Method and apparatus for load-locked printing

Information

  • Patent Grant
  • 10519535
  • Patent Number
    10,519,535
  • Date Filed
    Thursday, January 14, 2016
    8 years ago
  • Date Issued
    Tuesday, December 31, 2019
    4 years ago
Abstract
The disclosure relates to a method and apparatus for preventing oxidation or contamination during a circuit printing operation. The circuit printing operation can be directed to OLED-type printing. In an exemplary embodiment, the printing process is conducted at a load-locked printer housing having one or more of chambers. Each chamber is partitioned from the other chambers by physical gates or fluidic curtains. A controller coordinates transportation of a substrate through the system and purges the system by timely opening appropriate gates. The controller may also control the printing operation by energizing the print-head at a time when the substrate is positioned substantially thereunder.
Description
BACKGROUND
Field of the Invention

The disclosure relates to a method and apparatus for efficient deposition of a patterned film on a substrate. More specifically, the disclosure relates to a method and apparatus for supporting and transporting a substrate on gas bearing during thermal jet printing of material on a substrate.


Description of Related Art

The manufacture of organic light emitting devices (OLEDs) requires depositing one or more organic films on a substrate and coupling the top and bottom of the film stack to electrodes. The film thickness is a prime consideration. The total layer stack thickness is about 100 nm and each layer is optimally deposited uniformly with an accuracy of better than .+−.1 nm. Film purity is also important. Conventional apparatuses form the film stack using one of two methods: (1) thermal evaporation of organic material in a relative vacuum environment and subsequent condensation of the organic vapor on the substrate; or, (2) dissolution of organic material into a solvent, coating the substrate with the resulting solution, and subsequent removal of the solvent.


Another consideration in depositing the organic thin films of an OLED is placing the films precisely at the desired location on the substrate. There are two conventional technologies for performing this task, depending on the method of film deposition. For thermal evaporation, shadow masking is used to form OLED films of a desired configuration. Shadow masking techniques require placing a well-defined mask over a region of the substrate followed by depositing the film over the entire substrate area. Once deposition is complete, the shadow mask is removed. The regions exposed through the mask define the pattern of material deposited on the substrate. This process is inefficient as the entire substrate must be coated, even though only the regions exposed through the shadow mask require a film. Furthermore, the shadow mask becomes increasingly coated with each use, and must eventually be discarded or cleaned. Finally, the use of shadow masks over large areas is made difficult by the need to use very thin masks (to achieve small feature sizes) that make said masks structurally unstable. However, the vapor deposition technique yields OLED films with high uniformity and purity and excellent thickness control.


For solvent deposition, ink jet printing can be used to deposit patterns of OLED films. Ink jet printing requires dissolving organic material into a solvent that yields a printable ink. Furthermore, ink jet printing is conventionally limited to the use of single layer OLED film stacks, which typically have lower performance as compared to multilayer stacks. The single-layer limitation arises because printing typically causes destructive dissolution of any underlying organic layers. Finally, unless the substrate is first prepared to define the regions into which the ink is to be deposited, a step that increases the cost and complexity of the process, ink jet printing is limited to circular deposited areas with poor thickness uniformity as compared to vapor deposited films. The material quality is also lower due to structural changes in the material that occur during the drying process and due to material impurities present in the ink. However, the ink jet printing technique is capable of providing patterns of OLED films over very large areas with good material efficiency.


No conventional technique combines the large area patterning capabilities of ink jet printing with the high uniformity, purity, and thickness control achieved with vapor deposition for organic thin films. Because ink jet processed single layer OLED devices continue to have inadequate quality for widespread commercialization, and thermal evaporation remains impractical for scaling to large areas, it is a major technological challenge for the OLED industry to develop a technique that can offer both high film quality and cost-effective large area scalability.


Manufacturing OLED displays may also require the patterned deposition of thin films of metals, inorganic semiconductors, and/or inorganic insulators. Conventionally, vapor deposition and/or sputtering have been used to deposit these layers. Patterning is accomplished using prior substrate preparation (e.g., patterned coating with an insulator), shadow masking as described above, and when a fresh substrate or protective layers are employed, conventional photolithography. Each of these approaches is inefficient as compared to the direct deposition of the desired pattern, either because it wastes material or requires additional processing steps. Thus, for these materials as well there is a need for a method and apparatus for depositing high-quality, cost effective, large area scalable films.


Certain applications of thermal jet printing require non-oxidizing environment to prevent oxidation of the deposited materials or associated inks. In a conventional method, a sealed nitrogen tent is used to prevent oxidation. Conventional systems use a floating system to support and move the substrate. A floatation system can be defined as a bearing system of alternative gas bearings and vacuum ports. The gas bearings provide the lubricity and non-contacting support for the substrate, while the vacuum supports the counter-force necessary to strictly control the height at which the relatively light-weight substrate floats. Since high-purity nitrogen gas can be a costly component of the printing system, it is important to minimize nitrogen loss to the ambient.


Accordingly, there is a need for load-locked printing system which supports a substrate on gas bearings while minimizing system leakage and nitrogen loss.


SUMMARY

The disclosure relates to a method and apparatus for preventing oxidation or contamination during a thermal jet printing operation. The thermal jet printing operation may include OLED printing and the printing material may include suitable ink composition. In an exemplary embodiment, the printing process is conducted at a load-locked printer housing having one or more chambers. Each chamber is partitioned from the other chambers by physical gates or fluidic curtains. A controller coordinates transportation of a substrate through the system and purges the system by timely opening appropriate gates. The substrate may be transported using a transport mechanism, such as a conveyor belt, or gas bearings which are formed using a plurality of vacuum and gas input portals. The controller may also provide a non-oxidizing environment within the chamber using a gas similar to, or different from, the gas used for the gas bearings. The controller may also control the printing operation by energizing the print-head at a time when the substrate is positioned substantially thereunder.


In one embodiment, the disclosure relates to a method for printing a film of OLED material on a substrate by (i) receiving the substrate at an inlet chamber; (ii) flooding the inlet load-locked chamber with a noble gas and sealing the inlet chamber; (iii) directing at least a portion of the substrate to a print-head chamber and discharging a quantity of OLED material from a thermal jet discharge nozzle onto the portion of the substrate; (iv) directing the substrate to an outlet chamber; (v) partitioning the print-head chamber from the outlet chamber; and (vi) unloading the print-head from the outlet chamber. In one embodiment of the invention, the print-head chamber pulsatingly delivers a quantity of material from a thermal jet discharge nozzle to the substrate.


In another embodiment, the disclosure relates to a method for depositing a material on a substrate. The method includes the steps of: (i) receiving the substrate at an inlet chamber; (ii) flooding the inlet chamber with a chamber gas and sealing the inlet chamber; (iii) directing at least a portion of the substrate to a print-head chamber and discharging a quantity of material from a thermal jet discharge nozzle onto the portion of the substrate; (iv) directing the substrate to an outlet chamber; (v) partitioning the print-head chamber from the outlet chamber; and (vi) unloading the print-head from the outlet chamber. The print-head chamber pulsatingly delivers a quantity of material from a thermal jet discharge nozzle to the substrate.


In another embodiment, the disclosure relates to a load-locked printing apparatus, comprising an inlet chamber for receiving a substrate, the inlet chamber having a first partition and a second partition; a print-head chamber in communication with the inlet chamber, the print-head chamber having a discharge nozzle for pulsatingly metering a quantity of ink onto a substrate, the second partition separating the print-head chamber from the inlet chamber; an outlet chamber in communication with the print-head chamber through a third partition, the outlet chamber receiving the substrate from print head chamber and exiting the substrate from a fourth chamber. In a preferred embodiment, the inlet chamber, the print-head chamber and the outlet chamber provide an inert gas environment while the discharge nozzle pulsatingly meters the quantity of ink onto the substrate. Although the implementation of the invention are not limited thereto, the inert gas environment can be a noble gas (e.g. argon, helium, nitrogen or hydrogen).


In still another embodiment, the disclosure relates to a load-locked thermal jet printing system. The system includes a housing with an inlet partition and an outlet partition. The housing defines a print-head chamber for depositing a quantity of ink onto a substrate. The housing also includes an inlet partition and an outlet partition for receiving and dispatching the substrate. A gas input provides a first gas to the housing. A controller communicates with the print-head chamber, the gas input and the inlet and outlet partitions. The controller comprises a processor circuit in communication with a memory circuit, the memory circuit instructing the processor circuit to (i) receive the substrate at the inlet partition; (ii) purge the housing with the first gas; (iii) direct the substrate to a discharge nozzle at the print-head chamber; (iv) energize the thermal jet discharge nozzle to pulsatingly deliver a quantity of film material from the discharge nozzle onto the substrate; and (v) dispatch the substrate from the housing through the outlet partition.





BRIEF DESCRIPTION OF THE DRAWINGS

These and other embodiments of the disclosure will be discussed with reference to the following exemplary and non-limiting illustrations, in which like elements are numbered similarly, and where:



FIG. 1 is a schematic representation of a conventional substrate floatation system;



FIG. 2 is a schematic representation of an exemplary load-locked printing housing;



FIG. 3 is a schematic representation of the load-locked printing housing of FIG. 2 receiving a substrate;



FIG. 4 schematically shows the substrate received at the print-head chamber of the housing;



FIG. 5 schematically shows the completion of the printing process of FIGS. 3 and 4;



FIG. 6 is a schematic representation of a print-head for use with the load-locked housing of FIG. 2; and



FIG. 7 is an exemplary load-locked system according to an embodiment of the invention;



FIG. 8 shows several types of substrate misalignment within the print system, and



FIG. 9 shows a substrate pattern including fiducials and initial locus of area viewed by a camera or other imaging devices.





DETAILED DESCRIPTION


FIG. 1 is a schematic representation of a conventional substrate floatation system. More specifically, FIG. 1 shows a portion of a flotation system in which substrate 100 is supported by air bearings. The air bearings are shown schematically as arrows entering and leaving between baffles 110. The substrate floatation system of FIG. 1 is typically housed in a sealed chamber (not shown). The chamber includes multiple vacuum outlet ports 120 and gas bearing inlet ports 130, which are typically arranged on a flat surface 140. Substrate 100 is lifted and kept off a hard surface by the pressure of a gas such as nitrogen. The flow out of the bearing volume is accomplished by means of multiple vacuum outlet ports 120. The floating height 150 is typically a function of the gas pressure and flow. In principle, any gas can be utilized for such a substrate floatation system; however, in practice it is preferable to utilize a floatation gas that is inert to the materials that come into contact with the gas. As a result, it is conventional to use noble gases (e.g., nitrogen, argon, and helium) as they usually demonstrate sufficient inertness.


The floatation gas is an expensive component of the substrate floatation system. The cost is compounded when the printing system calls for substantially pure gas. Thus, it is desirable to minimize any gas loss to the environment.



FIG. 2 is a simplified representation of an exemplary load-locked printing housing according to one embodiment of the disclosure. Housing 200 is divided into three chambers, including inlet chamber 210, print-head chamber 220 and outlet chamber 230. As will be discussed, each chamber is separated from the rest of housing 200 through a gate or a partition. In one embodiment of the disclosure the gates or partitions substantially seal the chambers from the ambient environment and from the rest of housing 200. In another embodiment of the disclosure (not shown), chamber 230 is not included in housing 200, and chamber 210 is utilized as both an inlet and an outlet chamber.



FIG. 3 is a schematic representation of the load-locked printing housing of FIG. 2 receiving a substrate. During operation, substrate 350 is received at inlet chamber 310 through inlet gates 312. Inlet gates 312 can comprise a variety of options, including single or multiple moving gates. The gates can also be complemented with an air curtain (not shown) for minimizing influx of ambient gases into inlet chamber 310. Alternatively, the gates can be replaced with air curtains acting as a partition. Similar schemes can be deployed in all gates of the housing. Once substrate 350 is received at inlet chamber 310, inlet gates 312 close. The substrate can then be detained at inlet chamber 310. At this time, the inlet chamber can be optionally purged from any ambient gases and refilled with the desired chamber gas, which is conventionally selected to be the same as the floatation gas, e.g. pure nitrogen or other noble gases. During the purging process, print-head inlet gate 322 as well as inlet gate 312 remain closed. Print-head inlet gate 322 can define a physical or a gas curtain. Alternatively, print-head inlet gate 322 can define a physical gate similar to inlet gate 312.



FIG. 4 schematically shows the substrate received at the print-head chamber of the housing. Air bearings can be used as a transport mechanism to transport substrate 450 through housing 400 and from inlet chamber 410 through print-head inlet gate 422 and into print-chamber 420. Print-head chamber 420 houses the thermal jet print-head, and optionally, the ink reservoir. The printing process occurs at print-head chamber 420. In one implementation of the invention, once substrate 450 is received at print-head chamber 420, print-head gates 422 and 424 are closed during the printing process. Print-head chamber can be optionally purged with a chamber gas (e.g., high purity nitrogen) for further purification of the printing environment. In another implementation, substrate 450 is printed while gates 422 and 424 remain open. During the printing operation, substrate 450 can be supported by air bearings. The substrate's location in relation to housing 400 can be controlled using a combination of air pressure and vacuum, such as those shown in FIG. 1. In an alternative embodiment, the substrate is transported through housing 400 using a conveyer belt as a transport mechanism.


Once the printing process is complete, the substrate is transported to the outlet chamber as shown in FIG. 5. Here, print-head gates 522 and 524 are closed to seal off outlet chamber 530 from the remainder of housing 500. Outlet gate 532 is opened to eject substrate 550 as indicated by the arrow. The process shown in FIGS. 3-5 can be repeated to continuously print OLED materials on multiple substrates. Alternatively, gates 512, 522, 524 and 532 can be replaced with air curtains to provide for continuous and uninterrupted printing process. In another embodiment of the disclosure, once the printing process is complete, the substrate is transported back to the inlet chamber 310 through gate 322, where gate 322 can be subsequently sealed off and gate 312 opened to eject the substrate. In this embodiment, inlet chamber 310 functions also as the outlet chamber, functionally replacing outlet chamber 530.


The print-head chamber houses the print-head. In a preferred embodiment, the print-head comprises an ink chamber in fluid communication with nozzle. The ink chamber receives ink, comprising particles of the material to be deposited on the substrate dissolved or suspended in a carrier liquid, in substantially liquid form from a reservoir. The ink head chamber then meters a specified quantity of ink onto an upper face of a thermal jet discharge nozzle having a plurality of conduits such that upon delivery to the upper face, the ink flows into the conduits. The thermal jet discharge nozzle is activated such that the carrier liquid is removed leaving behind in the conduits the particles in substantially solid form. The thermal jet discharge nozzle is then further pulsatingly activated to deliver the quantity of material in substantially vapor form onto the substrate, where it condenses into substantially solid form.



FIG. 6 is a schematic representation of a thermal jet print-head for use with the load-locked housing of FIG. 2. Print-head 600 includes ink chamber 615 which is surrounded by top structure 610 and energizing element 620. Ink chamber 615 is in liquid communication with an ink reservoir (not shown). Energizing element 620 can comprise a piezoelectric element or a heater. Energizing element 620 is energized intermittently to dispense a metered quantity of ink, optionally in the form of a liquid droplet, on the top surface of the thermal jet discharge nozzle 640.


Bottom structure 630 supports nozzle 640 through brackets 660. Brackets 660 can include and integrated heating element. The heating element is capable of instantaneously heating thermal jet discharge nozzle 640 such that the ink carrier liquid evaporates from the conduits 650. The heating element is further capable of instantaneously heating the thermal jet discharge nozzle 650 such that substantially solid particles in the discharge nozzle are delivered from the conduits in substantially vapor form onto the substrate, where they condense into substantially solid form.


Print-head 600 operates entirely within the print-head chamber 220 and housing 200 of FIG. 2. Thus, for properly selected chamber and floatation gases (e.g. high purity nitrogen in most instances), the ink is not subject to oxidation during the deposition process. In addition, the load-locked housing can be configured to receive a transport gas, such as a noble gas, for carrying the material from the thermal jet discharge nozzle 640 onto the substrate surface. The transport gas may also transport the material from the thermal jet discharge nozzle 640 to the substrate by flowing through conduits 650. In a preferred embodiment, multiple print-heads 600 are arranged within a load-locked print system as an array. The array can be configured to deposit material on a substrate by activating the print-heads simultaneously or sequentially.



FIG. 7 is an exemplary load-locked system according to an embodiment of the invention. Load-locked system of FIG. 7 includes a housing with inlet chamber 710, print-head chamber 720 and outlet chamber 730. Inlet chamber 710 communicates through gates 712 and 722. Print-head chamber 720 receives substrate 750 from the inlet chamber and deposits organic LED material thereon as described in relation to FIG. 6. Gate 724 communicates substrate 750 to outlet chamber 730 after the printing process is completed. The substrate exists outlet chamber 730 through gate 732.


Vacuum and pressure can be used to transport substrate 750 through the load-locked system of FIG. 7. To control transporting the substrate, controller 770 communicates with nitrogen source 762 and vacuum 760 through valves 772 and 774, respectively. Controller 770 comprises one or more processor circuits (not shown) in communication with one or more memory circuit (not shown). The controller also communicates with the load-locked housing and ultimately with the print nozzle. In this manner, controller 770 can coordinate opening and closing gates 712, 722, 724 and 732. Controller 770 can also control ink dispensing by activating the piezoelectric element and/or the heater (see FIG. 6). The substrate can be transported through the load-locked print system through air bearings or by a physical conveyer under the control of the controller.


In an exemplary operation, a memory circuit (not shown) of controller 770 provides instructions to a processor circuit (not shown) to: (i) receive the substrate at the inlet partition; (ii) purge the housing with the first gas; (iii) direct the substrate to a discharge nozzle at the print-head chamber; (iv) energize the discharge nozzle to pulsatingly deliver a quantity of material from the thermal jet discharge nozzle onto the substrate; and (v) dispatch the substrate from the housing through the outlet partition. The first gas and the second gas can be different or identical gases. The first and/or the second gas can be selected from the group comprising nitrogen, argon, and helium.


Controller 770 may also identify the location of the substrate through the load-locked print system and dispense ink from the print-head only when the substrate is at a precise location relative to the print-head.


Another aspect of the invention relates to registering the substrate relative to the print-head. Printing registration is defined as the alignment and the size of one printing process with respect to the previous printing processes performed on the same substrate. In order to achieve appropriate registration, the print-head and the substrate need to be aligned substantially identically in each printing step. In one implementation of the invention, the substrate is provided with horizontal motion (i.e., motion in the x direction) and the print-head is provided with another horizontal motion (i.e., motion in the y direction). The x and y directions may be orthogonal to each other. With this arrangement, the movement of the print-head with respect to the substrate can be defined with a combination of these two horizontal directions.


When the substrate is loaded onto a load-locked system, the areas to be printed are usually not perfectly aligned in the x and y directions of the system. Thus, there is a need for detecting the misalignment, determining the required corrections to the motion of the print-head relative to the substrate and applying the corrections.


According to one embodiment of the invention, the pattern or the previous printing is detected using a pattern recognition system. This pattern can be inherent in the previous printing or may have been added deliberately (i.e., fiducials) for the pattern recognition step. By means of its recognition of the pattern, the misalignment of the substrate to the printing system's motion, direction or axis can be determined. This manifests itself as a magnification misalignment, a translational misalignment and an angular misalignment.



FIG. 8 shows several types of substrate misalignment within the print system, including translational misalignment, rotational misalignment, magnification misalignment and combinational misalignment. For each print-head scan motion relative to the substrate, the pattern recognition system will look for and find/recognize the desired pattern. The pattern recognition system can optionally be integrated with the controller (see FIG. 7). The pattern recognition system will look for and find/recognize the desired pattern. The pattern recognition system will provide the degree of error/misalignment in the x and y directions to the system's controller, which will then reposition the print-head and substrate to eliminate the error/misalignment. This means that for several motions of the print-head with respect to the substrate, the motion control system will check for misalignment and make the necessary corrections.


Alternatively, an initial scan of the entire substrate can be performed by the pattern recognition system utilizing the x and y motions available in the printing system. FIG. 9 shows a substrate pattern including fiducials and initial locus of area viewed by a camera or other imaging devices. In FIG. 9, fiducials or alignment targets are identified as boxes 910 in each replicated “pixel.” Each pixel in this example, and in many OLED applications, comprises three sub-pixels each having a distinct color: red, green, and blue (RGB). The camera or the pattern recognition device initially focuses on an area of the substrate identified by circle 930. Once the amount of misalignment is determined, the motion control system can compensate for the misalignment by causing the x and the y directions to move in a rotated and translated set of axes x1 and y1 such that these axis are a linear combination of the previous motions.


For either alignment technique, the printing control system will then cause the print-head to fire appropriately at the desired print axis as it scans the substrate. In the case of the embodiment described above, the print system will periodically use the pattern recognition system to update and adjust for any misalignment, causing the print-head to fire after alignment has been achieved. Depending on the degree of misalignment, the required update and adjustment steps may have to be repeated more often during the printing operations. Alternatively, the pattern recognition system must scan the substrate initially to assess the amount and direction of misalignment, then printing control system will utilize the misalignment information to adjust the print-head firing accordingly.


While the principles of the disclosure have been illustrated in relation to the exemplary embodiments shown herein, the principles of the disclosure are not limited thereto and include any modification, variation or permutation thereof. For example, while the exemplary embodiments are discussed in relation to a thermal jet discharge nozzle, the disclosed principles can be implemented with different type of nozzles. Moreover, the same or different gases can be used for floating the substrate and for providing a non-oxidizing environment within the chamber. These gases need not be noble gases. Finally, the substrate may enter the system from any direction and the schematic of a tri-chamber system is entirely exemplary.

Claims
  • 1. A printing system, comprising: a print-head chamber configured to be placed in flow communication with an inert gas source to supply inert gas to an interior of the print-head chamber, the print-head chamber being configured to isolate the interior of the print-head chamber to maintain an inert gas environment within the interior of the print-head chamber;a first opening in the print-head chamber, the first opening sized and positioned to permit passage of a substrate from a first environment external the print-head chamber through the first opening and into the print-head chamber;a first partition arranged to selectively open and close the first opening, wherein when the first opening is closed by the partition, the interior of the print-head chamber is sealed from the first environment external the print-head chamber;a print-head within the print-head chamber;a floatation system within the print-head chamber, wherein the floatation system comprises a gas-bearing surface to floatingly support the substrate in the print-head chamber;at least one transport mechanism to move the substrate through the opening into the interior of the print-head chamber;andone or more controllers operably coupled to the floatation system, the first partition, the transport mechanism, and the print-head, wherein the one or more controllers are configured to: identify a position of the substrate along a path of transport of the substrate through the printing system;identify an alignment of the substrate relative to a predetermined alignment, the alignment being chosen from a translational alignment, a rotational alignment, a magnification alignment, and a combination thereof;operate the first partition to control opening and closing of the first opening based on the identifying of the position of the substrate;operate the transport mechanism to transport the substrate into the print-head chamber through the opening;operate the print-head to deposit a material on the substrate based on identifying the position of the substrate relative to the print-head in the print-head chamber and based on the identifying the alignment of the substrate, andoperate the floatation system to floatingly support the substrate at a controlled height above the gas bearing surface while operation of the print-head is being controlled.
  • 2. The printing system of claim 1, wherein the print head comprises a plurality of print-heads.
  • 3. The printing system of claim 1, wherein said inert-gas source comprises a substantially nitrogen-gas source.
  • 4. The printing system of claim 1, wherein the first partition comprises at least one of a gate and a gas curtain.
  • 5. The printing system of claim 1, wherein the first opening in the print-head chamber is an opening to an inlet chamber.
  • 6. The printing system of claim 5, wherein the inlet chamber is a load lock chamber.
  • 7. The printing system of claim 1, further comprising: a second opening sized and positioned to permit passage of the substrate through the second opening and into the print-head chamber, the second opening being located on a side of the print-head chamber opposite to the first opening;a second partition arranged to selectively open and close the second opening, wherein when the second opening is closed by the partition, the interior of the print-head chamber is sealed from a second environment external the print-head chamber on a side of the second opening opposite the print-head chamber.
  • 8. The printing system of claim 7, wherein the second partition comprises at least one of a gate and a gas curtain.
  • 9. The printing system of claim 7, wherein the second opening in the print-head chamber is an opening to an outlet chamber.
  • 10. The printing system of claim 9, wherein the outlet chamber is a load lock chamber.
  • 11. The printing system of claim 1, wherein the first opening in the print-head chamber is an opening to a chamber configured to function as an inlet chamber and an outlet chamber.
  • 12. The printing system of claim 11, wherein the chamber configured to function as an inlet chamber and an outlet chamber is a load-lock chamber.
  • 13. The printing system of claim 1, wherein the print-head is in communication with a reservoir containing an organic light-emissive material ink.
  • 14. The printing system of claim 1, wherein the one or more controllers are configured to control gas pressure and flow from the floatation system to floatingly support the substrate at the controlled height above the gas bearing surface.
  • 15. The printing system of claim 1, further comprising a pattern recognition system to detect a pattern corresponding to the predetermined alignment, the one or more controllers operably coupled to the pattern recognition system.
  • 16. The printing system of claim 15, wherein the one or more controllers are configured to identify the alignment of the substrate based on recognition of the pattern.
CROSS REFERENCE TO RELATED APPLICATIONS

This application is a continuation case of U.S. application Ser. No. 13/776,602, filed Feb. 25, 2013 (now U.S. Pat. No. 9,248,643). U.S. application Ser. No. 13/776,602 is a divisional application of U.S. Pat. No. 8,720,366, filed Jul. 17, 2012. U.S. Pat. No. 8,720,366 is a continuation case of U.S. Pat. No. 8,383,202, filed Jan. 5, 2010. U.S. Pat. No. 8,383,202 claims the benefit of U.S. Provisional Application No. 61/142,575, filed Jan. 5, 2009, and is also a continuation-in-part to U.S. patent application Ser. No. 12/139,391 filed Jun. 13, 2008 (now abandoned). The disclosure of each of the cross-referenced related applications in this section is incorporated herein in its entirety.

US Referenced Citations (137)
Number Name Date Kind
3216858 Bogdanowski Nov 1965 A
3251139 Strimling May 1966 A
3498343 Sperberg Mar 1970 A
3670466 Lynch Jun 1972 A
3885362 Pollock May 1975 A
4226897 Coleman Oct 1980 A
4581478 Pugh et al. Apr 1986 A
4676144 Smith Jun 1987 A
4693175 Hashimoto Sep 1987 A
4721121 Adams Jan 1988 A
5029518 Austin Jul 1991 A
5065169 Vincent et al. Nov 1991 A
5314377 Pelosi May 1994 A
5344365 Scott et al. Sep 1994 A
5562539 Hashimoto et al. Oct 1996 A
5651625 Smith et al. Jul 1997 A
5788447 Yonemitsu et al. Aug 1998 A
5896154 Mitani et al. Apr 1999 A
6023899 Mecozzi Feb 2000 A
6049167 Onitsuka et al. Apr 2000 A
6089282 Spiegelman et al. Jul 2000 A
6375304 Aldrich et al. Apr 2002 B1
6437351 Smick et al. Aug 2002 B1
6604810 Silverbrook Aug 2003 B1
6781684 Ekhoff Aug 2004 B1
6869636 Chung Mar 2005 B2
6939212 Pham Sep 2005 B1
7258768 Yamazaki Aug 2007 B2
7326300 Sun et al. Feb 2008 B2
7384662 Takano et al. Jun 2008 B2
7387662 Ahman et al. Jun 2008 B2
7530778 Yassour et al. May 2009 B2
7703911 Chung et al. Apr 2010 B2
7989025 Sakai et al. Aug 2011 B2
8383202 Somekh et al. Feb 2013 B2
8414688 Delgado et al. Apr 2013 B1
8720366 Somekh et al. May 2014 B2
8802186 Somekh et al. Aug 2014 B2
8802195 Somekh et al. Aug 2014 B2
8899171 Mauck et al. Dec 2014 B2
9048344 Mauck et al. Jun 2015 B2
9174433 Somekh et al. Nov 2015 B2
9248643 Somekh et al. Feb 2016 B2
9278564 Mauck et al. Mar 2016 B2
9387709 Mauck et al. Jul 2016 B2
9550383 Lowrance et al. Jan 2017 B2
9656491 Lowrance et al. May 2017 B1
20010041530 Hara Nov 2001 A1
20020033860 Kubota et al. Mar 2002 A1
20020053589 Owen et al. May 2002 A1
20020079057 Yoshioka et al. Jun 2002 A1
20020084464 Yamazaki et al. Jul 2002 A1
20020124906 Suzuki et al. Sep 2002 A1
20020191063 Gelbart et al. Dec 2002 A1
20030000476 Matsunaga et al. Jan 2003 A1
20030097929 Watanabe et al. May 2003 A1
20030175414 Hayashi Sep 2003 A1
20040021762 Seki et al. Feb 2004 A1
20040050325 Samoilov et al. Mar 2004 A1
20040062856 Marcus et al. Apr 2004 A1
20040075112 Yamazaki et al. Apr 2004 A1
20040075385 Tao Apr 2004 A1
20040086631 Han et al. May 2004 A1
20040115339 Ito Jun 2004 A1
20040118309 Fedor et al. Jun 2004 A1
20040123804 Yamazaki et al. Jul 2004 A1
20040206307 Boroson et al. Oct 2004 A1
20050005850 Yamazaki Jan 2005 A1
20050040338 Weiss et al. Feb 2005 A1
20050062773 Fouet Mar 2005 A1
20050140764 Chang et al. Jun 2005 A1
20050223994 Blomiley et al. Oct 2005 A1
20060008591 Sun et al. Jan 2006 A1
20060045669 Namioka et al. Mar 2006 A1
20060054774 Yassour Mar 2006 A1
20060096395 Weiss et al. May 2006 A1
20060099328 Waite et al. May 2006 A1
20060119669 Sharma et al. Jun 2006 A1
20060219605 Devitt Oct 2006 A1
20060236938 Powell et al. Oct 2006 A1
20060273713 Mehta et al. Dec 2006 A1
20070004328 Balzer Jan 2007 A1
20070021050 Kennedy Jan 2007 A1
20070026151 Higginson et al. Feb 2007 A1
20070044713 Yasui et al. Mar 2007 A1
20070046185 Kim Mar 2007 A1
20070099310 Vepa et al. May 2007 A1
20070195653 Yassour et al. Aug 2007 A1
20070234952 Kojima Oct 2007 A1
20070257033 Yamada Nov 2007 A1
20080085652 Winters Apr 2008 A1
20080206036 Smith et al. Aug 2008 A1
20080241587 Ohmi et al. Oct 2008 A1
20080259101 Kurita et al. Oct 2008 A1
20080260938 Ikeda et al. Oct 2008 A1
20080308037 Bulovic et al. Dec 2008 A1
20080311307 Bulovic et al. Dec 2008 A1
20090031579 Piatt et al. Feb 2009 A1
20090058915 Hayashi et al. Mar 2009 A1
20090078204 Kerr et al. Mar 2009 A1
20090081885 Levy et al. Mar 2009 A1
20090244510 Domanowski Oct 2009 A1
20090295857 Kikuchi et al. Dec 2009 A1
20090324368 Koparal et al. Dec 2009 A1
20100182359 Kim et al. Jul 2010 A1
20100201749 Somekh et al. Aug 2010 A1
20100282271 Devitt Nov 2010 A1
20110043554 Silverbrook et al. Feb 2011 A1
20110096124 North et al. Apr 2011 A1
20110318503 Adams et al. Dec 2011 A1
20120056923 Vronsky et al. Mar 2012 A1
20120089180 Fathi et al. Apr 2012 A1
20120128890 Mirchev May 2012 A1
20120156365 Ohara Jun 2012 A1
20120201749 Crawshaw et al. Aug 2012 A1
20120306951 Somekh et al. Dec 2012 A1
20130004656 Chen et al. Jan 2013 A1
20130038649 Lowrance et al. Feb 2013 A1
20130040061 Lowrance et al. Feb 2013 A1
20130164438 Somekh et al. Jun 2013 A1
20130164439 Somekh et al. Jun 2013 A1
20130206058 Mauck et al. Aug 2013 A1
20130209669 Somekh et al. Aug 2013 A1
20130209670 Somekh et al. Aug 2013 A1
20130209671 Somekh et al. Aug 2013 A1
20130252533 Mauck et al. Sep 2013 A1
20130258709 Thompson et al. Oct 2013 A1
20130307898 Somekh et al. Nov 2013 A1
20140290567 Mauck et al. Oct 2014 A1
20140311405 Mauck et al. Oct 2014 A1
20170080730 Mauck et al. Mar 2017 A1
20170130315 Somekh et al. May 2017 A1
20170136793 Lowrance et al. May 2017 A1
20170239966 Mauck et al. Aug 2017 A1
20170321911 Mauck et al. Nov 2017 A1
20180326767 Lowrance et al. Nov 2018 A1
20180370263 Mauck et al. Dec 2018 A1
Foreign Referenced Citations (56)
Number Date Country
1445089 Oct 2003 CN
1722918 Jan 2006 CN
1956209 May 2007 CN
101088141 Dec 2007 CN
101243543 Aug 2008 CN
101357541 Feb 2009 CN
201446232 May 2010 CN
101754861 Jun 2010 CN
102328317 Jan 2012 CN
2973676 Jan 2016 EP
62098783 Jun 1987 JP
2005502487 Apr 1993 JP
549294 Jun 1993 JP
H0950374 Apr 1997 JP
11312640 Nov 1999 JP
2006123551 May 2001 JP
2002069650 Mar 2002 JP
2002093878 Mar 2002 JP
2003173871 Jun 2003 JP
2003266007 Sep 2003 JP
2003272847 Sep 2003 JP
2004146369 May 2004 JP
2004164873 Jun 2004 JP
2004253332 Sep 2004 JP
2004291456 Oct 2004 JP
2004362854 Dec 2004 JP
2004535956 Dec 2004 JP
2005074299 Mar 2005 JP
2005254038 Sep 2005 JP
2006026463 Feb 2006 JP
2006150900 Jun 2006 JP
2006159116 Jun 2006 JP
2007013140 Jan 2007 JP
2007299785 Nov 2007 JP
2008004919 Jan 2008 JP
2008047340 Feb 2008 JP
2008511146 Apr 2008 JP
4423082 Mar 2010 JP
2010134315 Jun 2010 JP
2010533057 Oct 2010 JP
2011225355 Nov 2011 JP
2011255366 Dec 2011 JP
20060044265 May 2006 KR
20060084048 Jul 2006 KR
20060088909 Aug 2006 KR
20070042272 Apr 2007 KR
20090126568 Dec 2009 KR
20120022197 Mar 2012 KR
200302678 Aug 2003 TW
200303829 Sep 2003 TW
I247554 Jan 2006 TW
200618308 Jun 2006 TW
2001060623 Aug 2001 WO
2006021568 Mar 2006 WO
2011118652 Sep 2011 WO
2013023099 Feb 2013 WO
Non-Patent Literature Citations (169)
Entry
Street et al., “Jet Printing of Active-Matrix TFT Backplanes for Displays and Sensors”, IS&T Archiving, Dec. 2005, vol. 20, No. 5, 16 pages.
Forrest, Stephen R., “The Path to Ubiquitous and Low-cost Organic Electronic Appliances on Plastic,” Nature, Apr. 29, 2004, vol. 428, 8 pages.
Applicant-Initiated Interview Summary dated Aug. 15, 2013 for U.S. Appl. No. 13/551,209.
Applicant-Initiated Interview Summary dated Aug. 20, 2014 for U.S. Appl. No. 13/802,304.
Applicant-Initiated Interview Summary dated Jun. 30, 2014 for U.S. Appl. No. 13/720,830.
Applicant-Initiated Interview Summary dated Oct. 19, 2012 for U.S. Appl. No. 12/652,040.
Corrected Notice of Allowability dated Feb. 3, 2015 for U.S. Appl. No. 13/802,304.
Corrected Notice of Allowability dated Oct. 31, 2014 for U.S. Appl. No. 13/720,830.
Final Office Action dated Jun. 10, 2014, to U.S. Appl. No. 13/773,649.
Final Office Action dated Jun. 12, 2014, to U.S. Appl. No. 13/773,643.
Final Office Action dated Jun. 18, 2014, to U.S. Appl. No. 13/774,577.
Final Office Action dated Nov. 8, 2013, to U.S. Appl. No. 13/551,209.
International Search Report and Written Opinion dated Apr. 17, 2015, to PCT Application PCT/US15/11854.
International Search Report and Written Opinion dated Aug. 4, 2015, PCT Application PCT/US15/27835.
International Search Report and Written Opinion dated Dec. 22, 2014, to PCT Application PCT/US14/023820.
International Search Report and Written Opinion dated Feb. 26, 2013 for PCT Application No. PCT/US12/70717.
International Search Report and Written Opinion dated Jan. 17, 2013 to PCT Application PCT/US12/050207.
International Search Report and Written Opinion dated Jun. 18, 201 for PCT Application No. PCT/US13/031083.
International Search Report and Written Opinion dated Mar. 14, 2014, to PCT Application PCT/US13/063128.
International Search Report and Written Opinion dated Oct. 8, 2014, for corresponding PCT Application No. PCT/US2014/037722.
Non-Final Office Action dated Apr. 15, 2015 to U.S. Appl. No. 13/774,601.
Non-Final Office Action dated Apr. 17, 2015, to U.S. Appl. No. 13/774,693.
Non-Final Office Action dated Apr. 24, 2013, to U.S. Appl. No. 13/551,209.
Non-Final Office Action dated Apr. 28, 2014, to U.S. Appl. No. 13/720,830.
Non-Final Office Action dated Aug. 3, 2015, to U.S. Appl. No. 14/727,602.
Non-Final Office Action dated Dec. 31, 2013, to U.S. Appl. No. 13/774,577.
Non-Final Office Action dated Feb. 28, 2014, to U.S. Appl. No. 13/773,649.
Non-Final Office Action dated Feb. 7, 2014, to U.S. Appl. No. 13/773,643.
Non-Final Office Action dated Jun. 14, 2012, to U.S. Appl. No. 12/652,040.
Non-Final Office Action dated May 16, 2014, to U.S. Appl. No. 13/802,304.
Non-Final Office Action issued to U.S. Appl. No. 13/571,166 dated Oct. 8, 2014.
Non-Final Office Action dated Jul. 1, 2014, for U.S. Appl. No. 13/773,654.
Notice of Allowance dated Dec. 7, 2012 to U.S. Appl. No. 12/652,040.
Notice of Allowance dated Dec. 9, 2014 for U.S. Appl. No. 13/802,304.
Notice of Allowance dated Feb. 20, 2014, to U.S. Appl. No. 13/551,209.
Notice of Allowance dated Jul. 1, 2014, to U.S. Appl. No. 13/773,649.
Notice of Allowance dated Jul. 2, 2014, to U.S. Appl. No. 13/774,577.
Notice of Allowance dated Jun. 30, 2014, to U.S. Appl. No. 13/773,643.
Notice of Allowance dated Mar. 2, 2015 for U.S. Appl. No. 13/571,166.
Notice of Allowance dated Nov. 19, 2015, to U.S. Appl. No. 13/776,602.
Notice of Allowance dated Oct. 6, 2014 for U.S. Appl. No. 13/720,830.
Notice of Allowance dated Sep. 9, 2015, to U.S. Appl. No. 13/774,693.
Notice of Allowance issued to U.S. Appl. No. 13/570,154 dated Jul. 17, 2015.
Notice of Allowance dated Sep. 29, 2014, to U.S. Appl. No. 13/773,654.
Office Action issued to CN Patent Application 201210595672 dated Mar. 23, 2015.
Applicant-Initiated Interview Summary dated Apr. 7, 2017 for U.S. Appl. No. 14/275,637.
Examination Report dated Apr. 12, 2017 for EP Patent Application No. 13858304.2.
TW Examination Report and Search Report dated Mar. 13, 2017 for TW Patent Application No. 105144240.
CN First Office Action dated Mar. 27, 2017 for CN patent Application No. 201610181336.1.
Examination Report dated Apr. 19, 2017 for TW Patent Application No. 103108995.
JP Office Action dated Apr. 26, 2017 for JP Patent Application No. 2016-90252.
Notice of Allowance dated May 18, 2017 for U.S. App. No. 14/543,786.
CN Second Office Action dated Mar. 24, 2017 for CN Patent Application No. 201480045349.5.
Notice of Allowance dated Mar. 29, 2017, to U.S. Appl. No. 15/423,169.
Applicant-Initiated Interview Summary dated Dec. 22, 2016 to U.S. Appl. No. 14/543,786.
CN First Office Action dated Jan. 23, 2017 for CN Patent Application No. 201480027671.5.
Examination Report dated Apr. 26, 2016, to TW Patent Application 101148932.
Examination Report dated Oct. 8, 2015, to TW Patent Application No. 102143142.
Examiner Initiated Interview Summary dated Jun. 30, 2016 for U.S. Appl. No. 14/543,786.
Extended European Search Report dated Jul. 1, 2016 for EP Application No. 13585304.2.
Final Office Action dated Oct. 14, 2016 for U.S. Appl. No. 14/205,340.
Final Office Action dated Oct. 7, 2016 for U.S. Appl. No. 14/275,637.
First Office Action dated Jun. 22, 2016 for CN 201480045349.5.
Fourth Office Action dated Mar. 25, 2016 for CN Application No. 201210596572.1.
Japanese Official Action dated Jul. 28, 2016 for Japanese Patent Application No. 2014-548852.
Non-Final Office Action dated Apr. 27, 2016, to U.S. Appl. No. 14/543,786.
Non-Final Office Action dated Apr. 4, 2016, to U.S. Appl. No. 14/205,340.
Non-Final Office Action dated Feb. 17, 2017 for U.S. Appl. No. 15/409,844.
Non-Final Office Action dated Mar. 10, 2016 to U.S. Appl. No. 14/275,637.
Non-Final Office Action dated Nov. 20, 2015 for U.S. Appl. No. 14/637,301.
Non-Final Office Action dated Nov. 4, 2016 for U.S. Appl. No. 14/543,786.
Notice of Allowance dated Jan. 31, 2017 for U.S. Appl. No. 14/205,340.
Notice of Allowance dated May 16, 2016 to U.S. Appl. No. 14/637,301.
Notification of Provisional Rejection dated Aug. 22, 2016, to KR Patent Application No. 10-2015-7003107.
Notification of Provisional Rejection dated Dec. 9, 2015, for Korean Patent Application No. 10-2015-7014277.
Notification of Provisional Rejection dated Jun. 14, 2016 for KR Application No. 10-2016-7014087.
Office Action dated Jun. 23, 2016, to CN Patent Application 201380052559.2.
Office Action Issued to CN Patent Application 201310704315.X dated Aug. 13, 2015.
Office Action issued to Japanese Patent Application No. 2015-544055, dated Oct. 20, 2015.
Dffice Action issued to JP Patent Application 2015-526775 dated Jan. 28, 2016.
Search Report dated Jul. 29, 2015 to CN Patent Application 201310704315.X.
Second Office Action dated Mar. 2, 2017, to CN Patent Application 201380052559.2.
Second Office Action issued to CN Patent Application 201210596572 dated Oct. 8, 2015.
Third Office Action issued to CN Patent Application 201210596572 dated Jan. 26, 2016.
Second Notice of Allowance dated Feb. 10, 2017, for U.S. Appl. No. 14/205,340.
Second Provisional Rejection dated Feb. 27, 2017 for KR Patent Application No. 10-2016-7014087.
CN Third Office Action dated Jul. 12, 2017 for CN Patent Application No. 201480045349.5.
Extended European Search Report dated Apr. 12, 2017 for EP Patent Application No. 14810543.0.
Extended European Search Report dated Jun. 19, 2017 for EP Patent Application No. 14779907.6.
Final Office Action dated Jul. 19, 2017 for U.S. Appl. No. 15/409,844.
JP Office Action dated Jun. 1, 2017, to JP Patent Application No. 2016-501353.
KR Notification of Provisional Rejection dated May 25, 2017 for KR Patent Application No. 10-2014-7020478.
Supplemental Notice of Allowability dated Jun. 7, 2017 for U.S. Appl. No. 14/543,786.
TW Examination Report issued to TW Patent Application 105117833, dated May 10, 2017.
Applicant-Initiated Interview Summary dated Sep. 22, 2017, for U.S. Appl. No. 14/543,786.
CN First Office Action dated Aug. 1, 2017 for CN Patent Application No. 201610692510.9.
CN Second Office Action dated Jul. 31, 2017 for CN Patent Application No. 20140027671.5.
Corrected Notice of Allowability dated Aug. 25, 2017, to U.S. Appl. No. 15/385,803.
Corrected Notice of Allowability dated Aug. 9, 2017, to U.S. Appl. No. 15/385,803.
Corrected Notice of Allowability dated Sep. 20, 2017, to U.S. Appl. No. 15/385,801.
Non-Final Office Action dated Oct. 5, 2017, to U.S. Appl. No. 15/594,856.
Non-Final Office action dated Sep. 18, 2017, to U.S. Appl. No. 14/543,786.
Notice of Allowance dated Jul. 14, 2017, to U.S. Appl. No. 15/385,803.
Notice of Allowance dated Sep. 13, 2017, to U.S. Appl. No. 14/275,637.
CN Second Office Action dated Sep. 27, 2017 for CN Patent Application No. 201610181336.1.
KR Provisional Rejection dated Oct. 17, 2017, to KR Patent Application No. 10-2015-7027963.
Notice of Allowance dated Nov. 2, 2017, to U.S. Appl. No. 15/409,844.
Notice of Allowance dated Nov. 24, 2017, to U.S. Appl. No. 14/275,637.
Supplemental Notice of Allowance dated Nov. 1, 2017, to U.S. Appl. No. 14/275,637.
EP Extended Search Report dated Mar. 9, 2018, to EP Patent Application No. 18155378.5.
Examination Report dated Mar. 22, 2018, to TW Patent Application No. 103117122.
Examiner-Initiated Interview Summary dated Apr. 5, 2018, to U.S. Appl. No. 14/275,637.
Final Office Action dated Mar. 7, 2018, to U.S. Appl. No. 14/543,786.
Non-Final Office action dated Jan. 26, 2018, to U.S. Appl. No. 15/184,755.
Notice of Allowance dated Feb. 9, 2018, for U.S. Appl. No. 14/275,637.
Notice of Allowance dated Mar. 26, 2018, to U.S. Appl. No. 15/409,844.
Notification of Provisional Rejection dated Jan. 18. 2018 to KR Patent Application No. 10-2017-7018730.
Office action dated Feb. 2. 2018, to JP Patent Application No. 2016-519508.
Penultimate Office action dated Mar. 22, 2018, to JP Patent Application No. 2016-90252.
Provisional Rejection dated Mar. 14, 2018, to KR Patent Application No. 10-2018-7003619.
Third Office Action dated Feb. 27, 2018, to CN Patent Application No. 201480027671.5.
Applicant-Initiated Interview Summary dated May 30, 2018, to U.S. Appl. No. 15/184,755.
Corrected Notice of Allowability dated Jun. 26, 2018, to U.S. Appl. No. 15/594,856.
Final Office Action dated May 14, 2018, to JP Patent Application No. 2016-148189.
Non-Final Office Action dated Jun. 29, 2018, to U.S. Appl. No. 15/605,806.
Notice of Allowability dated Jun. 29, 2018, to U.S. Appl. No. 14/275,637.
Notice of Allowance dated Jun. 21, 2018, to U.S. Appl. No. 15/409,844.
Notice of Allowance dated Jun. 29, 2018, to U.S. Appl. No. 15/184,755.
Notice of Allowance dated May 24, 2018, to U.S. Appl. No. 15/409,844.
Provisional Rejection dated Jul. 6, 2018, to KR Patent Application No. 9-5-2018-046228232.
Examination report dated Aug. 13, 2018, to TW Patent Application 106145084.
Notification of First Refusal dated Oct. 23, 2018, to KR Patent application No. 10-2017-7018730.
Notification of First Refusal dated Oct. 23, 2018, to KR Patent application No. 10-2017-7018732.
Office action dated Sep. 3, 2018, to CN Patent Application No. 201710428301.8.
Provisional Rejection dated Sep. 10, 2018, to KR Patent Application No. 10-2018-7016567.
Non-Final Office action dated Oct. 17, 2018, to U.S. Appl. No. 15/446,984.
Notice of Allowance dated Aug. 24, 2018, to U.S. Appl. No. 15/409,844.
Notice of Allowance dated Oct. 18, 2018, to U.S. Appl. No. 14/543,786.
Notice of Allowance dated Sep. 17, 2018, to U.S. Appl. No. 15/184,755.
Notice of Allowance dated Sep. 24, 2018, to U.S. Appl. No. 14/275,637.
Office action dated Oct. 8, 2018, to CN Patent Application No. 201610837821.X.
EP Search report dated Mar. 25, 2019 to EP Patent Application No. 18201256.7.
Final Office action dated Mar. 22, 2019, to U.S. Appl. No. 15/446,984.
Final Office action dated Nov. 16, 2018, to JP Patent Application No. 2016-090252.
JP Official Action dated Aug. 3, 2018 to JP Patent Application No. 2017-255134.
Non Final Office Action dated Mar. 28, 2019 to U.S. Appl. No. 16/102,392.
Notice of Allowance dated Mar. 7, 2019 to U.S. Appl. No. 15/605,806.
Notice of Allowance dated Apr. 17, 2019 to U.S. Appl. No. 15/184,755.
Notice of Allowance dated Dec. 13, 2018, to U.S. Appl. No. 15/184,755.
Notice of Allowance dated Dec. 19, 2018, to U.S. Appl. No. 15/409,844.
Notice of Allowance dated Feb. 14, 2019 to U.S. Appl. No. 14/275,637.
Notice of Allowance dated Feb. 27, 2019, to U.S. Appl. No. 14/543,786.
Notice of Allowance dated Jan. 24, 2019, to U.S. Appl. No. 15/605,806.
Notice of Allowance dated Jan. 24, 2019, U.S. Appl. No. 14/275,637.
Notice of Allowance dated Mar. 4, 2019, to U.S. Appl. No. 15/409,844.
Notice of Allowance dated Mar. 8, 2019 to U.S. Appl. No. 14/275,637.
Notice of Allowance dated Nov. 7, 2018, to U.S. Appl. No. 15/409,844.
Office action dated Feb. 28, 2019, to CN Patent Application No. 201810257998.1.
Provisional Rejection dated Jan. 28, 2019, to KR Patent Application No. 10-2018-7035564.
Second Office Action dated Jun. 26, 2018 for CN Patent Application No. 201710427402.3.
Supplemental Notice of Allowability dated Feb. 28, 2019, to U.S. Appl. No. 15/184,755.
European Search Report dated Apr. 17, 2019 in European Application No. 19162637.3.
Examination Report dated May 2, 2019 in Taiwanese Patent Application No. 107116642.
Non-Final Office Action dated May 23, 2019 in U.S. Appl. No. 15/409,844.
Notice of Allowance dated Jun. 14, 2019 in U.S. Appl. No. 15/446,984.
Notification of Reasons for Refusal issued in Korean Patent Application No. 10-2019-7008155, dated Apr. 4, 2019.
Office Action dated Apr. 23, 2019 in Japanese Patent Application No. 2018-140175.
Office Action dated Apr. 26, 2019 in Chinese Patent Application No. 201610837821.X.
Office Action dated May 7, 2019 in Japanese Patent Application No. 2018-142544.
Related Publications (1)
Number Date Country
20160207313 A1 Jul 2016 US
Provisional Applications (1)
Number Date Country
61142575 Jan 2009 US
Divisions (1)
Number Date Country
Parent 13551209 Jul 2012 US
Child 13776602 US
Continuations (2)
Number Date Country
Parent 13776602 Feb 2013 US
Child 14996086 US
Parent 12652040 Jan 2010 US
Child 13551209 US
Continuation in Parts (1)
Number Date Country
Parent 12139391 Jun 2008 US
Child 12652040 US