Claims
- 1. A mask supporting method, comprising the steps of:
- providing a mask having a mask frame with a rectangular outside peripheral shape and a window having a rectangular shape analogous to the outside peripheral shape of the mask frame; and
- supporting the mask by supporting an outside periphery of the mask frame at (i) three supporting points and (ii) at least two pressing points substantially opposed to the supporting points, wherein each of the supporting points is disposed at or outwardly of a point of intersection between an extension of a side of the window of the mask frame and the outside periphery of the mask frame.
- 2. A method according to claim 1, wherein the distance from a longitudinal center line of the mask to one of the at least two pressing points and the distance from a transverse center line of the mask to the other of the at least two pressing points, are substantially equal to each other.
- 3. A method according to claim 1, wherein said supporting step comprises supporting the mask with a mask frame and wherein two of the three supporting points are disposed on one side of the outside periphery of the mask frame, and the remaining one supporting point is disposed on another side perpendicular to the one side.
- 4. A method according to claim 3, wherein the distances from a longitudinal center line of the mask to the two supporting points and the distance from a transverse center line of the mask to the remaining one supporting point are substantially equal to each other.
- 5. A method according to claim 1, wherein said supporting step comprises supporting the mask with a mask frame and the mask frame is supported at a plurality of points on its bottom surface.
- 6. A method according to claim 5, wherein the plural points comprises three points.
- 7. A mask supporting mechanism for supporting a mask having a mask frame with a rectangular outside peripheral shape and a window having a rectangular shape analogous to the outside peripheral shape of the mask frame, said mechanism comprising:
- three supporting members for supporting the outside periphery of the mask frame, wherein each of the supporting members is disposed at or outwardly of a point of intersection between an extension of a side of the window of the mask frame and the outside periphery of the mask frame; and
- at least two pressing mechanisms disposed substantially opposed to the supporting members for applying a pressing force to the mask frame in a direction parallel to the pattern surface of the mask.
- 8. A mask supporting mechanism according to claim 7, further comprising supporting means for supporting the bottom surface of the mask frame at a plurality of points.
- 9. An exposure apparatus, comprising:
- a mask supporting mechanism as recited in claim 8; and
- exposure means for exposing a mask supported by said mask supporting mechanism.
- 10. A device manufacturing method for manufacturing a microdevice, said method comprising:
- providing an exposure apparatus comprising:
- (i) a mask supporting mechanism as recited in claim 12; and
- (ii) exposure means for exposing a mask supported by the mask supporting mechanism; and
- exposing the mask supported by the supporting mechanism using the exposure means.
Priority Claims (1)
Number |
Date |
Country |
Kind |
6-043903 |
Mar 1994 |
JPX |
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Parent Case Info
This application is a continuation of application Ser. No. 08/401,701, filed Mar. 10, 1995, now abandoned.
US Referenced Citations (24)
Non-Patent Literature Citations (1)
Entry |
Patent Abstracts of Japan, Kokai No. 61-264,725, vol. 11, No. 117, E-498, Apr. 1987. |
Continuations (1)
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Number |
Date |
Country |
Parent |
401701 |
Mar 1995 |
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