Details of optical elements

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G03F7/70316

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70316Details of optical elements

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Single grab overlay measurement of tall targets
- Patent number 12,066,322
- Issue date Aug 20, 2024
- KLA Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Lithography system and methods
- Patent number 12,050,405
- Issue date Jul 30, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Eng Hock Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pulse width expansion apparatus and electronic device manufacturing...
- Patent number 12,038,567
- Issue date Jul 16, 2024
- Gigaphoton Inc.
- Hirotaka Miyamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical fibers and production methods therefor
- Patent number 11,999,645
- Issue date Jun 4, 2024
- ASML Netherlands B.V.
- Robbert Edgar Van Leeuwen
- G01 - MEASURING TESTING
Information Patent Grant
Lithography apparatus, patterning system, and method of patterning...
- Patent number 11,994,804
- Issue date May 28, 2024
- Applied Materials, Inc.
- Christopher Dennis Bencher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion exposure tool
- Patent number 11,966,165
- Issue date Apr 23, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yung-Yao Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Projection exposure method and projection lens with setting of the...
- Patent number 11,906,904
- Issue date Feb 20, 2024
- Carl Zeiss SMT GmbH
- Toralf Gruner
- G02 - OPTICS
Information Patent Grant
Optical element and lithography system
- Patent number 11,874,525
- Issue date Jan 16, 2024
- Carl Zeiss SMT GmbH
- Eric Eva
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Electrodeposition compatible anti-reflection coatings for laser int...
- Patent number 11,815,822
- Issue date Nov 14, 2023
- Toyota Motor Engineering & Manufacturing North America, Inc.
- Shailesh N. Joshi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror, in particular for a microlithographic projection exposure a...
- Patent number 11,809,085
- Issue date Nov 7, 2023
- Carl Zeiss SMT GmbH
- Hans Michael Stiepan
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Diffractive waveguide providing structured illumination for object...
- Patent number 11,747,719
- Issue date Sep 5, 2023
- DigiLens. Inc.
- Milan Momcilo Popovich
- G01 - MEASURING TESTING
Information Patent Grant
Frequency broadening apparatus and method
- Patent number 11,733,617
- Issue date Aug 22, 2023
- ASML Netherlands B.V.
- Patrick Sebastian Uebel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Graded interface in Bragg reflector
- Patent number 11,720,013
- Issue date Aug 8, 2023
- Applied Materials, Inc.
- Wen Xiao
- G02 - OPTICS
Information Patent Grant
Gamma ray generator and method of generating gamma ray
- Patent number 11,669,014
- Issue date Jun 6, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- You-Hua Chou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Hyperspectral camera based on continuously variable film filter and...
- Patent number 11,622,084
- Issue date Apr 4, 2023
- Jiangsu Dualix Spectral Imaging Technology Co., Ltd
- Xinghai Chen
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Method of reducing roughness and/or defects on an optical surface a...
- Patent number 11,605,478
- Issue date Mar 14, 2023
- Zygo Corporation
- John Matthew Kincade
- G02 - OPTICS
Information Patent Grant
Gamma ray generator and gamma ray lithography system
- Patent number 11,460,779
- Issue date Oct 4, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- You-Hua Chou
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Lithography system and methods
- Patent number 11,448,970
- Issue date Sep 20, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Eng Hock Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing a reflecting optical element of a projection e...
- Patent number 11,415,892
- Issue date Aug 16, 2022
- Carl Zeiss SMT GmbH
- Matthias Kaes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet light concentrating mirror and electronic devic...
- Patent number 11,410,785
- Issue date Aug 9, 2022
- Gigaphoton Inc.
- Yoshiyuki Honda
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Optical arrangement for EUV lithography
- Patent number 11,372,335
- Issue date Jun 28, 2022
- Carl Zeiss SMT GmbH
- Anastasia Gonchar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Support of an optical element
- Patent number 11,366,393
- Issue date Jun 21, 2022
- Carl Zeiss SMT GmbH
- Eugen Anselm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror, in particular for a microlithographic projection exposure s...
- Patent number 11,366,395
- Issue date Jun 21, 2022
- Carl Zeiss SMT GmbH
- Kerstin Hild
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Mirror, in particular for a microlithographic projection exposure s...
- Patent number 11,360,393
- Issue date Jun 14, 2022
- Carl Zeiss SMT GmbH
- Ben Wylie-Van Eerd
- G02 - OPTICS
Information Patent Grant
Optical device, and method for preventing contamination of optical...
- Patent number 11,353,802
- Issue date Jun 7, 2022
- Lasertec Corporation
- Haruhiko Kusunose
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Graded interface in bragg reflector
- Patent number 11,327,394
- Issue date May 10, 2022
- Applied Materials Inc.
- Wen Xiao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation source and device for feeding back emitted radiation to a...
- Patent number 11,303,092
- Issue date Apr 12, 2022
- Carl Zeiss SMT GmbH
- Udo Dinger
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Illumination system with curved 1d-patterned mask for use in EUV-ex...
- Patent number 11,300,884
- Issue date Apr 12, 2022
- Nikon Corporation
- Daniel Gene Smith
- G02 - OPTICS
Information Patent Grant
Systems and methods using mask pattern measurements performed with...
- Patent number 11,281,093
- Issue date Mar 22, 2022
- Samsung Electronics Co., Ltd.
- Ji Hoon Na
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Frequency broadening apparatus and method
- Patent number 11,262,665
- Issue date Mar 1, 2022
- ASML Netherlands B.V.
- Patrick Sebastian Uebel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL DEVICE, METHOD FOR MEASURING AN ACTUAL TILT OF AN OPTICAL S...
- Publication number 20240426603
- Publication date Dec 26, 2024
- Carl Zeiss SMT GMBH
- Heiner ZWICKEL
- G01 - MEASURING TESTING
Information Patent Application
INSPECTION APPARATUS, POLARIZATION-MAINTAINING ROTATABLE BEAM DISPL...
- Publication number 20240427251
- Publication date Dec 26, 2024
- ASML NETHERLANDS B.V.
- Douglas C. CAPPELLI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM AND METHODS
- Publication number 20240402623
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chen-Pin CHENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM AND METHODS
- Publication number 20240337949
- Publication date Oct 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Eng Hock LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIGHTING OPTICAL SYSTEM AND EXPOSURE APPARATUS
- Publication number 20240319610
- Publication date Sep 26, 2024
- Ushio Denki Kabushiki Kaisha
- Osamu OSAWA
- G02 - OPTICS
Information Patent Application
METHOD FOR DEPOSITING A COVER LAYER, EUV LITHOGRAPHY SYSTEM AND OPT...
- Publication number 20240302756
- Publication date Sep 12, 2024
- Carl Zeiss SMT GMBH
- Dirk EHM
- G02 - OPTICS
Information Patent Application
LITHOGRAPHIC APPARATUS, TEMPERATURE SENSOR, AND FIBER BRAGG GRATING...
- Publication number 20240302753
- Publication date Sep 12, 2024
- ASML Holding N.V.
- Mahesh Upendra AJGAONKAR
- G01 - MEASURING TESTING
Information Patent Application
EXPOSURE METHOD, EXPOSURE DEVICE, AND METHOD OF FORMING OPTICALLY-A...
- Publication number 20240288678
- Publication date Aug 29, 2024
- FUJIFILM CORPORATION
- Hirotoshi ANDO
- G02 - OPTICS
Information Patent Application
METHOD FOR DETERMINING A POSITION OF A MIRROR
- Publication number 20240255319
- Publication date Aug 1, 2024
- Carl Zeiss SMT GMBH
- Michael Patra
- G01 - MEASURING TESTING
Information Patent Application
MULTI-MIRROR ARRAY
- Publication number 20240248408
- Publication date Jul 25, 2024
- Carl Zeiss SMT GMBH
- Moritz Becker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV ILLUMINATION DEVICE AND METHOD FOR OPERATING A MICROLITHOGRAPHI...
- Publication number 20240248410
- Publication date Jul 25, 2024
- Carl Zeiss SMT GMBH
- Michael Patra
- G02 - OPTICS
Information Patent Application
IMMERSION EXPOSURE TOOL
- Publication number 20240231240
- Publication date Jul 11, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yung-Yao LEE
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
OPTICAL ELEMENT WITH COOLING CHANNELS, AND OPTICAL ARRANGEMENT
- Publication number 20240219849
- Publication date Jul 4, 2024
- Carl Zeiss SMT GMBH
- Eric EVA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TEMPERATURE MEASUREMENT OF OPTICAL ELEMENTS IN AN OPTICAL APPARATUS
- Publication number 20240201029
- Publication date Jun 20, 2024
- ASML Netherland B.V.
- Koen Martin Willem Jan BOS
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL SYSTEM AND PROJECTION EXPOSURE APPARATUS
- Publication number 20240184212
- Publication date Jun 6, 2024
- Carl Zeiss SMT GMBH
- Boaz Pnini
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT, PROJECTION OPTICAL UNIT AND PROJECTION EXPOSURE AP...
- Publication number 20240176249
- Publication date May 30, 2024
- Carl Zeiss SMT GMBH
- Marwene Nefzi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DRAWING APPARATUS AND DRAWING METHOD
- Publication number 20240168386
- Publication date May 23, 2024
- SCREEN Holdings Co., Ltd.
- Shota MAJIMA
- G02 - OPTICS
Information Patent Application
ASSEMBLY FOR SEPARATING RADIATION IN THE FAR FIELD
- Publication number 20240168392
- Publication date May 23, 2024
- ASML NETHERLANDS B.V.
- Petrus Wilhelmus SMORENBURG
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
SUPPORT FOR AN OPTICAL ELEMENT
- Publication number 20240159988
- Publication date May 16, 2024
- Carl Zeiss SMT GMBH
- Rodolfo Guglielmi Rabe
- G02 - OPTICS
Information Patent Application
SINGLE GRAB OVERLAY MEASUREMENT OF TALL TARGETS
- Publication number 20240159585
- Publication date May 16, 2024
- KLA Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Application
BYPASS APPARATUS, LASER APPARATUS, AND ELECTRONIC DEVICE MANUFACTUR...
- Publication number 20240128702
- Publication date Apr 18, 2024
- Gigaphoton Inc.
- Shinichi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING A MIRROR OF A LITHOGRAPHY SYSTEM
- Publication number 20240027730
- Publication date Jan 25, 2024
- Carl Zeiss SMT GMBH
- Christoph Zaczek
- G02 - OPTICS
Information Patent Application
METHOD FOR PRODUCING A MIRROR OF A MICROLITHOGRAPHIC PROJECTION EXP...
- Publication number 20240019613
- Publication date Jan 18, 2024
- Carl Zeiss SMT GMBH
- Christoph Zaczek
- G02 - OPTICS
Information Patent Application
PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY
- Publication number 20240012334
- Publication date Jan 11, 2024
- Carl Zeiss SMT GMBH
- Markus Raab
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIGHT SOURCE APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACT...
- Publication number 20240004306
- Publication date Jan 4, 2024
- Canon Kabushiki Kaisha
- MAHIRO SAITO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL COMPONENT AND OPTICAL SYSTEM, IN PARTICULAR FOR MICROLITHOG...
- Publication number 20230384687
- Publication date Nov 30, 2023
- Carl Zeiss SMT GMBH
- Jeffrey Erxmeyer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT FOR REFLECTING RADIATION, AND OPTICAL ASSEMBLY
- Publication number 20230350307
- Publication date Nov 2, 2023
- Carl Zeiss SMT GMBH
- Stefan Xalter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM, AND METHOD FOR OPERATING AN OPTICAL SYSTEM
- Publication number 20230324648
- Publication date Oct 12, 2023
- Carl Zeiss SMT GMBH
- Andre Dirauf
- G02 - OPTICS
Information Patent Application
ELECTRODEPOSITION COMPATIBLE ANTI-REFLECTION COATINGS FOR LASER INT...
- Publication number 20230314965
- Publication date Oct 5, 2023
- Toyota Motor Engineering & Manufacturing North America, Inc.
- Shailesh N. Joshi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING AN OPTICAL ELEMENT, OPTICAL ELEMENT, DEVICE FO...
- Publication number 20230257866
- Publication date Aug 17, 2023
- Carl Zeiss SMT GMBH
- Anastasia GONCHAR
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING

Details of optical elements

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Single grab overlay measurement of tall targets

Lithography system and methods

Pulse width expansion apparatus and electronic device manufacturing...

Optical fibers and production methods therefor

Lithography apparatus, patterning system, and method of patterning...

Immersion exposure tool

Projection exposure method and projection lens with setting of the...

Optical element and lithography system

Electrodeposition compatible anti-reflection coatings for laser int...

Mirror, in particular for a microlithographic projection exposure a...

Diffractive waveguide providing structured illumination for object...

Frequency broadening apparatus and method

Graded interface in Bragg reflector

Gamma ray generator and method of generating gamma ray

Hyperspectral camera based on continuously variable film filter and...

Method of reducing roughness and/or defects on an optical surface a...

Gamma ray generator and gamma ray lithography system

Lithography system and methods

Method for producing a reflecting optical element of a projection e...

Extreme ultraviolet light concentrating mirror and electronic devic...

Optical arrangement for EUV lithography

Support of an optical element

Mirror, in particular for a microlithographic projection exposure s...

Mirror, in particular for a microlithographic projection exposure s...

Optical device, and method for preventing contamination of optical...

Graded interface in bragg reflector

Radiation source and device for feeding back emitted radiation to a...

Illumination system with curved 1d-patterned mask for use in EUV-ex...

Systems and methods using mask pattern measurements performed with...

Frequency broadening apparatus and method

Patents Applicationslast 30 patents

OPTICAL DEVICE, METHOD FOR MEASURING AN ACTUAL TILT OF AN OPTICAL S...

INSPECTION APPARATUS, POLARIZATION-MAINTAINING ROTATABLE BEAM DISPL...

LITHOGRAPHY SYSTEM AND METHODS

LITHOGRAPHY SYSTEM AND METHODS

LIGHTING OPTICAL SYSTEM AND EXPOSURE APPARATUS

METHOD FOR DEPOSITING A COVER LAYER, EUV LITHOGRAPHY SYSTEM AND OPT...

LITHOGRAPHIC APPARATUS, TEMPERATURE SENSOR, AND FIBER BRAGG GRATING...

EXPOSURE METHOD, EXPOSURE DEVICE, AND METHOD OF FORMING OPTICALLY-A...

METHOD FOR DETERMINING A POSITION OF A MIRROR

MULTI-MIRROR ARRAY

EUV ILLUMINATION DEVICE AND METHOD FOR OPERATING A MICROLITHOGRAPHI...

IMMERSION EXPOSURE TOOL

OPTICAL ELEMENT WITH COOLING CHANNELS, AND OPTICAL ARRANGEMENT

TEMPERATURE MEASUREMENT OF OPTICAL ELEMENTS IN AN OPTICAL APPARATUS

OPTICAL SYSTEM AND PROJECTION EXPOSURE APPARATUS

OPTICAL ELEMENT, PROJECTION OPTICAL UNIT AND PROJECTION EXPOSURE AP...

DRAWING APPARATUS AND DRAWING METHOD

ASSEMBLY FOR SEPARATING RADIATION IN THE FAR FIELD

SUPPORT FOR AN OPTICAL ELEMENT

SINGLE GRAB OVERLAY MEASUREMENT OF TALL TARGETS

BYPASS APPARATUS, LASER APPARATUS, AND ELECTRONIC DEVICE MANUFACTUR...

METHOD FOR PRODUCING A MIRROR OF A LITHOGRAPHY SYSTEM

METHOD FOR PRODUCING A MIRROR OF A MICROLITHOGRAPHIC PROJECTION EXP...

PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY

LIGHT SOURCE APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACT...

OPTICAL COMPONENT AND OPTICAL SYSTEM, IN PARTICULAR FOR MICROLITHOG...

OPTICAL ELEMENT FOR REFLECTING RADIATION, AND OPTICAL ASSEMBLY

OPTICAL SYSTEM, AND METHOD FOR OPERATING AN OPTICAL SYSTEM

ELECTRODEPOSITION COMPATIBLE ANTI-REFLECTION COATINGS FOR LASER INT...

METHOD FOR PRODUCING AN OPTICAL ELEMENT, OPTICAL ELEMENT, DEVICE FO...