Claims
- 1. A method of characterizing materials comprising the steps of:
providing a substrate; synthesizing an array of materials on said substrate; providing at least one reactant gas, wherein said reactant gas is in contact with said array of materials; activating at least one of said materials on said array with a heating source; and periodically monitoring an infrared emission from said activated material with an infrared camera, wherein said infrared camera outputs a series of signals corresponding to an emission intensity varying with time of said activated material.
- 2. The method of claim 1, wherein said heating source and said infrared camera scan, in unison, said array of materials.
- 3. The method of claim 1, wherein said entire array of materials is simultaneously monitored by said infrared camera.
- 4. A method of characterizing materials comprising the steps of:
providing a substrate; synthesizing an array of materials on said substrate; enclosing said array in a chamber; filling said chamber with an inert gas at a predefined pressure; equilibrating said chamber and said array to a uniform temperature; leaking at least one reactant gas into said chamber; and monitoring an infrared emission from said array of materials with an infrared camera, wherein said infrared camera outputs a series of signals corresponding to an emission intensity as a function of time for each of said materials.
- 5. A method of characterizing materials comprising the steps of:
providing a substrate; synthesizing an array of materials on said substrate; enclosing said array in a chamber; enclosing a standard material in said chamber; monitoring an infrared emission from each of said materials of said array and of said standard material with an infrared camera while at least one environmental condition within said chamber is varied, wherein said infrared camera outputs a series of signals corresponding to a temperature of each of said materials as a function of time, and wherein said environmental condition is selected from the group consisting of chamber temperature, chamber pressure, and chamber gas composition; and calculating a temperature difference between each of said materials of said array and said standard material.
- 6. A method of monitoring the infrared absorption spectrum of a library of materials contained in an array, said method comprising the steps of:
providing a substrate; synthesizing said array of materials on said substrate; irradiating said array of materials with a monochromatic infrared radiation source; and monitoring material absorption for each of said materials of said array as a function of time.
- 7. The method of claim 6, wherein said monochromatic infrared radiation source sequentially irradiates said materials of said array.
- 8. The method of claim 6, wherein said monochromatic infrared radiation source simultaneously irradiates said materials of said array.
- 9. A method of monitoring the infrared absorption spectrum of a library of materials contained in an array, said method comprising the steps of:
providing a substrate; synthesizing said array of materials on said substrate; irradiating said array of materials with a polychromatic infrared radiation source; filtering radiation passing through said array of materials with at least one optical filter, wherein said filter is selected to pass the desired wavelength spectra; and monitoring material absorption for each of said materials of said array as a function of time.
- 10. A method of characterizing a library of materials contained in an array, said method comprising the steps of:
providing a substrate; synthesizing said array of materials on said substrate; simultaneously irradiating said array of materials with a modulated beam of infrared radiation, wherein at least a portion of said modulated beam interacts with at least one of said materials; focussing radiation passing through said array onto a focal plane array of a high speed infrared camera, wherein said infrared camera captures position sensitive intensity profiles sequentially in time; and transforming said sequential intensity profiles into a complete infrared spectrum using Fourier analysis.
- 11. The method of claim 10, wherein said infrared camera captures position sensitive intensity profiles at a rate of at least 60 frames per second.
- 12. The method of claim 10, wherein a continuous scanning interferometer is used to vary the wavelength of the modulated beam of infrared radiation.
- 13. The method of claim 10, wherein a step scanning interferometer is used to vary the wavelength of the modulated beam of infrared radiation.
- 14. A method of characterizing materials comprising the steps of:
providing a substrate; synthesizing an array of materials on said substrate; irradiating said array of materials with infrared radiation of a first wavelength; and monitoring an infrared emission from each of said materials of said array of materials, wherein said infrared emission is at a second wavelength.
- 15. A system for monitoring the heats of reaction of a combinatorial array of materials, comprising:
an IR transparent substrate containing said combinatorial array of materials; a reaction chamber enclosing said IR transparent substrate; at least one reactant gas, wherein said reactant gas is coupled to said reaction chamber through a valve; and an infrared camera imaging said combinatorial array of materials, wherein said infrared camera outputs a series of signals corresponding to an emission intensity as a function of time of at least one activated material of said combinatorial array of materials.
- 16. The system of claim 15, further comprising a heat source capable of selectively heating at least one material of said combinatorial array of materials to a predefined temperature.
- 17. The system of claim 16, wherein said heat source is selected from the group consisting of focussed infrared radiation sources and resistive heating elements.
- 18. The system of claim 15, further comprising:
a standard material within said reaction chamber, said standard material within a field of view of said infrared camera; and a processor for calculating a temperature difference between said materials of said combinatorial array and said standard material.
- 19. The system of claim 18, further comprising means for varying an environmental condition within said reaction chamber, wherein said environmental condition is selected from the group consisting of chamber temperature, chamber pressure, and chamber gas composition.
- 20. A system for monitoring the infrared absorption of each of a plurality of materials contained on a combinatorial array of materials, comprising:
an IR transparent substrate containing said combinatorial array of materials; an infrared radiation source, wherein said radiation source sequentially irradiates each of said plurality of materials; and an infrared detection system monitoring material absorption as a function of time for each of said plurality of materials.
- 21. The system of claim 20, wherein said radiation source is a monochromatic source.
- 22. The system of claim 20, wherein said radiation source is a polychromatic source, said system further comprising at least one optical filter interposed between said combinatorial array of materials and said infrared detection system.
- 23. A system for monitoring the infrared absorption of each of a plurality of materials contained on a combinatorial array of materials, comprising:
an IR transparent substrate containing said combinatorial array of materials; an infrared radiation source, wherein said radiation source simultaneously irradiates said plurality of materials; and an infrared detection system monitoring material absorption as a function of time for each of said plurality of materials.
- 24. The system of claim 23, wherein said radiation source is a monochromatic source.
- 25. The system of claim 23, wherein said radiation source is a polychromatic source, said system further comprising at least one optical filter interposed between said combinatorial array of materials and said infrared detection system.
- 26. A system for simultaneously characterizing a plurality of chemical reactions contained on a combinatorial array of materials, comprising:
an IR transparent substrate containing said combinatorial array of materials; a modulated infrared radiation source, wherein said radiation source simultaneously irradiates said combinatorial array of materials; an optical element interposed between said combinatorial array of materials and a focal plane array of a high speed infrared camera, wherein said optical element focuses radiation from said combinatorial array of materials onto said focal plane array; and a processor coupled to said infrared camera, said processor transforming sequential intensity profiles captured by said camera into infrared spectra using Fourier analysis.
- 27. The system of claim 26, wherein said radiation source is further comprised of an interferometer.
- 28. The system of claim 27, wherein a mirror within said interferometer moves at a constant velocity resulting in a continuous output.
- 29. A system for monitoring the infrared emission of each of a plurality of materials contained on a combinatorial array of materials, comprising:
a substrate containing said combinatorial array of materials; an infrared radiation source emitting radiation of at least a first wavelength, wherein said radiation source irradiates said plurality of materials; and an infrared detection system monitoring infrared emission of at least a second wavelength as a function of time for each of said plurality of materials.
- 30. A method of characterizing a relative thermal diffusivity for a plurality of materials, comprising the steps of:
providing a thermally uniform substrate; synthesizing said plurality of materials on a first surface of said substrate; irradiating a second surface of said substrate with an infrared source; modulating said infrared source; and monitoring a temperature change associated with each of said plurality of materials as a function of time, said temperature change indicative of said relative thermal diffusivity of said plurality of materials.
- 31. A system for characterizing a relative thermal diffusivity for a plurality of materials, comprising:
a thermally uniform substrate containing said plurality of materials on a first surface of said substrate; a modulated IR radiation source directing modulated IR radiation at a second surface of said substrate, wherein said IR radiation is substantially uniform across at least one material of said plurality of materials; an IR detector monitoring a temperature change associated with said at least one material of said plurality of materials as a function of time, said IR detector outputting a signal corresponding to a monitored temperature; a translation stage system coupled to said substrate and said IR detector, said translation stage repositioning said substrate and said IR detector so that said IR detector sequentially monitors said temperature change as a function of time for each material of said plurality of materials, and wherein each material of said plurality of materials receives substantially equivalent IR radiation from said IR radiation source; and a processor coupled to said IR detector, wherein said processor records said output signals from said detector and determines said relative thermal diffusivity of said plurality of materials.
- 32. A system for characterizing a relative thermal diffusivity for a plurality of materials, comprising:
a thermally uniform substrate containing said plurality of materials on a first surface of said substrate; a modulated IR radiation source directing modulated IR radiation at a second surface of said substrate, wherein said IR radiation is substantially uniform across said plurality of materials; an IR detector array monitoring a temperature change associated with each material of said plurality of materials as a function of time, said IR detector outputting a plurality of signals corresponding to said monitored temperature change for each material; and a processor coupled to said IR detector array, wherein said processor records said output signals from said detector array and determines said relative thermal diffusivity of said plurality of materials.
CROSS REFERENCE TO RELATED APPLICATIONS
[0001] This application is a continuation-in-part of commonly assigned U.S. patent application Ser. No. 08/898,715, filed Jul. 22, 1997, and a continuation-in-part of commonly assigned, co-pending U.S. Provisional Applications Serial No. 60/050,949, filed Jun. 13, 1997; No. 60/028,106, filed Oct. 9, 1996; No. 60/029,255, filed Oct. 25, 1996; No. 60/035,366, filed Jan. 10, 1997; No. 60/048,987, filed Jun. 9, 1997; No. 60/028,105, filed Oct. 9, 1996; and No. 60/035,202, filed Jan. 10, 1997; the complete disclosures of which are incorporated herein by reference for all purposes.
[0002] This application is also related to commonly assigned, co-pending U.S. patent applications Ser. Nos. 08/327,513, filed Oct. 18, 1994, Ser. No. 08/438,043, filed May 8, 1995, and Ser. No. 08/841,423, filed Apr. 22, 1997; commonly assigned U.S. Provisional Application Serial No. 60/016,102, filed Jul. 23, 1996; and PCT Application No. WO 95/13278, filed Oct. 18, 1995; the complete disclosures of which are incorporated herein by reference for all purposes.
Provisional Applications (7)
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Number |
Date |
Country |
|
60050949 |
Jun 1997 |
US |
|
60028106 |
Oct 1996 |
US |
|
60029255 |
Oct 1996 |
US |
|
60035366 |
Jan 1997 |
US |
|
60048987 |
Jun 1997 |
US |
|
60028105 |
Oct 1996 |
US |
|
60035202 |
Jan 1997 |
US |
Continuations (1)
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Number |
Date |
Country |
Parent |
08946135 |
Oct 1997 |
US |
Child |
10183306 |
Jun 2002 |
US |
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
08898715 |
Jul 1997 |
US |
Child |
08946135 |
Oct 1997 |
US |