The Government has rights in this invention pursuant to Grant Number DAAL03-86-K-0002 awarded by the Department of the Army.
Number | Name | Date | Kind |
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3743842 | Smith et al. | Jul 1973 | |
4360586 | Flanders et al. | Nov 1982 | |
4388728 | Emmanuel | Jun 1983 | |
4488799 | Hams et al. | Aug 1984 | |
4514857 | Kimura et al. | Apr 1985 |
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---|
"The Phase-Shifting Mask II: Imaging Simulations and Submicrometer Resist Exposures", M. D. Levenson et al., IEEE Trans. on Elec. Dev. vol. 31, No. 6, (1984). |
"Electron-Beam X-ray, & Ion-Beam Techniques for Submicrometer Lithographies V", R. Radaelli et al., SPIE, vol. 632. |
"High-Resolution X-Ray Lithography Using a Phase Mask", Y. Yamakoshi et al., App. Optics, vol. 25, No. 6, (1986). |
"Optical Imaging with Phase Shift Masks", M. Prouty et al., SPIE, vol. 420, (1984). |