 include bare metal (which can be stainless steel, Cu, or Ti), thus facilitating the electrical coupling between both surfaces of solar cell 318 and the cathode, which is electrically coupled to the spring-loaded pins via frame 302. In some embodiments, the surfaces of solar cell 318 include pre-patterned (as bus bars and finger grids) seed and/or adhesive metal layers, and the extruded portions of front part 332 and back part 334 of spring-loaded pin 320 are in direct contact with the bus bars.

FIG. 4A presents a diagram illustrating a front view of a double-arm wafer-holding jig, in accordance with an embodiment of the present invention. In FIG. 4A, the front view of double-arm wafer-holding jig 400 shows a frame 402 and a common connector 404. Frame 402 is similar to frame 302 shown in FIG. 3A, and includes a number of pre-cut openings for mounting solar cells. Common connector 404 is a joint connection that connects both arms of double-arm wafer-holding jig 400 to the cathode (not shown in FIG. 4A). In some embodiments, common connector 404 may include a metal piece that is electrically coupled to the bare metal portion located on the metal frame of each arm.

FIG. 4B presents a diagram illustrating a cross-sectional view of the double-arm wafer-holding jig, in accordance with an embodiment of the present invention. FIG. 4B shows that double-arm wafer-holding jig 400 includes two parallel situated arms (frames 402 and 406) and a common connector 404. The two parallel arms are mechanically attached to and electrically connected to common connector 404. In some embodiment, common connector 404 may include a metal beam. Each arm or frame shown in FIG. 4B is similar to frame 302 shown in FIG. 3B, and is capable of holding multiple solar cells. From FIG. 4B, one can see that, given the frames being identical, double-arm wafer-holding jig 400 can accommodate twice as many solar cells as a wafer-holding jig that has only one arm. When double-arm wafer-holding jig 400 is placed in the electrolyte bath, a channel 408 is formed, and electrolyte solution can flow in and out of channel 408. Therefore, the solar cell surfaces that face channel 408 can be plated the same time when the solar cell surfaces that face away channel 408 are plated. To ensure the plating of a sufficiently thick metal layer and to ensure the plating uniformity, the width of channel 408 (determined by the distance between frames 402 and 406) needs to be sufficiently large. In some embodiments, such a distance is kept between 2 and 20 cm. Note that jigs with a larger distance ensure better uniformity, but would need a larger tank to accommodate them.

FIG. 5 presents a diagram illustrating the schematic top view of an electroplating system, in accordance with an embodiment of the present invention. In FIG. 5, an electroplating system 500 includes a rectangular tank 502 filled with electrolyte solution, a number of anodes (such as anodes 504 and 506) situated on both sides of tank 502, a cathode 508 situated above tank 502, and a number of double-arm wafer-holding jigs, such as a double-arm wafer-holding jig 510, attached to cathode 508. Rectangular tank 502 can be a standard tank built for large-scale electroplating operations. In some embodiments, the length of tank 502 can be between 4 and 50 m, and the width of tank 502 can be between 0.3 and 1 m. Depending on the size of tank 502, the number of wafer-holding jigs that are simultaneously submerged in tank 502 may vary. Note that, during operation, cathode 508 may move along the longer edge of tank 502, and jigs that are connected to cathode 508 then move together with cathode 508, moving from one end of tank 502 to the other end of tank 502. Each double-arm wafer-holding jig includes two parallel arms (or frames) for holding solar cells in an upright position in the electrolyte solution. For example, double-arm wafer-holding jig 510 includes a frame 512 and a frame 514 that are situated substantially parallel to each other. Note that each arm or frame can hold a plurality of solar cells with both sides of the solar cells exposed to the electrolyte solution to enable plating. More specifically, the anodes situated at both sides of tank 502, the electrolyte solution, and the conducting portions of solar cell surfaces (which are electrically coupled to cathode 508) form a closed circuit, and metal ions dissolved from the anodes are deposited onto the surfaces of the solar cells.

From FIG. 5, one can see that when solar cells are mounted on the double-arm wafer holding jigs, one side of the solar cells are facing the anodes, whereas the other side of the solar cells are facing the channel formed by the two arms of the jigs. This may lead to an uneven metal deposition on the two sides of the solar cells, because the electric field lines pointing to the channel-facing surface cells may be partially blocked by the metal frame itself, resulting in a weaker electrical field intensity at the channel-facing surface. Although the electrical field can still reach the channel-facing surface through the top and bottom opening of the channel, and through the gaps (such as a gap 516) between adjacent jigs, the field distribution at the channel-facing surface may be non-uniform and may not match the field intensity at the anode-facing surface. In addition, movement of metal ions may also be blocked by the frame, although may can go through the gaps by diffusion and circulation flow of the electrolyte solution. Installing carefully designed spargers at the tank edge may direct the electrolyte solution flow direction, assisting the flow of the metal ions. However, the different electric field strength between the anode-facing surface and the channel-facing surface can still lead to metal layers of different thickness being deposited at these two surfaces.

Increasing the gaps between two adjacent jigs may slightly improve the deposition uniformity between the two sides, because the increased gap allows stronger electrical field to go through to reach the channel-facing surface. However, the increased gap may reduce the overall throughput of plating system 500 due to the reduced number of jigs that can be accommodated in tank 502. In some embodiments, the distance between two adjacent double-arm wafer-holding jigs is between 1 and 10 cm. In a further embodiment, the distance is between 4 and 5 cm. Note that certain solar cells may require the front and back surfaces to have metal grids with different thicknesses. In such a scenario, the solar cells are place in a way such that the side requiring a thicker metal layer is facing the anodes. For example, some solar cells may require thicker metal grids on their front, light-facing surface and thinner metal grids on their back surface. To obtain this desired plating effect, one may mount the solar cells on each arm of the jig with the front surface facing the anodes, and the back surface facing the channel in between the arms. Note that the jigs may be placed in the tank in a symmetrical way to ensure that solar cells located on different arms are plated identically. For example, in some embodiments, the symmetrical axis of the jigs are aligned to the symmetrical axis of the electrolyte bath such that the electrical field is distributed symmetrically with the anode-facing surfaces of solar cells on both arms experiencing the same field intensity. Similarly, the channel-facing surfaces of solar cells on both arms also experience the same field intensity, resulting in similar plating effects on these surfaces.

In addition to adjusting the width of the gaps between jigs, in some embodiments, extra holes may be introduced on the metal frames to allow the penetration of the electric field. FIG. 6 presents a diagram illustrating a front view of a double-arm wafer-holding jig, in accordance with an embodiment of the present invention. In FIG. 6, the front view of double-arm wafer-holding jig 600 shows a frame 602 and a common connector 604. In addition to the pre-cut openings for mounting the solar cells, frame 602 includes a number of through holes, such as through holes 606 and 608. These through holes not only allow metal ions to reach the other side of frame 602 along with the flow of the electrolyte solution, but also allow additional electrical field to reach the other side of frame 602. A careful design of the shapes and sizes of these through holes may further improve the plating uniformity, especially on the channel-facing surface of the solar cells.

Another way for improving the deposition uniformity is to insert an auxiliary anode between the two arms of the double-arm wafer-holding jig in order to introduce additional electrical field. FIG. 7 presents a diagram illustrating a cross-sectional view of an electroplating system, in accordance with an embodiment of the present invention. In FIG. 7, electroplating system 700 includes a tank 702 filled with electrolyte solutions, a number of anodes (such as anodes 704 and 706, a double-arm wafer-holding jig that includes a pair of wafer-holding frames 708 and 710 and a common connector 712, and an auxiliary anode 714 situated between frames 708 and 710. In some embodiments, tank 702 can be a stainless steel tank; anodes 704 and 704 may be cylindrically shaped metal rods that are made of metals that are to be deposited on the solar cell surfaces, such as Cu and Ni. As described previously, common connector 712 is electrically coupled to the cathode (not shown in FIG. 7), and the to-be-plated surfaces of the solar cells, such as solar cells 716 and 718, are electrically coupled to common connector 712 via s number of spring-loaded pins. Therefore, the to-be-plated surfaces, including the surfaces facing away from anodes 704 and 706 are electrically coupled to the cathode.

During plating, a voltage is applied between the anodes (such as anodes 704 and 706) and the cathode, thus facilitating metal ions dissolved from the anodes to be deposited on the conducting portions of the solar cell surfaces. In the mean time, a voltage can be applied between auxiliary anode 714 and the cathode, creating additional electric field, as indicated by the dashed arrows. The additional electrical field can improve the uniformity of the metal deposition on the solar cell surface (often the back surface) that faces away from the anodes. Moreover, it can slightly increase the electrical field intensity at the channel-facing surface, making it possible to match the field intensity at the channel-facing surface to the field intensity at the anode-facing surface.

In some embodiments, auxiliary anode 714 includes noble metals, such as platinum (Pt), titanium (Ti), and stainless steel. In such scenarios, auxiliary anode 714 only provides additional electrical field within the channel formed by the two arms of the wafer-holding jig, but does not participate actively (providing metal ions) in the electroplating process. Note that the shape of auxiliary anode 714 and the amount of voltage applied can be carefully designed to further improve the deposition uniformity or to achieve the desired metal plating effect.

In some embodiments, auxiliary anode 714 may include the metal used for plating, and hence actively participates in the electroplating process. In other words, auxiliary anode 714 can have a similar material make up as that of anodes 704 and 706. For example, when Cu is plated on the solar cell surfaces, auxiliary anode 714 may include Cu to provide additional Cu deposition at the back surface of the solar cells, thus ensuring that the back surface of the solar cells can be plated with a Cu layer of the same thickness as the Cu layer plated on the front surface. However, such as an arrangement has a drawback because the active anode needs to be replaced or replenished on a regular basis, requiring extra maintenance.

In addition to the configurations shown in FIGS. 4-7, the electroplating system may have different configurations as long as the wafer-holding jigs are capable of providing multiple wafer-mounting surfaces that enables effective use of space. In the example shown in FIGS. 4B and 7, each wafer-holding jig includes two parallel arms, with each arm providing a wafer-mounting surface. In practice, it is also possible to have more than two arms or to have the arms configured in a different way as long as plating uniformity can be achieved. For example, a jig with 4 arms may be configured to have all arms parallel to each other or to have the arms grouped into two pairs with each pair comprising two parallel arms. However, the more complex the jigs are, the more difficult it is to achieve the desired deposition uniformity. To do so, a more sophisticated design of the auxiliary anode or the spargers may be needed. Also noted that, in addition to electroplating solar cells, embodiments of the present invention can also be used for electroplating of other types of device, such as printed circuit board (PCB). Moreover, in the examples shown in FIG. 4A and FIG. 6, the frames are rectangular. In practice, the frames may take on other shapes that are suitable to accommodate the devices being plated.

The foregoing descriptions of various embodiments have been presented only for purposes of illustration and description. They are not intended to be exhaustive or to limit the present invention to the forms disclosed. Accordingly, many modifications and variations will be apparent to practitioners skilled in the art. Additionally, the above disclosure is not intended to limit the present invention.

Claims

1. A wafer-holding jig for electroplating of a plurality of photovoltaic structures, comprising: a common connector electrically coupled to a cathode, wherein the common connector is a metal beam;a wafer-holding mechanism consisting of a pair of wafer-mounting frames electrically coupled to the common connector, wherein each wafer-mounting frame comprises a plurality of openings and a plurality of spring-loaded mechanisms that hold to-be-plated photovoltaic structures in the openings,wherein each wafer-mounting frame comprises a plurality of through holes that are positioned between the openings, thereby facilitating flow of metal ions and electric field through the frame,wherein each spring-loaded mechanism comprises a back part in a fixed position, a rotatable front part, and a spring coupling the back part and the front part,wherein one end of the spring is directly attached to the wafer-mounting frame,wherein the wafer-mounting frames are arranged in such a way that a first to-be-plated photovoltaic structure mounted on a first wafer-mounting frame is positioned substantially parallel to a second to-be-plated photovoltaic structure mounted on a second wafer-mounting frame,wherein an open space exists between the first to-be-plated photovoltaic structure and the second to-be-plated photovoltaic structure to facilitate simultaneous plating of front and back surfaces of the plurality of the photovoltaic structures, andwherein a distance between the wafer-mounting frames is between 2 and 20 cm.

2. The wafer-holding jig of claim 1, wherein a respective wafer-mounting frame is made of one or more materials selected from the following group: stainless steel;Ti; andCu.

3. The wafer-holding jig of claim 1, wherein the opening is slightly larger than the to-be-plated solar cell.

4. The wafer-holding jig of claim 1, wherein the rotatable front part and the back part of the spring-loaded mechanism act as electrodes to electrically couple front and back surfaces of the to-be-plated photovoltaic structure to the cathode.

5. The wafer-holding jig of claim 1, wherein a respective wafer-mounting frame further includes a plurality of through holes, thereby facilitating uniform metal deposition of both the front and back surfaces of the plurality of photovoltaic structures.

6. An electroplating apparatus, comprising: a tank filled with an electrolyte solution;a number of anodes situated around edges of the tank;a cathode; anda plurality of wafer-holding jigs attached to the cathode, wherein a respective wafer-holding jig comprises: a common connector electrically coupled to the cathode, wherein the common connector is a metal beam;a wafer-holding mechanism consisting of a pair of wafer-mounting frames electrically coupled to the common connector, wherein each wafer-mounting frame includes a plurality of openings and a plurality of spring-loaded mechanisms that hold to-be-plated photovoltaic structures in the opening,wherein each wafer-mounting frame comprises a plurality of through holes that are positioned between the openings, thereby facilitating flow of metal ions and electric field through the frame,wherein each spring-loaded mechanism comprises a back part in a fixed position, a rotatable front part, and a spring coupling the back part and the front part,wherein one end of the spring is directly attached to the wafer-mounting frame,wherein the wafer-mounting frames are arranged in such a way that a first to-be-plated photovoltaic structure mounted on a first wafer-mounting frame is positioned substantially parallel to a second to-be-plated photovoltaic structure mounted on a second wafer-mounting frame,wherein an open space exists between the first to-be-plated photovoltaic structure and the second to-be-plated photovoltaic structure to facilitate simultaneous plating of both the front and back sides of the first and second to-be-plated photovoltaic structures, andwherein a distance between the wafer-mounting frames is between 2 and 20 cm.

7. The electroplating apparatus of claim 6, wherein the cathode is configured to move from one end of the tank to the other end of the tank, thereby facilitating continuous operation of the electroplating apparatus.

8. The electroplating apparatus of claim 6, wherein a respective wafer-mounting frame is made of one or more materials selected from the following group: stainless steel;Ti; andCu.

9. The electroplating apparatus of claim 6, wherein a respective opening is slightly larger than a to-be-plated photovoltaic structure.

10. The electroplating apparatus of claim 6, wherein the rotatable front part and the back part of the spring-loaded mechanism act as electrodes to electrically couple front and back surfaces of the to-be-plated photovoltaic structure to the cathode.

11. The electroplating apparatus of claim 6, wherein a respective wafer-mounting frame further includes a plurality of through holes, thereby facilitating uniform metal deposition of both the front and back surfaces of to-be-plated photovoltaic structures.

12. The electroplating apparatus of claim 6, wherein a gap between two adjacent wafer-holding jigs is between 1 and 10 cm wide.

13. The electroplating apparatus of claim 6, further comprising an auxiliary anode situated between the pair of wafer-mounting frames.

14. The electroplating apparatus of claim 13, wherein the auxiliary anode is made of one or more materials selected from the following group: stainless steel;Ti; andPt.

15. The electroplating apparatus of claim 13, wherein the auxiliary anode is made of similar metals that form the anodes situated around edges of the tank.