Claims
- 1. A method for forming a resist pattern consisting essentially of:
- (i) preparing a resist by coating on a substrate a photosensitive resin composition as a single layer, the composition consisting essentially of:
- (a) a polymer having one or more silyloxy groups,
- (b) a compound or polymer capable of generating an acid due to irradiation of an active light ray, and
- (c) optionally a binder resin;
- (ii) irradiating said resist with an active light ray through a pattern mask and letting said silyloxy groups dissociate from the polymer (a) to form silanol compounds;
- (iii) bringing the resist into contact with volatile organic solvent vapor formed from a solvent having a boiling point of not more than 150.degree. C. to remove said silanol compounds on an irradiated portion, resulting in making the irradiated portion removable by oxygen plasma, and
- (iv) subjecting said resist to oxygen plasma to remove the irradiated portion.
- 2. The method according to claim 1, wherein said volatile organic solvent vapor is the vapor of a low molecular weight volatile solvent selected from the group consisting of an alcohol, an ester, a ketone, an ether, and an aliphatic hydrocarbon solvent.
- 3. The method according to claim 2, wherein the solvent is selected from the group consisting of acetone, methanol, n-propanol, methyl ethyl ketone and n-hexane.
Priority Claims (1)
Number |
Date |
Country |
Kind |
5-159902 |
May 1993 |
JPX |
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Parent Case Info
This application is a continuation of now abandoned application, Ser. No. 08/248,203, filed May 24, 1994 now abandoned.
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Foreign Referenced Citations (1)
Number |
Date |
Country |
4-69662 |
Mar 1992 |
JPX |
Non-Patent Literature Citations (2)
Entry |
Yamaoka et al., Polymer Engineering and Science, vol. 29, No. 13, "A Novel Positive Resist for Deep UV Lithography", Mid-Jul., 1992, pp. 856-858. |
Aoai et al., J. Photopolym. Sci. Technol., vol. 3, No. 3, "Application of Silylether and Silylester Polymer for Chemical Amplification System", 1990, pp. 389-400. |
Continuations (1)
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Number |
Date |
Country |
Parent |
248203 |
May 1994 |
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