Number | Date | Country | Kind |
---|---|---|---|
43 42 424.4 | Dec 1992 | DEX | |
9409744 U | Jun 1994 | DEX |
Number | Name | Date | Kind |
---|---|---|---|
3770340 | Cronin et al. | Nov 1973 | |
5208629 | Matsuo et al. | May 1993 | |
5357311 | Shiraishi | Oct 1994 |
Number | Date | Country |
---|---|---|
0266203 | May 1988 | EPX |
0297161 | Jan 1989 | EPX |
0343729 | Nov 1989 | EPX |
0486316 | May 1992 | EPX |
0486316 | May 1992 | EPX |
0500393 | Aug 1992 | EPX |
0496891 | Aug 1992 | EPX |
Entry |
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"Effect of central obscuration on image formation in projection lithography" by S. T. Yang et al., SPIE, vol. 1264, Optical/Laser Microlithography III, (1990), pp. 477 to 485. |