Claims
- 1. Method for selectively imaging a planographic substrate for waterless lithography, said method consisting essentially of the following serial steps:(i) coating one surface of an oleophobic, silicone resin substrate with a first material comprising an amine in a heptane carrier which is soluble in a first solvent without being exposed to actinic light, (ii) selectively applying a second material comprising an oleophilic cyanoacrylate adhesive using an ink jet print head in a desired image array on said coating of said first material on said substrate, thereby producing imaged areas and non-imaged areas, said second material adhering to said first material on said imaged areas and being insoluble in said first solvent without being exposed to actinic light, and (iii) dissolving the first material on said non-imaged areas in said first solvent, thereby removing said first material to expose said surface of said substrate in said non-imaged areas.
- 2. Method as in claim 1, wherein said second material is applied to a thickness of less than 5 microns.
- 3. Method as in claim 1, wherein said second material is not removed.
- 4. Method of manufacturing a lithographic printing plate, said method comprising the following serial steps:(i) providing a substrate having a hydrophilic surface, (ii) coating said substrate with a negative working photosensitive material which is soluble in a developer, (iii) selectively imaging said negative working photosensitive material with a transparent adhesive material which is insoluble in said developer without being exposed to actinic light and which adheres to said negative working photosensitive material by applying said transparent adhesive material with an ink jet print head, thereby producing imaged areas and non-imaged areas, (iv) washing said imaged areas and said non-imaged areas with said developer to remove non-imaged negative working photosensitive material from said non-imaged areas, (v) exposing said imaged areas to actinic light which renders said imaged areas of said negative working photosensitive material insoluble, and (vi) removing said adhesive material from said imaged areas.
- 5. Method as in claim 4, wherein said negative working photosensitive material is a photopolymer.
- 6. Method as on claim 4, wherein said negative working photosensitive material is a diazo resin.
- 7. Method as in claim 4, wherein said adhesive material is a phase change material.
- 8. Method as in claim 7, wherein said phase change material is a hot melt adhesive.
- 9. Method as in claim 8, wherein said phase change material is removed by washing in hot water.
- 10. Method as in claim 4, wherein said adhesive is a curable adhesive.
- 11. Method as in claim 4, wherein said adhesive material is a polymerizable adhesive.
- 12. Method as in claim 4, wherein said adhesive material is a solvent releasable adhesive.
- 13. Method as in claim 4, wherein said negative working photosensitive material is rendered oleophilic by exposing said imaged areas to actinic light.
- 14. Method for selectively imaging a planographic substrate, said method comprising the following serial steps:(i) coating one surface of a hydrophilic substrate with an oleophilic first material which is soluble in a first solvent without being exposed to actinic light, (ii) selectively applying a second material with an ink jet print head in a desired image array on said coating of said first material on said substrate, thereby producing imaged areas and non-imaged areas, said second material adhering to said first material on said imaged areas and being insoluble in said first solvent without being exposed to actinic light, (iii) dissolving the first material on said non-imaged areas in said first solvent, thereby removing said first material to expose said surface of said substrate in said non-imaged areas, and (iv) removing said second material from said imaged areas while leaving said first material thereunder intact.
- 15. Method for selectively imaging a planographic substrate, said method comprising the following serial steps:(i) coating one surface of a hydrophilic substrate with a first material which is soluble in a first solvent without being exposed to actinic light, wherein said first material is a negative working photosensitive material that is cured when exposed to actinic light, (ii) selectively applying a second material that is transparent to said actinic light with an ink jet print head in a desired image array on said coating of said first material on said substrate, thereby producing imaged areas and non-imaged areas, said second material adhering to said first material on said imaged areas and being insoluble in said first solvent without being exposed to actinic light, (iii) dissolving the first material on said non-imaged areas in said first solvent, thereby removing said first material to expose said surface of said substrate in said non-imaged areas; (iv) removing said second material from said imaged areas while leaving said first material thereunder intact; and (v) exposing said imaged areas to actinic light subsequent to development in said first solvent, thereby curing said first material in said imaged areas.
- 16. Method for selectively imaging a planographic substrate, said method comprising the following serial steps:(i) coating one surface of a substrate with a first material which is soluble in a first solvent without being exposed to actinic light, (ii) selectively applying with an ink jet print head a second material in a desired image array on said coating of said first material on said substrate, thereby producing imaged areas and non-imaged areas, said second material adhering to said first material on said imaged areas and being insoluble in said first solvent without being exposed to actinic light, and (iii) dissolving the first material on said non-imaged areas in said first solvent, thereby removing said first material to expose said surface of said substrate in said non-imaged areas; wherein said second material is soluble in a second solvent in which said first material is not soluble, and wherein said second material is removed by washing said imaged areas in said second solvent.
Parent Case Info
This application is a continuation of application Ser. No. 09/145,404 filed Sep. 2, 1998, now U.S. Pat. No. 6,014,931 issued Jan. 18, 2000, which is a division of Ser. No. 08/928,202 filed Sep. 12, 1997, now U.S. Pat. No. 5,992,322 issued Nov. 30, 1999, which is a continuation of application Ser. No. 08/567,690 filed Dec. 5, 1995, now U.S. Pat. No. 5,750,314 issued May 12, 1998.
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Foreign Referenced Citations (4)
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Continuations (2)
|
Number |
Date |
Country |
Parent |
09/145404 |
Sep 1998 |
US |
Child |
09/484932 |
|
US |
Parent |
08/567690 |
Dec 1995 |
US |
Child |
08/928202 |
|
US |