Claims
- 1. A method producing an interface connection through a hole in a high-temperature-resistant and vacuum-proof insulating part made of one of ceramic, glass and a single crystal, which interface connection comprises a metallic lead inserted into the hole and having a coefficient of thermal expansion less than that of the insulating part, wherein at least one end of the lead, when it is flush with at least one surface of the insulating part, is covered with active brazing material which high-vacuum-seals it to the insulating part, and when it projects beyond at least one surface of the insulating part, is high-vacuum-sealed to the insulating part by means of ring-shaped active brazing material, with at least one conductive layer provided on at least one of the surfaces of the insulating part and making contact to the lead, said method comprising the following features:
- depositing the at least one conductive layer on the insulating part provided with the hole, which has a spot facing on the conductive-layer side, such that the conductive layer extends into the hole;
- inserting the lead into the hole;
- widening an end of the lead which is located on the conductive-layer side, such that said end and the conductive layer extending into the hole are cold-welded together;
- depositing a sufficient amount of active brazing material consisting essentially of a metal and an active metal on an opposite side of the insulating part from the conductive layer, wherein the active metal content is just sufficient for wetting the points of contact with the insulating part, and
- heating the active brazing material to a temperature above the melting point of the active brazing material until the latter has completely melted so that the active brazing material enters and moves into the hole around the lead by capillary action and wets the lead and the hole, and subsequently allowing it to cool down.
- 2. A method as claimed in claim 1 wherein the conductive layer is deposited by sputtering.
- 3. A method as claimed in claim 2, wherein the heating step is in a vacuum having a residual-gas pressure of less than 0.01 .mu.bar (=1 mPa).
- 4. A method as claimed in claim 2, wherein the heating step is in a gas atmosphere having a pressure not exceeding 10 mbars (=1 kPa).
- 5. A method as claimed in claim 2, wherein the heating step is in a gas atmosphere comprising an inert gas or a reactive gas or of a mixture of inert and/or reactive gases.
- 6. A method as claimed in claim 1 wherein the heating step is in a vacuum having a residual-gas pressure of less than 0.01 .mu.bar (=1 mPa).
- 7. A method as claimed in claim 1 wherein the heating step is in a gas atmosphere having a pressure not exceeding 10 mbars (=1 kPa).
- 8. A method as claimed in claim 1 wherein the heating step is in a gas atmosphere comprising an inert gas or a reactive gas or of a mixture of inert and/or reactive gases.
Priority Claims (1)
Number |
Date |
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Kind |
91108553 |
May 1991 |
EPX |
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Parent Case Info
This is a division of U.S. patent application Ser. No. 07/981,781, to Hegner et al., filed Nov. 25, 1992, now U.S. Pat. No. 5,539,611, which is a continuation of U.S. patent application Ser. No. 07/878,516, to Hegner et al., filed May 5, 1992 and now abandoned.
US Referenced Citations (16)
Foreign Referenced Citations (8)
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DEX |
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Divisions (1)
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Number |
Date |
Country |
Parent |
981781 |
Nov 1992 |
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Continuations (1)
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Number |
Date |
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Parent |
878516 |
May 1992 |
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