Y. Borodovsky, Intel Corporation, Portland Technology Development, "Impact of Local Partial Coherence Variations on Exposure Tool Performance," SPIE Proceedings, vol. 2440 (11 pp.). |
J. Kirk, C. Progler, IBM Advanced Semiconductor Technology Center, Pinholes and Pupil Fills, Microlithography World, pp. 25-28 (Autumn 1997). |
J. M. Lavine, M.T. Mason, and D. R. Beaulieu, GCA Corporation, IC Systems Group, "The Effect of Semiconductor Processing Upon the Focusing Properties of Fresnel Zone Plates Used as Alignment Targets," SPIE vol. 470 Optical Microlithography III: Technology for the Next Decade (1984), pp. 122-129. |