W. Ulrich, S Beiersdöfer, H.J. “Trends in Optical Design of Projection Lenses for UV and EUV Lithography ” in Soft X-Ray and EUV Imaging Systems, W.M Kaiser, R.H. Stulen, Proceedins of SPIE, vol. 4146 (2000) pp. 13-24. |
M. Antoni, W. Singer, J. Schultz, J. Wangler, I. Escudero-Sanz, B. Kruizinga, “Illumination Optics Design for EUV Lithography” in Soft X-Ray and EUV Imaging Systems. W M Kaiser. R H Stulen, Proceedings of SPIE. vol. 4146 pp. 25-34. |
H. Petersen, C. Jung, C. Hellwig, W.B. Peatmen, W. Gudat “Review of plane grating focusing for soft x-ray monochromators”, Rev. Sci. Instrum. 66(1). Jan. 1995. |
M.V.R.K. Murty “Use of convergent and divergent illumination with plane gratings”, Journal of the Optical Society of America, vol. 52. No. 7, Jul. 1962, pp. 768-773. |
T. Oshio. E Ishiguro. R Iwanaga: “A theory of new astigmatism and coma-free spectrometer”. Nuclear Instruments and Methods 208 (1993) 297-301. |
“Lexicon of Optics” published by Hans Hagerborn. pp 48-49. |
“Lexicon of Optics” in two vo:umes pp 77-80. |
H. Raul Beguiristain. “Thermal Distortion Effects on Optical Subtrates that Reduce Coherence Properties of Undulator Beam Lines”. |