Metallic material for electronic components, and connector terminals, connectors and electronic components using same

TECHNICAL FIELD

The present invention relates to a metallic material for electronic components, and connector terminals, connectors and electronic components using the same.

BACKGROUND ART

In connectors as connecting components for electronic devices for consumer use and for vehicle use, materials are used in which base plating of Ni or Cu is applied to the surface of brass or phosphor bronze materials and Sn or Sn alloy plating is further applied to the base plating. Sn or Sn alloy plating is generally required to have properties such as low contact resistance and high solder wettability, and further, recently the reduction of the insertion force has also been required at the time of joining together a male terminal and a female terminal molded by press processing of plating materials. In the production process, on the plating surface, there occur sometimes whiskers, which are needle crystals, causing problems such as short circuiting, and hence such whiskers are also required to be suppressed satisfactorily.

In this regard, Patent Literature 1 discloses an electrical contact material including a contact base material, a ground layer composed of Ni or Co, or an alloy of both of Ni and Co and formed on the surface of the contact base material, and an Ag—Sn alloy layer formed on the surface of the ground layer, wherein the average concentration of Sn in the Ag—Sn alloy layer is less than 10 mass %, and the concentration of Sn in the Ag—Sn alloy layer is varied with a concentration gradient so as to increase from the interface with the ground layer toward the surface layer portion of the Ag—Sn alloy layer. According to Patent Literature 1, an electrical contact material excellent in wear resistance, corrosion resistance and processability is described, and the electrical contact material is described to be able to be produced with an extremely low cost.

Patent Literature 2 discloses a material for electric/electronic components wherein on the surface of a substrate having a surface composed of Cu or a Cu alloy, through the intermediary of an intermediate layer composed of a Ni layer or a Ni alloy layer, a surface layer composed of a Sn layer or a Sn alloy layer is formed, each of these layers containing an Ag₃Sn (ε phase) compound and having a thickness of 0.5 to 20 μm. As described in Patent Literature 2, an object of the invention described in Patent Literature 2 is to provide a material for electrical/electronic components, wherein the surface layer is lower in melting point than Sn, excellent in solderability, and free from the occurrence of whisker; the joint strength of the junction formed after soldering is high and at the same time the temporal degradation of the joint strength at high temperatures is hardly caused, and hence the material is suitable for a lead material; even when the material is used in a high-temperature environment, the increase of the contact resistance is suppressed, the material does not cause the degradation of the connection reliability with the counterpart member, and hence the material is suitable as a contact material, the object also including the provision of a method for producing the above-described material, and the provision of electrical/electronic components using the above-described material.

CITATION LIST
Patent Literature

Patent Literature 1—Japanese Patent Laid-Open No. Hei 4-370613

Patent Literature 2—Japanese Patent Laid-Open No. Hei 11-350189

SUMMARY OF INVENTION
Technical Problem

However, the technique described in Patent Literature 1 has not revealed the relation to the recently required reduction of the insertion force and the relation to the occurrence and nonoccurrence of the whiskers. The average concentration of Sn in the Ag—Sn alloy layer is less than 10 mass %, and the proportion of Ag in the Ag—Sn alloy layer is considerably large, and hence the gas corrosion resistance against the gases such as chlorine gas, sulfurous acid gas and hydrogen sulfide is not sufficient.

The technique described in Patent Literature 2 adopts a surface layer composed of a Sn layer or a Sn alloy layer, each of these layers containing a Ag₃Sn (ε phase) compound and having a thickness of 0.5 to 20 μm, and this thickness cannot sufficiently reduce the insertion force as it is also the case in Patent Literature 1. Moreover, the content of Ag₃Sn (ε phase) in the surface layer composed of a Sn layer or a Sn alloy layer is described to be 0.5 to 5 mass % in terms of the content of Ag, the proportion of Sn in the surface layer composed of a Sn layer or a Sn alloy layer is large, the thickness of the surface layer composed of a Sn layer or a Sn alloy layer is thick, and hence a problem of the occurrence of whiskers remains unsolved.

As described above, the metallic materials for electronic components having a conventional Sn—Ag alloy/Ni base plating structure suffer from problems involving insertion/extraction performance and whiskers, find difficulties in achieving sufficiently satisfactory specifications with respect to durability (including, for example, heat resistance, gas corrosion resistance, high solder wettability and fine sliding wear resistance), and the reasons for such difficulties have not yet been clarified.

The present invention has been achieved in order to solve the above-described problems, and an object of the present invention is the provision of a metallic material for electronic components, having a low degree of insertion/extraction force (the low degree of insertion/extraction force means the low insertion force generated at the time of joining together an male terminal and a female terminal), a low degree of whisker formation, and a high durability, and the provision of connector terminals, connectors and electronic components using the material.

SOLUTION TO PROBLEM

The present inventors made a diligent study, and consequently have discovered that a metallic material for electronic components, provided with all of a low degree of insertion/extraction force, a low degree of whisker formation and a high durability can be prepared by disposing a lower layer and an upper layer in this order on a base material, and by using a predetermined metal for each of the lower and upper layers to form a layer having a predetermined thickness or a predetermined deposition amount and a predetermined composition.

The present invention perfected on the basis of the above-described findings is, in an aspect thereof, a metallic material for electronic components excellent in low degree of whisker formation, low degree of insertion/extraction force, fine sliding wear resistance and gas corrosion resistance, including a base material; on the base material, a lower layer constituted with one or two or more selected from the group consisting of Ni, Cr, Mn, Fe, Co and Cu; and on the lower layer, an upper layer constituted with an alloy of one or both of Sn and In (constituent elements A) and one or two or more selected from Ag, Au, Pt, Pd, Ru, Rh, Os and Ir (constituent elements B), wherein the thickness of the lower layer is 0.05 μm or more; the thickness of the upper layer is 0.005 μm or more and 0.6 μm or less; and in the upper layer, the relation between the constituent element(s) A/(the constituent element(s) A+the constituent element(s) B) [mass %] (hereinafter, referred to as the proportion of Sn+In) and the plating thickness [μm] is given by

plating thickness≦8.2×(proportion of Sn+In)^−0.66[here, (proportion of Sn+In)≧10 mass %].

In the present invention, the proportion of Sn+In [mass %] excludes 0 and 100 mass %.

The metallic material for electronic components of the present invention is, in another aspect thereof, a metallic material for electronic components excellent in low degree of whisker formation, low degree of insertion/extraction force, fine sliding wear resistance and gas corrosion resistance, including a base material; on the base material, a lower layer constituted with one or two or more selected from the group consisting of Ni, Cr, Mn, Fe, Co and Cu; and on the lower layer, an upper layer constituted with an alloy of one or both of Sn and In (constituent elements A) and one or two or more selected from Ag, Au, Pt, Pd, Ru, Rh, Os and Ir (constituent elements B), wherein the plating deposition amount of the lower layer is 0.03 mg/cm²or more; the plating deposition amount of the upper layer is 7 μg/cm²or more and 600 μg/cm²or less; and in the upper layer, the relation between the constituent element(s) A/(the constituent element(s) A+the constituent element(s) B) [mass %] (hereinafter, referred to as the proportion of Sn+In) and the plating deposition amount [μg/cm²] is given by

plating deposition amount≦8200×(proportion of Sn+In)^−0.66[here, (proportion of Sn+In)≧10 mass %].

In the metallic material for electronic components of the present invention, in one embodiment thereof, the plating thickness of the upper layer is 0.05 μm or more.

In the metallic material for electronic components of the present invention, in another embodiment thereof, the plating deposition amount of the upper layer is 40 μg/cm²or more.

In the metallic material for electronic components of the present invention, in yet another embodiment thereof, the relation between the proportion of Sn+In [mass %] and the plating thickness [μm] of the upper layer is given by

plating thickness≧0.03×e^{0.015×(proportion of Sn+In)}.

In the metallic material for electronic components of the present invention, in yet another embodiment thereof, the relation between the proportion of Sn+In [mass %] and the plating deposition amount [μg/cm²] of the upper layer is given by

plating deposition amount≧27.8×e^{0.017×(proportion of Sn+In)}.

In the metallic material for electronic components of the present invention, in yet another embodiment thereof, the upper layer is formed by the diffusion of the constituent element(s) A and the constituent element(s) B under the conditions that a film of the constituent element(s) B is formed on the lower layer and then a film of the constituent element(s) A is formed on the lower layer.

In the metallic material for electronic components of the present invention, in yet another embodiment thereof, the diffusion is performed by heat treatment.

In the metallic material for electronic components of the present invention, in yet another embodiment thereof, the constituent elements A in the upper layer is 50 mass % or more in terms of the total content of Sn and In, and the upper layer further includes one or two or more metals selected from the group consisting of As, Bi, Cd, Co, Cr, Cu, Fe, Mn, Mo, Ni, Pb, Sb, W and Zn, as the alloy components.

In the metallic material for electronic components of the present invention, in yet another embodiment thereof, the constituent elements B in the upper layer is 50 mass % or more in terms of the total content of Ag, Au, Pt, Pd, Ru, Rh, Os and Ir, and the upper layer further includes one or two or more metals selected from the group consisting of Bi, Cd, Co, Cu, Fe, In, Mn, Mo, Ni, Pb, Sb, Se, Sn, W, TI and Zn, as the alloy components.

In the metallic material for electronic components of the present invention, in yet another embodiment thereof, the alloy composition of the lower layer includes Ni, Cr, Mn, Fe, Co and Cu in the total amount of these of 50 mass % or more, and further includes one or two or more selected from the group consisting of B, P, Sn and Zn.

In the metallic material for electronic components of the present invention, in yet another embodiment thereof, the Vickers hardness measured from the surface of the upper layer is Hv 100 or more.

In the metallic material for electronic components of the present invention, in yet another embodiment thereof, the indentation hardness measured from the surface of the upper layer is 1000 MPa or more.

In the metallic material for electronic components of the present invention, in yet another embodiment thereof, the Vickers hardness measured from the surface of the upper layer is Hv 1000 or less.

In the metallic material for electronic components of the present invention, in yet another embodiment thereof, the arithmetic mean height (Ra) of the surface of the upper layer is 0.1 μm or less.

In the metallic material for electronic components of the present invention, in yet another embodiment thereof, the maximum height (Rz) of the surface of the upper layer is 1 μm or less.

In the metallic material for electronic components of the present invention, in yet another embodiment thereof, the reflection density of the surface of the upper layer is 0.3 or more.

In the metallic material for electronic components of the present invention, in yet another embodiment thereof, on the basis of a depth analysis performed by XPS (X-ray photoelectron spectroscopy), the position (D₁) indicating the highest value of the atomic concentration (at %) of Sn or In of the constituent elements A of the upper layer, the position (D₂) indicating the highest value of the concentration (at %) of Ag, Au, Pt, Pd, Ru, Rh, Os or Ir of the constituent elements B of the upper layer, and the position (D₃) indicating the highest value of the atomic concentration (at %) of Ni, Cr, Mn, Fe, Co or Cu of the lower layer are located in the order of D₁, D₂and D₃from the outermost surface.

In the metallic material for electronic components of the present invention, in yet another embodiment thereof, on the basis of a depth analysis performed by XPS (X-ray photoelectron spectroscopy), the depth is 50 nm or more at which the highest value of the atomic concentration (at %) of Sn or In of the constituent elements A of the upper layer and the highest value of the concentration (at %) of Ag, Au, Pt, Pd, Ru, Rh, Os or Ir of the constituent elements B of the upper layer are each 10 at % or more, and the atomic concentration (at %) of Ni, Cr, Mn, Fe, Co or Cu of the lower layer is 25 at % or more.

In the metallic material for electronic components of the present invention, in yet another embodiment thereof, the Vickers hardness of the cross section of the lower layer is Hv 300 or more.

In the metallic material for electronic components of the present invention, in yet another embodiment thereof, the indentation hardness of the cross section of the lower layer is 2500 MPa or more.

In the metallic material for electronic components of the present invention, in yet another embodiment thereof, the Vickers hardness of the cross section of the lower layer is Hv 1000 or less.

In the metallic material for electronic components of the present invention, in yet another embodiment thereof, the indentation hardness of the surface of the lower layer is 10000 MPa or less.

The present invention is, in yet another aspect thereof, a connector terminal using, in the contact portion thereof, the metallic material for electronic components of the present invention.

The present invention is, in yet another aspect thereof, a connector using the connector terminal of the present invention.

The present invention is, in yet another aspect thereof, an FFC terminal using, in the contact portion thereof, the metallic material for electronic components of the present invention.

The present invention is, in yet another aspect thereof, an FPC terminal using, in the contact portion thereof, the metallic material for electronic components of the present invention.

The present invention is, in yet another aspect thereof, an FFC using the FFC terminal of the present invention.

The present invention is, in yet another aspect thereof, an FPC using the FPC terminal of the present invention.

The present invention is, in yet another aspect thereof, an electronic component using, in the electrode thereof for external connection, the metallic material for electronic components of the present invention.

The present invention is, in yet another aspect thereof, an electronic component using the metallic material for electronic components of the present invention, in a push-in type terminal thereof for fixing a board connection portion to a board by pushing the board connection portion into the through hole formed in the board, wherein a female terminal connection portion and the board connection portion are provided respectively on one side and the other side of a mounting portion to be attached to a housing.

Advantageous Effects of Invention

According to the present invention, it is possible to provide a metallic material for electronic components having a low degree of insertion/extraction force, a low degree of whisker formation and a high durability, and connector terminals, connectors and electronic components using the metallic material.

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1 is a schematic view illustrating the structure of the metallic material for electronic components according to one embodiment of the present invention.

FIG. 2 shows the results of the depth measurement by XPS (X-ray photoelectron spectroscopy) according to Example 17.

DESCRIPTION OF EMBODIMENTS

Hereinafter, the metallic materials for electronic components according to the embodiments of the present invention are described. As shown in FIG. 1, the metallic material 10 for electronic components according to an embodiment includes a base material 11, an lower layer 12 formed on the surface of the base material 11, and an upper layer 13 formed on the lower layer 12.

Structure of Metallic Material for Electronic Components

Base Material

Usable examples of the base material 11 include, without being particularly limited to: metal base materials such as copper and copper alloys, Fe-based materials, stainless steel, titanium and titanium alloys and aluminum and aluminum alloys. The base material 11 may be formed by combining a metal base material with a resin layer. Examples of the base material formed by combining a metal base material with a resin layer include the electrode portions in FPC and FFC base materials.

Upper Layer

The upper layer 13 is required to be constituted with an alloy composed of one or both of Sn and In (constituent elements A) and one or two or more of Ag, Au, Pt, Pd, Ru, Rh, Os and Ir (constituent elements B).

Sn and In are oxidizable metals, but are characterized by being relatively soft among metals. Accordingly, even when an oxide film is formed on the surface of Sn or In, for example at the time of joining together a male terminal and a female terminal by using a metallic material for electronic components as a contact material, the oxide film is easily scraped to result in contact between metals, and hence a low contact resistance is obtained.

Sn and In are excellent in the gas corrosion resistance against the gases such as chlorine gas, sulfurous acid gas and hydrogen sulfide gas; for example, when Ag poor in gas corrosion resistance is used for the upper layer 13, Ni poor in gas corrosion resistance is used for the lower layer 12, and copper or a copper alloy poor in gas corrosion resistance is used for the base material 11, Sn and In have an effect to improve the gas corrosion resistance of the metallic material for electronic components. As for Sn and in, Sn is preferable because In is severely regulated on the basis of the technical guidelines for the prevention of health impairment prescribed by the Ordinance of Ministry of Health, Labour and Welfare.

Ag, Au, Pt, Pd, Ru, Rh, Os and Ir are characterized by being relatively heat-resistant among metals. Accordingly, these metals suppress the diffusion of the composition of the base material 11 or the lower layer 12 toward the side of the upper layer 13 to improve the heat resistance. These metals also form compounds with Sn or In in the upper layer 13 to suppress the formation of the oxide film of Sn or In, so as to improve the solder wettability. Among Ag, Au, Pt, Pd, Ru, Rh, Os and Ir, Ag is more desirable from the viewpoint of electrical conductivity. Ag is high in electrical conductivity. For example, when Ag is used for high-frequency wave signals, impedance resistance is made low due to the skin effect.

The thickness of the upper layer 13 is required to be 0.005 μm or more and 0.6 μm or less. When the thickness of the upper layer 13 is less than 0.005 μm, the gas corrosion resistance is poor, and the exterior appearance of the upper layer 13 is discolored when a gas corrosion test is performed. Additionally, the fine sliding wear resistance is also poor, and the contact resistance is increased. On the other hand, when the thickness of the upper layer 13 exceeds 0.6 μm, the adhesive wear of Sn or In is significant, and the thin film lubrication effect due to the hard base material 11 or the lower layer is degraded to increase the insertion/extraction force and to cause whiskers to occur.

The deposition amount of the upper layer 13 is required to be 7 μg/cm²or more and 600 μg/cm²or less. Here, the reason for defining in terms of the deposition amount is described. For example, when the thickness of the upper layer 13 is measured with an X-ray fluorescent analysis thickness meter, sometimes errors occur in the value of the measured thickness, due to the alloy layer formed between the upper layer 13 and the lower layer 12. On the other hand, when the thickness is controlled by the deposition amount, a more accurate quality control can be performed independently of the formation state of the alloy layer.

When the deposition amount of the upper layer 13 is less than 7 μg/cm², the gas corrosion resistance is poor, and when a gas corrosion test is performed, the exterior appearance of the upper layer 13 is discolored. The fine sliding wear resistance is also poor to increase the contact resistance. On the other hand, when the deposition amount of the upper layer 13 exceeds 600 μg/cm², the adhesive wear of Sn or In is significant, and the thin film lubrication effect due to the hard base material 11 or the lower layer is degraded to increase the insertion/extraction force and to cause whiskers to occur.

In the upper layer, the relation between the constituent element(s) A/(the constituent element(s) A+the constituent element(s) B) [mass %] (hereinafter, referred to as the proportion of Sn+In) and the plating thickness [μm] is required to be given by

plating thickness≦8.2×(proportion of Sn+In)^−0.66[here, (proportion of Sn+In)≧10 mass %].

When the plating thickness does not fall within this range, the insertion force is high to degrade the insertion/extraction performance, whiskers are caused to occur, the fine sliding wear resistance is also degraded and the gas corrosion resistance is also poor.

In the upper layer, the relation between the constituent element(s) A/(the constituent element(s) A+the constituent element(s) B) [mass %] (hereinafter, referred to as the proportion of Sn+In) and the plating deposition amount [μg/cm²] is required to be given by

plating deposition amount≦8200×(proportion of Sn+In)^−0.66[here, (proportion of Sn+In)≧10 mass %].

When the plating deposition amount does not fall within this range, the insertion force is high to degrade the insertion/extraction performance, whiskers are caused to occur, the humidity resistance is also poor and the fine sliding wear resistance is also degraded.

The thickness of the upper layer 13 is preferably 0.05 μm or more. When the thickness of the upper layer 13 is less than 0.05 μm, sometimes the insertion/extraction resistance is poor, and repeated insertion/extraction operations sometimes scrape the upper layer to increase the contact resistance.

The deposition amount of the upper layer 13 is preferably 40 μg/cm²or more. When the deposition amount of the upper layer 13 is less than 40 μg/cm², sometimes the insertion/extraction resistance is poor, and repeated insertion/extraction operations sometimes scrape the upper layer to increase the contact resistance.

In the upper layer 13, the relation between the proportion of Sn+In [mass %] and the plating thickness [μm] is preferably given by

plating thickness≧0.03×e^{0.015×(proportion of Sn+In)}.

When the plating thickness does not fall within this range, sometimes the heat resistance and the solder wettability are poor.

In the upper layer 13, the relation between the proportion of Sn+In [mass %] and the plating deposition amount [μg/cm²] is preferably given by

plating deposition amount≧27.8×e^{0.017×(proportion of Sn+In)}.

When the plating deposition amount does not fall within this range, sometimes the heat resistance and the solder wettability are poor.

In the upper layer 13, the amount of the constituent elements A may be 50 mass % or more in terms of the total amount of Sn and In, and the residual alloy component may be composed of one or two or more metals selected from the group consisting of Ag, As, Au, Bi, Cd, Co, Cr, Cu, Fe, Mn, Mo, Ni, Pb, Sb, W and Zn. These metals sometimes further improve the low degree of insertion/extraction force, the low degree of whisker formation and the durability (including, for example, the heat resistance, gas corrosion resistance and solder wettability).

In the upper layer 13, the amount of the constituent elements B may be 50 mass % or more in terms of the total amount of Ag, Au, Pt, Pd, Ru, Rh, Os and Ir, and the residual alloy component may be composed of one or two or more metals selected from the group consisting of Bi, Cd, Co, Cu, Fe, In, Mn, Mo, Ni, Pb, Sb, Se, Sn, W, Tl and Zn. These metals sometimes further improve the low degree of insertion/extraction force, the low degree of whisker formation and the durability (including, for example, the heat resistance, gas corrosion resistance and solder wettability).

Lower Layer

Between the base material 11 and the upper layer 13, the lower layer 12 constituted with one or two or more selected from the group consisting of Ni, Cr, Mn, Fe, Co and Cu is required to be formed. The formation of the lower layer 12 by using one or two or more metals selected from the group consisting of Ni, Cr, Mn, Fe, Co and Cu improves the thin film lubrication effect through the formation of the hard lower layer and hence improves the low degree of insertion/extraction force, and the lower layer 12 prevents the diffusion of the constituent metals of the base material 11 into the upper layer 13, to improve the durability, for example, in such a way that the increase of the contact resistance and the degradation of the solder wettability after the heat resistance test or the gas corrosion resistance test are suppressed.

The thickness of the lower layer 12 is required to be 0.05 μm or more. When the thickness of the lower layer 12 is less than 0.05 μm, the thin film lubrication effect due to the hard lower layer is degraded to degrade the low degree of insertion/extraction force, the constituent metals of the base material 11 tend to diffuse into the upper layer 13, and sometimes the durability is degraded in such a way that the contact resistance is increased and the solder wettability tends to be degraded after the heat resistance test or the gas corrosion resistance test.

The deposition amount of Ni, Cr, Mn, Fe, Co and Cu in the lower layer 12 is required to be 0.03 mg/cm²or more. Here, the reason for defining in terms of the deposition amount is described. For example, when the thickness of the lower layer 12 is measured with an X-ray fluorescent analysis thickness meter, sometimes errors occur in the value of the measured thickness, due to the upper layer 13, the base material 11 and kike, and the formed alloy layer. On the other hand, when the thickness is controlled by the deposition amount, a more accurate quality control can be performed independently of the formation state of the alloy layer. When the deposition amount of Ni, Cr, Mn, Fe, Co and Cu in the lower layer 12 is less than 0.03 mg/cm², the thin film lubrication effect due to the hard lower layer is degraded to degrade the low degree of insertion/extraction force, the constituent metals of the base material 11 tend to diffuse into the upper layer 13, and sometimes the durability is degraded in such a way that the contact resistance is increased and the solder wettability tends to be degraded after the heat resistance test or the gas corrosion resistance test.

The alloy composition of the lower layer 12 includes Ni, Cr, Mn, Fe, Co and Cu in the total amount of these of 50 mass % or more, and may further include one or two or more selected from the group consisting of B, P, Sn and Zn. The alloy composition of the lower layer 12 having such a constitution as described above makes the lower layer harder and further improves the thin film lubrication effect to improve the low degree of insertion/extraction force; the alloying of the lower layer 12 further prevents the diffusion of the constituent metals of the base material 11 into the upper layer, and improves the durability in such a way that the increase of the contact resistance and the degradation of the solder wettability after the heat resistance test or the gas corrosion resistance test are suppressed.

Diffusion Treatment

The upper layer 13 may also be formed by the diffusion of the constituent element(s) A and the constituent element(s) B under the conditions that a film of the constituent element(s) B is formed on the lower layer 12 and then a film of the constituent element(s) A is formed on the lower layer. For example, when the constituent element A is Sn and the constituent element B is Ag, the diffusion of Ag into Sn, and thus, a Sn—Ag alloy layer is formed by spontaneous diffusion. The alloy layer formation makes the adhesion force of Sn further smaller to result in the low degree of insertion/extraction force, and also allows the low degree of whisker formation and the durability to be further improved.

Heat Treatment

After the formation of the upper layer 13, a heat treatment may be applied for the purpose of improving the low degree of insertion/extraction force, low degree of whisker formation, durability (including, for example, heat resistance, gas corrosion resistance and solder wettability). The heat treatment allows the constituent element(s) A and the constituent element(s) B of the upper layer 13 to form the alloy layer further easily, further reduces the adhesion force of Sn to result in low degree of insertion/extraction force, and can further improve the low degree of whisker formation and the durability. For the heat treatment, the treatment conditions (temperature×time) can be appropriately selected. The heat treatment is not particularly required to be applied.

Post-Treatment

To the upper layer 13, or to the upper layer 13 after being subjected to heat treatment, a post-treatment may be applied for the purpose of improving the low degree of insertion/extraction force or the durability (including, for example, heat resistance, gas corrosion resistance and solder wettability). The post-treatment improves the lubricity to result in further lower insertion/extraction force, and suppresses the oxidation of the upper layer 13 so as to be able to improve the durability including, for example, heat resistance, gas corrosion resistance and solder wettability. Specific examples of the post-treatment include phosphoric acid salt treatment, lubrication treatment and silane coupling treatment using an inhibitor. For the post-treatment, the treatment conditions (temperature×time) can be appropriately selected. The post-treatment is not particularly required to be applied.

Properties of Metallic Material for Electronic Components

The Vickers hardness measured from the surface of the upper layer 13 is preferably Hv 100 or more. The Vickers hardness of the surface of the upper layer 13 being Hv 100 or more improves the thin film lubrication effect through the hard upper layer, and consequently improves the low degree of insertion/extraction force. On the other hand, the Vickers hardness of the surface of the upper layer 13 surface (the value measured from the surface of the upper layer) is preferably Hv 1000 or less. The Vickers hardness of the surface of the upper layer 13 being Hv 1000 or less improves the bending processability, makes cracks hardly occur in the molded portion when the metallic material for electronic components of the present invention is subjected to press molding, and consequently suppresses the degradation of the gas corrosion resistance (durability).

The indentation hardness of the surface of the upper layer 13 is preferably 1000 MPa or more. The indentation hardness of the surface of the upper layer 13 being 1000 MPa or more improves the thin film lubrication effect through the hard upper layer, and consequently improves the low degree of insertion/extraction force. On the other hand the indentation hardness of the surface of the upper layer 13 is preferably 10000 MPa or less. The indentation ¥hardness of the surface of the upper layer 13 being 10000 MPa or less improves the bending processability, makes cracks hardly occur in the molded portion when the metallic material for electronic components of the present invention is subjected to press molding, and consequently suppresses the degradation of the gas corrosion resistance (durability).

The arithmetic mean height (Ra) of the surface of the upper layer 13 is preferably 0.1 μm or less. The arithmetic mean height (Ra) of the surface of the upper layer 13 being 0.1 μm or less reduces the raised portions of the surface relatively tending to be corroded, thus smoothes the surface and improves the gas corrosion resistance.

The maximum height (Rz) of the surface of the upper layer 13 is preferably 1 μm or less. The maximum height (Rz) of the surface of the upper layer 13 being 1 μm or less reduces the raised portions relatively tending to be corroded, thus smoothes the surface and improves the gas corrosion resistance.

The reflection density of the surface of the upper layer 13 is preferably 0.3 or more. The reflection density of the surface of the upper layer 13 being 0.3 or more reduces the raised portions relatively tending to be corroded, thus smoothes the surface and improves the gas corrosion resistance.

The Vickers hardness of the lower layer 12 is preferably Hv 300 or more. The Vickers hardness of the lower layer 12 being Hv 300 or more makes the lower layer harder and further improves the thin film lubrication effect to improve the low degree of insertion/extraction force. On the other hand, the Vickers hardness of the lower layer 12 is preferably Hv 1000 or less. The Vickers hardness of the lower layer 12 being Hv 1000 or less improves the bending processability, makes cracks hardly occur in the molded portion when the metallic material for electronic components of the present invention is subjected to press molding, and consequently suppresses the degradation of the gas corrosion resistance (durability).

The indentation hardness of the lower layer 12 is preferably 2500 MPa or more. The indentation hardness of the lower layer 12 being 2500 MPa or more makes the lower layer harder and further improves the thin film lubrication effect to improve the low degree of insertion/extraction force. On the other hand, the indentation hardness of the lower layer 12 is preferably 10000 MPa or less. The indentation hardness of the lower layer 12 being 10000 MPa or less improves the bending processability, makes cracks hardly occur in the molded portion when the metallic material for electronic components of the present invention is subjected to press molding, and consequently suppresses the degradation of the gas corrosion resistance (durability).

On the basis of a depth analysis performed by XPS (X-ray photoelectron spectroscopy), the position (D₁) indicating the highest value of the atomic concentration (at %) of Sn or In of the constituent elements A of the upper layer 13, the position (D₂) indicating the highest value of the concentration (at %) of Ag, Au, Pt, Pd, Ru, Rh, Os or Ir of the constituent elements B of the upper layer 13, and the position (D₃) indicating the highest value of the atomic concentration (at %) of Ni, Cr, Mn, Fe, Co or Cu of the lower layer 12 are preferably located in the order of D₁, D₂and D₃from the outermost surface. When D₁, D₂and D₃are not located in this order, no sufficient gas corrosion resistance is obtained, and consequently when the metallic material for electronic components is subjected to a gas corrosion test with a gas such as chlorine gas, sulfurous acid gas and hydrogen sulfide gas, the metallic material for electronic components is corroded, and the contact resistance may be significantly increased as compared to the contact resistance before the gas corrosion test.

On the basis of a depth analysis performed by XPS (X-ray photoelectron spectroscopy), the depth is preferably 50 nm or more at which the highest value of the atomic concentration (at %) of Sn or In of the constituent elements A of the upper layer 13 and the highest value of the concentration (at %) of Ag, Au, Pt, Pd, Ru, Rh, Os or Ir of the constituent elements B of the upper layer 13 are each 10 at % or more, and the atomic concentration (at %) of Ni, Cr, Mn, Fe, Co or Cu of the lower layer 12 is 25 at % or more. When the depth is less than 50 nm at which the highest value of the atomic concentration (at %) of Sn or In of the constituent elements A of the upper layer 13 and the highest value of the atomic concentration (at %) of Ag, Au, Pt, Pd, Ru, Rh, Os or Ir of the constituent elements B of the upper layer 13 are each less than 10 at %, and the atomic concentration (at %) of Ni, Cr, Mn, Fe, Co or Cu of the lower layer 12 is 25 at % or more, the low degree of insertion/extraction force or the durability (including, for example, heat resistance, gas corrosion resistance and solder wettability) may be degraded by the diffusion of the components of the base material into the upper layer 13.

On the basis of a depth analysis performed by XPS (X-ray photoelectron spectroscopy), in the range of 0.02 μm from the outermost surface, the atomic concentration (at %) ratio, the constituent elements A/(the constituent elements A+the constituent elements B) is preferably 0.1 or more. In the case where the above-described ratio is less than 0.1, when the metallic material for electronic components is subjected to a gas corrosion test with a gas such as chlorine gas, sulfurous acid gas and hydrogen sulfide gas, the metallic material for electronic components is corroded and the exterior appearance of the material may be significantly discolored as compared to the exterior appearance before the gas corrosion test.

Applications of Metallic Material for Electronic Components

Examples of the application of the metallic material for electronic components of the present invention include, without being particularly limited to: a connector terminal using, in the contact portion thereof, the metallic material for electronic components, an FFC terminal or an FPC terminal using, in the contact portion thereof, the metallic material for electronic components, and an electronic component using, in the electrode thereof for external connection, the metallic material for electronic components. The terminal does not depend on the connection mode on the wiring side as exemplified by a crimp-type terminal, a soldering terminal and a press-fit terminal. Examples of the electrode for external connection include a connection component prepared by applying a surface treatment to a tab, and material surface treated for use in under bump metal of a semiconductor.

Connectors may also be prepared by using such connector terminals formed as described above, and an FFC or an FPC may also be prepared by using an FFC terminal or an FPC terminal.

The metallic material for electronic components of the present invention may also be used in a push-in type terminal for fixing a board connection portion to a board by pushing the board connection portion into the through hole formed in the board, wherein a female terminal connection portion and the board connection portion are provided respectively on one side and the other side of a mounting portion to be attached to a housing.

In a connector, both of the male terminal and the female terminal may be made of the metallic material for electronic components of the present invention, or only one of the male terminal and the female terminal may be made of the metallic material for electronic components of the present invention. The use of the metallic material for electronic components of the present invention for both of the male terminal and the female terminal further improves the low degree of insertion/extraction force.

Method for Producing Metallic Material for Electronic Components

As the method for producing the metallic material for electronic components of the present invention, for example, either a wet plating (electroplating or electroless plating) or a dry plating (sputtering or ion plating) can be used.

EXAMPLES

Hereinafter, Examples of the present invention are presented together with Comparative Examples; these Examples and Comparative Examples are provided for better understanding of the present invention, and are not intended to limit the present invention.

As Examples and Comparative Examples, the samples each formed by arranging a base material, a lower layer and an upper layer in this order and by heat treating the resulting arranged were prepared under the conditions shown in Tables 1 to 6 presented below.

Table 1 shows the preparation conditions of the base material, Table 2 shows the preparation conditions of the lower layer, Table 3 shows the preparation conditions of the upper layer and Table 4 shows the heat treatment conditions. Table 5 (Table 5-1, Table 5-2 and Table 5-3) shows the preparation conditions of the respective layers and the heat treatment conditions used in each of Examples, and Table 6 shows the preparation conditions of the respective layers and the heat treatment conditions used in each of Comparative Examples.

TABLE 1

Thickness
Width
Component

Shape
[mm]
[mm]
[mass %]
Temper

Plate
0.30
30
Cu—30Zn
H

Male material
0.64
2.3

TABLE 2

Surface

treatment

No.
method
Details

1
Electro-
Plating solution: Ni sulfamate plating solution

plating
Plating temperature: 55° C.

Electric current density: 0.5 to 4 A/dm²

2
Electro-
Plating solution: Cu sulfate plating solution

plating
Plating temperature: 30° C.

Electric current density: 2.3 A/dm²

3
Electro-
Plating solution: Chromium sulfate plating solution

plating
Plating temperature: 30° C.

Electric current density: 4 A/dm²

4
Sputtering
Target: Target having a predetermined composition

Apparatus: Sputtering apparatus manufactured by

ULVAC, Inc.

Output: DC 50 W

Argon pressure: 0.2 Pa

5
Electro-
Plating solution: Fe sulfate solution

plating
Plating temperature: 30° C.

Electric current density: 4 A/dm²

6
Electro-
Plating solution: Co sulfate solution

plating
Plating temperature: 30° C.

Electric current density: 4 A/dm²

7
Electro-
Plating solution: Ni sulfamate plating solution +

plating
saccharine

Plating temperature: 55° C.

Electric current density: 4 A/dm²

8
Electro-
Plating solution: Ni sulfamate plating solution +

plating
saccharine + additive(s)

Plating temperature: 55° C.

Electric current density: 4 A/dm²

TABLE 3

Surface

treatment

No.
method
Details

1
Sputtering
Target: Target having a predetermined composition

Apparatus: Sputtering apparatus manufactured by

ULVAC, Inc.

Output: DC 50 W

Argon pressure: 0.2 Pa

2
Electro-
Ag plating → Sn plating

plating
“Ag plating”

Plating solution: Ag cyanide plating solution

Plating temperature: 40° C.

Electric current density: 0.2 to 4 A/dm²

“Sn plating”

Plating solution: Sn methanesulfonate plating solution

Plating temperature: 40° C.

Electric current density: 0.2 to 4 A/dm²

3
Electro-
Plating solution: Sn methanesulfonate plating solution

plating
Plating temperature: 40° C.

Electric current density: 0.2 to 4 A/dm²

4
Electro-
Plating solution: Sn—Ag alloy plating solution

plating
Plating temperature: 40° C.

Electric current density: 0.2 to 4 A/dm²

5
Electro-
Sn plating → Ag plating

plating
“Ag plating”

Plating solution: Ag cyanide plating solution

Plating temperature: 40° C.

Electric current density: 0.2 to 4 A/dm²

“Sn plating”

Plating solution: Sn methanesulfonate plating solution

Plating temperature: 40° C.

Electric current density: 0.2 to 4 A/dm²

TABLE 4

Temperature
Time

No.
[° C.]
[sec]

1
300
3

2
300
5

3
500
18

4
600
30

5
600
4

TABLE 5-1

Upper layer
Lower layer
Heat treatment

Condition No.
Condition No.
Condition No.

Example No.
(see Table 3)
(see Table 2)
(see Table 4)

1
1
1
1

2
1
1
1

3
1
1
1

4
1
1
1

5
1
1
1

6
1
1
1

7
1
1
1

8
1
1
1

9
1
1
1

10
1
1
1

11
1
1
1

12
1
1
1

13
1
1
1

14
1
1
1

15
1
1
1

16
2
1
1

17
2
1
—

18
2
1
—

19
2
1
1

20
1
1
1

21
1
1
1

22
1
1
1

23
1
1
1

24
1
1
1

25
1
1
1

26
1
1
1

27
1
1
1

28
1
1
1

29
1
1
1

30
1
1
1

31
1
1
1

32
1
1
1

33
1
1
1

34
1
1
1

35
1
1
1

36
1
1
1

37
1
1
1

38
1
1
1

39
1
1
1

40
1
1
1

41
1
1
1

TABLE 5-2

Upper layer
Lower layer
Heat treatment

Condition No.
Condition No.
Condition No.

Example No.
(see Table 3)
(see Table 2)
(see Table 4)

42
1
1
1

43
1
1
1

44
1
1
1

45
1
1
1

46
1
1
1

47
1
1
1

48
1
1
1

49
1
1
1

50
1
1
1

51
1
1
1

52
1
1
1

53
1
1
1

54
1
1
1

55
1
1
1

56
1
1
1

57
1
1
1

58
1
1
1

59
1
3
1

60
1
4
1

61
1
5
1

62
1
6
1

63
1
2
1

64
1
1
1

65
1
1
1

66
1
1
1

67
1
1
1

68
1
1
1

69
1
1
1

70
1
1
1

71
1
1
1

72
1
1
1

73
2
1
—

74
2
7
—

75
2
8
—

76
2
4
—

77
2
1
—

78
2
1
—

79
2
1
—

80
2
1
—

81
2
1
—

TABLE 5-3

Upper layer
Lower layer (C layer)
Heat treatment

Condition No.
Condition No.
Condition No.

Example No.
(see Table 3)
(see Table 2)
(see Table 4)

82
2
1
—

83
2
1
—

84
2
7
—

85
2
8
—

86
2
4
—

87
1
1
1

88
1
1
1

89
1
1
1

TABLE 6

Upper layer
Lower layer
Heat treatment

Comparative
Condition No.
Condition No.
Condition No.

Example No.
(see Table 3)
(see Table 2)
(see Table 4)

1
3
1
2

2
3
1
2

3
3
1
—

4
3
2
2

5
3
1
2

6
2
1
3

7
2
1
4

8
4
1
5

9
1
—
1

10
—
1
—

11
1
1
1

12
1
1
1

13
1
1
1

14
1
1
1

15
1
1
1

16
1
1
1

17
2
1
—

18
5
1
—

19
3
1
—

20
2
1
—

21
2
1
4

22
2
1
5

Measurement of Thickness

The thickness of the upper layer and the thickness of the lower layer were determined by using the samples prepared by surface treating base materials containing no elements of the upper and lower layer, respectively, and by actually measuring the thickness of each of the samples with an X-ray fluorescent analysis thickness meter (SEA5100, manufactured by Seiko Instruments Inc., collimator: 0.1 mmΦ). For example, because in the case of Sn plating, if the base material was made of Cu-10 mass % Sn-0.15 mass % P, the base material contained Sn, and no accurate thickness of the Sn plating was able to be found, the thickness was measured with a sample prepared by using a base material made of Cu-30 mass % Zn, which did not contain Sn.

Measurement of Deposition Amount

Each of the samples was decomposed with an acid such as sulfuric acid or nitric acid, the deposition amounts of the respective metals were measured by ICP (inductively-coupled plasma) emission spectroscopic analysis. The specifically used acids are different depending on the compositions of the respective samples.

Determination of Composition

On the basis of the measured deposition amounts, respective metallic compositions were calculated.

Determination of Layer Structure

The layer structure of each of the obtained samples was determined on the basis of the depth profile obtained by XPS (X-ray photoelectron spectroscopy) analysis. The analyzed elements are the elements in the compositions of the upper layer and the lower layer, and C and O. These elements are defined as the specified elements. The total amount of the specified elements was taken as 100%, and the concentrations (at %) of the respective elements were analyzed. The thickness based on the XPS (X-ray photoelectron spectroscopy) corresponds to the distance (distance in terms of SiO₂) on the abscissa of the chart based on the analysis.

The surface of each of the obtained samples was also qualitatively analyzed by the survey measurement based on XPS (X-ray photoelectron spectroscopy). The resolution of the concentration in the qualitative analysis was set at 0.1 at %.

As the XPS apparatus, 5600MC manufactured by Ulvac-Phi, Inc. was used, under the following conditions: ultimate vacuum: 5.7×10⁻⁹Torr, excitation source: monochromatized AlKα, output power: 210 W, detection area: 800 μmΦ, incident angle: 45 degrees, take-off angle: 45 degrees, neutralization gun: not used; measurement was performed under the following sputtering conditions:

Ion species: Ar⁺

Acceleration voltage: 3 kV

Scanning area: 3 mm×3 mm

Rate: 2.8 nm/min. (in terms of SiO₂)

Evaluations

For each of the samples, the following evaluations were performed.

A. Insertion/Extraction Force

The insertion/extraction force was evaluated by performing an insertion/extraction test for each of the plated male terminals according to Examples and Comparative Examples by using a commercially available Sn reflow plating female terminal (090 type Sumitomo TS/Yazaki 090II Series female terminal, non-waterproofing/F090-SMTS).

The measurement apparatus used in the test was the 1311NR manufactured by Aikoh Engineering Co., Ltd., and the evaluation was performed with a sliding distance of a male pin of 5 mm. The number of the samples was set at five, and because the insertion force and the extraction force were equivalent, a value obtained by averaging the maximum insertion forces of the respective samples was adopted as the insertion/extraction force. As the blank material of the insertion/extraction force, the sample of Comparative Example 1 was adopted.

The intended target of the insertion/extraction force is less than 85% of the maximum insertion/extraction force of Comparative Example 1. This is because the insertion/extraction force of Comparative Example 2 was 90% of the maximum insertion force of Comparative Example 1, and a larger reduction of the insertion/extraction force than the reduction of the insertion/extraction force in Comparative Example 2 was adopted as the intended target.

B. Whiskers

Whiskers were evaluated by the load test (ball indenter method) of JEITA RC-5241. Specifically, each of the samples was subjected to the load test, and each of the samples subjected to the load test was observed with a SEM (model JSM-5410, manufactured by JEOL Ltd.) at a magnification of 100× to 10000×, and thus the occurrence state of the whiskers was observed. The load test conditions are shown below.

Diameter of ball indenter: Φ 1 mm±0.1 mm

Test load: 2 N±0.2 N

Test time: 120 hours

Number of samples: 10

The intended property was such that no whiskers 20 μm or more in length occurred, and the biggest intended target was such that no whiskers occurred.

C. Contact Resistance

The contact resistance was measured with the contact simulator model CRS-113-Au manufactured by Yamasaki-seiki Co., Ltd., under the condition of the contact load of 50 kg, on the basis of the four-terminal method. The number of the samples was set at five, and the range from the minimum value to the maximum value of each of the samples was adopted. The intended target was the contact resistance of 10 mΩ or less.

D. Heat Resistance

The heat resistance was evaluated by measuring the contact resistance of a sample after an atmospheric heating (155° C.×1000 h). The intended property was the contact resistance of 10 mΩ or less, and the biggest target was such that the contact resistance was free from variation (equal) between before and after the heat resistance test.

E. Insertion/Extraction Performance

Insertion/extraction test was performed ten times on the basis of the method for the insertion force, and the insertion/extraction performance was evaluated by the contact resistance after the insertion/extraction test. The intended property was such that the contact resistance was 10 mΩ or less.

F. Fine Sliding Wear Resistance

The fine sliding wear resistance was evaluated in terms of the relation between the number of the sliding operations and the contact resistance by using the fine sliding tester model CRS-G2050 manufactured by Yamasaki-seiki Co., Ltd., under the conditions of a sliding distance of 0.5 mm, a sliding speed of 1 mm/s, a contact load of 1 N, and a number of the back and forth sliding operations of 500. The number of the samples was set at five, and the range from the minimum value to the maximum value of each of the samples was adopted. The intended property was such that the contact resistance was 50 mΩ or less at the time of the number of sliding operations of 100.

G. Gas Corrosion Resistance

The gas corrosion resistance was evaluated in the following test environment. The evaluation of the gas corrosion resistance was based on the exterior appearance and the contact resistance of each of the samples after the completion of an environmental test. The intended property was such that the exterior appearance was hardly discolored and the contact resistance after the test was 10 mΩ or less.

Hydrogen Sulfide Gas Corrosion Test

Hydrogen sulfide concentration: 10 ppm

Temperature: 40° C.

Humidity: 80% RH

Exposure time: 96 h

Number of samples: 5

H. Solder Wettability

The solder wettability was evaluated for the samples after plating. A solder checker (SAT-5000, manufactured by Rhesca Corp.) was used, a commercially available 25% rosin-methanol flux was used as a flux, and the solder wetting time was measured by a meniscograph method. A solder Sn-3Ag-0.5Cu (250° C.) was used. The number of the samples was set at five, and the range from the minimum value to the maximum value of each of the samples was adopted. The intended property was such that the zero cross time was 5 seconds (s) or less.

I. Bending Processability

The bending processability was evaluated by using a W-shaped mold on the basis of the 90° bending under the condition that the ratio between the plate thickness of each of the samples and the bending radius was 1. The evaluation was performed as follows: the surface of the bending-processed portion of each of the samples was observed with an optical microscope, and the case where no cracks were observed and practically no problems were determined to be involved was marked with ◯, and the case where crack(s) was found was marked with x.

J. Vickers Hardness

The Vickers hardness of the upper layer was measured by pressing an indenter from the surface of each of the samples with a load of 980.7 mN (Hv 0.1) and a load retention time of 15 seconds.

The Vickers hardness of the lower layer was measured by pressing an indenter from the cross section of the lower layer of each of the samples with a load of 980.7 mN (Hv 0.1) and a load retention time of 15 seconds.

K. Indentation Hardness

The indentation hardness of the upper layer was measured with a nanoindentation hardness tester (ENT-2100, manufactured by Elionix Inc.) by pressing an indenter onto the surface of each of the samples with a load of 0.1 mN.

The indentation hardness of the lower layer was measured by pressing an indenter from the cross section of the lower layer of each of the samples with a load of 980.7 mN (Hv 0.1) and a load retention time of 15 seconds.

L. Surface Roughness

The measurement of the surface roughness (the arithmetic mean height (Ra) and the maximum height (Rz)) was performed according to JIS B 0601, by using a noncontact three-dimensional measurement apparatus (model NH-3, manufactured by Mitaka Kohki Co., Ltd.). The cutoff was 0.25 mm, the measurement length was 1.50 mm, and the measurement was repeated five times for one sample.

M. Reflection Density

The reflection density of each of the samples was measured by using a densitometer (ND-1, manufactured by Nippon Denshoku Industries Co., Ltd.).

TABLE 7-1

Upper layer

Depo-

Thick-
sition
Relation between thickness
Relation between deposition amount

Compo-
ness
amount
and proportion of Sn + In
and proportion of Sn + In

sition
[μm]
[μg/cm²]
[mass %]
[mass %]
Formation method

Exam-
1
Sn40—Ag
0.01
9
Plating thickness ≦ 8.2 ×
Plating deposition amount ≦ 8200 ×
Sputtering of alloy

ples

(proportion of Sn + In)^−0.66
(proportion of Sn + In)^−0.66
having predetermined

composition

2
Sn20—Ag
0.55
542
Plating thickness ≦ 8.2 ×
Plating deposition amount ≦ 8200 ×
Sputtering of alloy

(proportion of Sn + In)^−0.66
(proportion of Sn + In)^−0.66
having predetermined

composition

3
Sn40—Ag
0.55
507
Plating thickness ≦ 8.2 ×
Plating deposition amount ≦ 8200 ×
Sputtering of alloy

(proportion of Sn + In)^−0.66
(proportion of Sn + In)^−0.66
having predetermined

composition

4
Sn60—Ag
0.50
428
Plating thickness ≦ 8.2 ×
Plating deposition amount ≦ 8200 ×
Sputtering of alloy

(proportion of Sn + In)^−0.66
(proportion of Sn + In)^−0.66
having predetermined

composition

5
Sn80—Ag
0.40
317
Plating thickness ≦ 8.2 ×
Plating deposition amount ≦ 8200 ×
Sputtering of alloy

(proportion of Sn + In)^−0.66
(proportion of Sn + In)^−0.66
having predetermined

composition

6
Sn40—Ag
0.55
471
Plating thickness ≦ 8.2 ×
Plating deposition amount ≦ 8200 ×
Sputtering of alloy

(proportion of Sn + In)^−0.66
(proportion of Sn + In)^−0.66
having predetermined

composition

7
Sn40—Ag
0.27
231
Plating thickness ≦ 8.2 ×
Plating deposition amount ≦ 8200 ×
Sputtering of alloy

(proportion of Sn + In)^−0.66
(proportion of Sn + In)^−0.66
having predetermined

composition

8
In40—Ag
0.27
231
Plating thickness ≦ 8.2 ×
Plating deposition amount ≦ 8200 ×
Sputtering of alloy

(proportion of Sn + In)^−0.66
(proportion of Sn + In)^−0.66
having predetermined

composition

9
Sn40—Au
0.27
326
Plating thickness ≦ 8.2 ×
Plating deposition amount ≦ 8200 ×
Sputtering of alloy

(proportion of Sn + In)^−0.66
(proportion of Sn + In)^−0.66
having predetermined

composition

10
Sn40—Pt
0.27
349
Plating thickness ≦ 8.2 ×
Plating deposition amount ≦ 8200 ×
Sputtering of alloy

(proportion of Sn + In)^−0.66
(proportion of Sn + In)^−0.66
having predetermined

composition

11
Sn40—Pd
0.27
249
Plating thickness ≦ 8.2 ×
Plating deposition amount ≦ 8200 ×
Sputtering of alloy

(proportion of Sn + In)^−0.66
(proportion of Sn + In)^−0.66
having predetermined

composition

12
Sn40—Ru
0.27
248
Plating thickness ≦ 8.2 ×
Plating deposition amount ≦ 8200 ×
Sputtering of alloy

(proportion of Sn + In)^−0.66
(proportion of Sn + In)^−0.66
having predetermined

composition

13
Sn40—Rh
0.27
252
Plating thickness ≦ 8.2 ×
Plating deposition amount ≦ 8200 ×
Sputtering of alloy

(proportion of Sn + In)^−0.66
(proportion of Sn + In)^−0.66
having predetermined

composition

14
Sn40—Os
0.27
356
Plating thickness ≦ 8.2 ×
Plating deposition amount ≦ 8200 ×
Sputtering of alloy

(proportion of Sn + In)^−0.66
(proportion of Sn + In)^−0.66
having predetermined

composition

15
Sn40—Ir
0.27
356
Plating thickness ≦ 8.2 ×
Plating deposition amount ≦ 8200 ×
Sputtering of alloy

(proportion of Sn + In)^−0.66
(proportion of Sn + In)^−0.66
having predetermined

composition

16
Sn26—Ag
0.15
145
Plating thickness ≦ 8.2 ×
Plating deposition amount ≦ 8200 ×
0.1-μm Ag plating

(proportion of Sn + In)^−0.66
(proportion of Sn + In)^−0.66
followed by 0.05-μm

Sn plating on Ag

17
Sn26—Ag
0.15
145
Plating thickness ≦ 8.2 ×
Plating deposition amount ≦ 8200 ×
0.1-μm Ag plating

(proportion of Sn + In)^−0.66
(proportion of Sn + In)^−0.66
followed by 0.05-μm

Sn plating on Ag

18
Sn41—Ag
0.06
55
Plating thickness ≦ 8.2 ×
Plating deposition amount ≦ 8200 ×
0.03-μm Ag plating

(proportion of Sn + In)^−0.66
(proportion of Sn + In)^−0.66
followed by 0.03-μm

Sn plating on Ag

19
Sn26—Ag
0.30
275
Plating thickness ≦ 8.2 ×
Plating deposition amount ≦ 8200 ×
0.2-μm Ag plating

(proportion of Sn + In)^−0.66
(proportion of Sn + In)^−0.66
followed by 0.1-μm

Sn plating on Ag

20
Sn15—Ag
0.30
275
Plating thickness ≦ 8.2 ×
Plating deposition amount ≦ 8200 ×
Sputtering of alloy

(proportion of Sn + In)^−0.66
(proportion of Sn + In)^−0.66
having predetermined

composition

Targets

0.005≦
7≦
Plating thickness ≦ 8.2 ×
Plating deposition amount ≦ 8200 ×

≦0.6
≦600
(proportion of Sn + In)^−0.66
(proportion of Sn + In)^−0.66

*Sn60—Ag means 60 mass % of Sn and 40 mass % of Ag

TABLE 7-2

Upper layer

Depo-

Thick-
sition
Relation between thickness
Relation between deposition amount

Compo-
ness
amount
and proportion of Sn + In
and proportion of Sn + In

sition
[μm]
[μg/cm²]
[mass %]
[mass %]
Formation method

Compar-
1
Sn
1.0
728

Sn plating

ative
2
Sn
0.6
437

Sn plating

Exam-
3
Sn
0.6
437

Sn plating

ples
4
Sn
1.0
728

Sn plating

5
Sn
1.0
728

Sn plating

6
Sn8—Ag
0.56
408

0.5-μm Ag plating

followed by 0.06-μm

Sn plating on Ag

7
Sn3—Ag
1.05
1092

1.0-μm Ag plating

followed by 0.05-μm

Sn plating on Ag

8
Sn96—Ag
0.6
445
Plating thickness > 8.2 ×
Plating deposition amount > 8200 ×
Sn—Ag alloy

(proportion of Sn + In)^−0.66
(proportion of Sn + In)^−0.66
plating

9
Sn40—Ag
0.55
471

Sputtering of alloy

having predetermined

composition

10

11
Sn40—Ag
0.55
471

Sputtering of alloy

having predetermined

composition

12
Sn40—Ag
0.003
3

Sputtering of alloy

having predetermined

composition

13
Sn20—Ag
0.80
788
Plating thickness > 8.2 ×
Plating deposition amount > 8200 ×
Sputtering of alloy

(proportion of Sn + In)^−0.66
(proportion of Sn + In)^−0.66
having predetermined

composition

14
Sn40—Ag
0.80
737
Plating thickness > 8.2 ×
Plating deposition amount > 8200 ×
Sputtering of alloy

(proportion of Sn + In)^−0.66
(proportion of Sn + In)^−0.66
having predetermined

composition

15
Sn60—Ag
0.60
514
Plating thickness > 8.2 ×
Plating deposition amount > 8200 ×
Sputtering of alloy

(proportion of Sn + In)^−0.66
(proportion of Sn + In)^−0.66
having predetermined

composition

16
Sn80—Ag
0.50
396
Plating thickness > 8.2 ×
Plating deposition amount > 8200 ×
Sputtering of alloy

(proportion of Sn + In)^−0.66
(proportion of Sn + In)^−0.66
having predetermined

composition

Targets

0.005≦
7≦
Plating thickness ≦ 8.2 ×
Plating deposition amount ≦ 8200 ×

≦0.6
≦600
(proportion of Sn + In)^−0.66
(proportion of Sn + In)^−0.66

*Sn60—Ag means 60 mass % of Sn and 40 mass % of Ag.

TABLE 7-3

Insertion/

extraction

force

Maximum

Whiskers
insertion
Fine

Number of
force/maximum
sliding

Lower layer

Number of
whiskers of
insertion
wear
Gas corrosion

Depo-

whiskers less
20 μm or
force of
resistance
resistance

Thick-
sition
Heat
than 20 μm
more in
Comparative
Contact
Exterior
Contact

Compo-
ness
amount
treatment
in length
length
Example 1
resistance
appearance
resistance

sition
[μm]
[mg/cm²]
Conditions
[pieces]
[pieces]
[%]
[mΩ]
after test
[mΩ]

Exam-
1
Ni
1.0
0.9
300° C. × 3 sec
0
0
69
1 to 50
Not
2 to 5

ples

discolored

2
Ni
1.0
0.9
300° C. × 3 sec
0
0
79
1 to 50
Not
2 to 5

discolored

3
Ni
1.0
0.9
300° C. × 3 sec
0
0
78
1 to 50
Not
2 to 5

discolored

4
Ni
1.0
0.9
300° C. × 3 sec
0
0
76
1 to 50
Not
2 to 5

discolored

5
Ni
1.0
0.9
300° C. × 3 sec
0
0
77
1 to 50
Not
2 to 5

discolored

6
Ni
0.1
0.1
300° C. × 3 sec
0
0
80
1 to 50
Not
2 to 5

discolored

7
Ni
1.0
0.9
300° C. × 3 sec
0
0
75
1 to 50
Not
2 to 5

discolored

8
Ni
1.0
0.9
300° C. × 3 sec
0
0
76
1 to 50
Not
2 to 5

discolored

9
Ni
1.0
0.9
300° C. × 3 sec
0
0
74
1 to 50
Not
2 to 5

discolored

10
Ni
1.0
0.9
300° C. × 3 sec
0
0
72
1 to 50
Not
2 to 5

discolored

11
Ni
1.0
0.9
300° C. × 3 sec
0
0
73
1 to 50
Not
2 to 5

discolored

12
Ni
1.0
0.9
300° C. × 3 sec
0
0
76
1 to 50
Not
2 to 5

discolored

13
Ni
1.0
0.9
300° C. × 3 sec
0
0
72
1 to 50
Not
2 to 5

discolored

14
Ni
1.0
0.9
300° C. × 3 sec
0
0
74
1 to 50
Not
2 to 5

discolored

15
Ni
1.0
0.9
300° C. × 3 sec
0
0
76
1 to 50
Not
2 to 5

discolored

16
Ni
1.0
0.9
300° C. × 3 sec
0
0
75
1 to 50
Not
2 to 5

discolored

17
Ni
1.0
0.9
None
0
0
79
1 to 50
Not
2 to 5

discolored

18
Ni
1.0
0.9
None
0
0
72
1 to 50
Not
2 to 5

discolored

19
Ni
1.0
0.9
300° C. × 3 sec
0
0
70
1 to 50
Not
2 to 5

discolored

20
Ni
1.0
0.9
300° C. × 3 sec
0
0
73
1 to 50
Not
4 to 8

discolored

Compar-
1
Ni
0.5
0.4
300° C. × 5 sec
—
≦3
100
200<
Not
2 to 5

ative

discolored

Exam-
2
Ni
0.5
0.4
300° C. × 5 sec
—
≦2
90
200<
Not
2 to 5

ples

discolored

3
Ni
0.5
0.4

—
≦2
90
200<
Not
2 to 5

discolored

4
Cu
0.5
0.4
300° C. × 5 sec
—
≦3
100
200<
Not
2 to 5

discolored

5
Ni
1.0
0.9
300° C. × 5 sec
—
≦3
100
200<
Not
2 to 5

discolored

6
Ni
0.5
0.4
500° C. × 18 sec
—
—
—
—
Discolored
10<

7
Ni
0.5
0.4
600° C. × 30 sec
—
—
—
—
Discolored
10<

8
Ni
0.5
0.4
600° C. × 4 sec
—
≦2
91
—
—
—

9

300° C. × 3 sec
0
0
88
—
—
—

10
Ni
1.0
0.9
None
—
—
—
200<
Discolored
10<

11
Ni
0.01
0.01
300° C. × 3 sec
0
0
87
—
—
—

12
Ni
1.0
0.9
300° C. × 3 sec
—
—
—
200<
Discolored
10<

13
Ni
1.0
0.9
300° C. × 3 sec
≦3
≦1
87
—
—
—

14
Ni
1.0
0.9
300° C. × 3 sec
≦3
≦1
88
—
—
—

15
Ni
1.0
0.9
300° C. × 3 sec
≦3
≦1
88
50 to 100
—
—

16
Ni
1.0
0.9
300° C. × 3 sec
≦3
≦1
86
50 to 100
—
—

Targets

0.005≦
0.03≦

0
<85
1 to 50
Not
<10

discolored

TABLE 8

Upper layer
Lower layer

Depo-

Depo-

Insertion/extraction

Thick-
sition

Thick-
sition
Heat
performance

Compo-
ness
amount

Compo-
ness
amount
treatment
Contact

sition
[μm]
[μg/cm²]
Formation method
sition
[μm]
[mg/cm²]
Conditions
resistance[mΩ]

Exam-
21
Sn20—Ag
0.03
30
Sputtering of alloy having
Ni
1.0
0.9
300° C. × 3 sec
3 to 9

ples

predetermined composition

22
Sn40—Ag
0.03
28
Sputtering of alloy having
Ni
1.0
0.9
300° C. × 3 sec
3 to 9

predetermined composition

23
Sn60—Ag
0.03
26
Sputtering of alloy having
Ni
1.0
0.9
300° C. × 3 sec
3 to 9

predetermined composition

24
Sn80—Ag
0.03
24
Sputtering of alloy having
Ni
1.0
0.9
300° C. × 3 sec
3 to 9

predetermined composition

25
Sn20—Ag
0.07
69
Sputtering of alloy having
Ni
1.0
0.9
300° C. × 3 sec
1 to 5

predetermined composition

26
Sn40—Ag
0.07
64
Sputtering of alloy having
Ni
1.0
0.9
300° C. × 3 sec
1 to 5

predetermined composition

27
Sn60—Ag
0.07
60
Sputtering of alloy having
Ni
1.0
0.9
300° C. × 3 sec
1 to 5

predetermined composition

28
Sn80—Ag
0.07
55
Sputtering of alloy having
Ni
1.0
0.9
300° C. × 3 sec
1 to 5

predetermined composition

*Sn20—Ag means 20 mass % of Sn and 80 mass % of Ag.

TABLE 9

Heat

Upper layer

resis-

Relation between
Relation between
Lower layer
Heat

tance

Depo-
thickness and
deposition amount
Depo-
treat-
Contact
Contact
Solder

Thick-
sition
proportion of
and proportion of
Thick-
sition
ment
resis-
resis-
wettability

Compo-
ness
amount
Sn + In
Sn + In
Formation
Compo-
ness
amount
Condi-
tance
tance
Zero cross

sition
[μm]
[μg/cm²]
[mass %]
[mass %]
method
sition
[μm]
[mg/cm²]
tions
[mΩ]
[mΩ]
time [sec]

Exam-
29
Sn20—Ag
0.03
30
Plating thickness < 0.03 ×
Plating deposition amount < 27.8 ×
Sputtering of
Ni
1.0
0.9
300° C. ×
1 to 5
3 to 9
2 to 5

ples

e^{0.015 × (proportion of Sn + In)}
e^{0017 × (proportion of Sn + In)}
alloy having

3 sec

predetermined

composition

30
Sn40—Ag
0.03
28
Plating thickness < 0.03 ×
Plating deposition amount < 27.8 ×
Sputtering of
Ni
1.0
0.9
300° C. ×
1 to 5
3 to 9
2 to 5

e^{0.015 × (proportion of Sn + In)}
e^{0017 × (proportion of Sn + In)}
alloy having

3 sec

predetermined

composition

31
Sn60—Ag
0.03
43
Plating thickness < 0.03 ×
Plating deposition amount < 27.8 ×
Sputtering of
Ni
1.0
0.9
300° C. ×
1 to 5
3 to 9
2 to 5

e^{0.015 × (proportion of Sn + In)}
e^{0017 × (proportion of Sn + In)}
alloy having

3 sec

predetermined

composition

32
Sn80—Ag
0.10
79
Plating thickness < 0.03 ×
Plating deposition amount < 27.8 ×
Sputtering of
Ni
1.0
0.9
300° C. ×
1 to 5
3 to 9
2 to 5

e^{0.015 × (proportion of Sn + In)}
e^{0017 × (proportion of Sn + In)}
alloy having

3 sec

predetermined

composition

33
Sn20—Ag
0.05
49
Plating thickness ≧ 0.03 ×
Plating deposition amount ≧ 27.8 ×
Sputtering of
Ni
1.0
0.9
300° C. ×
1 to 5
1 to 5
1 to 3

e^{0.015 × (proportion of Sn + In)}
e^{0017 × (proportion of Sn + In)}
alloy having

3 sec

predetermined

composition

34
Sn40—Ag
0.07
64
Plating thickness ≧ 0.03 ×
Plating deposition amount ≧ 27.8 ×
Sputtering of
Ni
1.0
0.9
300° C. ×
1 to 5
1 to 5
1 to 3

e^{0.015 × (proportion of Sn + In)}
e^{0017 × (proportion of Sn + In)}
alloy having

3 sec

predetermined

composition

35
Sn60—Ag
0.12
103
Plating thickness ≧ 0.03 ×
Plating deposition amount ≧ 27.8 ×
Sputtering of
Ni
1.0
0.9
300° C. ×
1 to 5
1 to 5
1 to 3

e^{0.015 × (proportion of Sn + In)}
e^{0017 × (proportion of Sn + In)}
alloy having

3 sec

predetermined

composition

36
Sn80—Ag
0.18
143
Plating thickness ≧ 0.03 ×
Plating deposition amount ≧ 27.8 ×
Sputtering of
Ni
1.0
0.9
300° C. ×
1 to 5
1 to 5
1 to 3

e^{0.015 × (proportion of Sn + In)}
e^{0017 × (proportion of Sn + In)}
alloy having

3 sec

predetermined

composition

*Sn20—Ag means 20 mass % of Sn and 80 mass % of Ag.

TABLE 10

Insertion/extraction

force

Maximum insertion

Upper layer
Lower layer

force/maximum
Heat resistance
Solder

Deposition

Deposition

insertion force of
Contact
wettability

Thickness
amount

Thickness
amount
Heat treatment
Comparative Example 1
resistance
Zero cross time

Composition
[μm]
[μg/cm²]
Formation method
Composition
[μm]
[mg/cm²]
Conditions
[%]
[mΩ]
[sec]

Examples
37
Sn60—Ag—As2
0.27
231
Sputtering of alloy having
Ni
1.0
0.9
300° C. × 3 sec
73
1 to 4
1 to 3

predetermined composition

38
Sn60—Ag—Au2
0.27
231
Sputtering of alloy having
Ni
1.0
0.9
300° C. × 3 sec
74
1 to 4
1 to 3

predetermined composition

39
Sn60—Ag—Bi2
0.27
231
Sputtering of alloy having
Ni
1.0
0.9
300° C. × 3 sec
72
1 to 4
1 to 3

predetermined composition

40
Sn60—Ag—Cd2
0.27
231
Sputtering of alloy having
Ni
1.0
0.9
300° C. × 3 sec
71
1 to 4
1 to 3

predetermined composition

41
Sn60—Ag—Co2
0.27
231
Sputtering of alloy having
Ni
1.0
0.9
300° C. × 3 sec
74
1 to 4
1 to 3

predetermined composition

42
Sn60—Ag—Cr2
0.27
231
Sputtering of alloy having
Ni
1.0
0.9
300° C. × 3 sec
72
1 to 4
1 to 3

predetermined composition

43
Sn60—Ag—Cu2
0.27
231
Sputtering of alloy having
Ni
1.0
0.9
300° C. × 3 sec
75
1 to 4
1 to 3

predetermined composition

44
Sn60—Ag—Fe2
0.27
231
Sputtering of alloy having
Ni
1.0
0.9
300° C. × 3 sec
73
1 to 4
1 to 3

predetermined composition

45
Sn60—Ag—In2
0.27
231
Sputtering of alloy having
Ni
1.0
0.9
300° C. × 3 sec
70
1 to 4
1 to 3

predetermined composition

46
Sn60—Ag—Mn2
0.27
231
Sputtering of alloy having
Ni
1.0
0.9
300° C. × 3 sec
76
1 to 4
1 to 3

predetermined composition

47
Sn60—Ag—-Mo2
0.27
231
Sputtering of alloy having
Ni
1.0
0.9
300° C. × 3 sec
77
1 to 4
1 to 3

predetermined composition

48
Sn60—Ag—-Ni2
0.27
231
Sputtering of alloy having
Ni
1.0
0.9
300° C. × 3sec
74
1 to 4
1 to 3

predetermined composition

49
Sn60—Ag—Pb2
0.27
231
Sputtering of alloy having
Ni
1.0
0.9
300° C. × 3 sec
71
1 to 4
1 to 3

predetermined composition

50
SR60—Ag—Sb2
0.27
231
Sputtering of alloy having
Ni
1.0
0.9
300° C. × 3 sec
73
1 to 4
1 to 3

predetermined composition

51
Sn60—Ag—W2
0.27
231
Sputtering of alloy having
Ni
1.0
0.9
300° C. × 3 sec
72
1 to 4
1 to 3

predetermined composition

52
Sn60—Ag—Zn2
0.27
231
Sputtering of alloy having
Ni
1.0
0.9
300° C. × 3 sec
74
1 to 4
1 to 3

predetermined composition

53
Sn60—Ag—Pd2
0.27
231
Sputtering of alloy having
Ni
1.0
0.9
300° C. × 3 sec
71
1 to 4
1 to 3

predetermined composition

54
Sn60—Ag—Pt2
0.27
231
Sputtering of alloy having
Ni
1.0
0.9
300° C. × 3 sec
72
1 to 4
1 to 3

predetermined composition

55
Sn60—Ag—Rh2
0.27
231
Sputtering of alloy having
Ni
1.0
0.9
300° C. × 3 sec
73
1 to 4
1 to 3

predetermined composition

56
Sn60—Ag—Ru2
0.27
231
Sputtering of alloy having
Ni
1.0
0.9
300° C. × 3 sec
75
1 to 4
1 to 3

predetermined composition

57
Sn60—Ag—Se2
0.27
231
Sputtering of alloy having
Ni
1.0
0.9
300° C. × 3 sec
77
1 to 4
1 to 3

predetermined composition

58
Sn60—Ag—Ir2
0.27
231
Sputtering of alloy having
Ni
1.0
0.9
300° C. × 3 sec
73
1 to 4
1 to 3

predetermined composition

59
Sn60—Ag
0.27
231
Sputtering of alloy having
Cr
1.0
0.9
300° C. × 3 sec
69
1 to 4
1 to 3

predetermined composition

60
Sn60—Ag
0.27
231
Sputtering of alloy having
Mn
1.0
0.9
300° C. × 3 sec
76
1 to 4
1 to 3

predetermined composition

61
Sn60—Ag
0.27
231
Sputtering of alloy having
Fe
1.0
0.9
300° C. × 3 sec
73
1 to 4
1 to 3

predetermined composition

62
Sn60—Ag
0.27
231
Sputtering of alloy having
Co
1.0
0.9
300° C. × 3 sec
71
1 to 4
1 to 3

predetermined composition

63
Sn60—Ag
0.27
231
Sputtering of alloy having
Cu
1.0
0.9
300° C. × 3 sec
75
1 to 4
1 to 3

predetermined composition

64
Sn60—Ag
0.27
231
Sputtering of alloy having
Ni—20Cr
1.0
0.9
300° C. × 3 sec
67
1 to 4
1 to 3

predetermined composition

65
Sn60—Ag
0.27
231
Sputtering of alloy having
Ni—20Mn
1.0
0.9
300° C. × 3 sec
75
1 to 4
1 to 3

predetermined composition

66
Sn60—Ag
0.27
231
Sputtering of alloy having
Ni—20Fe
1.0
0.9
300° C. × 3 sec
73
1 to 4
1 to 3

predetermined composition

67
Sn60—Ag
0.27
231
Sputtering of alloy having
Ni—20Co
1.0
0.9
300° C. × 3 sec
69
1 to 4
1 to 3

predetermined composition

68
Sn60—Ag
0.27
231
Sputtering of alloy having
Ni—20Cu
1.0
0.9
300° C. × 3 sec
73
1 to 4
1 to 3

predetermined composition

69
Sn60—Ag
0.27
231
Sputtering of alloy having
Ni—2B
1.0
0.9
300° C. × 3 sec
62
1 to 4
1 to 3

predetermined composition

70
Sn60—Ag
0.27
231
Sputtering of alloy having
Ni—2P
1.0
0.9
300° C. × 3 sec
62
1 to 4
1 to 3

predetermined composition

71
Sn60—Ag
0.27
231
Sputtering of alloy having
Ni—10Sn
1.0
0.9
300° C. × 3 sec
71
1 to 4
1 to 3

predetermined composition

72
Sn60—Ag
0.27
231
Sputtering of alloy having
Ni—10Zn
1.0
0.9
300° C. × 3 sec
73
1 to 4
1 to 3

predetermined composition

*Sn60—Ag—As2 means 60 mass % of Sn, 38 mass % of Ag and 2 mass % of As.

TABLE 11

Insertion/

extraction

force

Maximum

insertion

force/

maximum

Upper layer
Lower layer
Heat
insertion

Depo-

Depo-
treat-
Inden-
force of

Thick-
sition

Thick-
sition
ment
Vickers
tation
Comparative
Bending

Compo-
ness
amount
Formation
Compo-
ness
amount
Condi-
hardness
hardness
Example 1
process-

sition
[μm]
[μg/cm²]
method
sition
[μm]
[μg/cm²]
tions
Hv
[MPa]
[%]
ability

Exam-
73
Sn26—Ag
0.15
145
0.1-μm Ag
Ni
1.0
0.9
None
130
1500
79
∘

ples

plating

followed by

0.05-μm Sn

plating on

Ag

74
Sn26—Ag
0.15
145
0.1-μm Ag
Ni
1.0
0.9
None
300
3400
75
∘

plating
(semi-

followed by
glossy)

0.05-μm Sn

plating on

Ag

75
Sn26—Ag
0.15
145
0.1-μm Ag
Ni
1.0
0.9
None
600
6700
69
∘

plating
(glossy)

followed by

0.05-μm Sn

plating on

Ag

76
Sn26—Ag
0.15
145
0.1-μm Ag
Ni—2P
1.0
0.9
None
1200
13000
63
x

plating

followed by

0.05-μm Sn

plating on

Ag

*Sn26—Ag means 26 mass % of Sn and 74 mass % of Ag.

TABLE 12

Evaluations from outermost

layer

Arith-

Upper layer
Lower layer
Heat
metic

Depo-

Depo-
treat-
mean
Maximum

Thick-
sition

Thick-
sition
ment
height
height

Gas

Compo-
ness
amount
Formation
Compo-
ness
amount
Condi-
Ra
Rz
Reflection
corrosion

sition
[μm]
[μg/cm²]
method
sition
[μm]
[mg/cm²]
tions
[μm]
[μm]
density
resistance

Exam-
77
Sn26—Ag
0.15
145
0.1-μm Ag
Ni
1.0
0.9
None
0.12
1.25
0.2
Somewhat

ples

plating (Dk =

discolored

0.5) followed

in small

by 0.05-μm

areas

Sn plating

(Dk = 0.5)

on Ag

78
Sn26—Ag
0.15
145
0.1-μm Ag
Ni
1.0
0.9
None
0.087
0.75
0.3
Not

plating (Dk =

discolored

4) followed

by 0.05-μm

Sn plating

(Dk = 0.5)

on Ag

79
Sn26—Ag
0.15
145
0.1-μm Ag
Ni
1.0
0.9
None
0.075
0.55
0.7
Not

plating (Dk =

discolored

0.5) followed

by 0.05-μm

Sn plating

(Dk = 4)

on Ag

80
Sn26—Ag
0.15
145
0.1-μm Ag
Ni
1.0
0.9
None
0.045
0.35
0.9
Not

plating (Dk =

discolored

4) followed

by 0.05-μm

Sn plating

(Dk = 4)

on Ag

*Sn26—Ag means 26 mass % of Sn and 74 mass % of Ag.

TABLE 13

Insertion/

extraction

force

Maximum

insertion

XPS (Depth)
force/maximum

D₃
insertion
Heat

Upper layer
Lower layer

Thickness
force of
resistance

Deposition

Deposition
Heat
of 25 at %
Comparative
Contact
Gas

Compo-
Thickness
amount
Formation
Compo-
Thickness
amount
treatment
Order of D₁,
D₁
D₂
or more
Example 1
resistance
corrosion

sition
[μm]
[μg/cm²]
method
sition
[μm]
[mg/cm²]
Conditions
D₂and D₃
[at %]
[at %]
[nm]
[%]
[mΩ]
resistance

Exam-
81
Sn41—Ag
0.06
55
0.03-μm Ag
Ni
1.0
0.9
None
D₁ custom character

D₂

D₃
35
35
100<
72
1 to 4
No

ples

plating

discolored

followed by

0.03-μm Sn

plating on Ag

82
Sn41—Ag
0.06
55
0.03-μm Ag
Ni
0.1
0.1
None
D₁ custom character

D₂

D₃
87
87
80
80
1 to 4
No

plating

discolored

followed by

0.03-μm Sn

plating on Ag

Compar-
17
Sn41—Ag
0.06
55
0.03-μm Ag
Ni
0.01
0.01
None
D₁ custom character

D₂

D₃
87
87
25
87

ative

plating

Exam-

followed by

ples

0.03-μm Sn

plating on Ag

18
Sn41—Ag
0.06
55
0.03-μm Sn
Ni
1.0
0.89
None
D₂ custom character

D₁

D₃

Discolored

plating

followed by

0.03-μm Ag

plating on Sn

19
Sn
0.002
1.5
Sn plating
Ni
1.0
0.89
None
D₁ custom character

D₃
12
<10
100<

10<

20
Sn41—Ag
0.002
1.5
0.001-μm Ag
Ni
1.0
0.89
None
D₁ custom character

D₂

D₃
<10
14
100<

Discolored

plating

followed by

0.001-μm Sn

plating on Ag

*Sn41—Ag means 41 mass % of Sn and 59 mass % of Ag.

TABLE 14

Insertion/

extraction

force

Maximum

insertion

force/

Lower layer

maximum

Upper layer

Inden-
Heat
insertion

Depo-

Depo-
Vickers
tation
treat-
force of

Thick-
sition

Thick-
sition
hard-
hard-
ment
Comparative
Bending

Compo-
ness
amount
Formation
Compo-
ness
amount
ness
ness
Condi-
Example 1
process-

sition
[μm]
[μg/cm²]
method
sition
[μm]
[mg/cm²]
Hv
[MPa]
tions
[%]
ability

Exam-
83
Sn26—Ag
0.15
145
0.1-μm Ag
Ni
1.0
0.9
130
1500
None
79
∘

ples

plating

followed by

0.05-μm Sn

plating on Ag

84
Sn26—Ag
0.15
145
0.1-μm Ag
Ni
1.0
0.9
300
3400
None
75
∘

plating
(semi-

followed by
glossy)

0.05-μm Sn

plating on Ag

85
Sn26—Ag
0.15
145
0.1-μm Ag
Ni
1.0
0.9
600
6700
None
69
∘

plating
(glossy)

followed by

0.05-μm Sn

plating on Ag

86
Sn26—Ag
0.15
145
0.1-μm Ag
Ni—P
1.0
0.9
1200
13000
None
63
x

plating

followed by

0.05-μm Sn

plating on As

*Sn26—Ag means 26 mass % of Sn and 74 mass % of Ag.

TABLE 15

XPS

Constituent

elements

A/(constituent

elements A +

constituent

Upper layer
Lower layer
Heat
elements B) in
Gas corrosion

Depo-

Depo-
treat-
the range of
resistance

Thick-
sition

Thick-
sition
ment
0.02 μm from
Exterior
Contact

Compo-
ness
amount
Formation
Compo-
ness
amount
Condi-
outermost
appearance
resistance

sition
[μm]
[μg/cm²]
method
sition
[μm]
[mg/cm²]
tions
surface
after test
after test

Exam-
87
Sn15—Ag
0.30
275
Sputtering of
Ni
1.0
0.9
300° C. ×
0.13<
No
4 to 8

ples

alloy having

3 sec

discolored

predetermined

composition

88
Sn40—Ag
0.27
248
Sputtering of
Ni
1.0
0.9
300° C. ×
0.18<
No
2 to 5

alloy having

3 sec

discolored

predetermined

composition

89
Sn60—Ag
0.27
248
Sputtering of
Ni
1.0
0.9
300° C. ×
0.20<
No
2 to 5

alloy having

3 sec

discolored

predetermined

composition

Compa-
21
Sn8—Ag
0.56
514
0.5-μm Ag
Ni
1.0
0.9
500° C. ×
<0.1
Discolored
10<

rative

plating

18 sec

Exam-

followed by

ples

0.06-μm Sn

plating on Ag

22
Sn3—Ag
1.05
964
1.0-μm Ag
Ni
1.0
0.9
600° C. ×
<0.1
Discolored
10<

plating

30 sec

followed by

0.05-μm Sn

plating on

Ag

*Sn15—Ag means 15 mass % of Sn and 85 mass % of Ag.

Examples 1 to 89 were each a metallic material for electronic components excellent in any of the low degree of insertion/extraction force, the low degree of whisker formation and the high durability.

Comparative Example 1 is a blank material.

In Comparative Example 2, the preparation thereof was performed by making thinner the Sn plating of the blank material of Comparative Example 1, but the whiskers of 20 μm or more in length occurred. In Comparative Example 2, the fine sliding wear resistance was poor and the contact resistance was increased.

In Comparative Example 3, the preparation thereof was performed without applying heat treatment, as compared with Comparative Example 2, but the whiskers of 20 μm or more in length occurred. In Comparative Example 3, the fine sliding wear resistance was poor and the contact resistance was increased.

In Comparative Example 4, the preparation thereof was performed by applying Cu plating to the lower layer, as compared with Comparative Example 1, but the whiskers of 20 μm or more in length occurred. In Comparative Example 4, the fine sliding wear resistance was poor and the contact resistance was increased.

In Comparative Example 5, the preparation thereof was performed by applying a thicker Ni plating of the lower layer as compared with the blank material of Comparative Example 1, but the properties were not different from those of Comparative Example 1.

In Comparative Example 6, the proportion of Sn+In in the upper layer was 10 mass % or less, and hence the gas corrosion resistance was poor.

In Comparative Example 7, the gas corrosion resistance was poor as it was the case in Comparative Example 6.

In Comparative Example 8, the plating thickness was thicker than 8.2×(proportion of Sn+In)^−0.66and hence the insertion/extraction force was higher than the intended target, and the whiskers of 20 μm or more in length occurred.

In Comparative Example 9, the plating was not applied to the lower layer, and hence the insertion force was higher than the intended target.

In Comparative Example 10, no plating was applied to the upper layer, and hence the fine sliding wear resistance was poor, the contact resistance was increased, and the gas corrosion resistance was also poor.

In Comparative Example 11, the plating of the lower layer was extremely thin, and hence the insertion/extraction force was higher than the intended target.

In Comparative Example 12, the plating of the upper layer was extremely thin, and hence the fine sliding wear resistance was poor, the contact resistance was increased, and the gas corrosion resistance was also poor.

In Comparative Example 13, the plating thickness of the upper layer exceeds 0.6 μm, the plating thickness was thicker than 8.2×(proportion of Sn+In)^−0.66, and hence the whiskers of 20 μm or more occurred and the insertion/extraction force was higher than the intended target.

In Comparative Example 14, the plating thickness of the upper layer exceeds 0.6 μm, the plating thickness was thicker than 8.2×(proportion of Sn+In)^−0.66and hence the whiskers of 20 μm or more occurred and the insertion/extraction force was higher than the intended target.

In Comparative Example 15, the plating thickness of the upper layer was thicker than 8.2×(proportion of Sn+In)^−0.66and the whiskers of 20 μm or more occurred, the insertion/extraction force was higher than the intended target, and the contact resistance after the fine sliding wear resistance test was high.

In Comparative Example 16, the plating thickness of the upper layer was thicker than 8.2×(proportion of Sn+In)^−0.66, and the whiskers of 20 μm or more occurred, the insertion/extraction force was higher than the intended target, and the contact resistance after the fine sliding wear resistance test was high.

In Comparative Example 17, the plating of the lower layer was extremely thin, accordingly the depth at which the atomic concentration (at %) of Ni, Cr, Mn, Fe, Co or Cu in the lower layer as measured by the depth measurement with XPS (X-ray photoelectron spectroscopy) was 25 at % or more was thinner than the intended target, and hence the insertion/extraction force was higher than the intended target.

In Comparative Example 18, the order of the Sn plating and the Ag plating was reversed in the production of Comparative Example 18 as compared with Example 17; the position (D₁) indicating the highest value of the atomic concentration (at %) of Sn or In of the constituent elements A of the upper layer and the position (D₂) indicating the highest value of the concentration (at %) of Ag, Au, Pt, Pd, Ru, Rh, Os or Ir of the constituent elements B of the upper layer, as measured by the depth measurement with XPS (X-ray photoelectron spectroscopy), were located in the order of D₂and D₁, and hence the gas corrosion resistance was poor.

In Comparative Example 19, no constituent elements B were present in the upper layer, the highest value of the atomic concentration (at %) of Ag, Au, Pt, Pd, Ru, Rh, Os or Ir of the constituent elements B of the upper layer was equal to or lower than the intended target, and hence the heat resistance was poor.

In Comparative Example 20, the preparation thereof was performed by making the Sn plating of the upper layer extremely thin; on the basis of a depth measurement performed by XPS (X-ray photoelectron spectroscopy), the atomic concentration at the position (D₁) indicating the highest value of the atomic concentration (at %) of Sn or In of the upper layer was 10 at % or less, and the gas corrosion resistance was poor.

In Comparative Example 21, the proportion of Sn+In in the upper layer was 10 mass % or less, and on the basis of a depth measurement performed by XPS (X-ray photoelectron spectroscopy), in the range of 0.02 μm from the outermost surface, the atomic concentration (at %) ratio, the constituent elements A [at %]/(the constituent elements A+the constituent elements B)[at %] was less than 0.1; thus, the proportion of the constituent element(s) A was extremely small, Ag₃Sn was not present, and no Ag phase was present, and hence the gas corrosion resistance was poor.

In Comparative Example 22, the gas corrosion resistance was poor for the same reason as in Comparative Example 21.

FIG. 2 shows the results of a depth measurement with XPS (X-ray photoelectron spectroscopy) according to Example 17. As can be seen from FIG. 2, the position (D₁) indicating the highest value of the atomic concentration (at %) of Sn or In in the upper layer and the position (D₂) indicating the highest value of the atomic concentration (at %) of Ag, Au, Pt, Pd, Ru, Rh, Os or Ir in the upper layer were located in the order of D₁and D₂, and the atomic concentration at D₁was 35 at % and the atomic concentration at D₂was 87 at %. As can also be seen from FIG. 2, the atomic concentration (at %) ratio, the constituent elements A/(the constituent elements A+the constituent elements B), in the range of 0.02 μm from the outermost surface, is 0.1 or more. Specifically, in this range, the lowest concentration of the constituent element A (Sn) was 10 at %, and the corresponding concentration of the constituent element B (Ag) was 90 at %, the ratio of the constituent element A/(constituent element A+constituent element B) was 0.1.

REFERENCE SIGNS LIST

10 Metallic material for electronic components

11 Base material

12 Lower layer

13 Upper layer

Number	Date	Country	Kind
2012-068148	Mar 2012	JP	national
2012-112634	May 2012	JP	national

Number	Date	Country
2868776	May 2015	EP
01-306574	Dec 1989	JP
4-370613	Dec 1992	JP
02-925986	Jul 1999	JP
11-279792	Oct 1999	JP
11-350189	Dec 1999	JP
2001-53210	Feb 2001	JP
2010-265540	Nov 2010	JP
2012-36436	Feb 2012	JP
200936806	Sep 2009	TW

Metallic material for electronic components, and connector terminals, connectors and electronic components using same

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Date Filed

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Inventors

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Examiners

Agents

CPC

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