Details of optical elements

Industry

CPC
G03F7/70316

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70316Details of optical elements

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Method for generating EUV radiation
- Patent number 12,321,099
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Sheng-Min Wang
- G02 - OPTICS
Information Patent Grant
Optical element, EUV lithography system, and method for forming nan...
- Patent number 12,306,539
- Issue date May 20, 2025
- Carl Zeiss SMT GmbH
- Anastasia Gonchar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion exposure tool
- Patent number 12,306,542
- Issue date May 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yung-Yao Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for fabricating anti-reflective layer on quartz surface by u...
- Patent number 12,287,454
- Issue date Apr 29, 2025
- Institute of Microelectronics, Chinese Academy of Sciences
- Lina Shi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Oxygen-loss resistant top coating for optical elements
- Patent number 12,287,455
- Issue date Apr 29, 2025
- ASML Netherlands B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror, in particular for microlithography
- Patent number 12,276,917
- Issue date Apr 15, 2025
- Carl Zeiss SMT GmbH
- Jan Horn
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
EUV collector mirror
- Patent number 12,276,815
- Issue date Apr 15, 2025
- Carl Zeiss SMT GmbH
- Marcus Van De Kerkhof
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Single grab overlay measurement of tall targets
- Patent number 12,066,322
- Issue date Aug 20, 2024
- KLA Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Lithography system and methods
- Patent number 12,050,405
- Issue date Jul 30, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Eng Hock Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pulse width expansion apparatus and electronic device manufacturing...
- Patent number 12,038,567
- Issue date Jul 16, 2024
- Gigaphoton Inc.
- Hirotaka Miyamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical fibers and production methods therefor
- Patent number 11,999,645
- Issue date Jun 4, 2024
- ASML Netherlands B.V.
- Robbert Edgar Van Leeuwen
- G01 - MEASURING TESTING
Information Patent Grant
Lithography apparatus, patterning system, and method of patterning...
- Patent number 11,994,804
- Issue date May 28, 2024
- Applied Materials, Inc.
- Christopher Dennis Bencher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Immersion exposure tool
- Patent number 11,966,165
- Issue date Apr 23, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yung-Yao Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Projection exposure method and projection lens with setting of the...
- Patent number 11,906,904
- Issue date Feb 20, 2024
- Carl Zeiss SMT GmbH
- Toralf Gruner
- G02 - OPTICS
Information Patent Grant
Optical element and lithography system
- Patent number 11,874,525
- Issue date Jan 16, 2024
- Carl Zeiss SMT GmbH
- Eric Eva
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Electrodeposition compatible anti-reflection coatings for laser int...
- Patent number 11,815,822
- Issue date Nov 14, 2023
- Toyota Motor Engineering & Manufacturing North America, Inc.
- Shailesh N. Joshi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror, in particular for a microlithographic projection exposure a...
- Patent number 11,809,085
- Issue date Nov 7, 2023
- Carl Zeiss SMT GmbH
- Hans Michael Stiepan
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Diffractive waveguide providing structured illumination for object...
- Patent number 11,747,719
- Issue date Sep 5, 2023
- DigiLens. Inc.
- Milan Momcilo Popovich
- G01 - MEASURING TESTING
Information Patent Grant
Frequency broadening apparatus and method
- Patent number 11,733,617
- Issue date Aug 22, 2023
- ASML Netherlands B.V.
- Patrick Sebastian Uebel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Graded interface in Bragg reflector
- Patent number 11,720,013
- Issue date Aug 8, 2023
- Applied Materials, Inc.
- Wen Xiao
- G02 - OPTICS
Information Patent Grant
Gamma ray generator and method of generating gamma ray
- Patent number 11,669,014
- Issue date Jun 6, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- You-Hua Chou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Hyperspectral camera based on continuously variable film filter and...
- Patent number 11,622,084
- Issue date Apr 4, 2023
- Jiangsu Dualix Spectral Imaging Technology Co., Ltd
- Xinghai Chen
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Method of reducing roughness and/or defects on an optical surface a...
- Patent number 11,605,478
- Issue date Mar 14, 2023
- Zygo Corporation
- John Matthew Kincade
- G02 - OPTICS
Information Patent Grant
Gamma ray generator and gamma ray lithography system
- Patent number 11,460,779
- Issue date Oct 4, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- You-Hua Chou
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Lithography system and methods
- Patent number 11,448,970
- Issue date Sep 20, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Eng Hock Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing a reflecting optical element of a projection e...
- Patent number 11,415,892
- Issue date Aug 16, 2022
- Carl Zeiss SMT GmbH
- Matthias Kaes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet light concentrating mirror and electronic devic...
- Patent number 11,410,785
- Issue date Aug 9, 2022
- Gigaphoton Inc.
- Yoshiyuki Honda
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Optical arrangement for EUV lithography
- Patent number 11,372,335
- Issue date Jun 28, 2022
- Carl Zeiss SMT GmbH
- Anastasia Gonchar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Support of an optical element
- Patent number 11,366,393
- Issue date Jun 21, 2022
- Carl Zeiss SMT GmbH
- Eugen Anselm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror, in particular for a microlithographic projection exposure s...
- Patent number 11,366,395
- Issue date Jun 21, 2022
- Carl Zeiss SMT GmbH
- Kerstin Hild
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING

Patents Applicationslast 30 patents

Information Patent Application
LASER PROCESSING SYSTEM AND LASER PROCESSING METHOD
- Publication number 20250199416
- Publication date Jun 19, 2025
- Gigaphoton Inc.
- Akira SUWA
- G02 - OPTICS
Information Patent Application
INTERMEDIATE PRODUCT FOR PRODUCING AN OPTICAL ELEMENT FOR A PROJECT...
- Publication number 20250189900
- Publication date Jun 12, 2025
- Carl Zeiss SMT GMBH
- Sandro HOFFMANN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DRIVE DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS
- Publication number 20250180998
- Publication date Jun 5, 2025
- Carl Zeiss SMT GMBH
- Oliver HERBST
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LAYER STACK FOR EXTREME ULTRAVIOLET LITHOGRAPHY
- Publication number 20250164891
- Publication date May 22, 2025
- TOKYO ELECTRON LIMITED
- Soo Doo Chae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LENS ELEMENT FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS...
- Publication number 20250164890
- Publication date May 22, 2025
- Carl Zeiss SMT GMBH
- Stephan Six
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FACET MIRROR ASSEMBLY
- Publication number 20250147426
- Publication date May 8, 2025
- Carl Zeiss SMT GMBH
- Ralf Ameling
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY
- Publication number 20250147427
- Publication date May 8, 2025
- Carl Zeiss SMT GMBH
- Carlos Alberto JANSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ASSEMBLY, PROJECTION EXPOSURE SYSTEM FOR SEMICONDUCTOR LITH...
- Publication number 20250138302
- Publication date May 1, 2025
- Carl Zeiss SMT GMBH
- Thilo Pollak
- G02 - OPTICS
Information Patent Application
METHOD FOR PRODUCING A MAIN BODY OF AN OPTICAL ELEMENT FOR SEMICOND...
- Publication number 20250135716
- Publication date May 1, 2025
- Carl Zeiss SMT GMBH
- Eduard SCHWEIGERT
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
MIRROR FOR A PROJECTION EXPOSURE APPARATUS
- Publication number 20250138228
- Publication date May 1, 2025
- Carl Zeiss SMT GMBH
- Valentin Jonatan Bolsinger
- G02 - OPTICS
Information Patent Application
METHOD FOR OPERATING A PROJECTION EXPOSURE SYSTEM, AND PROJECTION E...
- Publication number 20250093782
- Publication date Mar 20, 2025
- Carl Zeiss SMT GMBH
- Malte LANGENHORST
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TEMPERATURE MEASUREMENT OF OPTICAL ELEMENTS IN AN OPTICAL APPARATUS
- Publication number 20250085172
- Publication date Mar 13, 2025
- ASML Netherland B.V.
- Koen Martin Willem Jan BOS
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL ELEMENT, AND ASSEMBLY AND OPTICAL SYSTEM THEREWITH
- Publication number 20250068089
- Publication date Feb 27, 2025
- Carl Zeiss SMT GMBH
- Sonja Schneider
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE S...
- Publication number 20250068084
- Publication date Feb 27, 2025
- Carl Zeiss SMT GMBH
- Joern WEBER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS AND DEVICE FOR CHEMICAL PROCESSING OF A SURFACE
- Publication number 20250021013
- Publication date Jan 16, 2025
- Carl Zeiss SMT GMBH
- Jan Philip KRAACK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL DEVICE, METHOD FOR MEASURING AN ACTUAL TILT OF AN OPTICAL S...
- Publication number 20240426603
- Publication date Dec 26, 2024
- Carl Zeiss SMT GMBH
- Heiner ZWICKEL
- G01 - MEASURING TESTING
Information Patent Application
INSPECTION APPARATUS, POLARIZATION-MAINTAINING ROTATABLE BEAM DISPL...
- Publication number 20240427251
- Publication date Dec 26, 2024
- ASML NETHERLANDS B.V.
- Douglas C. CAPPELLI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM AND METHODS
- Publication number 20240402623
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chen-Pin CHENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM AND METHODS
- Publication number 20240337949
- Publication date Oct 10, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Eng Hock LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIGHTING OPTICAL SYSTEM AND EXPOSURE APPARATUS
- Publication number 20240319610
- Publication date Sep 26, 2024
- Ushio Denki Kabushiki Kaisha
- Osamu OSAWA
- G02 - OPTICS
Information Patent Application
METHOD FOR DEPOSITING A COVER LAYER, EUV LITHOGRAPHY SYSTEM AND OPT...
- Publication number 20240302756
- Publication date Sep 12, 2024
- Carl Zeiss SMT GMBH
- Dirk EHM
- G02 - OPTICS
Information Patent Application
LITHOGRAPHIC APPARATUS, TEMPERATURE SENSOR, AND FIBER BRAGG GRATING...
- Publication number 20240302753
- Publication date Sep 12, 2024
- ASML Holding N.V.
- Mahesh Upendra AJGAONKAR
- G01 - MEASURING TESTING
Information Patent Application
EXPOSURE METHOD, EXPOSURE DEVICE, AND METHOD OF FORMING OPTICALLY-A...
- Publication number 20240288678
- Publication date Aug 29, 2024
- FUJIFILM CORPORATION
- Hirotoshi ANDO
- G02 - OPTICS
Information Patent Application
METHOD FOR DETERMINING A POSITION OF A MIRROR
- Publication number 20240255319
- Publication date Aug 1, 2024
- Carl Zeiss SMT GMBH
- Michael Patra
- G01 - MEASURING TESTING
Information Patent Application
MULTI-MIRROR ARRAY
- Publication number 20240248408
- Publication date Jul 25, 2024
- Carl Zeiss SMT GMBH
- Moritz Becker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV ILLUMINATION DEVICE AND METHOD FOR OPERATING A MICROLITHOGRAPHI...
- Publication number 20240248410
- Publication date Jul 25, 2024
- Carl Zeiss SMT GMBH
- Michael Patra
- G02 - OPTICS
Information Patent Application
IMMERSION EXPOSURE TOOL
- Publication number 20240231240
- Publication date Jul 11, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yung-Yao LEE
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
OPTICAL ELEMENT WITH COOLING CHANNELS, AND OPTICAL ARRANGEMENT
- Publication number 20240219849
- Publication date Jul 4, 2024
- Carl Zeiss SMT GMBH
- Eric EVA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TEMPERATURE MEASUREMENT OF OPTICAL ELEMENTS IN AN OPTICAL APPARATUS
- Publication number 20240201029
- Publication date Jun 20, 2024
- ASML Netherland B.V.
- Koen Martin Willem Jan BOS
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL SYSTEM AND PROJECTION EXPOSURE APPARATUS
- Publication number 20240184212
- Publication date Jun 6, 2024
- Carl Zeiss SMT GMBH
- Boaz Pnini
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Details of optical elements

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for generating EUV radiation

Optical element, EUV lithography system, and method for forming nan...

Immersion exposure tool

Method for fabricating anti-reflective layer on quartz surface by u...

Oxygen-loss resistant top coating for optical elements

Mirror, in particular for microlithography

EUV collector mirror

Single grab overlay measurement of tall targets

Lithography system and methods

Pulse width expansion apparatus and electronic device manufacturing...

Optical fibers and production methods therefor

Lithography apparatus, patterning system, and method of patterning...

Immersion exposure tool

Projection exposure method and projection lens with setting of the...

Optical element and lithography system

Electrodeposition compatible anti-reflection coatings for laser int...

Mirror, in particular for a microlithographic projection exposure a...

Diffractive waveguide providing structured illumination for object...

Frequency broadening apparatus and method

Graded interface in Bragg reflector

Gamma ray generator and method of generating gamma ray

Hyperspectral camera based on continuously variable film filter and...

Method of reducing roughness and/or defects on an optical surface a...

Gamma ray generator and gamma ray lithography system

Lithography system and methods

Method for producing a reflecting optical element of a projection e...

Extreme ultraviolet light concentrating mirror and electronic devic...

Optical arrangement for EUV lithography

Support of an optical element

Mirror, in particular for a microlithographic projection exposure s...

Patents Applicationslast 30 patents

LASER PROCESSING SYSTEM AND LASER PROCESSING METHOD

INTERMEDIATE PRODUCT FOR PRODUCING AN OPTICAL ELEMENT FOR A PROJECT...

DRIVE DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS

LAYER STACK FOR EXTREME ULTRAVIOLET LITHOGRAPHY

LENS ELEMENT FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS...

FACET MIRROR ASSEMBLY

PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY

OPTICAL ASSEMBLY, PROJECTION EXPOSURE SYSTEM FOR SEMICONDUCTOR LITH...

METHOD FOR PRODUCING A MAIN BODY OF AN OPTICAL ELEMENT FOR SEMICOND...

MIRROR FOR A PROJECTION EXPOSURE APPARATUS

METHOD FOR OPERATING A PROJECTION EXPOSURE SYSTEM, AND PROJECTION E...

TEMPERATURE MEASUREMENT OF OPTICAL ELEMENTS IN AN OPTICAL APPARATUS

OPTICAL ELEMENT, AND ASSEMBLY AND OPTICAL SYSTEM THEREWITH

MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE S...

PROCESS AND DEVICE FOR CHEMICAL PROCESSING OF A SURFACE

OPTICAL DEVICE, METHOD FOR MEASURING AN ACTUAL TILT OF AN OPTICAL S...

INSPECTION APPARATUS, POLARIZATION-MAINTAINING ROTATABLE BEAM DISPL...

LITHOGRAPHY SYSTEM AND METHODS

LITHOGRAPHY SYSTEM AND METHODS

LIGHTING OPTICAL SYSTEM AND EXPOSURE APPARATUS

METHOD FOR DEPOSITING A COVER LAYER, EUV LITHOGRAPHY SYSTEM AND OPT...

LITHOGRAPHIC APPARATUS, TEMPERATURE SENSOR, AND FIBER BRAGG GRATING...

EXPOSURE METHOD, EXPOSURE DEVICE, AND METHOD OF FORMING OPTICALLY-A...

METHOD FOR DETERMINING A POSITION OF A MIRROR

MULTI-MIRROR ARRAY

EUV ILLUMINATION DEVICE AND METHOD FOR OPERATING A MICROLITHOGRAPHI...

IMMERSION EXPOSURE TOOL

OPTICAL ELEMENT WITH COOLING CHANNELS, AND OPTICAL ARRANGEMENT

TEMPERATURE MEASUREMENT OF OPTICAL ELEMENTS IN AN OPTICAL APPARATUS

OPTICAL SYSTEM AND PROJECTION EXPOSURE APPARATUS