Claims
- 1. An apparatus for providing an ionized analyte for mass analysis by photon desorption comprising:
at least one layer for contacting an analyte; and a substrate on which said layer is deposited, wherein said analyte upon irradiation of said apparatus with a photon source desorbs and ionizes for mass analysis.
- 2. The apparatus of claim 1, further comprising one or more layers deposited on said substrate that act to absorb and convert photons to energy sufficient to desorb and ionize said analyte.
- 3. The apparatus of claim 1, wherein said substrate upon irradiation absorbs and converts photon energy to energy sufficient to desorb and ionize said analyte.
- 4. The apparatus of claim 1, wherein said substrate is selected from the group consisting of semiconductors, glasses, plastics, polymers, metals, ceramics, insulators, organic materials, inorganic materials, or any combinations thereof.
- 5. The apparatus of claim 2, wherein said one or more layers is selected form the group consisting of metals, semiconductors, insulators, ceramics, polymers, organic materials, inorganic materials, and any combinations thereof.
- 6. The apparatus of claim 4, wherein said deposited layer enhances the absorption of photons by optical impedance matching, by acting as an anti-reflective coating, by increasing the photon path length, or any combinations thereof.
- 7. The apparatus of claim 1, wherein said deposited layer contacting said analyte is selected from the group consisting of silicon, silicon dioxide, germanium, germanium oxide, indium, gallium, cadmium, selenium, tellurium, and alloys and compounds thereof, carbon, hydrogen, semiconductors, insulators, metals, ceramics, polymers, other inorganic material, organic material, or any combinations thereof.
- 8. The apparatus of claim 1, wherein said layer is deposited by physical vapor deposition, chemical vapor deposition, liquid deposition, molecular beam epitaxy, plasma assisted chemical vapor deposition, sol-gels, nebulization, spraying, electroplating, tape casting, spin coating, assembly from liquid chemical precursors, printing, self-assembly and any combinations thereof.
- 9. The apparatus of claim 2, wherein said layer is deposited by physical vapor deposition, chemical vapor deposition, liquid deposition, molecular beam epitaxy, plasma assisted chemical vapor deposition, sol-gels, nebulization, spraying, electroplating, tape casting, spin coating, assembly from liquid chemical precursors, printing, self-assembly and any combinations thereof.
- 10. The apparatus of claim 1, wherein said deposited layer is a continuous film, a discontinuous film or any combinations thereof.
- 11. The apparatus of claim 1, wherein said layer contacting said analyte is physically or chemically modified, surface functionalized, or patterned.
- 12. The apparatus of claim 11, wherein the surface of said layer is chemically modified to control acid behavior, basic behavior, hydrophobicity, hydrophylicity, and any combinations thereof.
- 13. The apparatus of claim 1, wherein the thickness of said layer is essentially uniform from 5 nm to 10 microns.
- 14. The apparatus of claim 1, wherein said layer contacting an analyte is non-textured, micro-scale textured, nano-scale textured, or any combinations thereof.
- 15. The apparatus of claim 1, wherein the analyte is in an amount greater than 1 attomole.
- 16. The apparatus of claim 1, further comprising a micro-fluidic apparatus, a nano-fluidic apparatus, or combination thereof.
- 17. The apparatus of claim 1, further comprising a mass spectrometer for analysis of the mass of said analyte.
- 18. The apparatus of claim 17, wherein said mass analysis is by time of flight mass spectrometer, quadrapole mass spectrometer, ion trap device, or any combinations thereof.
- 19. The apparatus of claim 2, wherein one or more of said deposited layers is a continuous film, a discontinuous film, or any combinations thereof.
- 20. The apparatus of claim 1, wherein one or more of said contacting layers is physically or chemically modified, surface functionalized, or patterned.
- 21. The apparatus of claim 20, wherein the surface of said layer is chemically modified to control acid behavior, basic behavior, water content, hydrophobicity or hydrophylicity, and any combinations thereof.
- 22. The apparatus of claim 2, wherein the thickness of said layer is essentially uniform from 5 nm to 10 microns.
- 23. The apparatus of claim 1, wherein said layer contacting an analyte is non-textured, micro-scale textured, nano-scale textured, or any combinations thereof.
- 24. The apparatus of claim 1, wherein the analyte is in an amount less than 1 attomole.
- 25. The apparatus of claim 1, further comprising a micro-fluidic apparatus, a nano-fluidic apparatus, or combination thereof.
- 26. The apparatus of claim 1, further comprising a device for analysis of the mass of said analyte.
- 27. The apparatus of claim 26, wherein said device is a time of flight mass spectrometer, a quadrapole mass spectrometer, an ion trap device, or any combinations thereof.
- 28. A method for providing an ionized analyte for analysis of mass comprising:
providing an apparatus comprising at least one layer for contacting an analyte wherein said layer is deposited on a substrate; contacting an amount of an analyte containing entities such as molecules whose mass or masses are to be determined with said deposited layer; and irradiating said apparatus to desorb and ionize said analyte.
- 29. The method of claim 28, wherein said analyte is substantially free of a matrix.
- 30. The method of claim 28, wherein said analyte is selected from the group comprising organic chemical compositions, inorganic chemical compositions, biochemical compositions, cells, micro-organisms, peptides, polypeptides, proteins, lipids, carbohydrates, drug candidate molecules, drug molecules, drug metabolites, combinatorial chemistry products, nucleic acids, and any combinations thereof.
- 31. The method of claim 28, wherein said apparatus further comprises on or more layers deposited on said substrate that upon irradiating said apparatus absorb and convert photon energy sufficient to desorb and ionize said analyte.
- 32. The method of claim 28, wherein said substrate upon irradiation of said apparatus absorbs and converts photons to energy sufficient to desorb and ionize said analyte.
- 33. The method of claim 28, wherein said substrate is selected from the group consisting of semiconductors, glasses, plastics, polymers, metals, ceramics, insulators, organic materials, inorganic materials, and any combinations thereof.
- 34. The method of claim 31, wherein said one or more deposited layers enhance the absorption of light by optical impedance matching, by acting as an anti-reflection coating, by increasing the photon path length, or by any combinations thereof.
- 35. The method of claim 31, wherein said one or more layers is selected form the group consisting of metals, semiconductors, insulators, ceramics, polymers, organic materials, inorganic materials, and any combinations thereof.
- 36. The method of claim 28, wherein said deposited layer contacting said analyte is selected form the group consisting of silicon, silicon dioxide, germanium, germanium oxide, indium, gallium, cadmium, selenium, tellurium, and alloys and compounds thereof, carbon, hydrogen, semiconductors, insulators, metals, ceramics, polymers, other inorganic material, organic material, or any combinations thereof.
- 37. The method of claim 28, wherein said deposited layer of said apparatus is deposited by physical vapor deposition, chemical vapor deposition, liquid deposition, molecular beam epitaxy, plasma assisted chemical vapor deposition, sol-gels, nebulization, electroplating, tape casting, spin coating, assembly from liquid chemical precursors, printing, self-assembly, and any combinations thereof.
- 38. The method of claim 31, wherein said one or more layers is deposited by physical vapor deposition, chemical vapor deposition, liquid deposition, molecular beam epitaxy, plasma assisted chemical vapor deposition, sol-gels, nebulization, electroplating, tape casting, spin coating, assembly from liquid chemical precursors, printing, self-assembly, and any combinations thereof.
- 39. The method of claim 28, wherein said deposited layer of said apparatus contacting said analyte is a continuous film, a discontinuous film, or any combinations thereof.
- 40. The method of claim 28, wherein said deposited layer of said apparatus contacting said analyte is physically or chemically modified, surface functionalized, patterned, or any combinations thereof.
- 41. The method of claim 40, wherein said layer is chemically modified to control hydrophobicity or hydropilicity.
- 42. The method of claim 40, wherein said layer is chemically modified to control the surface pH of said layer.
- 43. The method of claim 28, wherein said layer contacting said analyte is non-textured, micro-scale textured, nano-scale textured, or any combinations thereof.
- 44. The method of claim 43, wherein said layer is textured by prefabricating textured substrates, physical roughening, laser ablation, lithographic processes, textured film growth, self-assembly deposition, or any combinations thereof.
- 45. The method of claim 28, wherein said analyte is in an amount less than 1 attomole.
- 46. The method of claim 28, wherein the thickness of said layer is essentially uniform from 5 nm to 10 microns.
- 47. The method of claim 28, further comprising adding an enhancing agent to said analyte prior to irradiating said apparatus.
- 48. The method of claim 47, wherein said enhancing agent is ammonium citrate, HCl, TFA, salts, hydrated molecules, surfactants, detergents, acids, bases, and any combinations thereof.
- 49. The method of claim 28, wherein said apparatus further comprises a micro-fluidic apparatus, a nano-fluidic apparatus, or combination thereof.
- 50. The method of claim 28, further comprising analyzing the mass of said ionized analyte by a device.
- 51. The method of claim 50, wherein said analyzing the mass of said ionized analyte is by time of flight mass spectroscopy, quadrapole mass spectroscopy, ion trap device, or any combinations thereof.
- 52. A method for determining a physical property of an analyte component comprising:
providing an apparatus comprising at least one layer for contacting an analyte and a substrate on which said layer is deposited; positioning an amount of an analyte on the layer used for contacting an analyte of said apparatus; irradiating said apparatus having said contacted analyte; desorbing and ionizing at least one component of said analyte; and analylzing said ionized at least one analyte component for a physical property.
- 53. The method of claim 52, wherein said physical property of said at least one analyte component is the mass to charge ratio (m/z) of the ionized analyte.
- 54. The method of claim 53, wherein said physical property is analyzed by mass spectrometry.
- 55. The method of claim 54, wherein said mass spectroscopy is time of flight, quadrapole, ion trap, or any combinations thereof.
- 56. The method of claim 52, wherein said analyte is substantially free of photon-absorbing matrix.
- 57. The method of claim 52, wherein said analyte is selected from the group consisting of organic chemical compositions, inorganic chemical compositions, biochemical compositions, cells, micro-organisms, peptides, polypeptides, proteins, lipids, carbohydrates, drug candidate molecules, drug molecules, drug metabolites, combinatorial chemistry products, nucleic acids, and any combinations thereof.
- 58. The method of claim 52, wherein said apparatus further comprises one or more layers deposited on said substrate that upon irradiating said apparatus absorb and convert photons to energy sufficient to desorb and ionize said analyte.
- 59. The method of claim 58, wherein said one or more layers is selected from the group consisting of metals, semiconductors, insulators, ceramics, polymers, organic materials, inorganic materials, and any combinations thereof.
- 60. The method of claim 58, wherein said one or more deposited layers enhances the absorption of light by photons impedance matching, by acting as an anti-reflection coating, by increasing the optical path length, or by any combinations thereof.
- 61. The method of claim 52, wherein said substrate upon irradiation of said apparatus absorbs and converts photons to energy sufficient to desorb and ionize said analyte.
- 62. The method of claim 52, wherein said substrate is selected from the group consisting of semiconductors, glasses, plastics, polymers, metals, ceramics, insulators, organic materials, inorganic materials, and any combinations thereof.
- 63. The method of claim 52, wherein said deposited layer contacting said analyte is selected form the group consisting of silicon, silicon dioxide, germanium, germanium oxide, indium, gallium, cadmium, selenium, tellurium and alloys and compounds thereof, carbon, hydrogen, semiconductors, insulators, ceramics, metals, polymers, other inorganic material, organic material, and any combinations thereof.
- 64. The method of claim 52, wherein said layer is deposited by physical vapor deposition, chemical vapor deposition, liquid deposition, molecular beam epitaxy, plasma assisted chemical vapor deposition, sol-gels, nebulization, electroplating, tape casting, spin coating, assembly from liquid chemical precursors, printing, self-assembly, and any combinations thereof.
- 65. The method of claim 58, wherein said layer is deposited by physical vapor deposition, chemical vapor deposition, liquid deposition, molecular beam epitaxy, plasma assisted chemical vapor deposition, sol-gels, nebulization, electroplating, tape casting, spin coating, assembly from liquid chemical precursors, printing, self-assembly, and any combinations thereof.
- 66. The method of claim 52, wherein said deposited layer of said apparatus contacting said analyte is a continuous film, a discontinuous film, or any combinations thereof.
- 67. The method of claim 52, wherein said deposited layer of said apparatus contacting said analyte is physically or chemically modified, surface functionalized, patterned, or any combinations thereof.
- 68. The method of claim 67, wherein said layer is chemically modified to control hydrophobicity or hydrophilicity.
- 69. The method of claim 67, wherein said layer is chemically modified to control the surface pH of said layer.
- 70. The method of claim 52, wherein said layer contacting said analyte is non-textured, micro-scale textured, nano-scale textured, or any combinations thereof.
- 71. The method of claim 70, wherein said layer is textured by prefabricating textured substrates, physical roughening, laser ablation, lithographic processes, textured film growth, or any combinations thereof.
- 72. The method of claim 52, wherein said analyte is in an amount greater than 1 attomole.
- 73. The method of claim 52, wherein the thickness of said deposited layer is essentially uniform.
- 74. The method of claim 73, wherein said thickness of said deposited layer is from 5 nm to 10 microns.
- 75. The method of claim 52, further comprising adding an [ionizing] enhancing agent to said analyte prior to irradiating said apparatus.
- 76. The method of claim 75, wherein said enhancing agent is ammonium citrate, HCl, TFA, salts, hydrated molecules, surfactants, chelating agents, detergents, acids, bases, and any combinations thereof.
- 77. The method of claim 52, wherein said apparatus further comprises a micro-fluidic apparatus, a nano-fluidic apparatus, or combinations thereof.
- 78. The method of claim 52, further comprising analyzing the masses of said one or more components of said ionized analyte by a device.
- 79. The method of claim 78, wherein analyzing the mass is by time of flight mass spectroscopy, quadrapole mass spectroscopy, ion trap device, or any combinations thereof.
- 80. An apparatus for determining the masses of one or more components of an analyte comprising a substrate, an analyte contacting the substrate, a source of radiation irradiating the substrate wherein illumination of the substrate causes the desorption and ionization of the analyte, a source of positive or negative voltage connected to the substrate that controls and directs the ionized analyte, and a spectrometer that analyzes the mass to charge ratio (m/z) of the ionized analyte components wherein the improvement comprises:
a substrate that is an apparatus comprising at least one layer for contacting an analyte deposited on a substrate material wherein said apparatus has optical properties to absorb and convert photons to energy sufficient to desorb and ionize said analyte.
- 81. An apparatus according to claim 80, wherein the analyte is substantially free of photon absorbing matrix.
- 82. An apparatus according to claim 80, wherein one or more of said layers of said apparatus is a continuous film, a discontinuous film, or any combinations thereof.
- 83. A method of improving the detection of an analyte by laser desorption mass spectrometry comprising the steps of:
providing a substrate having a fluorinated coated sample loading region; providing an analyte dissolved in a first liquid as a sample; and contacting the coated sample loading region with the sample wherein the sample does not spread on the coated sample loading regions to form a sample loaded substrate.
- 84. A device of claim 1 where the deposited layer is a composite material comprising an organic material and a photon adsorbing micro or nanoparticle.
- 85. A device of claim 84 where the organic material is polymer.
- 86. A device of claim 85 where the polymer is a halogenated material.
- 87. A device of claim 86 where the polymer is an acid.
- 88. A device of claim 85 wherein the polymer is a fluorinated/sulfur containing material.
- 89. A device of claim 84 where the photon adsorbing micro or nanoparticle is a semiconductor.
- 90. A device of claim 84 where the photon adsorbing micro or nanoparticle is a metal, organic, insulator or inorganic material.
- 91. A device of claim 84 where the photon adsorbing micro or nanoparticle is carbon.
Parent Case Info
[0001] This application claims priority from U.S. Provisional Application No. 60/290,876, filed May 14, 2001, and is a continuation in part application of U.S. application Ser. No. 09/580,105, filed May 30, 2000. This application also claims priority from U.S. patent application Ser. No. 10/104,749, filed Mar. 22, 2002, which is a continuation of U.S. patent application Ser. No. 09/580,105, filed May 30, 2000. Priority is also claimed from U.S. application Ser. No. 09/836,449, filed Apr. 17, 2001, which is a continuation in part of U.S. patent application Ser. No. 09/739,940, filed Dec. 19, 2000, which is a continuation in part of U.S. patent application Ser. No. 09/580,105, filed May 30, 2000.
Provisional Applications (1)
|
Number |
Date |
Country |
|
60290876 |
May 2001 |
US |
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
09580105 |
May 2000 |
US |
Child |
10144456 |
May 2002 |
US |