Number | Date | Country | Kind |
---|---|---|---|
3445527 | Dec 1984 | DEX |
This is a continuation, of application Ser. No. 802,258, filed Nov. 27, 1985 abandoned.
Number | Name | Date | Kind |
---|---|---|---|
3752711 | Kooi et al. | Aug 1973 | |
3852104 | Kooi et al. | Dec 1974 | |
4139442 | Bondur et al. | Feb 1979 | |
4170492 | Bartlett et al. | Oct 1979 | |
4325169 | Pander et al. | Apr 1982 | |
4418094 | See et al. | Nov 1983 | |
4420344 | Davies et al. | Dec 1983 | |
4435896 | Parillo et al. | Mar 1984 | |
4442591 | Haken | Apr 1984 | |
4454648 | Hsia | Jun 1984 | |
4484978 | Keyser | Nov 1984 | |
4484979 | Stocker | Nov 1984 | |
4490736 | McElroy | Dec 1984 | |
4561170 | Dacring et al. | Dec 1985 | |
4562638 | Schwabe et al. | Jan 1986 |
Entry |
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Zarowin; C. B., "Plasma Etch Anisatropy . . . ", Journal of the Electrochemical Society, vol. 130, #5, May 1983, pp. 1144-1152. |
Philips Research Reports, vol. 26, No. 3, Jun. 1971, "Local Oxidation of Silicon; New Technical Aspects", pp. 157-165, Appels and Paffen. |
IEDM Technical Digest, 1982, pp. 220-223, "Electrical Properties of MOS Devices Made with Silo Technology", Hui et al. |
IEDM Technical Digest, 1982, pp. 224-227, "The Swami--A Defect Free and Near-Zero Bird's-Beak Local Oxidation Process and Its Application in VLSI Technology", Chiu et al. |
IEEE Transaction on Electronic Devices, No. 4, Ed-29, Apr. 1982, pp. 541-547, "Direct Moat Isolation for VLSI", Wang et al. |
Number | Date | Country | |
---|---|---|---|
Parent | 802258 | Nov 1985 |