Number | Date | Country | Kind |
---|---|---|---|
44 27 515 | Aug 1994 | DEX |
Filing Document | Filing Date | Country | Kind | 102e Date | 371c Date |
---|---|---|---|---|---|
PCT/DE95/00998 | 8/1/1995 | 1/30/1997 | 1/30/1997 |
Publishing Document | Publishing Date | Country | Kind |
---|---|---|---|
WO96/04683 | 2/15/1996 |
Number | Name | Date | Kind |
---|---|---|---|
4142893 | Adlerstein et al. | Mar 1979 | |
4237600 | Rosen et al. | Dec 1980 | |
4983251 | Haisma et al. | Jan 1991 | |
5087585 | Hayashi | Feb 1992 | |
5250843 | Eichelberger | Oct 1993 | |
5391257 | Sullivan et al. | Feb 1995 | |
5453394 | Yonehara et al. | Sep 1995 |
Number | Date | Country |
---|---|---|
0531723 A1 | Mar 1993 | EPX |
2489041 | Feb 1982 | FRX |
43 08 705 A1 | Sep 1993 | DEX |
Entry |
---|
Japanese Journal of Applied Physics, vol. 23, No. 10, Oct. 1984, Tokyo, T. Hamaguchi et al., Device Layer Transfer Technique Using Chemi-Mechanical Polishing, pp. L815-L817. |