Heating system of batch type reaction chamber and method thereof

Abstract

A heating system of a batch type reaction chamber for semiconductor device and a method thereof are disclosed. Each heat unit of heating groups has different height and caloric value at right angles according to the divided areas, thereby it can control an uniform temperature incline of the entire process space of the reaction chamber. Also, the reflecting plates are formed by each heating unit, so that the change of the heating unit can be simple. Furthermore, the divided reflecting blocks are adjacently connected to another reflecting block through the radiant wave shielding slit between them, so that the leakage of the radiant wave can be prevented and the reflecting blocks can be separately attached and deattached to each other. Also, the turning member is formed at the lower portion of the reflecting blocks, so that it can be easily attached and deattached.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

The above as well as the other objects, features and advantages of the present invention will be more apparent from the following detailed description taken in conjunction with the accompanying drawings, in which:

FIG. 1A and FIG. 1B is explanatory views illustrating an external appearance of a conventional semiconductor manufacturing device;

FIG. 2 is an explanatory view illustrating an external appearance of a heating apparatus according to the present invention;

FIG. 3 is an explanatory view illustrating a heating apparatus according to the present invention;

FIG. 4A is an explanatory view illustrating an external appearance of a heating apparatus and a reflecting device according to the present invention;

FIG. 4 b is a side sectional view of FIG. 4A.

FIG. 5 is an explanatory view illustrating an external appearance of a reflecting device mounted by each heating unit according to the present invention; and

FIG. 6A through FIG. 6D are explanatory views illustrating a reflecting device having a shielding means according to the present invention.

Claims

1. A heating system of a batch type reaction chamber comprising: the reaction chamber of the batch type for forming a process space;a heating apparatus having a plurality of heating groups formed along an outer circumference of the reaction chamber, the heating group having a plurality of heaters for forming divided heating areas at right angles and having a pair of heating units as a heating element connected to each supplying line having separate thermostats; anda reflecting device having a reflecting plate for reflecting the radiant heat of the heating apparatus toward an inside of the reaction chamber arranged around the heating apparatus and a cooling waterway for exchanging a heat and preventing a heat damage owing to a heating of the heating apparatus.

2. A heating system of a batch type reaction chamber as claimed in claim 1 wherein, in the heating group, the same heating units share the supplying line having one thermostat with each other.

3. A heating system of a batch type reaction chamber as claimed in claim 1 wherein, the heating unit is in the form of a character “U”.

4. A heating system of a batch type reaction chamber as claimed in claim 1 wherein, the heating unit is in the form of a character “U” and a horizontal connecting portion of the heating unit is an additional heating portion.

5. A heating system of a batch type reaction chamber as claimed in claim 1 wherein, the reflecting device comprises a reflecting block for surrounding the heating apparatus, the cooling waterway for cooling the heat transmitted to the inside of the reflecting block, and the reflecting plate coated on the inner surface of the reflecting block by means of a reflecting material.

6. A heating system of a batch type reaction chamber as claimed in claim 1 wherein, a material of the reflecting block is an aluminum alloy.

7. A heating system of a batch type reaction chamber as claimed in claim 1 wherein, a noble metal having a good reflexibility such as a gold or a silver is coated on the reflecting plate so as to ensure a reflecting coating layer for reflecting a radiant wave.

8. A heating system of a batch type reaction chamber as claimed in claim 1 wherein, in the reflecting device, a divided reflecting block is mounted at one heating unit through a bracket.

9. A heating system of a batch type reaction chamber as claimed in claim 8 wherein, a connecting pipe is mounted at an outside of the divided reflecting block in order to connect the cooling waterway formed at an inside of the reflecting device to it.

10. A heating system of a batch type reaction chamber as claimed in claim 8 wherein, a plurality of shielding plates for assembling the reflecting blocks is formed at the boundary regions between the reflecting blocks.

11. A heating system of a batch type reaction chamber as claimed in claim 8 wherein, the reflecting block is adjacently connected to another reflecting block through a radiant wave shielding slit between them in order to prevent the radiant wave from being emitted outside through the boundary thereof.

12. A heating system of a batch type reaction chamber as claimed in claim 11 wherein, the radiant wave shielding slit comprises an inlet slit formed at the reaction chamber side, an outlet slit deviated from the inlet slit at a predetermined angle, first shielding slit portions extending from the inlet and outlet slit portions respectively, and a second shielding slit portion between the first shielding slit portions and formed at a circumferences of a concentric circle of the reflecting block in order to constitute bent prominence and depression portions and connect them to each other.

13. A heating system of a batch type reaction chamber as claimed in claim 11 wherein, the radiant wave shielding slit comprises an inlet slit formed at the reaction chamber side, an outlet slit deviated from the inlet slit at a predetermined angle, first shielding slit portions extending from the inlet and outlet slit portions respectively, and a second slanted slit portion slanted between the first shielding slit portions in order to allow the reflecting blocks to be attached and deattached and shield the remnant radiant wave radiated through the inlet slit and the first shielding slit portion.

14. A heating system of a batch type reaction chamber as claimed in claim 11 wherein, the radiant wave shielding slit comprises an inlet slit formed at the reaction chamber side, an outlet slit deviated from the inlet slit at a predetermined angle, and a shielding slit bent between the inlet slit and the outlet in order to allow the reflecting blocks to be attached and deattached and shield the emission of the radiant wave.

15. A heating system of a batch type reaction chamber as claimed in claim 8 wherein, a turning member is formed at the lower portion of the reflecting blocks so as to escape the interference with the peripheral device and an upper combination panel is formed on the reflecting blocks to constitute the reflecting device of a cylinder shape.

16. A method of heating a batch type reaction chamber using a heating system wherein, the heating system comprises the reaction chamber of the batch type for forming a process space; a heating apparatus having a plurality of heating groups formed along an outer circumference of the reaction chamber, the heating group having a plurality of heaters for forming divided heating areas at right angles and having a pair of heating units as a heating element connected to each supplying line having separate thermostats; and a reflecting device having a reflecting plate for reflecting the radiant heat of the heating apparatus toward an inside of the reaction chamber arranged around the heating apparatus and a cooling waterway for exchanging a heat and preventing a heat damage owing to a heating of the heating apparatus.