This application is a provisional that claims benefit to Ser. No. 60/039,616 filed Mar. 13, 1997.
Number | Name | Date | Kind |
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RE. 32849 | Wei et al. | Jan 1989 | |
4142958 | Wei et al. | Mar 1979 | |
4855026 | Sioshansi | Aug 1989 | |
5089746 | Rosenblum et al. | Feb 1992 | |
5160576 | Robbins | Nov 1992 | |
5240583 | Ahonen | Aug 1993 | |
5308461 | Ahonen | May 1994 | |
5332482 | Sameshima | Jul 1994 | |
5454919 | Hill et al. | Oct 1995 | |
5569362 | Lerbert et al. | Oct 1996 | |
5693376 | Fetherston et al. | Dec 1997 | |
5888906 | Sandhu et al. | Mar 1999 |
Entry |
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P. Reese Puckett et al., “Ion Beam Etching”, Thin Film Processes II, pp. 749-782, 1991. |
Thin Films for Optical Systems, Chap. 6, “Ion Beam Sputtering,” Wei et al., Marcel Dekker Inc., pp. 133-201 1995. |
“Technology of ion beam sources used in sputtering,” Kaufman, Harold R., J. Vac. Sci. Technol., Mar./Apr. 1978, pp. 272-275. |
Number | Date | Country | |
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60/039616 | Mar 1997 | US |