Claims
- 1. An emission spectroscopic processing apparatus, comprising:a spectroscope for spectrally separating input light emitted from a process unit into component spectra; a light receiving unit including a series of light receiving elements for detecting light quantities of said component spectra on a wavelength basis; a first signal hold unit for holding sequentially each of detection signals outputted from a subset of adjacent light receiving elements contained in said series of light receiving elements during a first period; an adder unit for adding together the detection signals of adjacent light receiving elements of said light receiving unit inclusive of said held detection signals of said subset of the adjacent light receiving elements; a second signal hold unit for holding sequentially sum outputs of said adder unit; and a signal processing unit for determining a state of said process unit on the basis of the output of said second signal hold unit.
- 2. An emission spectroscopic processing apparatus according to claim 1,wherein said first signal hold unit includes a first stage of signal hold part for holding sequentially the detection signals outputted from a subset of adjacent light receiving elements in said series of light receiving element for a first period, respectively; and a second stage of signal hold part for holding sequentially sum outputs of said first stage of signal hold part sequentially for a second period longer than said first period.
- 3. An emission spectroscopic processing apparatus according to claim 1,wherein said signal processing unit includes selecting means for inputting either the output of said adder unit or the detection signal outputted from each of said adjacent light receiving elements of said light receiving unit.
- 4. An emission spectroscopic processing apparatus according to claim 1,wherein said first signal hold unit is so designed as to hold detection signals of said input light amplified with ratios differing from one to another of plural adjacent light receiving elements of said light receiving unit.
- 5. An emission spectroscopic processing apparatus according to claim 1,said process unit being a plasma processing apparatus, wherein said emission spectroscopic processing apparatus is designed to stop etching process of said plasma processing apparatus on the basis of a sum output of said adder unit.
Priority Claims (1)
Number |
Date |
Country |
Kind |
2001-364626 |
Nov 2001 |
JP |
|
CROSS-REFERENCE TO RELATED APPLICATION
The present invention is related to (1) U.S. patent application Ser. No. 09/793,624 filed Feb. 27, 2001, (2) U.S. patent application Ser. No. 09/797,601 filed Mar. 5, 2001 and (3) U.S. patent application Ser. No. 09/946,504 filed Sep. 6, 2001.
US Referenced Citations (4)