This application is based upon and claims the benefit of priority from Japanese Patent Application No. 2018-055023, filed on Mar. 22, 2018; the entire contents of which are incorporated herein by reference.
Embodiments described herein generally relate to a gas sensing method, a gas sensor, and a gas sensing system.
Conventionally, various gas sensors have been proposed. For example, a capacitive sensor using carbon nanotubes (CNTs) has been known. In such a capacitive sensor, for example, a dielectric and the CNTs are stacked on a lower electrode, and a comb-shaped electrode is formed thereon. Since the CNTs are formed only at a surface, gas diffuses fast, and responsiveness is excellent. However, the CNT has a tubular shape, and a position control thereof is difficult, resulting in that the CNTs overlap with each other to generate gaps, and the dielectric is likely to be exposed. If the dielectric is exposed, measured gas enters the dielectric, to simultaneously measure a capacitance change due to a change of a dielectric constant resulting from the entered measured gas. Accordingly, there is a problem that sensitivity is lowered and response becomes slow.
As a gas sensor using graphene, there is known a gas sensor (GFET sensor) using a field-effect transistor (FET) where graphene is used as a channel. The GFET sensor includes a dielectric formed on a back gate electrode, and graphene, a source electrode, and a drain electrode provided on the dielectric. A conductance change with respect to a gate voltage takes a minimum value because graphene has two types of carriers of holes and electrons. For example, when the conductance is measured while supplying NO2 to the GFET and changing the gate voltage, gas can be sensed from a conductance change amount based on increase in the holes if the voltage is set to be constant, because NO2 functions as a p-type dopant.
However, since a drain current is passed through graphene in the GFET sensor, graphene is heated to cause temperature rise. Characteristics of the GFET change due to the temperature rise. In addition, a residual solvent and gas in the air are adsorbed to a surface of graphene, to be a doping state. Adsorbed substances are desorbed due to the heating of graphene, to cause a change in the number of carriers, resulting in that the characteristics of the GFET change. There is a problem that variation in the gas sensing becomes large in the conventional GFET due to these effects.
As another type of the gas sensor using graphene, there is known a sensor using an organic semiconductor FET (OFET) where graphene is used as a gate electrode of the organic semiconductor. Gas is adsorbed to graphene of the OFET to change a work function of graphene, resulting in that a drain current of the organic semiconductor changes. In this case, the current does not flow in graphene, but a channel where the current flows is formed at a gate oxide film just below graphene, resulting in that graphene is heated not so much as the GFET. Accordingly, there is a problem that the variation in the gas sensing becomes large due to the thermal effect as same as the GFET.
A gas sensing method of an embodiment includes: a step of supplying measured gas to a capacitor including a first electrode, a dielectric formed to be electrically connected to the first electrode, a graphene formed on the dielectric, and a second electrode formed to be electrically connected to the graphene; and a step of measuring a capacitance of the capacitor after the measured gas is brought into contact with the graphene.
Hereinafter, there will be explained a gas sensing method, a gas sensor, and a gas sensing system according to embodiments with reference to the drawings. In the embodiments, substantially the same constituent elements are denoted by the same reference signs and an explanation thereof will be omitted in some cases. The drawings are schematic, and a relation of the thickness and the planar dimension of each part, a thickness ratio of each part, and so on may differ from actual ones.
In the gas sensor 1 illustrated in
The capacitance of the capacitor 6 is measured by applying a direct-current voltage between the electrodes 2, 5, or by applying an alternating voltage between the electrodes 2, 5. First, a method measuring the capacitance by applying the direct-current voltage is described. The direct-current voltage is changed at a constant rate, and the capacitance is found from a current change (displacement current) at that time. An electric charge accumulated at the dielectric 3 sandwiched between the two electrodes 2, 5 is set as Q, and the capacitance is set as C, then a current I measured when a voltage V is changed is represented by the following expression (1).
Q=CV
I=dQ/dt=dC/dt×V+C×dV/dt (1)
When the voltage V is dual-scanned at a constant rate from minus to plus, and then to minus, where C does not change during the sensing (dC/dt=0), the current change becomes the state as illustrated in
Concretely, it is possible to supply a direct-current power supply to the two electrodes 2, 5 and measure a current value between the electrodes by connecting the two electrodes 2, 5 of the capacitor 6 sandwiching the graphene 4 and the dielectric 3 to, for example, terminals of a semiconductor parameter analyzer. A capacitance calculation can be made as described above by using the measurement value.
Next, a method measuring the capacitance by applying the alternating voltage is described. When an angular frequency of the alternating voltage (when a frequency of the alternating voltage is set to f, the angular frequency is 2πf) is set to ω, the alternating voltage is described as V0 cos(ωt). When the capacitance is found by using the alternating voltage, capacitance measurement is performed by using a series model or a parallel model according to a material and a parasitic resistance of the dielectric 3. In case of the series model, an equivalent circuit as illustrated in
I
m
=−CV
0ω/[√{square root over ( )}{1+(CRω)2}]sin(ωt−δ)
tan δ=CRω
C and R can be found from an absolute value and a phase δ of the measurement current Im.
In case of the parallel model, an equivalent circuit as illustrated in
I
m
=−V
0√{square root over ( )}{(1/R)2+(Cω)2}cos(ωt+δ)
tan δ=CRω
C and R can be found from an absolute value and a phase δ of the measurement current Im.
As the measurement methods of the above-stated C and R, there can be cited a simple method where a phase is detected by an oscilloscope, and an absolute value of the current is measured by a current probe. There are a bridge method, an auto-balancing bridge method, an I-V method, an RF-I-V method, a network analysis method, and so on, and they can be properly used according to accuracy, a measurement frequency, and a sample. A commercially available measuring device can be used as for an impedance measuring device (LCR meter) using the auto-balancing bridge method, the RF-I-V method, and the network analysis method, and C can be measured by using the above.
Next, an example measuring gas by using the above-stated gas sensor 1 is described. Here, an example using the direct-current voltage is shown. Dimethyl methylphosphonate (DMMP) gas at a concentration of 2 ppm is supplied to the gas sensor 1 set in vacuum, and a change in current I is measured while displacing the direct-current voltage V. The direct-current voltage V is displaced from −40 V to 60 V at 3.3 V/s, (the (+) direction scanning), then displaced from 60 V to −40 V at 3.3 V/s (the (−) direction scanning). A result of calculation of the capacitance from the current difference at this time when V is “0” (zero) V is illustrated in
The capacitance change is larger when the concentration of DMMP is 2 ppm than the case when the concentration is 80 ppb, and the capacitance depends on the gas concentration. A calibration curve formed by using an average capacitance from 10 minutes to 15 minutes after the gas is introduced is illustrated in
Since a current value flowing in the gas sensor 1 of the embodiment is smaller compared to a method sensing the gas by using Id-Vg (a drain current and a gate voltage) characteristics of a conventional graphene FET, and a method measuring a resistance change at two terminals without a gate electrode, an effect of a history observed when the sensing is performed for a plurality of number of times becomes small. Actually, a sensing result when after the gas at 2 ppm is introduced, evacuation is performed, and the gas at 2 ppm is introduced again is illustrated in
Next, the capacitance change in the gas sensor 1 of the embodiment is described.
The voltage for the above-stated degree is applied between the graphene 4 and the second electrode (upper metal) 5. That is, the voltage applied between the first electrode (lower metal) 2 and the second electrode (upper metal) 5 is a sum of the above-stated voltage between the graphene 4 and the second electrode (upper metal) 5, and effective voltage applied to the capacitor 6 where an oxide film is the dielectric 3. A change in the band structure of graphene when the gas is adsorbed is illustrated in
Next, advantages where the graphene 4 is used for the gas sensor 1 are described. Carbon nanotubes and graphite are known as nanocarbons in addition to graphene. Graphene is a two-dimensional substance where six-membered rings of carbon are formed in a sheet shape in one layer. Though there is no band gap, the density of states linearly changes in the vicinity of the Dirac point, and to be zero at the Dirac point. The neutral condition of graphene is a state where electrons are embedded up to the Dirac point, resulting in that the Fermi-level changes due to slight transfer of electrons and holes. When electron transfer occurs due to the gas adsorption, the Fermi-level largely changes. 100441 The carbon nanotube (a single-wall carbon nanotube: SWCNT) is one where a sheet made up of six-membered rings of carbon becomes a ring to form a hollow tube.
There are a metallic SWCNT and a semiconductor SWCNT, but the semiconductor SWCNT contributes to the gas sensing. Since the SWCNT is the semiconductor, a junction between the semiconductor and the metal is established in case of the junction with the electrode, resulting in that a depletion-layer capacitance is generated depending on a voltage direction, and capacitances other than the gas sensing are added to the measured capacitances. In a band structure of the semiconductor SWCNT, change in a density of states in a radial direction is the same as graphene, but a density of states in a tube longitudinal direction is higher than graphene, and a Fermi-level-change of the CNT in electron transfer due to the gas molecule adsorption is smaller than that of graphene.
Graphite is formed by stacking sheets where the six-membered rings of carbon are arranged to be a bulk structure. Graphite is a semimetal where bands are overlapped with each other, and has conductivity. Since graphite has a sufficient density of states in a vicinity of a Fermi-level, the Fermi-level-change of graphite in the electron transfer due to the gas molecule adsorption is smaller than those of graphene and CNT.
As stated above, it can be thought that the Fermi-level of graphene sensitively changes with respect to the gas molecule adsorption owing to the band structure, the measured capacitance change is large, and sensitivity is high compared to other nanocarbons. Accordingly, it is possible to enable high-sensitive gas sensing according to the gas sensor 1 using the graphene 4.
There is also the following difference between cases when the SWCNT is used and graphene is used for the gas sensing part. The CNT has a tubular shape. Accordingly, when the CNTs are formed on the dielectric, tubes are arranged horizontally, and it is difficult to densely arrange the CNTs into one layer. Parts where the dielectric exposes and the CNTs are overlapped are inevitably formed also at the sensor part. At the part where the CNTs are overlapped, walls of the CNTs are overlapped and the CNTs approximate to be graphite. As stated above, since the density of states in the vicinity of the Fermi-level becomes high, the sensing sensitivity decreases because a potential change becomes small compared to the part where the CNTs are not overlapped under the same gas adsorption amount. At the part where the dielectric is exposed, the gas enters the dielectric to change a dielectric constant. Accordingly, both the dielectric constant where gas is polarized by the CNTs and the dielectric constant where the dielectric constant of the dielectric is changed are measured. In addition, since the dielectric constant changes due to the gas entering the dielectric, it takes a time until a signal is stabilized, which deteriorates the responsiveness.
Meanwhile, graphene has a sheet shape originally, the sensing part can be covered. Further, graphene does not transmit gas. The dielectric constant change of the dielectric at a lower layer due to the gas adsorption is thereby prevented, and it is possible to enable the gas sensor 1 having good responsiveness and capable of measuring the gas concentration with high sensitivity.
The CNT is the semiconductor, so that the CNT has low conductivity and high resistance. Meanwhile, graphene has a very high mobility within the sheet, high conductivity, and low resistance. The voltage applied to the electrode can be regarded to be applied to the series of the resistor made of the CNT or graphene and a capacitor made of the dielectric. In view of the responsiveness, when the gas is adsorbed, a response speed of graphene is faster than that of the CNT because the response speed is faster as the resistance is smaller when the capacitance is the same.
It is ideally possible for the graphene 4 to cover the gas sensing area (the fabricated area of a graphene sheet) of the dielectric 3 for 100%, but actually, there is a case when a part of the graphene sheet is broken when the capacitor 6 is fabricated. A coverage of the graphene 4 at the gas sensing area of the dielectric 3 is preferably 95% or more in consideration of a function of the graphene 4 as a barrier layer with respect to the dielectric 3. The high-sensitive gas sensor 1 can be enabled as stated above even when the coverage of the graphene 4 is less than 95%.
The coverage of the graphene 4 can be observed with an optical microscope depending on a film thickness of the dielectric 3 under the graphene. For example, graphene can be identified with the optical microscope on a Si thermal oxide film, of which the thickness is a vicinity of 285 nm, and the coverage can be found. Since film thickness measurement is possible with an atomic force microscope (AFM), the coverage can be found by AFM. Graphene can be observed also with a scanning electron microscope (SEM) and a transmission electron microscope (TEM), and the coverage can be found by SEM and TEM.
The graphene 4 can be obtained by, for example, peeling a highly-oriented pyrolytic graphite (HOPG) to be a single layer (for example, a peeled graphene made by a Scotch tape method), but graphene fabricated by a chemical vapor deposition (CVD) method enables efficient device fabrication. As a fabrication method of CVD graphene, there can be exemplified a method where a Cu foil is used as a catalyst, raw gas such as methane and hydrogen is supplied at high temperature to once dissolve a carbon source into Cu, and then cooled to precipitate graphene.
Graphene is originally in one layer, but since CVD graphene achieve crystal growth from a precipitated nucleus, graphene is likely to be polycrystal. As a result, graphene is not necessarily a single layer, and there is a case when a several layers are overlapped, or the dielectric is not completely covered. The identification of graphene is usually performed by Raman spectrum. Graphene is identified from an intensity ratio (I2D/IG) between a G band around 1590 cm−1 and a 2D band around 27680 cm−1. In CVD graphene, a value of I2D/IG of one or less is usually identified as graphene in the context that there is no breakage, and covered, and the number of layers is approximately five layers or less. Graphene comes like graphite if the total number of six-membered ring sheets of carbon increases, resulting in that the high-sensitivity and high-responsiveness like the gas sensor 1 of the embodiment cannot be expected. Accordingly, the number of layers of graphene is desirably five layers or less where graphene is experimentally identifiable, and the high-sensitivity and high-responsiveness can be kept.
When graphene is fabricated by the CVD method, other metals such as Ni and Pt can be used as the catalyst instead of Cu. Hydrogenated Ge can also be used as the catalyst. However, the number of layers is likely to increase compared to the case when
Cu is used as the catalyst. In such cases, these metals can be used similarly as long as the value of I2D/IG is one or less in the Raman spectrum. CVD graphene can be fabricated also on an SiC substrate. Since it is necessary to dissolve a catalyst layer to fabricate a device, CVD graphene fabricated on the Cu foil which is cheaper than SiC is often used, but CVD graphene fabricated on the SiC substrate can also be used.
In the gas sensor 1 of the embodiment, noble metals such as Au, Pd, Ag, Pt can be used as materials of the first and second electrodes 2, 5. Further, the second electrode 5 may be formed by depositing Ni or Cr as a lower layer, and then vapor-depositing the noble metal in order to improve adhesiveness with the graphene 4 and the dielectric 3. The case when the dielectric 3 is formed on the first electrode 2 is also the same, and the dielectric 3 may be formed after Ni or Cr is deposited as a lower layer.
The first electrode (lower electrode) 2 is not limited to the metal, but, for example, a stacked film made of a metal film 2A and a highly-doped Si film 2B may be used as the electrode 2 as illustrated in
In the gas sensor 1 illustrated in each of
Next, a measurement flow of a gas concentration using the gas sensor 1 is described with reference to
A configuration example of a gas sensing system using the gas sensor 1 is described with reference to
The graphene 4 is likely to be contaminated, and reactivity is lowered if the graphene 4 is let stand in the air. The graphene 4 is therefore preferably sealed in vacuum before it is used. Accordingly, the gas sensor 1 is sealed in vacuum by the gas chamber 21. The vacuum-sealing of the gas chamber 21 is broken to introduce measured gas when it is used, and thereby, an accurate measurement is enabled. As a breaking method of the vacuum-sealing, an opening is formed at a vacuum sealing wall 21b provided at a gas inlet port 21a of the gas chamber 21 with an opening jig to fabricate an opening such as, for example, a cone, or a file or the like when the vacuum sealing wall 21b is made of glass. A valve 24 provided at the gas inlet port 21a is previously opened. The gas sensor 1 is able to obtain higher accuracy and higher responsiveness by introducing gas from a vacuum-sealing state at the usage time.
Reuse of the gas sensor 1 becomes possible by attaching a vacuum pump to the gas chamber 21, and providing the valve 24 on the gas chamber 21 side at the back of the vacuum sealing wall 21b. As illustrated in
A diaphragm pump and a rotary pump can be used as the rough-vacuum pump 25. A turbo molecular pump and an adsorption pump (an ion pump and a cryopump) can be used as the high-vacuum pump 26. Since the turbo molecular pump has the diaphragm pump or the rotary pump at a post-stage thereof, the diaphragm pump or the rotary pump may be used as the rough-vacuum pump 25 of the gas chamber 21 by being separated from the high-vacuum pump using a valve. The vacuum pump may be a dry pump. The vacuum pumps 25, 26 are divided off from the gas chamber 21 by the valves 27, 28, and the valves 27, 28 are set to be closed states at a gas sensing time, and the valves 27, 28 are set to be open states at an evacuation time.
In the aforementioned gas sensing system, it is assumed that the measured gas is measured as it is, but the gas may be concentrated and then supplied to the gas sensing system. Higher accuracy measurement becomes possible by supplying the gas after concentration. Further, higher accuracy measurement becomes possible if gases obstructing the sensing are previously removed with a filter or the like.
The above-stated explanation describes a case when the gas sensing is performed by using only the graphene 4, but the gas sensing is not limited thereto. For example, it is possible to measure the concentration of each gas species by fixing molecules each having a group reacting with the measured gas, for example, an organic probe at a surface of the graphene 4, and making the gas selectively react with the probe as it is described in Japanese Patent Application No. 2017-534026. The organic probe can be fixed to the graphene 4 through a method using a pyrene ring to fix by a π-π bonding with the graphene 4 as it is described in, for example, Japanese Patent Application No. 2017-534026, a method coating a polymer having a group which selectively reacts with gas such as a chemoselective polymer HC described in E. S. Snow et al., Science 307(2005)1942, a method coating nano-metal particles having a group selectively reacting with the gas, and so on.
A case when the gas is DM:MP is explained as an example, but the gas is not limited to DM:MP, and measurement is possible as long as it is the gas, of which the adsorption to grapheme induces capacitance change. Further, measurement is also possible when not graphene independently but a probe, a nano-metal particle, or a polymer each having a group reacting with the measured gas are formed at the graphene surface to make the gas selectively react with the probe. Examples of the gas include H2O, NH3, NO, NO2, CO, CO2, methane, ethane, propane, butane, acetylene, CF4, CHF3, C2F6, C3F8, C4F10 where H is replaced by F, and so on. Phosphoric acid-based gas belonging to the same series as DMMP, sarin, soman, tabun, agricultural chemicals, methanephetamine, amphetamine, cocaine being illicit drugs, and the like can be also measured.
Next, there is described a method performing concentration measurement by introducing a group reacting with gas into a pyrene derivative and utilizing reactivity thereof as an example of the method performing the gas sensing by fixing the probe having the group reacting with the measured gas to the surface of the graphene 4, and making the gas selectively react with the probe. The measured gas is DMMP, and a pyrene derivative illustrated in
A solvent where the pyrene derivative of the probe is dissolved may be selected as a probe forming solvent, and it is not limited to methanol. A probe solution concentration is set to 1 mM in this example, but it can be appropriately adjusted according to a kind of the probe and a solvent. In this example, the probe solution concentration of 1 mM is selected because a capacitance increases as the probe solution concentration is increased, and the capacitance is saturated when the concentration is 1 mM or more. It is thought that the capacitance increases because the gas and the probe selectively react. Since the capacitance is saturated when the probe solution concentration is 1 mM or more, it can be thought that the surface of the graphene 4 is almost covered with the probe molecules.
The sensor formed as stated above is put into a vacuum device, and after evacuation, DMMP is introduced into the device to perform the gas sensing. A capacitance change when DMIMP at 2 ppm is introduced is illustrated in
As described above, the gas sensing method and the gas sensing system of the embodiment can be applied to not only the case when the gas is adsorbed to the graphene 4 but also the case when the probe having the group reacting with the measured gas is formed at the surface of the graphene 4. An electric potential which changes due to a reaction between the gas and the probe molecules can be measured as a capacitance with high sensitivity and high accuracy. The measured gas is not limited to one kind. For example, a probe, a nano-metal particle, or a polymer whose reacting groups are different by each gas are formed on graphene, a plurality of gas sensors 1 corresponding to the gases are disposed in an array state, and identification and concentration measurement of a plurality kinds of gases can be simultaneously performed by using reaction patterns.
While certain embodiments of the present invention have been described, these embodiments have been presented by way of example only, and are not intended to limit the scope of the inventions. Indeed, the novel embodiments described herein may be embodied in a variety of other forms; furthermore, various omissions, substitutions and changes may be made without departing from the spirit of the inventions. The inventions described in the accompanying claims and their equivalents are intended to cover such forms or modifications as would fall within the scope and spirit of the inventions.
Number | Date | Country | Kind |
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2018-055023 | Mar 2018 | JP | national |