Manufacturing method of memory element, laser irradiation apparatus, and laser irradiation method

Abstract

A method for rapidly performing laser irradiation in a desired position as laser irradiation patterns are switched is proposed. A laser beam emitted from a laser oscillator is entered into a deflector, and a laser beam which has passed through the deflector is entered into a diffractive optical element to be diverged into a plurality of laser beams. Then, a photoresist formed over an insulating film is irradiated with the laser beam which is made to diverge into the plurality of laser beams, and the photoresist irradiated with the laser beam is developed so as to selectively etch the insulating film.

Description

BRIEF DESCRIPTION OF DRAWINGS

In the accompanying drawings:

FIGS. 1A and 1B are diagrams each showing a circuit configuration of a memory cell;

FIG. 2 is a view showing a laser irradiation pattern;

FIG. 3 is a view showing a laser irradiation pattern;

FIG. 4 is a view showing a structure of a laser irradiation apparatus;

FIG. 5 is a view showing a structure of a laser irradiation apparatus;

FIGS. 6A and 6B are views each showing a divergence pattern of a diffractive optical element;

FIG. 7 is a view showing a structure of a laser irradiation apparatus;

FIG. 8 is a view showing a cross section of a semiconductor device;

FIG. 9 is a flow chart of a manufacturing method of a semiconductor device;

FIG. 10 is a flow chart of a manufacturing method of a semiconductor device;

FIGS. 11A and 11B are views each showing a manufacturing process of a semiconductor device;

FIGS. 12A and 12B are views each showing a manufacturing process of a semiconductor device;

FIG. 13 is a diagram showing a configuration of a nonvolatile memory circuit;

FIGS. 14A to 14E are views each showing an embodiment of an antenna;

FIGS. 15A to 15C are views each showing an embodiment of an antenna;

FIGS. 16A to 16E are views each showing a manufacturing process of a semiconductor device;

FIGS. 17A to 17D are views each showing a manufacturing process of a semiconductor device;

FIGS. 18A and 18B are views each showing a manufacturing process of a semiconductor device;

FIGS. 19A to 19H are views each showing an application of a semiconductor device manufactured according to the present invention;

FIG. 20 is a view showing a bag using a semiconductor device manufactured according to the present invention;

FIGS. 21A and 21B are views each showing a certificate using a semiconductor device manufactured according to the present invention;

FIG. 22 is a view showing groceries control using a semiconductor device manufactured according to the present invention;

FIGS. 23A and 23B are views each showing distribution management using a semiconductor device manufactured according to the present invention; and

FIG. 24 is a view showing IC card settlement using a semiconductor device manufactured according to the present invention.

Claims

1. A method for manufacturing a memory element comprising: forming a plurality of regions to be a memory cell including an insulating film over a substrate;performing a deflection of a laser beam by a deflector so that the laser beam passes through one of diffractive optical elements to form a plurality of laser beams; andirradiating the plurality of regions with the plurality of laser beams to selectively form contact holes in the insulating film.

2. The method according to claim 1, wherein the deflector is an acousto-optic deflector or a galvanometer mirror.

3. The method according to claim 1, wherein each of the diffractive optical elements is a transmission-type diffractive optical element or a reflection-type diffractive optical element.

4. The method according to claim 1, wherein the memory element is a read only memory.

5. The method according to claim 1, wherein the memory element is incorporated in at least one of the group consisting of an IC card, an IC tag, an RFID, a transponder, paper money, a valuable instrument, a passport, an electronic device, a bag, and clothing.

6. A method for manufacturing a memory element comprising: forming a plurality of island-shaped semiconductor layers over a substrate;forming a first insulating film over the plurality of island-shaped semiconductor layers;forming a gate electrode over each of the plurality of island-shaped semiconductor layers with the first insulating film interposed therebetween;forming a second insulating film over the gate electrodes;providing a resist over the second insulating film;performing a deflection of a laser beam by a deflector so that the laser beam passes through one of diffractive optical elements to form a plurality of laser beams;irradiating the resist with the plurality of laser beams; andetching the first insulating film and the second insulating film by development of the resist irradiated with the laser beams to selectively form contact holes.

7. The method according to claim 6, wherein the deflector is an acousto-optic deflector or a galvanometer mirror.

8. The method according to claim 6, wherein each of the diffractive optical elements is a transmission-type diffractive optical element or a reflection-type diffractive optical element.

9. The method according to claim 6, wherein the memory element is a read only memory.

10. The method according to claim 6, wherein the memory element is incorporated in at least one of the group consisting of an IC card, an IC tag, an RFID, a transponder, paper money, a valuable instrument, a passport, an electronic device, a bag, and clothing.

11. A method for manufacturing a memory element comprising the steps of: forming a plurality of island-shaped semiconductor layers over a substrate;forming a first insulating film over the plurality of island-shaped semiconductor layers;forming a gate electrode over each of the plurality of island-shaped semiconductor layers with the first insulating film interposed therebetween;forming a second insulating film over the gate electrodes;providing a resist over the second insulating film;performing a deflection of a first laser beam by a first deflector so that the first laser beam passes through one of first diffractive optical elements to form a first plurality of laser beams;performing a deflection of a second laser beam by a second deflector so that the second laser beam passes through one of second diffractive optical elements to form a second plurality of laser beams;irradiating the resist with the first and the second plurality of laser beams; andetching the first insulating film and the second insulating film by development of the resist irradiated with the first and the second plurality of laser beams to selectively form contact holes.

12. The method according to claim 11, wherein each of the first deflector and the second deflector is an acousto-optic deflector or a galvanometer mirror.

13. The method according to claim 11, wherein each of the first diffractive optical elements and the second diffractive optical elements is a transmission-type diffractive optical element or a reflection-type diffractive optical element.

14. The method according to claim 11, wherein the memory element is a read only memory.

15. The method according to claim 11, wherein the memory element is incorporated in at least one of the group consisting of an IC card, an IC tag, an RFID, a transponder, paper money, a valuable instrument, a passport, an electronic device, a bag, and clothing.

16. A laser irradiation apparatus comprising: a laser oscillator for emitting a laser beam;a deflector for performing deflection of the laser beam emitted from the laser oscillator;diffractive optical elements for diverging a laser beam passed through the deflector into a plurality of laser beams; anda transport stage for mounting an object which is irradiated with the plurality of laser beams.

17. The laser irradiation apparatus according to claim 16, wherein the deflector is an acousto-optic deflector or a galvanometer mirror.

18. The laser irradiation apparatus according to claim 16, wherein each of the diffractive optical elements is a transmission-type diffractive optical element or a reflection-type diffractive optical element.

19. The laser irradiation apparatus according to claim 16, further comprising a computer for controlling the laser oscillator and the transport stage.

20. A laser irradiation apparatus comprising: a plurality of laser oscillators for emitting laser beams;a plurality of deflectors for performing deflection of the laser beams each emitted from the plurality of laser oscillators;a plurality of diffractive optical elements for diverging each of laser beams passed through the plurality of deflectors into a plurality of laser beams; anda transport stage for mounting an object which is irradiated with the plurality of laser beams.

21. The laser irradiation apparatus according to claim 20, wherein each of the plurality of deflectors is an acousto-optic deflector or a galvanometer mirror.

22. The laser irradiation apparatus according to claim 20, wherein each of the plurality of diffractive optical elements is a transmission-type diffractive optical element or a reflection-type diffractive optical element.

23. The laser irradiation apparatus according to claim 20, further comprising a computer for controlling the plurality of laser oscillators and the transport stage.

24. A laser irradiation method comprising: entering a laser beam emitted from a laser oscillator into a deflector;entering a laser beam passed through the deflector into a first diffractive optical element or a second diffractive optical element, wherein the first diffractive optical element and the second diffractive optical element have a different pattern each other; andirradiating an object mounted on a transport stage with a laser beam passed through the first diffractive optical element or the second diffractive optical element.

25. The laser irradiation method according to claim 24, wherein the deflector is an acousto-optic deflector or a galvanometer mirror.

26. The laser irradiation method according to claim 24, wherein each of the first diffractive optical element and the second diffractive optical element is a transmission-type diffractive optical element or a reflection-type diffractive optical element.

27. The laser irradiation method according to claim 24, wherein the object is irradiated with the plurality of laser beams after passing through a projection lens.

28. A laser irradiation method comprising: entering a laser beam emitted from a laser oscillator into a deflector;entering a laser beam passed through the deflector into one of diffractive optical elements to diverge into a plurality of laser beams; andirradiating an object mounted on a transport stage with the plurality of laser beams.

29. The laser irradiation method according to claim 28, wherein the deflector is an acousto-optic deflector or a galvanometer mirror.

30. The laser irradiation method according to claim 28, wherein each of the diffractive optical elements is a transmission-type diffractive optical element or a reflection-type diffractive optical element.

31. The laser irradiation method according to claim 28, wherein the object is irradiated with the plurality of laser beams after passing through a projection lens.

32. A laser irradiation method comprising: entering each of laser beams emitted from a plurality of laser oscillators into a plurality of different deflectors;entering each of laser beams passed through the plurality of deflectors into a plurality of different diffractive optical elements to diverge one of the laser beams into a plurality of laser beams; andirradiating an object mounted on a transport stage with the plurality of laser beams.

33. The laser irradiation method according to claim 32, wherein each of the plurality of deflectors is an acousto-optic deflector or a galvanometer mirror.

34. The laser irradiation method according to claim 32, wherein each of the plurality of diffractive optical elements is a transmission-type diffractive optical element or a reflection-type diffractive optical element.

35. The laser irradiation method according to claim 32, wherein the object is irradiated with the plurality of laser beams after passing through a projection lens.